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    • 2. 发明专利
    • Lamination method and lamination device
    • 层压方法和层压装置
    • JP2013129186A
    • 2013-07-04
    • JP2012172714
    • 2012-08-03
    • Meiki Co Ltd株式会社名機製作所
    • HIROSE TOMOAKIYAMAMOTO TAKAYUKI
    • B29C65/02B29C43/18B29C43/34B29L31/34
    • B32B37/14B32B37/10B32B37/1009B32B2457/14H01L2224/75315H01L2224/75317Y10T156/1002
    • PROBLEM TO BE SOLVED: To make a film-like laminate penetrate through at least a surface including a projection of a laminated body and securely laminate by a simple configuration, and perform molding at a uniform thickness without occurrence of voids.SOLUTION: A lamination device includes: heating means 1, 2 for heating at least an insulating resin film F; an upper board 3 and a lower board 4 openably installed and for forming a chamber 34 sealed upon closing; an elastic receiving member 5 disposed on the upper board 3 and opposing to the insulating resin film F superposed on the side on which a bump B of a semiconductor wafer W is formed; an elastic membrane body 6 disposed on the lower board 4 and opposing to the semiconductor wafer W on which the insulating resin film F is superposed; a vacuuming means 7 for vacuuming inside of the chamber 34; and a compressing means 8 for bloating the elastic membrane body 6 and compressing the semiconductor wafer W and the insulating resin film F between the receiving member 5 and the compressing means 8.
    • 要解决的问题:为了使薄膜状层叠体至少贯穿包括层叠体的突起的表面并且通过简单的结构牢固地层压,并且以均匀的厚度进行模制而不产生空隙。溶液:层压装置 包括:至少加热绝缘树脂膜F的加热装置1,2; 可开启地安装并用于形成在关闭时密封的室34的上板3和下板4; 设置在上板3上并与叠置在其上形成有半导体晶片W的凸块B的一侧的绝缘树脂膜F相对的弹性接收构件5; 弹性膜体6,其设置在下板4上并且与重叠有绝缘树脂膜F的半导体晶片W相对; 用于抽吸室34内部的抽气装置7; 以及用于使弹性膜体6膨胀并压缩接收构件5和压缩装置8之间的半导体晶片W和绝缘树脂膜F的压缩装置8。