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    • 26. 发明授权
    • Method for forming conductive or insulating layers
    • 形成导电层或绝缘层的方法
    • US5672460A
    • 1997-09-30
    • US480608
    • 1995-06-08
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • Toshihiro KatohTakao KuriyamaTatsuya TakeiTakashi KawaiHiroshi MurakamiEiji MunemotoNorio OhtaKoji Shimada
    • G03F7/004G03F7/021G03F7/04H01J9/02G03C11/00
    • G03F7/0212G03F7/0047G03F7/04H01J9/02H01J2217/04
    • The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.
    • 本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题,即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。 通过光刻法在玻璃基板上形成导电层(阳极母线3)或绝缘层(阻挡层1)的方法,使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液,其中,全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量%以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同,本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。
    • 28. 发明授权
    • Diazo heat-sensitive recording material
    • 重氮热敏记录材料
    • US5543260A
    • 1996-08-06
    • US337470
    • 1994-11-08
    • Keiichi TateishiSadao IshigeHiroshi Kamikawa
    • Keiichi TateishiSadao IshigeHiroshi Kamikawa
    • B41M5/323G03C1/00G03C1/52G03F7/021G03C1/58
    • G03C1/002G03C1/52
    • A diazo heat-sensitive recording material containing a support having provided thereon a recording layer containing a diazo compound, a coupler, and an organic base, wherein the diazo compound is a compound represented by formula (I): ##STR1## wherein R.sub.1 represents --C(Z.sub.1)(Z.sub.2)--CH.sub.2 --A, --CH.sub.2 --C(Z.sub.1)(Z.sub.2)--A or --{C(Z.sub.1)(Z.sub.2)}.sub.m --A,wherein Z.sub.1 represents an alkyl group, an aralkyl group or an aryl group; Z.sub.2 represents a hydrogen atom, an alkyl group, an aralkyl group or an aryl group; A represents a halogen atom, an acyl group, a cyano group, or a group containing at least one oxygen, nitrogen, phosphorus or sulfur atom through which A is bonded to --CH.sub.2 -- or Z.sub.2 ; and m represents an integer of 1 to 5;R.sub.2 and R.sub.3, which may be the same or different, each represent an alkyl group, an aralkyl group or an aryl group; R.sub.1 and R.sub.2 may be connected together via A to form a ring; and X represents an acid anion,and the coupler is a compound having at least 20 carbon atoms in total, represented by formula (II): ##STR2## wherein Y.sub.1 and Y.sub.2, which may be the same or different, each represent a hydrogen atom, an alkyl group, an aralkyl group, or an aryl group. The diazo heat-sensitive recording material of the present invention exhibits excellent raw stock aging stability before recording and excellent image stability, especially light fastness, after recording.
    • 一种重氮热敏记录材料,其含有在其上设置有含有重氮化合物,成色剂和有机碱的记录层的载体,其中重氮化合物是由式(I)表示的化合物:其中 R1表示-C(Z1)(Z2)-CH2-A,-CH2-C(Z1)(Z2)-A或 - {C(Z1)(Z2)} mA,其中Z1表示烷基, 或芳基; Z2表示氢原子,烷基,芳烷基或芳基; A表示卤素原子,酰基,氰基或含有至少一个氧,氮,磷或硫原子的基团,A与-CH 2 - 或Z 2键合; m表示1〜5的整数, R 2和R 3可以相同或不同,各自表示烷基,芳烷基或芳基; R1和R2可以通过A连接在一起形成环; 并且X表示酸性阴离子,并且成色剂是由式(II)表示的总共具有至少20个碳原子的化合物:其中Y 1和Y 2可以相同或不同,各自表示 氢原子,烷基,芳烷基或芳基。 本发明的重氮热敏记录材料在记录之前表现出优异的原料老化稳定性,并且在记录之后具有优异的图像稳定性,特别是耐光性。
    • 29. 发明授权
    • Polyvinyl alcohol-based photoresist
    • 聚乙烯醇类光刻胶
    • US5474872A
    • 1995-12-12
    • US250530
    • 1994-05-31
    • Yoichi TomoMasao Saito
    • Yoichi TomoMasao Saito
    • C08F8/12C08L29/04C08L61/20G03F7/004G03F7/021G03F7/028G03F7/038G03F7/039G03F7/32H01L21/027G03C1/492G03C1/494G03C1/76G03C5/00
    • G03F7/0045G03F7/039Y10S430/11
    • A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photo-resistive composition is also provided. The photoresist composition includes a substance containing a skeleton as at least a part of a main chain. The skeleton is obtained through polymerization of a vinyl alcohol type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by acid-releasing protective groups. The skeleton preferably contains a group for improving the dry etching resistance. The photoresist composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development, and a negative pattern is obtained by alcohol development.
    • 提供了适用于精细加工的新的光致抗蚀剂组合物,其在各种干蚀刻工艺中具有实际应用。 还提供了使用这种光电组合物的有利的图案形成方法。 光致抗蚀剂组合物包括含有作为主链的至少一部分的骨架的物质。 骨架通过乙烯醇类化合物如聚乙烯醇链的聚合获得,骨架中的至少一些羟基被释放酸的保护基保护。 骨架优选含有用于提高耐干蚀刻性的基团。 光致抗蚀剂组合物还包括光学酸发生剂。 提供了高极性溶剂的开发,例如水性显影。 通过水性发育获得阳性图案,通过酒精发育获得阴性图案。