专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US11104057B2 Imprint apparatus and method of imprinting a partial field 有权
公开(公告)号：US11104057B2
公开(公告)日：2021-08-31
申请号：US15010774
申请日：2016-01-29
申请人： CANON KABUSHIKI KAISHA
发明人： Mario Johannes Meissl , Wei Zhang , Byung-Jin Choi , Zhengmao Ye
IPC分类号： B29C59/02 , G03F7/00 , B29C35/02 , B29C37/00 , B29C59/00
摘要： In an embodiment, an imprint apparatus can include a substrate holder having a chucking region and a recessed support section; and a template holder, wherein the chucking region has more area as compared to a template region. In another embodiment, an imprint apparatus can include gas zones; and a gas controller that can be configured to adjust pressures within the gas zones to induce a convex curvature of a partial field of a workpiece used with the imprint apparatus. A method can include providing a workpiece within an imprint apparatus, wherein the workpiece includes a substrate and a formable material; and initially contacting a template with the formable material at a location spaced apart from the periphery of a partial field. In a particular embodiment, the method can further include modulating the substrate to form a convex shape contacting the template with the formable material.

2. 发明授权

US10199244B2 Imprint apparatus, and method of manufacturing article 有权
公开(公告)号：US10199244B2
公开(公告)日：2019-02-05
申请号：US14823075
申请日：2015-08-11
申请人： CANON KABUSHIKI KAISHA
发明人： Nobuto Kawahara , Yoshikazu Miyajima , Zhengmao Ye , Anshuman Cherala , Byung-Jin Choi , Xiaoming Lu , Kang Luo
IPC分类号： H01L21/67 , H01L21/683 , H01L21/304
摘要： An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.

3. 发明授权

US10095106B2 Removing substrate pretreatment compositions in nanoimprint lithography 有权
公开(公告)号：US10095106B2
公开(公告)日：2018-10-09
申请号：US15418952
申请日：2017-01-30
申请人： CANON KABUSHIKI KAISHA
发明人： Timothy Brian Stachowiak , Weijun Liu , Niyaz Khusnatdinov , Zhengmao Ye , Toshiki Ito
IPC分类号： B05D3/00 , C08J7/18 , G21H5/00 , G03F7/00
摘要： A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

4. 发明申请

US20180117626A1 EDGE FIELD IMPRINT LITHOGRAPHY 审中-公开
公开(公告)号：US20180117626A1
公开(公告)日：2018-05-03
申请号：US15339281
申请日：2016-10-31
申请人： Canon Kabushiki Kaisha
发明人： Zhengmao Ye
IPC分类号： B05D3/12 , B05D3/06
CPC分类号： B05D3/12 , B05D3/067 , G03F7/0002
摘要： Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for an imprint lithography method of edge field patterning, the method including providing a template having a mold, the mold having a patterning surface comprising patterned features; providing a substrate having an edge step layer positioned thereon the edge step layer including a sloped profile; depositing a polymerizable material on the edge step layer of the substrate; contacting the polymerizable material at one or more of a plurality of edge fields located at a perimeter of the substrate with the mold of the template; and based on the contacting, forming a pattern based on the patterned features at the one or more edge fields to provide an edge field pattern, wherein contact between the template and the substrate proximate to the plurality of edge fields is prevented based on the edge step layer of the substrate.

5. 发明申请

US20170028598A1 IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD 审中-公开
标题翻译：印刷装置和制品制造方法
公开(公告)号：US20170028598A1
公开(公告)日：2017-02-02
申请号：US15302680
申请日：2015-04-07
申请人： CANON KABUSHIKI KAISHA
发明人： Byung-jin Choi , Anshuman Cherala , Zhengmao Ye , Xiaoming Lu , Kang Luo , Nobuto Kawahara , Yoshikazu Miyajima
IPC分类号： B29C43/58 , G03F7/00
CPC分类号： B29C43/58 , B29C43/021 , B29C2043/025 , B29C2043/3222 , B29C2043/3652 , B29C2043/5866 , G03F7/0002 , H01L21/6838
摘要： Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
摘要翻译：提供了一种用于使施加到基板上的树脂与模具接触以在基板上进行图案化的压印装置。压印装置包括用于保持基板的基板保持单元，其中基板保持单元包括沿预定方向布置的多个保持区域，多个保持区域分别沿着方向上的位置在该方向上具有不同的宽度尺寸，具有不同宽度尺寸的多个保持区域的两个保持区域之间的表面比分别在0.8至1.2的范围内。

6. 发明公开

US20230197462A1 METHOD FOR INHIBITING FORMABLE MATERIAL EVAPORATION, SYSTEM FOR INHIBITING EVAPORATION, AND METHOD OF MAKING AN ARTICLE 审中-公开
公开(公告)号：US20230197462A1
公开(公告)日：2023-06-22
申请号：US17557940
申请日：2021-12-21
申请人： CANON KABUSHIKI KAISHA
发明人： Steven C. Shackleton , Edward Brian Fletcher , Zhengmao Ye , Craig William Cone , Hiroyuki Kondo
IPC分类号： H01L21/3105
CPC分类号： H01L21/31051
摘要： A method of inhibiting evaporation of a formable material on a substrate, the method comprising holding the substrate with a substrate chuck, the substrate chuck being positioned within a central opening of a frame such that the frame surrounds at least a portion of the substrate chuck, supplying the formable material or a volatile material different from the formable material to a portion of the frame surrounding the substrate chuck, and dispensing the formable material on the substrate.

7. 发明授权

US10549313B2 Edge field imprint lithography 有权
公开(公告)号：US10549313B2
公开(公告)日：2020-02-04
申请号：US15339281
申请日：2016-10-31
申请人： Canon Kabushiki Kaisha
发明人： Zhengmao Ye
IPC分类号： B05D3/12 , B05D3/06
摘要： Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for an imprint lithography method of edge field patterning, the method including providing a template having a mold, the mold having a patterning surface comprising patterned features; providing a substrate having an edge step layer positioned thereon the edge step layer including a sloped profile; depositing a polymerizable material on the edge step layer of the substrate; contacting the polymerizable material at one or more of a plurality of edge fields located at a perimeter of the substrate with the mold of the template; and based on the contacting, forming a pattern based on the patterned features at the one or more edge fields to provide an edge field pattern, wherein contact between the template and the substrate proximate to the plurality of edge fields is prevented based on the edge step layer of the substrate.

8. 发明申请

US20170282440A1 REMOVING SUBSTRATE PRETREATMENT COMPOSITIONS IN NANOIMPRINT LITHOGRAPHY 审中-公开
公开(公告)号：US20170282440A1
公开(公告)日：2017-10-05
申请号：US15418952
申请日：2017-01-30
申请人： CANON KABUSHIKI KAISHA
发明人： Timothy Brian Stachowiak , Weijun Liu , Niyaz Khusnatdinov , Zhengmao Ye , Toshiki Ito
IPC分类号： B29C59/02 , B29C35/08 , G03F7/00 , B29C59/00
CPC分类号： G03F7/0002
摘要： A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

9. 发明申请

US20230109973A1 SHAPING SYSTEM INCLUDING AN EVAPORATION COVER, SHAPING PROCESS, AND METHOD OF MANUFACTURING AN ARTICLE 有权
公开(公告)号：US20230109973A1
公开(公告)日：2023-04-13
申请号：US17498568
申请日：2021-10-11
申请人： CANON KABUSHIKI KAISHA
发明人： Steven C. Shackleton , Alireza Aghili , Zhengmao Ye
IPC分类号： B29C43/10 , B29C43/02 , B29C43/20 , B29C43/34 , B29C43/18
摘要： A shaping system comprises a dispensing station configured to dispense formable material on a substrate, a shaping station configured to contact the dispensed formable material on the substrate with a plate, a positioning system configured to move the substrate having the dispensed formable material from the dispensing system to the shaping station, and a cover having one or more walls. While the substrate having the dispensed formable material is moved by the positioning system from the dispensing station to the shaping station, the cover is positioned to enclose the substrate and the dispensed formable material such that a ratio of a diameter of the substrate to a distance between the cover and the substrate to 80:1 to 30:1.

10. 发明申请

US20180104888A1 METHODS FOR CONTROLLING SPREAD OF IMPRINT MATERIAL 审中-公开
公开(公告)号：US20180104888A1
公开(公告)日：2018-04-19
申请号：US15292645
申请日：2016-10-13
申请人： Canon Kabushiki Kaisha
发明人： Zhengmao Ye , Niyaz Khusnatdinov , Edward Brian Fletcher
IPC分类号： B29C59/00 , B29C37/00 , B29C59/02 , H01L21/027
CPC分类号： B29C59/002 , B29C37/0025 , B29C59/022 , B29C59/026 , B29C2059/023 , B29K2105/0058 , B29L2031/3425 , G03F7/00 , G03F7/0002 , H01L21/0271
摘要： A substrate useful for imprint lithography having a location thereon defining an imprint field, the imprint field further defined by an interior region, a perimeter region surrounding the interior region, and a border, with the perimeter region further including fluid control features. A polymerizable material deposited on the substrate at the imprint field location is allowed to spread on the substrate, with the fluid control relief features redirecting the spreading of the polymerizable material so as to minimize spreading of the polymerizable material beyond the imprint field border as further imprint lithography techniques are then performed.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式