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    • 2. 发明授权
    • Inkjet recording apparatus
    • 喷墨记录装置
    • US07997694B2
    • 2011-08-16
    • US11902445
    • 2007-09-21
    • Yuko NomuraIsao AmemiyaKazuhiko HiguchiKenichi Mori
    • Yuko NomuraIsao AmemiyaKazuhiko HiguchiKenichi Mori
    • B41J2/045
    • B41J2/14008
    • An inkjet recording apparatus includes: an ink holding chamber having a through hole to jet ink, and holding the ink; and a head unit jetting the ink held in the ink holding chamber from the through hole. The head unit includes an ultrasonic wave generation member, an ultrasonic wave focusing member focusing the ultrasonic waves generated at the ultrasonic wave generation member in a vicinity of the through hole, an ultrasonic wave propagation portion propagateting the ultrasonic waves leaving the ultrasonic wave focusing member, and a container portion containing the ultrasonic wave generation member, the ultrasonic wave focusing member, and the ultrasonic wave propagation portion.
    • 一种喷墨记录装置,包括:具有用于喷射墨水的通孔并保持墨水的墨水容纳室; 以及头单元,其从所述通孔喷射保持在所述墨水容纳室中的墨。 头单元包括超声波产生部件,将超声波产生部件中产生的超声波聚焦在通孔附近的超声波聚焦部件,传播离开超声波聚焦部件的超声波的超声波传播部, 以及包含超声波发生部件,超声波聚焦部件和超声波传播部的容器部。
    • 3. 发明授权
    • Display device
    • 显示设备
    • US07981526B2
    • 2011-07-19
    • US12211940
    • 2008-09-17
    • Yukio KizakiRei HasegawaHajime YamaguchiIsao Amemiya
    • Yukio KizakiRei HasegawaHajime YamaguchiIsao Amemiya
    • H05B41/14H01J1/62H01L29/04
    • F21K2/08C09K11/06C09K2211/1011H05B33/08H05B33/14Y10S428/917
    • A light-emitting device is provide, which includes a first substrate, a first electrode and a second electrode, which are disposed above the first substrate and insulated from each other, enabling a difference in electrical potential to be given between the first electrode and the second electrode, a second substrate disposed to face the first substrate and spaced apart from the first substrate, a light-emitting layer disposed between the first substrate and the second substrate, the light-emitting layer includes a light-emitting material which emits light through an electrochemical oxidation or reduction thereof and chloride ions, and a barrier electrode interposed between the first electrode and the second electrode to partition the light-emitting layer. This barrier electrode is used as a standard for the electrical potential.
    • 提供了一种发光器件,其包括第一基板,第一电极和第二电极,其设置在第一基板上方并彼此绝缘,使得能够在第一电极和第二电极之间施加电位差 第二电极,设置为与第一基板相对并且与第一基板间隔开的第二基板,设置在第一基板和第二基板之间的发光层,发光层包括发光的发光材料 其电化学氧化或还原和氯化物离子,以及插入在第一电极和第二电极之间以分隔发光层的势垒电极。 该阻挡电极用作电位的标准。
    • 4. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • US20090243502A1
    • 2009-10-01
    • US12211940
    • 2008-09-17
    • Yukio KIZAKIRei HasegawaHajime YamaguchiIsao Amemiya
    • Yukio KIZAKIRei HasegawaHajime YamaguchiIsao Amemiya
    • H05B41/14H01J1/62
    • F21K2/08C09K11/06C09K2211/1011H05B33/08H05B33/14Y10S428/917
    • A light-emitting device is provide, which includes a first substrate, a first electrode and a second electrode, which are disposed above the first substrate and insulated from each other, enabling a difference in electrical potential to be given between the first electrode and the second electrode, a second substrate disposed to face the first substrate and spaced apart from the first substrate, a light-emitting layer disposed between the first substrate and the second substrate, the light-emitting layer includes a light-emitting material which emits light through an electrochemical oxidation or reduction thereof and chloride ions, and a barrier electrode interposed between the first electrode and the second electrode to partition the light-emitting layer. This barrier electrode is used as a standard for the electrical potential.
    • 提供了一种发光器件,其包括第一基板,第一电极和第二电极,其设置在第一基板上方并彼此绝缘,使得能够在第一电极和第二电极之间施加电位差 第二电极,设置为与第一基板相对并且与第一基板间隔开的第二基板,设置在第一基板和第二基板之间的发光层,发光层包括发光的发光材料 其电化学氧化或还原和氯化物离子,以及插入在第一电极和第二电极之间以分隔发光层的势垒电极。 该阻挡电极用作电位的标准。
    • 5. 发明授权
    • Display device
    • 显示设备
    • US07002723B2
    • 2006-02-21
    • US10968989
    • 2004-10-21
    • Shintaro EnomotoShuichi UchikogaIsao AmemiyaYutaka Nakai
    • Shintaro EnomotoShuichi UchikogaIsao AmemiyaYutaka Nakai
    • G02F1/153G02F1/15G09G3/38
    • G02F1/1525G02F1/155G02F1/157
    • In a display device, a first electrode and a second electrode are mounted on a first substrate, a second substrate is arranged to face the first substrate with a gap provided between the first substrate and the second substrate, and a third electrode is mounted on the second substrate. A first layer is formed in a gap between the first substrate and the second substrate at the side of the first substrate and containing a ECL material that emits light due to electrochemical oxidation or reduction. A second layer is formed in the gap between the first substrate and the second substrate at the side of the second substrate and containing a EC material having the color changed due to electrochemical oxidation or reduction.
    • 在显示装置中,第一电极和第二电极安装在第一基板上,第二基板被布置为在第一基板和第二基板之间具有间隙而面向第一基板,并且第三电极安装在第一基板上 第二基板。 在第一基板一侧的第一基板和第二基板之间的间隙中形成第一层,并且包含由于电化学氧化或还原而发光的ECL材料。 在第二基板一侧的第一基板和第二基板之间的间隙中形成第二层,并且包含由于电化学氧化或还原而具有颜色变化的EC材料。
    • 7. 发明授权
    • Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same
    • 电子束绘图掩模板,电子束描绘掩模及其制造方法
    • US06812473B1
    • 2004-11-02
    • US09606679
    • 2000-06-30
    • Isao Amemiya
    • Isao Amemiya
    • G03F900
    • G03F1/20
    • An electron beam drawing mask includes a pattern supporting film for transmitting an electron beam therethrough; an electron beam scattering body pattern formed over the pattern supporting film; and a support member for supporting the pattern supporting film and the electron beam scattering body pattern. The pattern supporting film has a film thickness of 0.005 to 0.2 micron, a film material density of 1.0 to 5.0 g/cm3 and an elastic modulus of 0.8×1011 Pa or higher. The electron beam scattering body pattern has a film thickness of 0.2 to 2 micron, a film material density of 1.0 to 5.0 g/cm3, and an elastic modulus of 0.8×1011 Pa or higher.
    • 电子束描绘掩模包括用于透射电子束的图案支撑膜; 形成在图案支撑膜上的电子束散射体图案; 以及用于支撑图案支撑膜和电子束散射体图案的支撑构件。 图案支持膜的膜厚度为0.005〜0.2微米,膜材料密度为1.0〜5.0g / cm 3,弹性模量为0.8×10 11 Pa以上。 电子束散射体图案的膜厚为0.2〜2微米,膜材料密度为1.0〜5.0g / cm 3,弹性模量为0.8×10 11 Pa以上。