Gaseous dielectrics with low global warming potentials

摘要

A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf

权利要求

What is claimed is:

1. A method of using a gaseous dielectric compound to insulate electrical equipment comprising the steps of:

providing electrical equipment configured to have an insulation gas, the electrical equipment being selected from the group consisting of current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insulated substations; and

placing an insulation gas in the electrical equipment, the insulation gas consisting of:

at least one gas selected from the group consisting of nitrogen, CO₂ and N₂O; and

a gaseous compound selected to have each of the following properties:

a boiling point in the range between about −20° C. to about −273° C.;

a GWP less than about 22,200;

chemical stability, as measured by a negative standard enthalpy of formation (dHf<0);

a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL in the working environment; and

a dielectric strength greater than air.

2. The method of claim 1, wherein the gaseous compound is selected from the group consisting of:

Arsenic pentaflouride;

Arsine;

Diboron tetrafluoride;

Diborane;

Perchloric acid, 2-chloro-1,1,2,2-tetrafluoroethyl ester;

Perchloric acid, 1,2,2-trichloro-1,2-difluoroethyl ester;

Trifluoroacetyl chloride;

trifluoromethylisocyanide (CF3—NC);

trifluoro-nitroso-ethene;

Tetrafluoroethene;

3,3,4,4-tetrafluoro-3,4-dihydro-[1,2]diazete;

(Difluoramino)difluoracetonitrile;

Tetrafluorooxirane;

Trifluoroacetyl fluoride;

Perfluormethylfluorformate;

trifluoro-aceryl hypofluorite;

perfluoro-2-aza-1-propene;

3,3-difluoro-2-trifluoromethyl-oxaziridine;

bis-trifluoromethyl-diazene;

Fluoroxypentafluoroethane;

bis-trifluoromethyl peroxide;

1,1-Bis(fluoroxy)tetrafluoroethane;

Hexafluorodimethyl sulfide;

3-fluoro-3H-diazirine-3-carbonitrile;

Ethyne;

1,2,2-trifluoro-aziridine;

Ketene;

(difluoro)vinylborane;

trifluoro-vinyl-silane;

Ethinylsilane;

ethyl-difluor-borane;

methyl-methylen-amine;

Dimethyl ether;

vinyl-silane;

Dimethylsilane;

Chloroethyne;

fluoroethyne;

Ethanedinitrile;

1,3,3,3-tetrafluoropropyne;

hexafluoro-oxetane;

Trifluoro(trifluoromethyl)oxirane;

1,1,1,3,3,3-Hexafluoropropanone;

pentafluoro-propionyl fluoride;

Trifluoromethyl trifluorovinyl ether;

1-Propyne;

Cyclopropane;

Propane;

Trimethylborane;

Cyanoketene;

Butatriene;

Cyano-bispentafluorethyl-phosphine;

Trimethyl-1,1,2,2-tetrafluorethylsilane;

methyl diborane;

carbonyl bromide fluoride;

chloro-difluoro-nitroso-methane;

chloroperoxytrifluorornethane;

carbonylchlor-fluoride;

3,3-difluoro-3H-diazirine;

difluoro diazomethane;

Carbonyl fluoride;

Difluordioxiran;

difluoro-(3-fluoro-3H-diazirin-3-yl)-amine;

trifluoromethylazide;

tetrafluoro-diaziridine;

Fluoroperoxytrifluormethane;

Bis(fluoroxy)difluormethane;

Trifluormethyl-phosphonylfluoride;

Cyanogen fluoride;

Diazomethane;

formaldehyde;

(methyl)difluoroborane;

Chloromethane;

methylphosphonous acid difluoride;

trifluoro-methoxy-silane;

Methylhypofluoride;

Methane;

Methylsilane;

bromo(silylmethyl)silane;

iodo(silylmethyl)silane;

Difluoromethyl nitrite;

Trifluoromethanol;

Formyl fluoride;

Cyanic acid;

Chlorine;

Chlorine fluoride;

Chlorine trioxide fluoride;

carbon oxide selenide;

Fluorine;

Difluorosilane;

Fluorine oxide;

fluorine peroxide;

Sulfuryl fluoride;

sulphur difluoride;

Phosphorus trifluoride oxide;

Phosphorus trifluoride sulfide;

Tetrafluorophosphorane;

Tetrafluorohydrazine;

Sulfur tetrafluoride;

hexafluoro disiloxane;

Nitryl fluoride;

Hydrogen;

Hydrogen selenide;

Phosphorus trihydride;

Germanium hydride;

Silane;

Tin tetrahydride;

Oxygen;

Ozone;

Antimony monophosphide;

Disilicon monophosphide;

Radon;

Argon;

Trifluoroborane;

Hydrogen bromide;

Bromopentafluoroethane;

Chlorotrifluoroethene;

Trifluoroacetonitrile;

trifluoromethyl isocyanate;

trifluoromethyl thiocarbonyl fluoride;

pentafluoro-nitroso-ethane;

(trifluoromethyl-carbonyl)-difluoro-amine;

Hexafluoroethane;

Bis-trifluoromethyl-nitroxide;

bis-trifluoromethyl ether;

bis(trifluoromethyl)tellurium;

bis(trifluoromethyl) ditelluride;

N,N-Difluor-Dentafluoroethylamine;

N-Fluor-bis(trifluormethyl)-amine;

N-Fluor-N-trifluormethoxy-perfluoromethylamine;

fluoroformyl cyanide;

1-chloro-1-fluoro-ethene;

trans-1,2-difluoro-ethene;

1,2-difluoro-ethene;

cis-1,2-difluoro-ethene

1,1,1,2-Tetrafluoroethane;

1,1,2,2-Tetrafluoroethane;

Fluoroethene;

1,1,1-Trifluoroethane;

Ether, methyl trifluoromethyl;

Ethene;

1,1-Difluoroethane;

Fluoroethane;

Ethane;

fluoro-dimethyl-borane;

Disiloxane 1,1,3,3-tetrafluoro-1,3-dimethyl-trifluoroethene;

trifluoroacetaldehyde;

Pentafluoroethane;

Difluoromethyl trifluoromethyl ether;

Tris(trifluoromethyl)bismuth;

tetrafluoropropadiene;

tetrafluorocyclopropene;

Perfluoropropionyliodide;

pentafluoro-propionitrile;

hexafluoro-cyclopropane;

Hexafluoropropylene;

hexafluoro-[1,3]dioxolane;

Octafluoropropane;

Perfluormethylethylether;

1,1-difluoro-propadiene; 2,3,3,3-tetrafluoro-propene;

trans HFO-1234ze;

3,3,3-Trifluoropropene;

Cyclopropene;

Allene;

1,1-difluoro-propene;

Methylketene;

2-fluoropropene;

1-Propene;

DL-2-aminopropanoic acid;

3,3,3-trifluoro-1-propyne;

1,1,3,3,3-pentafluoro-propene;

1,2,3,3,3-pentafluoro-propene;

1,1,1,4,4,4-hexafluoro-2-butyne;

1,1,4,4-tetrafluoro-butane-2,3-dione;

Trifluoromethylhypochlorite;

Chloro-difluoro-methyl-hvpoflourite;

Chlorodifluorodifluoraminomethane;

thiocarbonyl difluoride;

Trifluoroiodomethane;

trifluoro-nitroso-methane;

difluoro-carbamoyl fluoride;

trifluoro-nitro-methane;

Tetrafluoromethane;

Tetrafluorourea;

hypofluorous acid trifluoromethyl ester;

trifluoromethanesulfonyl fluoride;

N,N-Difluor-trifluoromethylamine;

Trifluormethyloxydifluoroamine;

sulfurcyanide pentafluoride;

difluoro-trifluoromethyl-phosphine;

Hexafluormethandiamine;

perfluoro methyl silane;

Difluoromethane;

Fluoroiodomethane;

Fluoromethane;

trifluoromethyl-silane;

methyltrifluorosilane;

difluoro-methyl-silane;

fluoro-methyl-silane;

methylgermane;

Difluorformimin;

Trifluoromethane;

trifluoromethane thiol;

N,N,1,1-Tetrafluormethylamin;

difluoro dichlorosilane;

difluoro chlorosilane;

Phosphorus chloride difluoride;

Chlorotrifluorosilane;

Hydrogen chloride;

Chlorosilane;

Carbon monoxide;

Carbonyl sulfide;

Difluoramine;

trans-Difluorodiazine;

cis-Difluorodiazine;

Thionyl fluoride;

Trifluorosilane;

Nitrogen trifluoride;

Trifluoramine oxide;

thiazyl trifluoride;

Phosphorus trifluoride;

Germanium(IV) fluoride;

Tetrafluorosilane;

Phosphorus pentafluoride;

Selenium hexafluoride;

Tellurium hexafluoride;

Fluorosilane;

Nitrosyl fluoride;

Fluorine nitrate;

Hydrogen sulfide;

Ammonia;

Helium;

Hydrogen iodide;

Krypton;

Neon;

Nitrogen oxide; and

Xenon.

3. The method of claim 2, wherein the gaseous compound is selected from the group consisting of:

Argon;

Trifluoroborane;

Hydrogen bromide;

Bromopentafluoroethane;

Chlorotrifluoroethene;

Trifluoroacetonitrile;

trifluoromethyl isocyanate;

trifluoromethyl thiocarbonyl fluoride;

pentafluoro-nitroso-ethane;

(trifluoromethyl-carbonyl)-difluoro-amine;

Hexafluoroethane;

Bis-trifluoromethyl-nitroxide;

bis-trifluoromethyl ether;

bis(trifluoromethyl)tellurium;

bis(trifluoromethyl) ditelluride;

N,N-Difluor-pentafluoroethylamine;

N-Fluor-bis(trifluormethyl)-amine;

N-Fluor-N-trifluormethoxy-perfluoromethylamine;

fluoroformyl cyanide;

1-chloro-1-fluoro-ethene;

trans-1,2-difluoro-ethene;

1,2-difluoro-ethene;

cis-1,2-difluoro-ethene;

1,1,1,2-Tetrafluoroethane;

1,1,2,2-Tetrafluoroethane;

Fluoroethene;

1,1,1-Trifluoroethane;

Ether, methyl trifluoromethyl;

Ethene;

1,1-Difluoroethane;

Fluoroethane;

Ethane;

fluoro-dimethyl-borane;

Disiloxane 1,1,3,3-tetrafluoro-1,3-dimethyl-trifluoroethene;

trifluoroacetaldehyde;

Pentafluoroethane;

Difluoromethyl trifluoromethyl ether;

Tris(trifluoromethyl)bismuth;

tetrafluoropropadiene;

tetrafluorocyclopropene;

Perfluoropropionyliodide;

pentafluoro-propionitrile;

hexafluoro-cyclopropane;

Hexafluoropropylene;

hexafluoro-[1,3]dioxolane;

Octafluoropropane;

Perfluormethylethylether;

1,1-difluoro-propadiene;

2,3,3,3-tetrafluoro-propene;

trans HFO-1234ze;

3,3,3-Trifluoropropene;

Cyclopropene;

Allene;

1,1-difluoro-propene;

Methylketene;

2-fluoropropene;

1-Propene;

DL-2-aminopropanoic acid;

3,3,3-trifluoro-1-propyne;

1,1,3,3,3-pentafluoro-propene;

1,2,3,3,3-pentafluoro-propene;

1,1,1,4,4,4-hexafluoro-2-butyne;

1,1,4,4-tetrafluoro-butane-2,3-dione;

Trifluoromethylhypochlorite;

Chloro-difluoro-methyl-hypofluorite;

Chlorodifluordifluoraminomethane;

thiocarbonyl difluoride;

selenocarbonyl difluoride;

Trifluoroiodomethane;

trifluoro-nitroso-methane;

difluoro-carbamoyl fluoride;

trifluoro-nitro-methane;

Tetrafluoromethane;

Tetrafluorourea;

hypofluorous acid trifluoromethyl ester;

trifluoromethanesulfonyl fluoride;

Trifluormethyloxydifluoramin;

(Difluoraminoxy)difluoromethylhypofluorite;

sulfurcyanide pentafluoride;

difluoro-trifluoromethyl-phosphine;

Hexafluormethandiamine;

perfluoro methyl silane;

Difluoromethane;

Fluoroiodomethane;

fluoromethane;

methyltrifluorosilane;

difluoro-methyl-silane;

fluoro-methyl-silane;

methylgermane;

Difluorformimin;

Trifluoromethane;

trifluoromethane thiol;

N,N,1,1-Tetrafluormethylamin;

difluoro dichlorosilane;

difluoro chlorosilane;

Phosphorus chloride difluoride;

Chlorotrifluorosilane;

Hydrogen chloride;

Chlorosilane;

Carbon monoxide;

Carbonyl sulfide;

Difluoramine;

trans-Difluorodiazine;

cis-Difluorodiazine;

Thionyl fluoride;

Trifluorosilane;

Nitrogen trifluoride;

Trifluoramine oxide;

thiazyl trifluoride;

Phosphorus trifluoride;

Germanium(IV) fluoride;

Tetrafluorosilane;

Phosphorus pentafluoride;

Selenium hexafluoride;

Tellurium hexafluoride;

Fluorosilane;

Nitrosyl fluoride;

Fluorine nitrate;

Hydrogen sulfide;

Ammonia;

Helium;

Hydrogen iodide;

Krypton;

Neon;

Nitrogen oxide; and

Xenon.

4. A method of using a gaseous dielectric compound to insulate electrical equipment comprising the steps of:

providing electrical equipment configured to have an insulation gas; and

placing an insulation gas in the electrical equipment, the insulation gas consisting of:

at least one gas selected from the group consisting of nitrogen, CO₂ and N₂O; and

tetrafluorosilane.

5. The method of claim 4, wherein the electrical equipment is selected from the group consisting of current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insulated substations.

6. The method of claim 4, wherein the electrical equipment has SF₆ as an existing insulation gas and the step of placing comprises replacing the SF₆ with the insulation gas.

7. The method of claim 1, wherein the electrical equipment has SF₆ as an existing insulation gas and the step of placing comprises replacing the SF₆ with the insulation gas.

8. The method of claim 1, wherein the gaseous compound is low ozone depleting.

9. The method of claim 1, wherein the gaseous compound is non-ozone depleting.

10. A method of using a gaseous dielectric compound to insulate electrical equipment comprising the steps of:

providing electrical equipment having SF₆ as an insulation gas; and

replacing the SF₆ with an insulation gas, the insulation gas consisting of:

at least one gas selected from the group consisting of nitrogen, CO₂ and N₂O; and

a gaseous compound selected to have each of the following properties:

a boiling point in the range between about −20° C. to about −273° C.;

a GWP less than about 22,200;

chemical stability, as measured by a negative standard enthalpy of formation (dHf<0);

a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL in the working environment; and

a dielectric strength greater than air.

11. The method of claim 10, wherein the electrical equipment is selected from the group consisting of current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insulated substations.

说明书

FIELD

The present disclosure relates generally to a class of gaseous dielectric compounds having low global warming potentials (GWP). In particular, such gaseous dielectric compounds exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; low, preferably non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf<0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL, e.g., a PEL greater than about 0.3 ppm by volume (i.e., an Occupational Exposure Limit (OEL or TLV) of greater than about 0.3 ppm); and a dielectric strength greater than air. These gaseous dielectric compounds are particularly useful as insulating-gases for use with electrical equipment, such as gas-insulated circuit breakers and current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, or gas-insulated substations.

BACKGROUND

Sulfur hexafluoride (SF₆) has been used as a gaseous dielectric (insulator) in high voltage equipment since the 1950s. It is now known that SF₆ is a potent greenhouse warming gas with one of the highest global warming potentials (GWP) known. Because of its high GWP, it is being phased out of all frivolous applications. However, there is currently no known substitute for SF₆ in high voltage equipment. The electrical industry has taken steps to reduce the leak rates of equipment, monitor usage, increase recycling, and reduce emissions to the atmosphere. However, it would still be advantageous to find a substitute for SF₆ in electrical dielectric applications.

The basic physical and chemical properties of SF₆, its behavior in various types of gas discharges, and its uses by the electric power industry have been broadly investigated.

In its normal state, SF₆ is chemically inert, non-toxic, non-flammable, non-explosive, and thermally stable (it does not decompose in the gas phase at temperatures less than 500° C.). SF₆ exhibits many properties that make it suitable for equipment utilized in the transmission and distribution of electric power. It is a strong electronegative (electron attaching) gas both at room temperature and at temperatures well above ambient, which principally accounts for its high dielectric strength and good arc-interruption properties. The breakdown voltage of SF₆ is nearly three times higher than air at atmospheric pressure. Furthermore, it has good heat transfer properties and it readily reforms itself when dissociated under high gas-pressure conditions in an electrical discharge or an arc (i.e., it has a fast recovery and it is self-healing). Most of its stable decomposition byproducts do not significantly degrade its dielectric strength and are removable by filtering. It produces no polymerization, carbon, or other conductive deposits during arcing, and its is chemically compatible with most solid insulating and conducting materials used in electrical equipment at temperatures up to about 200° C.

Besides it good insulating and heat transfer properties, SF₆ has a relatively high pressure when contained at room temperature. The pressure required to liquefy SF₆ at 21° C. is about 2100 kPa; its boiling point is reasonably low, −63.8° C., which allows pressures of 400 kPa to 600 kPa (4 to 6 atmospheres) to be employed in SF₆-insulated equipment. It is easily liquefied under pressure at room temperature allowing for compact storage in gas cylinders. It presents no handling problems, is readily available, and reasonably inexpensive.

SF₆ replaced air as a dielectric in gas insulated equipment based on characteristics such as insulation ability, boiling point, compressibility, chemical stability and non-toxicity. They have found that pure SF₆, or SF₆-nitrogen mixtures are the best gases to date.

However, SF₆ has some undesirable properties: it can form highly toxic and corrosive compounds when subjected to electrical discharges (e.g., S₂F₁₀, SOF₂); non-polar contaminants (e.g., air, CF₄) are not easily removed from it; its breakdown voltage is sensitive to water vapor, conducting particles, and conductor surface roughness; and it exhibits non-ideal gas behavior at the lowest temperatures that can be encountered in the environment, i.e., in cold climatic conditions (about −50° C.), SF₆ becomes partially liquefied at normal operating pressures (400 kPa to 500 kPa). SF₆ is also an efficient infrared (IR) absorber and due to its chemical inertness, is not rapidly removed from the earth's atmosphere. Both of these latter properties make SF₆ a potent greenhouse gas, although due to its chemical inertness (and the absence of chlorine and bromine atoms in the SF₆ molecule) it is benign with regard to stratospheric ozone depletion.

That is, greenhouse gases are atmospheric gases which absorb a portion of the infrared radiation emitted by the earth and return it to earth by emitting it back. Potent greenhouse gases have strong infrared absorption in the wavelength range from approximately 7 μm to 13 μm. They occur both naturally in the environment (e.g., H₂O, CO₂, CH₄, N₂O) and as man-made gases that may be released (e.g., SF₆; perfluorinated compound (PFC); combustion products such as CO₂, nitrogen, and sulfur oxides). The effective trapping of long-wavelength infrared radiation from the earth by the naturally occurring greenhouse gases, and its reradiation back to earth, results in an increase of the average temperature of the earth's surface. Mans impact on climate change is an environmental issue that has prompted the implementation of the Kyoto Protocol regulating the emissions of man made greenhouse gases in a number of countries.

SF₆ is an efficient absorber of infrared radiation, particularly at wavelengths near 10.5 μm. Additionally, unlike most other naturally occurring green house gases (e.g., CO₂, CH₄), SF₆ is only slowly decomposed; therefore its contribution to global warming is expected to be cumulative and long lasting. The strong infrared absorption of SF₆ and its long lifetime in the environment are the reasons for its extremely high global warming potential which for a 100-year time horizon is estimated to be approximately 22,200 times greater (per unit mass) than that of CO₂, the predominant contributor to the greenhouse effect. The concern about the presence of SF₆ in the environment derives exclusively from this very high value of its potency as a greenhouse gas.

Accordingly, many in the electrical equipment industry have spent substantial time and effort seeking suitable replacement gases to reduce the use of SF₆ in high voltage electrical equipment. To date, the possible replacement gases have been identified as (i) mixtures of SF₆ and nitrogen for which a large amount of research results are available; (ii) gases and mixtures (e.g., pure nitrogen, low concentrations of SF₆ in N₂, and SF₆—He mixtures) for which a smaller yet significant amount of data is available; and (iii) potential gases for which little experimental data is available.

Some replacements which have been proposed have higher GWPs than SF₆. For example, CF₃SF₅ falls into this category. Because of fugitive emissions in the manufacture, transportation, filling and use of such chemicals, they should be avoided.

However, the present inventors have determined that given the environmental difficulty of SF₆, it is necessary to relax certain of the requirements traditionally held as important and accept as an alternative gas, compromise candidates with a lower GWP. For example, gases which are non-toxic are often inert with long atmospheric lifetimes which can yield high GWP. By accepting a somewhat more reactive gas than SF₆, the GWP can be greatly reduced. It may also be necessary to accept slightly more toxic materials in order to find the best alternative in these applications. Such an increase in toxicity can be offset by reducing equipment leak rates or installing monitoring equipment. In some cases, the gases discovered by the present inventors as suitable alternatives to SF₆ are show to be efficient at low levels and can be mixed with nitrogen and/or another non-toxic gas to give dielectrics with greatly reduced toxicity and acceptably low GWPs.

The unique gaseous compounds discovered by the present inventors for use as substitutes for SF₆ can be used in some existing electrical equipment, although they would preferably be used in specific electrical equipment optimized for them. The gaseous compounds of the present disclosure are preferably used in pure form, but can also be used as part of an azeotrope, or a mixture with an appropriate second gas, such as nitrogen, CO₂ or N₂O.

SUMMARY

A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; low, preferably non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf<0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL (i.e., an Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm); and a dielectric strength greater than air.

The dielectric gaseous compound is at least one compound selected from the group consisting of:

• Arsenic pentafluoride
• Arsine
• Diboron tetrafluoride
• Diborane
• Perchloric acid, 2-chloro-1,1,2,2-tetrafluoroethyl ester (9CI)
• Perchloric acid, 1,2,2-trichloro-1,2-difluoroethyl ester
• Trifluoroacetyl chloride
• trifluoromethylisocyanide (CF₃—NC)
• trifluoromethyl isocyanide
• trifluoro-nitroso-ethene//Trifluor-nitroso-aethen
• Tetrafluoroethene
• 3,3,4,4-tetrafluoro-3,4-dihydro-[1,2]diazete
• (Difluoramino)difluoracetonitril
• Tetrafluorooxirane
• Trifluoroacetyl fluoride
• Perfluormethylfluorformiat
• trifluoro-acetyl hypofluorite
• perfluoro-2-aza-1-propene
• Perfluor-2-aza-1-propen (germ.)
• N-Fluor-tetrafluor-1-aethanimin (germ.)
• 3,3-difluoro-2-trifluoromethyl-oxaziridine
• bis-trifluoromethyl-diazene//hexafluoro-#cis!-azomethane
• Fluoroxypentafluoroethane
• bis-trifluoromethyl peroxide
• 1,1-Bis(fluoroxy)tetrafluoroaethan
• Hexafluorodimethyl sulfide
• 3-fluoro-3#H!-diazirine-3-carbonitrile
• Ethyne
• 1,2,2-trifluoro-aziridine
• Ketene
• (difluoro)vinylboran
• (Difluor)vinylboran (germ.)
• trifluoro-vinyl-silane
• Ethinylsilan
• ethyl-difluor-borane
• Ethyl-difluor-boran (germ.)
• methyl-methylen-amine
• Dimethyl ether
• vinyl-silane
• Dimethylsilane
• Chloroethyne
• fluoroethyne//fluoro-acetylene
• Ethanedinitrile
• tetrafluoropropyne//1,3,3,3-tetrafluoropropyne
• hexafluoro-oxetane
• Trifluoro(trifluoromethyl)oxirane
• 1,1,1,3,3,3-Hexafluoropropanone
• pentafluoro-propionyl fluoride//perfluoropropionyl fluoride
• Trifluoromethyl trifluorovinyl ether
• 1-Propyne
• Cyclopropane
• Propane
• Trimethylborane
• cyanoketene
• butatriene
• Cyano-bispentafluorethyl-phosphin
• Trimethyl-1,1,2,2-tetrafluorethylsilan
• methyl diborane
• Methyldiboran (germ.)
• carbonyl bromide fluoride
• chloro-difluoro-nitroso-methane//Chlor-difluor-nitroso-methan
• chloroperoxytrifluoromethane
• carbonylchlorid-fluorid
• Carbonychloridifluorid (germ.)
• 3,3-difluoro-3#H!-diazirine
• difluoro diazomethane
• Difluordiazomethan (germ.)
• Carbonyl fluoride
• Difluordioxiran
• difluoro-(3-fluoro-3#H!-diazirin-3-yl)-amine
• trifluoromethylazide
• Trifluormethylazid (germ.)
• tetrafluoro-diaziridine
• Fluorperoxytrifluormethan
• Bis(fluoroxy)difluormethan
• Trifluormethyl-phosphonylfluorid
• Cyanogen fluoride
• Trifluormethylphosphane (germ.)
• Diazomethane
• formaldehyde//Formalin
• (methyl)difluoroborane
• (Methyl)difluorboran (germ.)
• Chloromethane
• methylphosphonous acid difluoride//difluoro-methyl-phosphine
• trifluoro-methoxy-silane
• Methylhypofluorid
• Methane
• Methylsilane
• #Si!-bromo-#Si!,#Si!-methanediyl-bis-silane
• #Si!-iodo-#Si,#Si!-methanediyl-bis-silane
• Difluormethylnitrit
• trifluoromethanol
• Formyl fluoride
• Cyanic acid
• Chlorine
• Chlorine fluoride
• Chlorine trioxide fluoride
• carbon oxide selenide//Kohlenoxidselenid
• Fluorine
• Difluorosilane
• Fluorine oxide
• fluorine peroxide
• Sulfuryl fluoride
• sulphur difluoride
• Phosphorus trifluoride oxide
• Phosphorus trifluoride sulfide
• tetrafluorophosphorane
• Tetrafluorohydrazine
• Sulfur tetrafluoride
• hexafluoro disiloxane
• Hexafluordisiloxan (germ.)
• Nitryl fluoride
• Hydrogen
• Hydrogen selenide
• Phosphorus trihydride
• Germanium hydride
• Silane
• Tin tetrahydride
• Oxygen
• Ozone
• Antimony monophosphide
• Disilicon monophosphide
• Radon
• Argon
• Trifluoroborane
• Hydrogen bromide
• Bromopentafluoroethane
• Chlorotrifluoroethene
• Trifluoroacetonitrile
• trifluoromethyl isocyanate
• trifluoromethyl thiocarbonyl fluoride
• Trifluormethylthiocarbonylfluorid (germ.)
• pentafluoro-nitroso-ethane//Pentafluor-nitroso-aethan
• (trifluoromethyl-carbonyl)-difluoro-amine
• Hexafluoroethane
• Bis-trifluormethyl-nitroxid
• bis-trifluoromethyl ether
• bis(trifluoromethyl)tellurium
• bis(trifluoromethyl) ditelluride
• N,N-Difluor-pentafluoraethylamin (germ.)
• N-Fluor-bis(trifluormethyl)-amin (germ.)
• N-Fluor-N-trifluormethoxy-perfluormethylamin (germ.)
• fluoroformyl cyanide
• 1-chloro-1-fluoro-ethene//1-Chlor-1-fluor-aethen//1-chloro-1-fluoroethylene
• 1,1-Difluoroethene
• #trans!-1,2-difluoro-ethene//#trans!-vinylene difluoride//(E)-1,2-difluoroethylene//(E)-1,2-difluoro-ethene//#trans!-vinylene fluoride
• 1,2-difluoro-ethene//#cis!-vinylene difluoride//1,2-Difluor-aethen//vinylene fluoride
• #cis!-1,2-difluoro-ethene//#cis!-vinylene difluoride//(Z)-1,2-difluoroethylene//(Z)-1,2-difluoro-ethene//#cis!-vinylene fluoride
• 1,1,1,2-Tetrafluoroethane
• 1,1,2,2-Tetrafluoroethane
• Fluoroethene
• 1,1,1-Trifluoroethane
• Ether, methyl trifluoromethyl
• Ethene
• 1,1-Difluoroethane
• Fluoroethane
• Ethane
• fluoro-dimethyl-borane
• Disiloxane, 1,1,3,3-tetrafluoro-1,3-dimethyl-Trifluoroethene
• trifluoroacetaldehyde//Trifluor-acetaldehyd
• Pentafluoroethane
• Difluoromethyl trifluoromethyl ether
• Tris(trifluoromethyl)bismuth
• tetrafluoropropadiene//tetrafluoro-allene//1,1,3,3-tetrafluoro-1,2-propadiene
• tetrafluorocyclopropene
• Perfluoropropionyliodid
• pentafluoro-propionitrile//pentafluoropropiononitrile
• hexafluoro-cyclopropane//Hexafluor-cyclopropan//freon-#C!216
• Hexafluoropropylene
• hexafluoro-[1,3]dioxolane
• Octafluoropropane
• Perfluormethylethylether
• 1,1-difluoro-propadiene//allenylidene difluoride//1,1-difluoro-allene
• 2,3,3,3-tetrafluoro-propene//HFO-1234yf
• trans HFO-1234ze
• 3,3,3-Trifluoropropene
• cyclopropene
• Allene
• 1,1-difluoro-propene//propenylidene difluoride//1,1-Difluor-propen
• methylketene
• 2-fluoropropene
• 1-Propene
• DL-2-aminopropanoic acid
• 3,3,3-trifluoro-propyne//3,3,3-Trifluor-propin//trifluoromethyl-ethyne//3,3,3-trifluoro-1-propyne
• 1,1,3,3,3-pentafluoro-propene//1,1,3,3,3-Pentafluor-propen
• 1,2,3,3,3-pentafluoro-propene
• 1,1,1,4,4,4-hexafluoro-2-butyne
• 1,1,4,4-tetrafluoro-butane-2,3-dione
• Trifluormethylhypochlorit
• Chlor-difluor-methyl-hypofluorit
• N-Chlor-N-fluor-trifluormethylamin (germ.)
• Chlordifluordifluoraminomethan
• thiocarbonyl difluoride
• Thiocarbonyldifluorid (germ.)
• selenocarbonyl difluoride
• Trifluoroiodomethane
• N-Fluor-difluormethanimin (germ.)
• trifluoro-nitroso-methane//Trifluor-nitroso-methan
• difluoro-carbamoyl fluoride
• trifluoro-nitro-methane//Trifluor-nitro-methan//fluoropicrin
• Tetrafluoromethane
• Tetrafluorformamidin (germ.)
• tetrafluorourea
• hypofluorous acid trifluoromethyl ester//Hypofluorigsaeure-trifluormethylester//trifluoromethyl hypofluorite
• trifluoromethanesulfonyl fluoride
• N,N-Difluor-trifluormethylamin (germ.)
• Trifluormethyloxydifluoramin
• (Difluoraminoxy)difluormethylhypofluorit
• sulfurcyanide pentafluoride
• Schwefelcyanid-pentafluorid (germ.)
• difluoro-trifluoromethyl-phosphine
• Hexafluormethandiamin
• perfluoro methyl silane
• Perfluormethylsilan (germ.)
• Trifluormethyl-tetrafluorphosphoran (germ.)
• Difluoromethane
• Fluoroiodomethane
• fluoromethane//methyl fluoride//Fluor-methan//freon-41
• trifluoromethyl-silane″CF3SiH3
• methyltrifluorosilane
• difluoro-methyl-silane
• fluoro-methyl-silane
• methylgermane
• Difluorformimin
• Trifluoromethane
• trifluoromethane thiol
• Trifluormethanthiol (germ.)
• N,N,1,1-Tetrafluormethylamin
• difluoro dichlorosilane
• Difluordichlorsilan (germ.)
• difluoro chlorosilane
• Difluorchlorsilan (germ.)
• Phosphorus chloride difluoride
• Chlorotrifluorosilane
• Hydrogen chloride
• Chlorosilane
• Carbon monoxide
• Carbon dioxide
• Carbonyl sulfide
• Difluoramine
• trans-Difluorodiazine
• cis-Difluorodiazine
• Thionyl fluoride
• Trifluorosilane
• Nitrogen trifluoride
• Trifluoramine oxide
• thiazyl trifluoride
• Phosphorus trifluoride
• Germanium(IV) fluoride
• Tetrafluorosilane
• Phosphorus pentafluoride
• Selenium hexafluoride
• Tellurium hexafluoride
• fluorosilane
• Nitrosyl fluoride
• Fluorine nitrate
• Hydrogen sulfide
• Ammonia
• Helium
• Hydrogen iodide
• Krypton
• Nitrogen
• dinitrogen oxide
• Neon
• Nitrogen oxide; and
• Xenon

More preferably, the dielectric compounds can be selected from the group consisting of:

• Argon
• Trifluoroborane
• Hydrogen bromide
• Bromopentafluoroethane
• Chlorotrifluoroethene
• Trifluoroacetonitrile
• trifluoromethyl isocyanate
• trifluoromethyl thiocarbonyl fluoride
• Trifluormethylthiocarbonylfluorid (germ.)
• pentafluoro-nitroso-ethane//Pentafluor-nitroso-aethan
• (trifluoromethyl-carbonyl)-difluoro-amine
• Hexafluoroethane
• Bis-trifluormethyl-nitroxid
• bis-trifluoromethyl ether
• bis(trifluoromethyl)tellurium
• bis(trifluoromethyl) ditelluride
• N,N-Difluor-pentafluoraethylamin (germ.)
• N-Fluor-bis(trifluormethyl)-amin (germ.)
• N-Fluor-N-trifluormethoxy-perfluormethylamin (germ.)
• fluoroformyl cyanide
• 1-chloro-1-fluoro-ethene//1-Chlor-1-fluor-aethen//1-chloro-1-fluoroethylene
• 1,1-Difluoroethene
• #trans!-1,2-difluoro-ethenekrans!-vinylene difluoride//(E)-1,2-difluoroethylene//(E)-1,2-difluoro-ethene//trans!-vinylene fluoride
• 1,2-difluoro-ethene//#cis!-vinylene difluoride//1,2-Difluor-aethen//vinylene
• fluoride
• #cis!-1,2-difluoro-ethene//#cis!-vinylene difluoride//(Z)-1,2-difluoroethylene//(Z)-1,2-difluoro-ethene//#cis!-vinylene fluoride
• 1,1,1,2-Tetrafluoroethane
• 1,1,2,2-Tetrafluoroethane
• Fluoroethene
• 1,1,1-Trifluoroethane
• Ether, methyl trifluoromethyl
• Ethene
• 1,1-Difluoroethane
• Fluoroethane
• Ethane
• fluoro-dimethyl-borane
• Disiloxane, 1,1,3,3-tetrafluoro-1,3-dimethyl-Trifluoroethene
• trifluoroacetaldehyde//Trifluor-acetaldehyd
• Pentafluoroethane
• Difluoromethyl trifluoromethyl ether
• Tris(trifluoromethyl)bismuth
• tetrafluoropropadiene//tetrafluoro-allene//1,1,3-tetrafluoro-1,2-propadiene
• tetrafluorocyclopropene
• Perfluoropropionyliodid
• pentafluoro-propionitrile//pentafluoropropiononitrile
• hexafluoro-cyclopropane//Hexafluor-cyclopropan//freon-#C!216
• Hexafluoropropylene
• hexafluoro-[1,3]dioxolane
• Octafluoropropane
• Perfluormethylethylether
• 1,1-difluoro-propadiene//allenylidene difluoride//1,1-difluoro-allene
• 2,3,3,3-tetrafluoro-propene//HFO-1234yf
• trans HFO-1234ze
• 3,3,3-Trifluoropropene
• cyclopropene
• Allene
• 1,1-difluoro-propene//propenylidene difluoride//1,1-Difluor-propen
• methylketene
• 2-fluoropropene
• 1-Propene
• DL-2-aminopropanoic acid
• 3,3,3-trifluoro-propyne//3,3,3-Trifluor-propin//trifluoromethyl-ethyne//3,3,3-trifluoro-1-propyne
• 1,1,3,3,3-pentafluoro-propene//1,1,3,3,3-Pentafluor-propen
• 1,2,3,3,3-pentafluoro-propene
• 1,1,1,4,4,4-hexafluoro-2-butyne
• 1,1,4,4-tetrafluoro-butane-2,3-dione
• Trifluormethylhypochlorit
• Chlor-difluor-methyl-hypofluorit
• N-Chlor-N-fluor-trifluormethylamin (germ.)
• Chlordifluordifluoraminomethan
• thiocarbonyl difluoride
• Thiocarbonyldifluorid (germ.)
• selenocarbonyl difluoride
• Trifluoroiodomethane
• N-Fluor-difluormethanimin (germ.)
• trifluoro-nitroso-methane//Trifluor-nitroso-methan
• difluoro-carbamoyl fluoride
• trifluoro-nitro-methane//Trifluor-nitro-methan//fluoropicrin
• Tetrafluoromethane
• Tetrafluorformamidin (germ.)
• tetrafluorourea
• hypofluorous acid trifluoromethyl ester//Hypofluorigsaeuretrifluormethylester//trifluoromethyl hypofluorite
• trifluoromethanesulfonyl fluoride
• N,N-Difluor-trifluomethylamin (germ.)
• Trifluormethyloxydifluoramin
• (Difluoraminoxy)difluormethylhypofluorit
• sulfurcyanide pentafluoride
• Schwefelcyanid-pentafluorid (germ.)
• difluoro-trifluoromethyl-phosphine
• Hexafluormethandiamin
• perfluoro methyl silane
• Perfluormethylsilan (germ.)
• Trifluormethyl-tetrafluorphosphoran (germ.)
• Difluoromethane
• Fluoroiodomethane
• fluoromethane//methyl fluoride//Fluor-methan//freon-41
• trifluoromethyl-silane″CF3 SiH3
• methyltrifluorosilane
• difluoro-methyl-silane
• fluoro-methyl-silane
• methylgermane
• Difluorformimin
• Trifluoromethane
• trifluoromethane thiol
• Trifluormethanthiol (germ.)
• N,N,1,1-Tetrafluormethylamin
• difluoro dichlorosilane
• Difluordichlorsilan (germ.)
• difluoro chlorosilane
• Difluorchlorsilan (germ.)
• Phosphorus chloride difluoride
• Chlorotrifluorosilane
• Hydrogen chloride
• Chlorosilane
• Carbon monoxide
• Carbon dioxide
• Carbonyl sulfide
• Difluoramine
• trans-Difluorodiazine
• cis-Difluorodiazine
• Thionyl fluoride
• Trifluorosilane
• Nitrogen trifluoride
• Trifluoramine oxide
• thiazyl trifluoride
• Phosphorus trifluoride
• Germanium(IV) fluoride
• Tetrafluorosilane
• Phosphorus pentafluoride
• Selenium hexafluoride
• Tellurium hexafluoride
• fluorosilane
• Nitrosyl fluoride
• Fluorine nitrate
• Hydrogen sulfide
• Ammonia
• Helium
• Hydrogen iodide
• Krypton
• Nitrogen
• Nitrous oxide
• Neon
• Nitrogen oxide; and
• Xenon

The dielectric gaseous compound is optionally form as an azeotrope, which imparts many advantages in handling the mixture. Preferred mixtures for dielectric gaseous compound contain one additional gas selected from the group consisting of: nitrogen, CO₂ and N₂O.

The present disclosure also includes an insulation-gas for use in electrical equipment, wherein said insulation-gas is a dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about −20° C. to about −273° C.; low, preferably non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf<0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL (i.e., Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm); and a dielectric strength greater than air.

Preferably, the electrical equipment is at least one selected from the group consisting of gas-insulated circuit breakers and current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insulated substations.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

The compounds of the present disclosure are useful in gaseous phase for electrical insulation and for arc quenching and current interruption equipment used in the transmission and distribution of electrical energy. Generally, there are four major types of electrical equipment which the gases of the present disclosure can be used for insulation and/or interruption purposes: (1) gas-insulated circuit breakers and current-interruption equipment, (2) gas-insulated transmission lines, (3) gas-insulated transformers, and (4) gas-insulated substations. Such gas-insulated equipment is a major component of power transmission and distribution systems all over the world. It offers significant savings in land use, is aesthetically acceptable, has relatively low radio and audible noise emissions, and enables substations to be installed in populated areas close to the loads.

Depending on the particular function of the gas-insulated equipment, the gas properties which are the most significant vary.

For circuit breakers the excellent thermal conductivity and high dielectric strength of such gases, along with the fast thermal and dielectric recovery (short time constant for increase in resistivity), are the main reasons for its high interruption capability. These properties enable the gas to make a rapid transition between the conducting (arc plasma) and the dielectric state of the arc, and to withstand the rise of the recovery voltage.

For gas-insulated transformers the cooling ability, compatibility with sold materials, and partial discharge characteristics, added to the dielectric characteristics, make them a desirable medium for use in this type of electrical equipment. The compounds have distinct advantages over oil insulation, including none of the fire safety problems or environmental problems related to oil, high reliability, flexible layout, little maintenance, long service life, lower noise, better handling, and lighter equipment.

For gas-insulated transmission lines the dielectric strength of the gaseous medium under industrial conditions is of paramount importance, especially the behavior of the gaseous dielectric under metallic particle contamination, switching and lightning impulses, and fast transient electrical stresses. These gases also have a high efficiency for transfer of heat from the conductor to the enclosure and are stable for long periods of time (e.g., 40 years). These gas-insulated transmission lines offer distinct advantages: cost effectiveness, high-carrying capacity, low losses, availability at all voltage ratings, no fire risk, reliability, and a compact alternative to overhead high voltage transmission lines in congested areas that avoids public concerns with overhead transmission lines.

For gas-insulated substations, the entire substation (circuit breakers, disconnects, grounding switches, busbar, transformers, etc., are interconnected) is insulated with the gaseous dielectric medium of the present disclosure, and, thus, all of the above-mentioned properties of the dielectric gas are significant.

The properties of a dielectric gas that are necessary for its use in high voltage equipment are many and vary depending on the particular application of the gas and the equipment.

Intrinsic properties are those properties of a gas which are inherent in the physical atomic or molecular structure of the gas. These properties are independent of the application or the environment in which a gas is placed. One of the desirable properties of a gaseous dielectric is high dielectric strength (higher, for instance than air). The gas properties that are principally responsible for high dielectric strength are those that reduce the number of electrons which are present in an electrically-stressed dielectric gas. To effect such a reduction in the electron number densities, as gas should: (i) be electronegative (remove electrons by attachment over as wide an energy range as possible); it should preferably exhibit increased electron attachment with increasing electron energy and gas temperature since electrons have a broad range of energies and the gas temperature in many applications is higher than ambient; (ii) have good electron slowing-down properties (slow electrons down so that they can be captured efficiently at lower energies and be prevented from generating more electrons by electron impact ionization); and (iii) have low ionization cross section and high ionization onset (prevent ionization by electron impact). Besides the above properties, there are a number of other basic properties which are necessary for the complete characterization of the dielectric gas behavior and its performance in practice, e.g., secondary processes such as electron emission from surfaces by ion and photon impact; photoprocesses; absorption of photoionizing radiation (this is a controlling factor in discharge development in non-uniform fields); dissociation under electron impact decomposition; ion-molecule reactions; reactions with trace impurities; and reactions with surfaces.

The dielectric gas must also have the following chemical properties: high vapor pressure; high specific heat, high thermal conductivity for gas cooling; thermal stability over long periods of time for temperatures greater than 400° K; chemical stability and inertness with regard to conducting and insulating materials; non-flammable; toxicity acceptable for industrial exposure; and non-explosive. When used in mixtures, it must have appropriate thermodynamic properties for mixture uniformity, composition, and separation.

Extrinsic properties are those which describe how a gas may interact with its surroundings, or in response to external influences, such as electrical breakdown and discharges. To be used in electrical applications, a dielectric gas should: (undergo no extensive decomposition; lead to no polymerization; form no carbon or other deposits; and be non-corrosive and non-reactive to metals, insulators, spacers, and seals. In addition it should have: no byproduct with toxicity unacceptable for industrial applications; removable byproducts; and a high recombination rate for reforming itself, especially for arc interruption. Finally, the gas must be environmentally friendly, e.g., it must not contribute to global warming, must not deplete stratospheric ozone, and must not persist in the environment for long periods of time.

Specific properties of the gas under discharge and breakdown conditions include: a high breakdown voltage under uniform and non-uniform electric fields; insensitivity to surface roughness or defects and freely moving conducting particles; good insulation properties under practical conditions; good insulator flashover characteristics; good heat transfer characteristics; good recovery (rate of voltage recovery) and self-healing; no adverse reactions with moisture and common impurities; and no adverse effects on equipment, especially on spacers and electrode surfaces.

Specific properties of gaseous insulators for specific electrical equipment is set forth below:

Circuit breakers—The most significant required gas properties for arc interruption are: (i) high dielectric strength comparable to that of SF₆; (ii) high thermal conductivity; (iii) fast gas recovery; and (iv) self-healing/dielectric integrity.

Gas-insulated transmission lines—The required properties include: (i) high dielectric strength; (ii) high vapor pressure at operating and ambient temperature; (iii) chemical inertness; (iv) high thermal conductivity; (v) no thermal aging; (vi) no deposits; (vii) easily removable, non-harmful byproducts; and (viii) no unacceptable level of hazards (fire, explosion, toxicity, corrosion).

Gas-insulated transformers—The properties of the gas required for this application include: (i) high dielectric strength at reasonable pressures (e.g., 500 kPa); (ii) low boiling point; (iii) acceptably low toxicity; (iv) chemical inertness; (v) good thermal stability; (vi) non-flammable; (vii) high cooling capability; (viii) good compatibility with solid materials; (ix) good partial discharge characteristics; (x) useable over a range of temperatures; and (xi) safe, easy to handle, inexpensive and securely available.

The present inventors have discovered a unique series of dielectric gases for use in electric equipment applications, which exhibit many of the aforementioned properties, which avoiding the greenhouse problems associated with SF₆. Such dielectric compounds exhibit at least one of the following properties:

• • A boiling point in the range between about −20° C. to about −273° C.
  • Low, preferably, Non-ozone depleting
  • A GWP less than about 22,200
  • Chemical stability, as measured by a negative standard enthalpy of formation (dHf<0)
  • A toxicity level such that when the working gas leaks from equipment at the manufacturer's specified maximum leak rate, the effective diluted concentration does not its PEL, i.e., does not exceed the PEL of that specific compound. In general with minimal ventilation PELs greater than about 0.3 ppm by volume are acceptable (i.e., an Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm). OSHA sets enforceable permissible exposure limits (PELs) to protect workers against the health effects of exposure to hazardous substances. OSHA PELs are based on an 8-hour time weighted average (TWA) exposure. Approximately 500 PELs have been established. Existing PELs are contained in 29 CFR 1910.1000, the air contaminants standard. Most PELs are listed in 29 CFR 1910.1000, Table Z-1, and 29 CFR 1910.1000, Table Z-2.
  • A dielectric strength greater than air.

These unique dielectric gases are at least one gas selected from the group consisting of those set forth in Table 1 below:

TABLE 1

Dielectric

MY

Compound

Structure

Name

CAS

MW

BP (° C.)

AsF5

AsF5

Arsenic pentafluoride

7784-36-3

169.91

−52.8

AsH3

AsH3

Arsine

7784-42-1

77.95

−62.2

B2F4

B2F4

Diboron tetrafluoride

13965-73-6

97.61

−34.2

B2H6

H2B(H2)BH2

Diborane

19287-45-7

27.67

−92.3

C2Cl2F4O4

O3ClOCF2CF2Cl

Perchloric acid, 2-chloro-

38126-28-2

234.92

−95.0

1,1,2,2-tetrafluoroethyl

ester (9Cl)

C2Cl4F2O4

O3ClOCFClCFCl2

Perchloric acid, 1,2,2-

38126-29-3

267.83

−35.0

trichloro-1,2-difluoroethyl

ester

C2ClF3O

CF3CCl(O)

Trifluoroacetyl chloride

354-32-5

132.47

−27.0

C2F3N

(CF3)—NC

trifluoromethylisocyanide

19480-01-4

95.02

−84.0

(CF3—NC)

C2F3N

CF3—NC

trifluoromethyl isocyanide

19480-01-4

95.02

−35.0

C2F3NO

CF2═CF—NO

trifluoro-nitroso-

2713-04-4

111.02

−23.7

ethene//Trifluor-nitroso-

aethen

C2F4

C2F4

Tetrafluoroethene

116-14-3

100.02

−75.6

C2F4N2

cyclo-CF2—N═N—CF2—′

3,3,4,4-tetrafluoro-3,4-

694-60-0

128.03

−36.0

dihydro-[1,2]diazete

C2F4N2

NF2—CF2—CN

(Difluoramino)difluoracetonitril

5131-88-4

128.03

−32.0

C2F4O

O(CF2CF2)

Tetrafluorooxirane

694-17-7

116.01

−63.5

C2F4O

CF3CF(O)

Trifluoroacetyl fluoride

354-34-7

116.01

−59.0

C2F4O2

FC(O)OCF3

Perfluormethylfluorformiat

3299-24-9

132.01

−33.0

C2F4O2

CF3C(O)OF

trifluoro-acetyl hypofluorite

359-46-6

132.01

−25.0

C2F5N

CF3N═CF2

perfluoro-2-aza-1-propene

133.02

−34.0

Perfluor-2-aza-1-propen (germ.)

C2F5N

CF3CFNF

N-Fluor-tetrafluor-1-

758-35-0

133.02

−32.0

aethanimin (germ.)

C2F5NO

cyclo(-CF2—N(CF3)—O—)

3,3-difluoro-2-

60247-20-3

149.02

−34.8

trifluoromethyl-oxaziridine

C2F6N2

(CF3)N═N(CF3)

bis-trifluoromethyl-

372-63-4

166.03

−20.0

diazene//hexafluoro-#cis!-

azomethane

C2F6O

C2F5OF

Fluoroxypentafluoroethane

3848-94-0

154.01

−50.0

C2F6O2

CF3—O—O—CF3

bis-trifluoromethyl peroxide

927-84-4

170.01

−40.0

C2F6O2

CF3C(OF)2F

1,1-

16329-92-3

170.01

−35.0

Bis(fluoroxy)tetrafluoroaethan

C2F6S

(CF3)2S

Hexafluorodimethyl sulfide

371-78-8

170.08

−22.2

C2FN3

(—N═N—)CF(CN)

3-fluoro-3#H!-diazirine-3-

4849-85-8

85.04

−30.0

carbonitrile

C2H2

HCCH

Ethyne

74-86-2

26.04

−84.7

C2H2F3N

—CF2—NF—CH2—

1,2,2-trifluoro-aziridine

1514-44-9

97.04

−24.0

C2H2O

CH2CO

Ketene

463-51-4

42.04

−49.8

C2H3BF2

F2BCHCH2

(difluoro)vinylboran

358-95-2

75.85

−38.8

(Difluor)vinylboran (germ.)

C2H3F3Si

F3Si—CH═CH2

trifluoro-vinyl-silane

421-24-9

112.13

−25.0

C2H4Si

HCCSiH3

Ethinylsilan

1066-27-9

56.14

−22.4

C2H5BF2

(C2H5)F2B

ethyl-difluor-borane

430-41-1

77.87

−25.0

Ethyl-difluor-boran (germ.)

C2H5N

CH2═NCH3

methyl-methylen-amine

1761-67-7

43.07

−35.0

C2H6O

CH3OCH3

Dimethyl ether

115-10-6

46.07

−24.8

C2H6Si

H2CCHSiH3

vinyl-silane

7291-09-0

58.15

−22.8

C2H8Si

(CH3)2SiH2

Dimethylsilane

1111-74-6

60.17

−20.2

C2HCl

ClCCH

Chloroethyne

593-63-5

60.48

−30.2

C2HF

fluoroethyne//fluoro-

2713-09-9

44.03

−105.0

acetylene

C2N2

NCCN

Ethanedinitrile

460-19-5

52.03

−21.2

C3F4

FCCCF3

tetrafluoropropyne//1,3,3,3-

20174-11-2

112.03

−50.0

tetrafluoropropyne

C3F6O

cyclo-CF2—CF2—O—CF2—

hexafluoro-oxetane

425-82-1

166.02

−38.0

C3F6O

cyclo(-CF2—O—CF(CF3)—)

Trifluoro(trifluoromethyl)oxirane

428-59-1

166.02

−27.4

C3F6O

(CF3)2CO

1,1,1,3,3,3-

684-16-2

166.02

−27.3

Hexafluoropropanone

C3F6O

CF3CF2C(O)F

pentafluoro-propionyl

422-61-7

166.02

−27.0

fluoride//perfluoropropionyl

fluoride

C3F6O

CF3OCFCF2

Trifluoromethyl

1187-93-5

166.02

−26.0

trifluorovinyl ether

C3H4

CH3CCH

1-Propyne

74-99-7

40.06

−23.2

C3H6

—CH2CH2CH2—

Cyclopropane

75-19-4

42.08

−32.8

C3H8

CH3CH2CH3

Propane

74-98-6

44.10

−42.0

C3H9B

B(CH3)3

Trimethylborane

593-90-8

55.92

−20.2

C3HNO

OCCHCN

cyanoketene

4452-08-8

67.05

−34.0

C4H4

CH2═C═C═CH2

butatriene

2873-50-9

52.08

−78.0

C5F10NP

(C2F5)2PCN

Cyano-bispentafluorethyl-

35449-90-2

295.02

−78.0

phosphin

C5H10F4Si

CHF2CF2Si(CH3)3

Trimethyl-1,1,2,2-

4168-08-5

174.21

−72.0

tetrafluorethylsilan

CB2H8

CH3B2H5

methyl diborane

23777-55-1

41.70

−35.0

Methyldiboran (germ.)

CBrFO

COBrF

carbonyl bromide fluoride

753-56-0

126.91

−20.6

CClF2NO

(F2Cl)CN═O

chloro-difluoro-nitroso-

421-13-6

115.47

−35.0

methane//Chlor-difluor-

nitroso-methan

CClF3O2

CF3—O—O—Cl

chloroperoxytrifluoromethane

32755-26-3

136.46

−22.0

CClFO

COClF

carbonylchlorid-fluorid

353-49-1

82.46

−46.0

Carbonychloridfluorid

(germ.)

CF2N2

F2C(—N═N—)

3,3-difluoro-3#H!-diazirine

693-85-6

78.02

−91.3

CF2N2

F2C═N═N

difluoro diazomethane

814-73-3

78.02

−91.3

Difluordiazomethan

(germ.)

CF2O

F2CO

Carbonyl fluoride

353-50-4

66.01

−84.6

CF2O2

F2C(OO)

Difluordioxiran

96740-99-7

82.01

−85.0

CF3N3

(NF2)(F)C(—N═N—)

difluoro-(3-fluoro-3#H!-

4823-43-2

111.03

−36.0

diazirin-3-yl)-amine

CF3N3

CF3—N—N—N

trifluoromethylazide

3802-95-7

110.03

−28.5

Trifluormethylazid (germ.)

CF4N2

cyclo-(—NF—NF—CF2—)

tetrafluoro-diaziridine

17224-09-8

116.02

−35.0

CF4O2

CF3—O—O—F

Fluorperoxytrifluormethan

34511-13-2

120.00

−69.4

CF4O2

F2C(OF)2

Bis(fluoroxy)difluormethan

16282-67-0

120.00

−64.0

CF5OP

OPF2CF3

Trifluormethyl-

19162-94-8

153.98

−20.1

phosphonylfluorid

CFN

Cyanogen fluoride

1495-50-7

45.02

−46.2

CH2F3P

CF3PH2

Trifluormethylphosphane

420-52-0

102.00

−26.5

(germ.)

CH2N2

H2CNN

Diazomethane

334-88-3

42.04

−23.2

CH2O

formaldehyde//Formalin

50-00-0

30.03

−21.0

CH3BF2

CH3BF2

(methyl)difluoroborane

373-64-8

63.84

−62.3

(Methyl)difluorboran

(germ.)

CH3Cl

CH3Cl

Chloromethane

74-87-3

50.49

−24.2

CH3F2P

F2PCH3

methylphosphonous acid difluoride//difluoro-

84.01

−28.0

methyl-phosphine

CH3F3OSi

F3Si—O—CH3

trifluoro-methoxy-silane

25711-11-9

116.11

−78.0

CH3FO

CH3—O—F

Methylhypofluorid

36336-08-0

50.03

−33.0

CH4

CH4

Methane

74-82-8

16.04

−161.5

CH6Si

CH3SiH3

Methylsilane

992-94-9

46.14

−56.9

CH7BrSi2

H3Si—CH2—SiH2Br

#Si!-bromo-#Si!,#Si!′-

56962-86-8

155.14

−64.0

methanediyl-bis-silane

CH7ISi2

H3Si—CH2—SiH2I

#Si!-iodo-#Si!,#Si!′-

56962-87-9

202.14

−49.0

methanediyl-bis-silane

CHF2NO2

F2CH—O—NO

Difluormethylnitrit

1493-06-7

97.02

−20.0

CHF3O

F3COH

trifluoromethanol

1493-11-4

86.01

−20.0

CHFO

HFCO

Formyl fluoride

1493-02-3

48.02

−26.5

CHNO

HOCN

Cyanic acid

420-05-3

43.03

−64.2

Cl2

Cl2

Chlorine

7782-50-5

70.91

−34.0

ClF

ClF

Chlorine fluoride

7790-89-8

54.45

−101.0

ClFO3

Chlorine trioxide fluoride

7616-94-6

102.45

−46.7

COSe

Se═C═O

carbon oxide

1603-84-5

106.97

−21.7

selenide//Kohlenoxidselenid

F2

F2

Fluorine

7782-41-4

38.00

−188.2

F2H2Si

SiF2H2

Difluorosilane

13824-36-7

68.10

−77.8

F2O

OF2

Fluorine oxide

7783-41-7

54.00

−144.7

F2O2

FOOF

fluorine peroxide

7783-44-0

70.00

−57.0

F2O2S

SO2F2

Sulfuryl fluoride

2699-79-8

102.06

−55.3

F2S

SF2

sulphur difluoride

13814-25-0

70.06

−35.0

F3OP

POF3

Phosphorus trifluoride

13478-20-1

103.97

−39.7

oxide

F3PS

PSF3

Phosphorus trifluoride

2404-52-6

120.03

−52.3

sulfide

F4HP

PHF4

tetrafluorophosphorane

13659-66-0

107.98

−37.0

F4N2

F2NNF2

Tetrafluorohydrazine

10036-47-2

104.01

−74.2

F4S

SF4

Sulfur tetrafluoride

7783-60-0

108.05

−40.5

F6OSi2

SiF3OSiF3

hexafluoro disiloxane

14515-39-0

186.16

−23.0

Hexafluordisiloxan (germ.)

FNO2

O2NF

Nitryl fluoride

10022-50-1

65.00

−72.3

H2

H2

Hydrogen

1333-74-0

2.02

−252.9

H2Se

H2Se

Hydrogen selenide

7783-07-5

80.98

−41.3

H3P

PH3

Phosphorus trihydride

7803-51-2

34.00

−87.8

H4Ge

GeH4

Germanium hydride

7782-65-2

76.62

−88.2

H4Si

SiH4

Silane

7803-62-5

32.12

−112.2

H4Sn

SnH4

Tin tetrahydride

2406-52-2

122.72

−51.8

O2

O2

Oxygen

7782-44-7

32.00

−183.0

O3

O3

Ozone

10028-15-6

48.00

−111.3

PSb

SbP

Antimony monophosphide

na

152.72

−52.3

PSi2

Si2P

Disilicon monophosphide

na

87.14

−52.3

Rn

Rn

Radon

10043-92-2

222.00

−61.7

Ar

Ar

Argon

7440-37-1

39.95

−185.9

BF3

BF3

Trifluoroborane

7637-07-2

67.81

−101.2

BrH

HBr

Hydrogen bromide

10035-10-6

80.91

−66.7

C2BrF5

CF3CF2Br

Bromopentafluoroethane

354-55-2

198.92

−21.0

C2ClF3

CFCl═CF2

Chlorotrifluoroethene

79-38-9

116.47

−28.4

C2F3N

CF3CN

Trifluoroacetonitrile

353-85-5

95.02

−68.8

C2F3NO

(CF3)NCO

trifluoromethyl isocyanate

460-49-1

111.02

−36.0

C2F4S

CF3C(S)F

trifluoromethyl thiocarbonyl fluoride

132.08

−21.0

Trifluormethylthiocarbonylfluorid (germ.)

C2F5NO

CF3CF2NO

pentafluoro-nitroso-

354-72-3

149.02

−45.7

ethane//Pentafluor-nitroso-

aethan

C2F5NO

CF3C(O)NF2

(trifluoromethyl-carbonyl)-

32822-49-4

149.02

−21.1

difluoro-amine

C2F6

CF3CF3

Hexafluoroethane

76-16-4

138.01

−78.2

C2F6NO

CF3N(O)CF3

Bis-trifluormethyl-nitroxid

2154-71-4

168.02

−20.0

C2F6O

CF3OCF3

bis-trifluoromethyl ether

1479-49-8

154.01

−59.0

C2F6Te

(CF3)2Te

bis(trifluoromethyl)tellurium

55642-42-7

265.61

−98.0

C2F6Te2

CF3TeTeCF3

bis(trifluoromethyl)

1718-20-3

393.21

−53.0

ditelluride

C2F7N

CF3CF2NF2

N,N-Difluor-

354-80-3

171.02

−38.0

pentafluoraethylamin

(germ.)

C2F7N

(CF3)2NF

N-Fluor-bis(trifluormethyl)-

359-62-6

171.02

−37.0

amin (germ.)

C2F7NO

CF3NFOCF3

N-Fluor-N-trifluormethoxy-

4217-92-9

187.02

−25.0

perfluormethylamin (germ.)

C2FNO

FC(O)CN

fluoroformyl cyanide

683-55-6

73.03

−21.0

C2H2ClF

CH2CFCl

1-chloro-1-fluoro-ethene//1-

2317-91-1

80.49

−25.5

Chlor-1-fluor-aethen//1-

chloro-1-fluoroethylene

C2H2F2

CF2═CH2

1,1-Difluoroethene

75-38-7

64.03

−85.7

C2H2F2

CHF═CHF

#trans!-1,2-difluoro-

1630-78-0

64.03

−53.1

ethene//#trans!-vinylene

difluoride//(E)-1,2-

difluoroethylene//(E)-1,2-

difluoro-ethene//#trans!-

vinylene fluoride

C2H2F2

FHC═CHF

1,2-difluoro-ethene//#cis!-

1691-13-0

64.03

−28.0

vinylene difluoride//1,2-

Difluor-aethen//vinylene

fluoride

C2H2F2

CHF═CHF

#cis!-1,2-difluoro-

1630-77-9

64.03

−26.0

ethene//#cis!-vinylene

difluoride//(Z)-1,2-

difluoroethylene//(Z)-1,2-

difluoro-ethene//#cis!-

vinylene fluoride

C2H2F4

CF3CH2F

1,1,1,2-Tetrafluoroethane

811-97-2

102.03

−26.1

C2H2F4

CF2HCF2H

1,1,2,2-Tetrafluoroethane

359-35-3

102.03

−23.0

C2H3F

CH2═CHF

Fluoroethene

75-02-5

46.04

−72.2

C2H3F3

CF3CH3

1,1,1-Trifluoroethane

420-46-2

84.04

−47.3

C2H3F3O

F3COCH3

Ether, methyl

421-14-7

100.04

−24.0

trifluoromethyl

C2H4

H2CCH2

Ethene

74-85-1

28.05

−103.7

C2H4F2

CHF2CH3

1,1-Difluoroethane

75-37-6

66.05

−24.0

C2H5F

CH3CH2F

Fluoroethane

353-36-6

48.06

−37.7

C2H6

CH3CH3

Ethane

74-84-0

30.07

−88.6

C2H6BF

(CH3)2BF

fluoro-dimethyl-borane

353-46-8

59.88

−44.0

C2H6F4OSi2

CH3SiF2OSiF2CH3

Disiloxane, 1,1,3,3-

63089-45-2

178.23

−39.0

tetrafluoro-1,3-dimethyl-

C2HF3

CF2═CFH

Trifluoroethene

359-11-5

82.02

−51.0

C2HF3O

CF3C(O)H

trifluoroacetaldehyde//Trifluor-

75-90-1

98.02

−21.0

acetaldehyd

C2HF5

CF3CF2H

Pentafluoroethane

354-33-6

120.02

−48.1

C2HF5O

CF3OCHF2

Difluoromethyl

3822-68-2

136.02

−35.3

trifluoromethyl ether

C3BiF9

Bi(CF3)3

Tris(trifluoromethyl)bismuth

5863-80-9

416.00

−55.0

C3F4

F2C═C═CF2

tetrafluoropropadiene//tetrafluoro-

461-68-7

112.03

−38.0

allene//1,1,3,3-

tetrafluoro-1,2-propadiene

C3F4

═CFCF2CF═

tetrafluorocyclopropene

19721-29-0

112.03

−20.0

C3F5IO

CF3CF2C(O)I

Perfluoropropionyliodid

137741-03-8

273.93

−27.0

C3F5N

C2F5CN

pentafluoro-

422-04-8

145.03

−35.0

propionitrile//pentafluoropropiononitrile

C3F6

cyclo-CF2CF2CF2—

hexafluoro-

931-91-9

150.02

−33.0

cyclopropane//Hexafluor-

cyclopropan//freon-#C!216

C3F6

CF3CF═CF2

Hexafluoropropylene

116-15-4

150.02

−29.6

C3F6O2

cyclo-CF2—O—CF2—CF2—O—

hexafluoro-[1,3]dioxolane

21297-65-4

182.02

−22.1

C3F8

CF3CF2CF3

Octafluoropropane

76-19-7

188.02

−36.7

C3F8O

CF3CF2OCF3

Perfluormethylethylether

665-16-7

204.02

−20.0

C3H2F2

F2CCCH2

1,1-difluoro-

430-64-8

76.05

−21.0

propadiene//allenylidene

difluoride//1,1-difluoro-

allene

C3H2F4

H2CCFCF3

2,3,3,3-tetrafluoro-

754-12-1

114.04

−28.3

propene//HFO-1234yf

C3H2F4

CHF═CHCF3

trans HFO-1234ze

114.04

−19.0

C3H3F3

CH2═CHCF3

3,3,3-Trifluoropropene

677-21-4

96.05

−25.0

C3H4

c-(CH═CH—CH2)

cyclopropene

2781-85-3

40.06

−36.0

C3H4

H2CCCH2

Allene

463-49-0

40.06

−34.5

C3H4F2

CH3CH═CF2

1,1-difluoro-

430-63-7

78.06

−29.0

propene//propenylidene

difluoride//1,1-Difluor-

propen

C3H4O

methylketene

6004-44-0

56.06

−23.0

C3H5F

CH2CFCH3

2-fluoropropene

1184-60-7

60.07

−24.0

C3H6

CH2CHCH3

1-Propene

115-07-1

42.08

−47.7

C3H7NO2

DL-2-aminopropanoic acid

302-72-7

89.09

−50.2

C3HF3

F3CCCH

3,3,3-trifluoro-

661-54-1

94.04

−48.0

propyne//3,3,3-Trifluor-

propin//trifluoromethyl-

ethyne//3,3,3-trifluoro-1-

propyne

C3HF5

CF3CH═CF2

1,1,3,3,3-pentafluoro-

690-27-7

132.03

−21.0

propene//1,1,3,3,3-

Pentafluor-propen

C3HF5

CF3—CF—CFH

1,2,3,3,3-pentafluoro-

2252-83-7

132.03

−20.0

propene

C4F6

CF3CCCF3

1,1,1,4,4,4-hexafluoro-2-

692-50-2

162.03

−24.6

butyne

C4H2F4O2

CF2HC(O)C(O)CF2H

1,1,4,4-tetrafluoro-butane-

158.05

−81.0

2,3-dione

C4H6N2O2

114.10

−33.0

CClF3O

F3C—O—Cl

Trifluormethylhypochlorit

22082-78-6

120.46

−47.0

CClF3O

ClF2C—OF

Chlor-difluor-methyl-

20614-17-9

120.46

−25.0

hypofluorit

CClF4N

CF3NFCl

N-Chlor-N-fluor-

13880-72-3

137.46

−32.8

trifluormethylamin (germ.)

CClF4N

ClCF2—NF2

Chlordifluordifluoraminomethan

13880-71-2

137.46

−28.0

CF2S

F2C═S

thiocarbonyl difluoride

420-32-6

82.07

−46.0

Thiocarbonyldifluorid

(germ.)

CF2Se

F2C═Se

selenocarbonyl difluoride

54393-39-4

128.97

−28.0

CF3I

CF3I

Trifluoroiodomethane

2314-97-8

195.91

−21.8

CF3N

CF2—N—F

N-Fluor-difluormethanimin

338-66-9

83.01

−101.0

(germ.)

CF3NO

CF3N═O

trifluoro-nitroso-

334-99-6

99.01

−86.0

methane//Trifluor-nitroso-

methan

CF3NO

FC(O)NF2

difluoro-carbamoyl fluoride

2368-32-3

99.01

−52.0

CF3NO2

CF3NO2

trifluoro-nitro-

335-02-4

115.01

−33.6

methane//Trifluor-nitro-

methan//fluoropicrin

CF4

CF4

Tetrafluoromethane

75-73-0

88.00

−128.1

CF4N2

NF2CF═NF

Tetrafluorformamidin

14362-70-0

116.02

−30.0

(germ.)

CF4N2O

(NF2)2CO

tetrafluorourea

10256-92-5

132.02

−20.0

CF4O

hypofluorous acid trifluoromethyl

104.00

−95.0

ester//Hypofluorigsaeure-

trifluormethylester//trifluoromethyl

hypofluorite

CF4O2S

CF3SO2F

trifluoromethanesulfonyl

335-05-7

152.07

−21.7

fluoride

CF5N

CF3NF2

N,N-Difluor-

335-01-3

121.01

−75.0

trifluormethylamin (germ.)

CF5NO

CF3ONF2

Trifluormethyloxydifluoramin

4217-93-0

137.01

−59.8

CF5NO2

F2NOCF2OF

(Difluoraminoxy)difluormethylhypofluorit

36781-60-9

153.01

−29.0

CF5NS

SF5CN

sulfurcyanide pentafluoride

1512-13-6

153.08

−25.0

Schwefelcyanid-

pentafluorid (germ.)

CF5P

CF3PF2

difluoro-trifluoromethyl-

1112-04-5

137.98

−43.0

phosphine

CF6N2

F2NCF2NF2

Hexafluormethandiamin

4394-93-8

154.01

−37.0

CF6Si

CF3SiF3

perfluoro methyl silane

335-06-8

154.09

−42.0

Perfluormethylsilan (germ.)

CF7P

CF3PF4

Trifluormethyl-

1184-81-2

175.97

−35.0

tetrafluorphosphoran

(germ.)

CH2F2

CH2F2

Difluoromethane

75-10-5

52.02

−51.7

CH2FI

CH2FI

Fluoroiodomethane

373-53-5

159.93

−53.8

CH3F

fluoromethane//methyl

593-53-3

34.03

−78.3

fluoride//Fluor-

methan//freon-41

CH3F3Si

CF3SiH3

trifluoromethyl-silane″

10112-11-5

100.12

−38.3

CF3SiH3

CH3F3Si

CH3SiF3

methyltrifluorosilane

373-74-0

100.12

−30.0

CH4F2Si

F2HSiCH3

difluoro-methyl-silane

420-34-8

82.12

−35.6

CH5FSi

CH3SiH2F

fluoro-methyl-silane

753-44-6

64.13

−44.0

CH6Ge

H3GeCH3

methylgermane

1449-65-6

90.65

−23.0

CHF2N

F2C═NH

Difluorformimin

2712-98-3

65.02

−22.0

CHF3

CHF3

Trifluoromethane

75-46-7

70.01

−82.1

CHF3S

CF3SH

trifluoromethane thiol

1493-15-8

102.08

−36.7

Trifluormethanthiol (germ.)

CHF4N

CF2H—NF2

N,N,1,1-

24708-53-0

103.02

−43.0

Tetrafluormethylamin

Cl2F2Si

SiF2Cl2

difluoro dichlorosilane

18356-71-3

136.99

−31.8

Difluordichlorsilan (germ.)

ClF2HSi

SiF2HCl

difluoro chlorosilane

80003-43-6

102.56

−50.0

Difluorchlorsilan (germ.)

ClF2P

PF2Cl

Phosphorus chloride

14335-40-1

104.42

−47.3

difluoride

ClF3Si

SiClF3

Chlorotrifluorosilane

14049-36-6

120.53

−70.2

ClH

HCl

Hydrogen chloride

7647-01-0

36.46

−85.0

ClH3Si

SiH3Cl

Chlorosilane

13465-78-6

66.56

−30.3

CO

CO

Carbon monoxide

630-08-0

28.01

−191.5

CO2

CO2

Carbon dioxide

124-38-9

44.01

−78.4

COS

OCS

Carbonyl sulfide

463-58-1

60.07

−50.3

F2HN

NHF2

Difluoramine

10405-27-3

53.01

−23.2

F2N2

FNNF

trans-Difluorodiazine

13776-62-0

66.01

−111.5

F2N2

FNNF

cis-Difluorodiazine

13812-43-6

66.01

−105.8

F2OS

F2SO

Thionyl fluoride

7783-42-8

86.06

−43.8

F3HSi

SiHF3

Trifluorosilane

13465-71-9

86.09

−95.2

F3N

NF3

Nitrogen trifluoride

7783-54-2

71.00

−129.1

F3NO

NOF3

Trifluoramine oxide

13847-65-9

87.00

−87.5

F3NS

NSF3

thiazyl trifluoride

15930-75-3

103.07

−27.1

F3P

PF3

Phosphorus trifluoride

7783-55-3

87.97

−101.5

F4Ge

GeF4

Germanium(IV) fluoride

7783-58-6

148.58

−36.5

F4Si

SiF4

Tetrafuorosilane

7783-61-1

104.08

−86.0

F5P

PF5

Phosphorus pentafluoride

7647-19-0

125.97

−84.5

F6Se

SeF6

Selenium hexafluoride

7783-79-1

192.95

−46.5

F6Te

TeF6

Tellurium hexafluoride

7783-80-4

241.59

−38.8

FH3Si

SiH3F

fluorosilane

13537-33-2

50.11

−98.0

FNO

Nitrosyl fluoride

7789-25-5

49.00

−59.9

FNO3

Fluorine nitrate

7789-26-6

81.00

−46.2

H2S

H2S

Hydrogen sulfide

7783-06-4

34.08

−59.5

H3N

NH3

Ammonia

7664-41-7

17.03

−33.3

He

He

Helium

7440-59-7

4.00

−268.9

HI

HI

Hydrogen iodide

10034-85-2

127.91

−35.6

Kr

Kr

Krypton

7439-90-9

83.80

−153.4

N2

N2

Nitrogen

7727-37-9

28.01

−195.8

N2O

NNO

dinitrogen oxide

10024-97-2

44.01

−88.5

Ne

Ne

Neon

7440-01-9

20.18

−246.1

NO

NO

Nitrogen oxide

10102-43-9

30.01

−151.8

Xe

Xe

Xenon

7440-63-3

131.29

−108.1

The preferred dielectric compounds are selected from the group consisting of those set forth in Table 2 below:

TABLE 2

Dielectric

MY

Compound

Structure

Name

CAS

MW

BP(° C.)

Ar

Ar

Argon

7440-37-1

39.95

−185.9

BF3

BF3

Trifluoroborane

7637-07-2

67.81

−101.2

BrH

HBr

Hydrogen bromide

10035-10-6

80.91

−66.7

C2BrF5

CF3CF2Br

Bromopentafluoroethane

354-55-2

198.92

−21.0

C2ClF3

CFCl═CF2

Chlorotrifluoroethene

79-38-9

116.47

−28.4

C2F3N

CF3CN

Trifluoroacetonitrile

353-85-5

95.02

−68.8

C2F3NO

(CF3)NCO

trifluoromethyl isocyanate

460-49-1

111.02

−36.0

C2F4S

CF3C(S)F

trifluoromethyl thiocarbonyl fluoride

132.08

−21.0

Trifluormethylthiocarbonylfluorid (germ.)

C2F5NO

CF3CF2NO

pentafluoro-nitroso-

354-72-3

149.02

−45.7

ethane//Pentafluor-nitroso-

aethan

C2F5NO

CF3C(O)NF2

(trifluoromethyl-carbonyl)-

32822-49-4

149.02

−21.1

difluoro-amine

C2F6

CF3CF3

Hexafluoroethane

76-16-4

138.01

−78.2

C2F6NO

CF3N(O)CF3

Bis-trifluormethyl-nitroxid

2154-71-4

168.02

−20.0

C2F6O

CF3OCF3

bis-trifluoromethyl ether

1479-49-8

154.01

−59.0

C2F6Te

(CF3)2Te

bis(trifluoromethyl)tellurium

55642-42-7

265.61

−98.0

C2F6Te2

CF3TeTeCF3

bis(trifluoromethyl)

1718-20-3

393.21

−53.0

ditelluride

C2F7N

CF3CF2NF2

N,N-Difluor-

354-80-3

171.02

−38.0

pentafluoraethylamin

(germ.)

C2F7N

(CF3)2NF

N-Fluor-bis(trifluormethyl)-

359-62-6

171.02

−37.0

amin (germ.)

C2F7NO

CF3NFOCF3

N-Fluor-N-trifluormethoxy-

4217-92-9

187.02

−25.0

perfluormethylamin (germ.)

C2FNO

FC(O)CN

fluoroformyl cyanide

683-55-6

73.03

−21.0

C2H2ClF

CH2CFCl

1-chloro-1-fluoro-ethene//1-

2317-91-1

80.49

−25.5

Chlor-1-fluor-aethen//1-

chloro-1-fluoroethylene

C2H2F2

CF2═CH2

1,1-Difluoroethene

75-38-7

64.03

−85.7

C2H2F2

CHF═CHF

#trans!-1,2-difluoro-

1630-78-0

64.03

−53.1

ethene//#trans!-vinylene

difluoride//(E)-1,2-

difluoroethylene//(E)-1,2-

difluoro-ethene//#trans!-

vinylene fluoride

C2H2F2

FHC═CHF

1,2-difluoro-ethene//#cis!-

1691-13-0

64.03

−28.0

vinylene difluoride//1,2-

Difluor-aethen//vinylene

fluoride

C2H2F2

CHF═CHF

#cis!-1,2-difluoro-

1630-77-9

64.03

−26.0

ethene//#cis!-vinylene

difluoride//(Z)-1,2-

difluoroethylene//(Z)-1,2-

difluoro-ethene//#cis!-

vinylene fluoride

C2H2F4

CF3CH2F

1,1,1,2-Tetrafluoroethane

811-97-2

102.03

−26.1

C2H2F4

CF2HCF2H

1,1,2,2-Tetrafluoroethane

359-35-3

102.03

−23.0

C2H3F

CH2═CHF

Fluoroethene

75-02-5

46.04

−72.2

C2H3F3

CF3CH3

1,1,1-Trifluoroethane

420-46-2

84.04

−47.3

C2H3F3O

F3COCH3

Ether, methyl

421-14-7

100.04

−24.0

trifluoromethyl

C2H4

H2CCH2

Ethene

74-85-1

28.05

−103.7

C2H4F2

CHF2CH3

1,1-Difluoroethane

75-37-6

66.05

−24.0

C2H5F

CH3CH2F

Fluoroethane

353-36-6

48.06

−37.7

C2H6

CH3CH3

Ethane

74-84-0

30.07

−88.6

C2H6BF

(CH3)2BF

fluoro-dimethyl-borane

353-46-8

59.88

−44.0

C2H6F4OSi2

CH3SiF2OSiF2CH3

Disiloxane, 1,1,3,3-

63089-45-2

178.23

−39.0

tetrafluoro-1,3-dimethyl-

C2HF3

CF2═CFH

Trifluoroethene

359-11-5

82.02

−51.0

C2HF3O

CF3C(O)H

trifluoroacetaldehyde//Trifluor-

75-90-1

98.02

−21.0

acetaldehyd

C2HF5

CF3CF2H

Pentafluoroethane

354-33-6

120.02

−48.1

C2HF5O

CF3OCHF2

Difluoromethyl

3822-68-2

136.02

−35.3

trifluoromethyl ether

C3BiF9

Bi(CF3)3

Tris(trifluoromethyl)bismuth

5863-80-9

416.00

−55.0

C3F4

F2C═C═CF2

tetrafluoropropadiene//tetrafluoro-

461-68-7

112.03

−38.0

allene//1,1,3,3-

tetrafluoro-1,2-propadiene

C3F4

═CFCF2CF═

tetrafluorocyclopropene

19721-29-0

112.03

−20.0

C3F5IO

CF3CF2C(O)I

Perfluoropropionyliodid

137741-03-8

273.93

−27.0

C3F5N

C2F5CN

pentafluoro-

422-04-8

145.03

−35.0

propionitrile//pentafluoropropiononitrile

C3F6

cyclo-

hexafluoro-

931-91-9

150.02

−33.0

CF2CF2CF2—

cyclopropane//Hexafluor-

cyclopropan//freon-#C!216

C3F6

CF3CF═CF2

Hexafluoropropylene

116-15-4

150.02

−29.6

C3F6O2

cyclo-CF2—O—CF2—CF2—O—

hexafluoro-[1,3]dioxolane

21297-65-4

182.02

−22.1

C3F8

CF3CF2CF3

Octafluoropropane

76-19-7

188.02

−36.7

C3F8O

CF3CF2OCF3

Perfluormethylethylether

665-16-7

204.02

−20.0

C3H2F2

F2CCCH2

1,1-difluoro-

430-64-8

76.05

−21.0

propadiene//allenylidene

difluoride//1,1-difluoro-

allene

C3H2F4

H2CCFCF3

2,3,3,3-tetrafluoro-

754-12-1

114.04

−28.3

propene//HFO-1234yf

C3H2F4

CHF═CHCF3

trans HFO-1234ze

114.04

−19.0

C3H3F3

CH2═CHCF3

3,3,3-Trifluoropropene

677-21-4

96.05

−25.0

C3H4

c-(CH═CH—CH2)

cyclopropene

2781-85-3

40.06

−36.0

C3H4

H2CCCH2

Allene

463-49-0

40.06

−34.5

C3H4F2

CH3CH═CF2

1,1-difluoro-

430-63-7

78.06

−29.0

propene//propenylidene

difluoride//1,1-Difluor-

propen

C3H4O

methylketene

6004-44-0

56.06

−23.0

C3H5F

CH2CFCH3

2-fluoropropene

1184-60-7

60.07

−24.0

C3H6

CH2CHCH3

1-Propene

115-07-1

42.08

−47.7

C3H7NO2

DL-2-aminopropanoic acid

302-72-7

89.09

−50.2

C3HF3

F3CCCH

3,3,3-trifluoro-

661-54-1

94.04

−48.0

propyne//3,3,3-Trifluor-

propin//trifluoromethyl-

ethyne//3,3,3-trifluoro-1-

propyne

C3HF5

CF3CH═CF2

1,1,3,3,3-pentafluoro-

690-27-7

132.03

−21.0

propene//1,1,3,3,3-

Pentafluor-propen

C3HF5

CF3—CF—CFH

1,2,3,3,3-pentafluoro-

2252-83-7

132.03

−20.0

propene

C4F6

CF3CCCF3

1,1,1,4,4,4-hexafluoro-2-

692-50-2

162.03

−24.6

butyne

C4H2F4O2

CF2HC(O)C(O)CF2H

1,1,4,4-tetrafluoro-butane-

158.05

−81.0

2,3-dione

C4H6N2O2

114.10

−33.0

CClF3O

F3C—O—Cl

Trifluormethylhypochlorit

22082-78-6

120.46

−47.0

CClF3O

ClF2C—OF

Chlor-difluor-methyl-

20614-17-9

120.46

−25.0

hypofluorit

CClF4N

CF3NFCl

N-Chlor-N-fluor-

13880-72-3

137.46

−32.8

trifluormethylamin (germ.)

CClF4N

ClCF2—NF2

Chlordifluordifluoraminomethan

13880-71-2

137.46

−28.0

CF2S

F2C═S

thiocarbonyl difluoride

420-32-6

82.07

−46.0

Thiocarbonyldifluorid

(germ.)

CF2Se

F2C═Se

selenocarbonyl difluoride

54393-39-4

128.97

−28.0

CF3I

CF3I

Trifluoroiodomethane

2314-97-8

195.91

−21.8

CF3N

CF2—N—F

N-Fluor-difluormethanimin

338-66-9

83.01

−101.0

(germ.)

CF3NO

CF3N═O

trifluoro-nitroso-

334-99-6

99.01

−86.0

methane//Trifluor-nitroso-

methan

CF3NO

FC(O)NF2

difluoro-carbamoyl fluoride

2368-32-3

99.01

−52.0

CF3NO2

CF3NO2

trifluoro-nitro-

335-02-4

115.01

−33.6

methane//Trifluor-nitro-

methan//fluoropicrin

CF4

CF4

Tetrafluoromethane

75-73-0

88.00

−128.1

CF4N2

NF2CF═NF

Tetrafluorformamidin

14362-70-0

116.02

−30.0

(germ.)

CF4N2O

(NF2)2CO

tetrafluorourea

10256-92-5

132.02

−20.0

CF4O

hypofluorous acid trifluoromethyl

104.00

−95.0

ester//Hypofluorigsaeure-

trifluormethylester//trifluoromethyl

hypofluorite

CF4O2S

CF3SO2F

trifluoromethanesulfonyl

335-05-7

152.07

−21.7

fluoride

CF5N

CF3NF2

N,N-Difluor-

335-01-3

121.01

−75.0

trifluormethylamin (germ.)

CF5NO

CF3ONF2

Trifluormethyloxydifluoramin

4217-93-0

137.01

−59.8

CF5NO2

F2NOCF2OF

(Difluoraminoxy)difluormethylhypofluorit

36781-60-9

153.01

−29.0

CF5NS

SF5CN

sulfurcyanide pentafluoride

1512-13-6

153.08

−25.0

Schwefelcyanid-

pentafluorid (germ.)

CF5P

CF3PF2

difluoro-trifluoromethyl-

1112-04-5

137.98

−43.0

phosphine

CF6N2

F2NCF2NF2

Hexafluormethandiamin

4394-93-8

154.01

−37.0

CF6Si

CF3SiF3

perfluoro methyl silane

335-06-8

154.09

−42.0

Perfluormethylsilan (germ.)

CF7P

CF3PF4

Trifluormethyl-

1184-81-2

175.97

−35.0

tetrafluorphosphoran

(germ.)

CH2F2

CH2F2

Difluoromethane

75-10-5

52.02

−51.7

CH2FI

CH2FI

Fluoroiodomethane

373-53-5

159.93

−53.8

CH3F

fluoromethane//methyl

593-53-3

34.03

−78.3

fluoride//Fluor-

methan//freon-41

CH3F3Si

CF3SiH3

trifluoromethyl-silane″

10112-11-5

100.12

−38.3

CF3SiH3

CH3F3Si

CH3SiF3

methyltrifluorosilane

373-74-0

100.12

−30.0

CH4F2Si

F2HSiCH3

difluoro-methyl-silane

420-34-8

82.12

−35.6

CH5FSi

CH3SiH2F

fluoro-methyl-silane

753-44-6

64.13

−44.0

CH6Ge

H3GeCH3

methylgermane

1449-65-6

90.65

−23.0

CHF2N

F2C═NH

Difluorformimin

2712-98-3

65.02

−22.0

CHF3

CHF3

Trifluoromethane

75-46-7

70.01

−82.1

CHF3S

CF3SH

trifluoromethane thiol

1493-15-8

102.08

−36.7

Trifluormethanthiol (germ.)

CHF4N

CF2H—NF2

N,N,1,1-

24708-53-0

103.02

−43.0

Tetrafluormethylamin

Cl2F2Si

SiF2Cl2

difluoro dichlorosilane

18356-71-3

136.99

−31.8

Difluordichlorsilan (germ.)

ClF2HSi

SiF2HCl

difluoro chlorosilane

80003-43-6

102.56

−50.0

Difluorchlorsilan (germ.)

ClF2P

PF2Cl

Phosphorus chloride

14335-40-1

104.42

−47.3

difluoride

ClF3Si

SiClF3

Chlorotrifluorosilane

14049-36-6

120.53

−70.2

ClH

HCl

Hydrogen chloride

7647-01-0

36.46

−85.0

ClH3Si

SiH3Cl

Chlorosilane

13465-78-6

66.56

−30.3

CO

CO

Carbon monoxide

630-08-0

28.01

−191.5

CO2

CO2

Carbon dioxide

124-38-9

44.01

−78.4

COS

OCS

Carbonyl sulfide

463-58-1

60.07

−50.3

F2HN

NHF2

Difluoramine

10405-27-3

53.01

−23.2

F2N2

FNNF

trans-Difluorodiazine

13776-62-0

66.01

−111.5

F2N2

FNNF

cis-Difluorodiazine

13812-43-6

66.01

−105.8

F2OS

F2SO

Thionyl fluoride

7783-42-8

86.06

−43.8

F3HSi

SiHF3

Trifluorosilane

13465-71-9

86.09

−95.2

F3N

NF3

Nitrogen trifluoride

7783-54-2

71.00

−129.1

F3NO

NOF3

Trifluoramine oxide

13847-65-9

87.00

−87.5

F3NS

NSF3

thiazyl trifluoride

15930-75-3

103.07

−27.1

F3P

PF3

Phosphorus trifluoride

7783-55-3

87.97

−101.5

F4Ge

GeF4

Germanium(IV) fluoride

7783-58-6

148.58

−36.5

F4Si

SiF4

Tetrafuorosilane

7783-61-1

104.08

−86.0

F5P

PF5

Phosphorus pentafluoride

7647-19-0

125.97

−84.5

F6Se

SeF6

Selenium hexafluoride

7783-79-1

192.95

−46.5

F6Te

TeF6

Tellurium hexafluoride

7783-80-4

241.59

−38.8

FH3Si

SiH3F

fluorosilane

13537-33-2

50.11

−98.0

FNO

Nitrosyl fluoride

7789-25-5

49.00

−59.9

FNO3

Fluorine nitrate

7789-26-6

81.00

−46.2

H2S

H2S

Hydrogen sulfide

7783-06-4

34.08

−59.5

H3N

NH3

Ammonia

7664-41-7

17.03

−33.3

He

He

Helium

7440-59-7

4.00

−268.9

HI

HI

Hydrogen iodide

10034-85-2

127.91

−35.6

Kr

Kr

Krypton

7439-90-9

83.80

−153.4

N2

N2

Nitrogen

7727-37-9

28.01

−195.8

N2O

NON

Nitrous oxide

10024-97-2

44.01

−88.5

Ne

Ne

Neon

7440-01-9

20.18

−246.1

NO

NO

Nitrogen oxide

10102-43-9

30.01

−151.8

Xe

Xe

Xenon

7440-63-3

131.29

−108.1

The aforementioned dielectric compounds may be used in pure form, but can also be used as part of an azeotrope, or a mixture with an appropriate second gas, i.e., nitrogen, CO₂ or N₂O.

Particularly preferred non-electrical properties for dielectric gases according to the present disclosure, include:

• • Non-liquefying, e.g., T_boil less than −20° C.
  • Chemically stable—decomposition temperature must be higher than hot spot temperature in equipment, e.g., T_dec=200° C., and gas should not decompose in partial discharge spark (approximately 1000° K)
  • Low environmental impact, i.e., little to no destruction of ozone layer ODP=0; and low global warming impact GWP less than SF₆
  • Acceptably low toxicity of gas and discharge byproducts

Electrical equipment property requirements for dielectric gases according to the present disclosure, include:

• • Insulation specific criteria include a critical field of E_cr, and no conducting decomposition products should be generated by discharge
  • Switching specific criteria include high critical field of E_cr, arcing stability, i.e., a gas must recombine to original molecular structure after being decomposed in switching arc (Gibbs free energy of reaction is <0)
  • Specific thermal interruption performance, i.e., must be able to interrupt current flow at ac current zero
  • Arc erosion product from equipment and gas must not form conduction deposits
  • Low velocity of sound

EXAMPLE 1

Measurements of the dielectric strength of potential alternatives were determined using ASTM D2477 or obtained from literature. These measurements were performed at 1 atmosphere pressure across a 0.1 inch gap and at ambient temperature.

In the intended applications, the gas will not be at 1 atmosphere pressure but at a higher pressure. In this example 5 atmospheres pressure is used as a maximum pressure. If the gas liquefies at a lower pressure than that pressure was used. These gases have higher dielectric strengths and break down voltages than air. Using 5 atmospheres (73.5 psia) pressure as the upper pressure (rating of the equipment).

Breakdown voltage

Dielectric strength

Pressure

at maximum pressure

Gas

kV/0.1 inch gap

(psia)

(kV/0.1 inch gap)

Air

4.75

73.5

23.75

R143a

5.8

73.5

29

R152a

5.9

73.5

29.5

R125

6.4

73.5

32

R134a

6.6

73.5

33

R22

7.2

73.5

39.9

R124

10.4

55.5

39.3

SF6

14.0

73.5

70

C318

16.0

45.3

49.3

R115

16.0

73.6

80

R114

17.0

31.1

36

EXAMPLE 2

The dielectric strength of additional gases is measure at 1 atmosphere and at the maximum system pressure. Their breakdown voltages are found to be greater then air, which allows smaller gaps and therefore smaller equipment then would be need if air was used. Here the measurements were performed on CTFE (Chlorotrifluoroethylene), HCl (hydrogen chloride) and SiF4 (silicon tetrafluoride).

Having described the invention in detail by reference to the preferred embodiments and specific examples thereof, it will be apparent that modifications and variations are possible without departing from the spirit and scope of the disclosure and claims.