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    • 3. 发明申请
    • Laminated film for head applications
    • 用于头部应用的层压膜
    • US20090009907A1
    • 2009-01-08
    • US11825034
    • 2007-07-03
    • Kunliang ZhangMin ZhengMin LiChen-Jung ChienCherng-Chyi Han
    • Kunliang ZhangMin ZhengMin LiChen-Jung ChienCherng-Chyi Han
    • G11B5/127G11B5/147
    • G11B5/3116G11B5/1278
    • A laminated main pole layer is disclosed in which a non-AFC scheme is used to break the magnetic coupling between adjacent high moment layers and reduce remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. An amorphous material layer with a thickness of 3 to 20 Angstroms and made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, or Si is inserted between adjacent high moment stacks. The laminated structure also includes an alignment layer below each high moment layer within each stack. In one embodiment, a Ru coupling layer is inserted between two high moment layers in each stack to introduce an AFC scheme. An uppermost Ru layer is used as a CMP stop layer. A post annealing process may be employed to further reduce the anisotropy field (Hk).
    • 公开了一种层叠主极层,其中使用非AFC方案来破坏相邻的高力矩层之间的磁耦合,并且在保持高磁矩的同时降低硬轴方向的剩磁,并实现Hch,Hce和 Hk。 由Hf,Zr,Ta,Al,Mg,Zn或Si中的一种或多种的氧化物,氮化物或氧氮化物形成的厚度为3〜20埃的无定形材料层插入相邻的高强度叠层之间。 层叠结构还包括在每个堆叠内的每个高力矩层下面的对准层。 在一个实施例中,Ru耦合层插入每个堆叠中的两个高矩层之间以引入AFC方案。 使用最上层的Ru层作为CMP停止层。 可以采用后退火工艺来进一步降低各向异性场(Hk)。
    • 4. 发明授权
    • Laminated film for head applications
    • 用于头部应用的层压膜
    • US07773341B2
    • 2010-08-10
    • US11825034
    • 2007-07-03
    • Kunliang ZhangMin ZhengMin LiChen-Jung ChienCherng-Chyi Han
    • Kunliang ZhangMin ZhengMin LiChen-Jung ChienCherng-Chyi Han
    • G11B5/33
    • G11B5/3116G11B5/1278
    • A laminated main pole layer is disclosed in which a non-AFC scheme is used to break the magnetic coupling between adjacent high moment layers and reduce remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. An amorphous material layer with a thickness of 3 to 20 Angstroms and made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, or Si is inserted between adjacent high moment stacks. The laminated structure also includes an alignment layer below each high moment layer within each stack. In one embodiment, a Ru coupling layer is inserted between two high moment layers in each stack to introduce an AFC scheme. An uppermost Ru layer is used as a CMP stop layer. A post annealing process may be employed to further reduce the anisotropy field (Hk).
    • 公开了一种层叠主极层,其中使用非AFC方案来破坏相邻的高力矩层之间的磁耦合,并且在保持高磁矩的同时降低硬轴方向的剩磁,并实现Hch,Hce和 Hk。 由Hf,Zr,Ta,Al,Mg,Zn或Si中的一种或多种的氧化物,氮化物或氧氮化物形成的厚度为3〜20埃的无定形材料层插入相邻的高强度叠层之间。 层叠结构还包括在每个堆叠内的每个高力矩层下面的对准层。 在一个实施例中,Ru耦合层插入每个堆叠中的两个高矩层之间以引入AFC方案。 使用最上层的Ru层作为CMP停止层。 可以采用后退火工艺来进一步降低各向异性场(Hk)。
    • 7. 发明授权
    • Planarizing method for fabricating an inductive magnetic write head for
high density magnetic recording
    • 用于制造用于高密度磁记录的感应磁写头的平面化方法
    • US6024886A
    • 2000-02-15
    • US985648
    • 1997-12-05
    • Cherng-Chyi HanYongchang FengRodney E. LeeHui-Chuan Wang
    • Cherng-Chyi HanYongchang FengRodney E. LeeHui-Chuan Wang
    • G11B5/31G11B5/39B44C1/22
    • G11B5/3967G11B5/3116G11B5/313G11B5/3163Y10T29/49032Y10T29/49048Y10T29/49052
    • Within a method for forming a magnetic transducer head there is first provided a substrate having formed thereover a lower magnetic pole layer in turn having formed thereupon a gap filling layer which is substantially planar. There is then formed upon the gap filling layer a patterned upper magnetic pole tip layer which serves as an etch mask layer for forming from the gap filling layer and the lower magnetic pole layer a patterned gap filling layer and an etched lower magnetic pole layer having a lower magnetic pole tip integral thereto, while simultaneously forming an etched patterned upper magnetic pole tip layer from the patterned upper magnetic pole tip layer. There is then formed upon the etched patterned upper magnetic pole tip layer and the etched lower magnetic pole layer a backfilling insulator layer to a thickness greater than a thickness of the etched patterned upper magnetic pole tip layer plus a thickness of the patterned gap filling layer plus a thickness of the lower magnetic pole tip. There is then planarized the backfilling insulator layer to form a patterned planarized backfilling insulator layer an exposed upper surface of which is coplanar with an exposed upper surface of the etched patterned upper magnetic pole tip layer. Finally, there is then formed a patterned upper magnetic pole layer contacting the exposed upper surface of the etched patterned upper magnetic pole tip layer.
    • 在用于形成磁换能器头的方法中,首先提供了一个在其上形成有下磁极层的衬底,其上形成有大致平坦的间隙填充层。 然后在间隙填充层上形成图案化的上磁极尖端层,其用作用于从间隙填充层形成的蚀刻掩模层,并且下部磁极层形成图案化的间隙填充层和蚀刻的下部磁极层,该下部磁极层具有 下部磁极尖端与其成一体,同时从图案化的上磁极尖端层形成蚀刻图案的上磁极尖端层。 然后在蚀刻图案化的上磁极尖端层和蚀刻的下磁极层上形成厚度大于蚀刻图案的上磁极尖端层厚度加上图案化间隙填充层的厚度加上的回填绝缘体层 下磁极尖端的厚度。 然后平面化回填绝缘体层,以形成图案化的平坦化回填绝缘体层,其暴露的上表面与蚀刻图案化的上磁极尖端层的暴露的上表面共面。 最后,然后形成图案化的上磁极层,其接触蚀刻图案化的上磁极尖端层的暴露的上表面。