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    • 8. 发明授权
    • Method and photo mask for manufacturing an array substrate
    • 用于制造阵列基板的方法和光罩
    • US06667198B2
    • 2003-12-23
    • US10205317
    • 2002-07-26
    • Shigeyuki ShimotoShuichi Uchikoga
    • Shigeyuki ShimotoShuichi Uchikoga
    • H01L2100
    • H01L29/66757H01L27/12H01L29/78675
    • A method of manufacturing an array substrate comprising; depositing an amorphous material on a transparent substrate; and changing the amorphous material to a polycrystalline material by irradiation of energy beams through a photo mask, the mask including a transparent region permitting the energy beams to pass through and a shutoff region surrounding the transparent region and interrupting the energy beams, wherein changing the amorphous material to the polycrystalline material includes: moving the transparent substrate by a constant distance perpendicularly to the lengthwise direction of a flat pattern projected onto the surface of the amorphous material when energy beams passing through the transparent region are irradiated onto the amorphous material; and irradiating the energy beams onto the amorphous material every time when the transparent substrate is moved.
    • 一种阵列基板的制造方法, 在透明基板上沉积无定形材料; 以及通过照射能量束通过光掩模将所述无定形材料改变为多晶材料,所述掩模包括允许所述能量束通过的透明区域和围绕所述透明区域的截止区域并中断所述能量束,其中, 多晶材料的材料包括:当通过透明区域的能量束照射到非晶材料上时,使透明基板移动垂直于投射到非晶材料表面上的平坦图案的长度方向上恒定的距离; 并且每当透明基板移动时,将能量束照射到非晶材料上。