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1. 发明授权

US08753790B2 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权
标题翻译：可自成像的成膜聚合物，其组合物和由其制成的器件和结构
公开(公告)号：US08753790B2
公开(公告)日：2014-06-17
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
IPC分类号： G03F7/016 , G03F7/021 , G03F7/30
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译：根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。由此形成的膜可用于形成微电子和光电子器件。

2. 发明申请

US20110104614A1 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权
标题翻译：可自成像的成膜聚合物，其组合物和由其制成的装置和结构
公开(公告)号：US20110104614A1
公开(公告)日：2011-05-05
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译：根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。由此形成的膜可用于形成微电子和光电子器件。

3. 发明授权

US08715900B2 Self-imageable layer forming polymer and compositions thereof 有权
标题翻译：自成像层形成聚合物及其组合物
公开(公告)号：US08715900B2
公开(公告)日：2014-05-06
申请号：US13550586
申请日：2012-07-16
申请人： Osamu Onishi , Haruo Ikeda , Nobuo Tagashira , Larry Rhodes , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Nobuo Tagashira , Larry Rhodes , Pramod Kandanarachchi
IPC分类号： G03F7/22 , G03F7/039
CPC分类号： G03F7/0233 , C08F32/08 , C08F222/06 , C08F232/08 , C09D135/00 , G03F7/022 , G03F7/0226 , G03F7/027 , G03F7/038 , G03F7/0384
摘要： Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
摘要翻译：公开了可用于形成包含这种共聚物的自显影膜的共聚物及其组合物。这种共聚物包括降冰片烯型重复单元和马来酸酐型重复单元，其中至少一些这样的马来酸酐型重复单元已经开环。由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。

4. 发明申请

US20130017488A1 Self-Imageable Layer Forming Polymer and Compositions Thereof 有权
标题翻译：自成像层形成聚合物及其组合物
公开(公告)号：US20130017488A1
公开(公告)日：2013-01-17
申请号：US13550586
申请日：2012-07-16
申请人： Osamu Onishi , Haruo Ikeda , Nobuo Tagashira , Larry Rhodes , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Nobuo Tagashira , Larry Rhodes , Pramod Kandanarachchi
IPC分类号： G03F7/027 , G03F7/004
CPC分类号： G03F7/0233 , C08F32/08 , C08F222/06 , C08F232/08 , C09D135/00 , G03F7/022 , G03F7/0226 , G03F7/027 , G03F7/038 , G03F7/0384
摘要： Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
摘要翻译：公开了可用于形成包含这种共聚物的自显影膜的共聚物及其组合物。这种共聚物包括降冰片烯型重复单元和马来酸酐型重复单元，其中至少一些这样的马来酸酐型重复单元已经开环。由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。

5. 发明申请

US20060041093A1 Polycycloolefin polymeric compositions for semiconductor applications 有权
标题翻译：用于半导体应用的聚环烯烃聚合物组合物
公开(公告)号：US20060041093A1
公开(公告)日：2006-02-23
申请号：US11204685
申请日：2005-08-16
申请人： Ramakrisha Ravikiran , Hendra Ng. , Rajesh Puthenkovilakom , Linda Zhang , Dino Amoroso , Brian Knapp , Andrew Bell , Larry Rhodes
发明人： Ramakrisha Ravikiran , Hendra Ng. , Rajesh Puthenkovilakom , Linda Zhang , Dino Amoroso , Brian Knapp , Andrew Bell , Larry Rhodes
IPC分类号： C08F36/00
CPC分类号： C08K5/0091 , C08G61/06 , C08K3/36 , C08K5/5425 , C08L65/00 , C08L45/00
摘要： Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formulae I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.
摘要翻译：用于半导体应用的聚合物组合物包含10至99wt。由式I（a），I（b）和任选的I（c）和/或I（d）中的一个或多个表示的降冰片烯型环烯烃单体的百分比为0.0005至0.5重量％％的加成聚合前催化剂，以及任选地：至多0.5wt。％的助催化剂，高达59wt。交联单体的％，至多50wt。％的增粘剂，高达20wt。触变添加剂的％，至多80重量％％的填料，最多10wt。％的抗氧化剂，和高达0.6wt。％的抗氧化增效剂，配方的配方总量可达100％。这样的制剂是大量聚合或固化的，以形成具有对于各种特定电子，微电子，光电子和微光电子应用所需的性质的聚合物组合物，例如芯片附着粘合剂，底部填充材料，预浸料粘合剂，密封剂，保护层和其他相关应用。

6. 发明申请

US20060235174A1 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions 审中-公开
标题翻译：降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
公开(公告)号：US20060235174A1
公开(公告)日：2006-10-19
申请号：US11358903
申请日：2006-02-21
申请人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： C08F4/80 , C08F36/00 , C08F10/00 , C08F132/08 , C08F236/00 , C08F136/00 , C08F232/08 , C08F32/08
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

7. 发明申请

US20060234164A1 Norbornene-type polymers, compositions thereof and lithographic process using such compositions 有权
标题翻译：降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
公开(公告)号：US20060234164A1
公开(公告)日：2006-10-19
申请号：US11359880
申请日：2006-02-22
申请人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： G03C5/00
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

8. 发明申请

US20060167197A1 Photosensitive compositions based on polycyclic polymers 有权
标题翻译：基于多环聚合物的光敏组合物
公开(公告)号：US20060167197A1
公开(公告)日：2006-07-27
申请号：US11324738
申请日：2006-01-03
申请人： Edmund Elce , Takashi Hirano , Jeffrey Krotine , Larry Rhodes , Brian Goodall , SaiKumar Jayaraman , W. McDougall , Shenliang Sun
发明人： Edmund Elce , Takashi Hirano , Jeffrey Krotine , Larry Rhodes , Brian Goodall , SaiKumar Jayaraman , W. McDougall , Shenliang Sun
IPC分类号： C08F132/08
CPC分类号： G03F7/0382 , C08G59/3218 , C08G61/02 , C08G61/06
摘要： A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1-R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH2)nC(O)OR5; —(CH2)nC(O)OR; —(CH2)nOR6; —(CH2)nOC(O)R6; —(CH2)nC(O)R6; —(CH2)nOC(O)OR6; and any combination of two of R1, R2, R3, and R4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
摘要翻译：一种共聚物组合物，其包含具有结构式I的重复单元的共聚物：其中X选自-CH 2 - ， - CH 2 -CH 2 > - 和O; m是0至5的整数; 并且每次出现的R 1 -R 4独立地选自H; C 1至C 25直链，支链和环状的烷基，芳基，芳烷基，烷芳基，烯基和炔基，其可以包括一个或多个选自O，N，和Si; 含有环氧官能团的基团; - （CH 2）2 C（O）OR 5; - （CH 2）2 C（O）OR; - （CH 2 2）n - 或 - 6 - - （CH 2）n OC（O）R 6; - （CH 2 CH 2）n C（O）R 6; - （CH 2）n OC（O）OR 6; 并且R 1，R 2，R 3，R 4和R 4中的两个的任何组合通过连接组。具有结构式I的重复单元的一部分含有至少一个环氧官能侧基。该共聚物组合物可以包含在可光致定影的电介质组合物中光子形成催化剂的材料，该组合物可用于在基底上形成光可定义层。

9. 发明申请

US20050192409A1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof 审中-公开
标题翻译：具有多面体寡聚倍半硅氧烷侧基的多环烯烃的聚合物及其用途
公开(公告)号：US20050192409A1
公开(公告)日：2005-09-01
申请号：US11054963
申请日：2005-02-10
申请人： Larry Rhodes , Larry Seger , Ramakrishna Ravikiran , Edmund Elce , Robert Shick , John-Henry Lipian
发明人： Larry Rhodes , Larry Seger , Ramakrishna Ravikiran , Edmund Elce , Robert Shick , John-Henry Lipian
IPC分类号： C08F230/08 , C08F232/00 , C08F232/08 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , H01L21/312 , H01L21/768 , C08F30/08 , C08F130/08 , C08F226/06
CPC分类号： H01L21/02134 , C08F230/08 , C08F232/08 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0395 , G03F7/0758 , H01L21/3124 , H01L21/7682
摘要： Embodiments in accordance with the present invention encompass polymers having at least one norbornene-type repeating unit derived from a norbornene-type monomer having a polyhedral oligosilsesquioxane pendant group. Such polymers, are formed by addition polymerizations that employ one of a neutral or cationic palladium catalyst or a neutral nickel catalyst. Such polymers are useful for a variety of applications such as a positive tone or negative tone photodefinable material, a low-k dielectric constant material, an etch selective layer, a sacrificial material or the like. In addition, embodiments of the present invention include devices formed using such polymers.
摘要翻译：根据本发明的实施方案包括具有至少一种衍生自具有多面体寡聚倍半硅氧烷侧基的降冰片烯型单体的降冰片烯型重复单元的聚合物。这种聚合物通过使用中性或阳离子钯催化剂或中性镍催化剂之一的加成聚合形成。这种聚合物可用于各种应用，例如正色调或负色调可光限定材料，低k介电常数材料，蚀刻选择层，牺牲材料等。此外，本发明的实施方案包括使用这种聚合物形成的装置。

10. 发明申请

US20050186502A1 Directly photodefinable polymer compositions and methods thereof 有权
标题翻译：直接光可定义聚合物组合物及其方法
公开(公告)号：US20050186502A1
公开(公告)日：2005-08-25
申请号：US11044484
申请日：2005-01-27
申请人： Edmund Elce , Ramakrishna Ravikiran , Larry Rhodes , Robert Shick , Saikumar Jayaraman
发明人： Edmund Elce , Ramakrishna Ravikiran , Larry Rhodes , Robert Shick , Saikumar Jayaraman
IPC分类号： C08F4/80 , C08F32/00 , C08F220/40 , C08F230/08 , C08F232/08 , G02B6/122 , G02B6/132 , G03C1/492 , G03C1/494 , G03C1/76 , G03F20060101 , G03F7/038 , G03F7/075 , H01L21/301 , H01L21/46 , H01L21/78
CPC分类号： G03F7/0388 , C08F220/40 , C08F230/08 , C08F232/08 , G03F7/0758
摘要： The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.
摘要翻译：本发明涉及直接可光成像的聚合物组合物（DPPC）及其用于形成微电子和光电器件的方法。这样的DPPC包括具有至少一个降冰片烯型重复单元的聚合物，该单体具有含甲酰基侧基和至少一个具有含丙烯酸酯基团的降冰片烯型重复单元。

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