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    • 6. 发明授权
    • Power switching circuit
    • 电源开关电路
    • US07577052B2
    • 2009-08-18
    • US11638187
    • 2006-12-13
    • Jui-Jen WuKun-Lung ChenHung-Jen LiaoYung-Lung LinChen Yen-HueiDao-Ping Wang
    • Jui-Jen WuKun-Lung ChenHung-Jen LiaoYung-Lung LinChen Yen-HueiDao-Ping Wang
    • G11C5/10
    • G11C11/412G11C11/413
    • A power control circuit for an integrated circuit module includes at least one switch device coupled between a supply voltage and a power node of the integrated circuit module; and a switch control module having a first terminal coupled to the switch device, a second terminal coupled to a control signal, a third terminal coupled to a first storage node of at least one tracking cell, a fourth terminal coupled to a second storage node of the tracking cell, and a fifth terminal coupled to the power node of the integrated circuit module, for controlling the switch device to pass the supply voltage to the power node with or without a substantial voltage drop depending on an operation mode of the integrated circuit module.
    • 用于集成电路模块的功率控制电路包括耦合在电源电压和集成电路模块的功率节点之间的至少一个开关装置; 以及开关控制模块,其具有耦合到所述开关装置的第一端子,耦合到控制信号的第二端子,耦合到至少一个跟踪单元的第一存储节点的第三端子,耦合到所述至少一个跟踪单元的第二存储节点的第四端子 跟踪单元和耦合到集成电路模块的功率节点的第五端子,用于根据集成电路模块的操作模式控制开关装置将电源电压传递到功率节点,具有或不具有实质的电压降 。
    • 9. 发明申请
    • INTEGRATED MEMS DEVICE
    • 集成MEMS器件
    • US20130161702A1
    • 2013-06-27
    • US13337150
    • 2011-12-25
    • Kun-Lung Chen
    • Kun-Lung Chen
    • H01L27/20
    • B81C1/00246B81B2201/0257B81B2207/015B81C2203/0714B81C2203/0742B81C2203/0771H04R19/005H04R19/04H04R31/00H04R2201/003
    • An integrated MEMS device is provided, including, from bottom up, a bonding wafer layer, a bonding layer, an aluminum layer, a CMOS substrate layer defining a large back chamber area (LBCA), a small back chamber area (SBCA) and a sound damping path (SDP), a set of CMOS wells, a field oxide (FOX) layer, a set of CMOS transistor sources/drains, a first polysilicon layer forming CMOS transistor gates, a second polysilicon layer, said CMOS wells, said CMOS transistor sources/drains and said CMOS gates forming CMOS transistors, an oxide layer embedded with a plurality of metal layers interleaved with a plurality of via hole layers, and a gap control layer, an oxide layer, a first Nitride deposition layer, a metal deposition layer, a second Nitride deposition layer, an under bump metal (UBM) layer made of preferably Al/NiV/Cu and a plurality of solder spheres.
    • 提供了一种集成的MEMS器件,包括从下而上的接合晶片层,接合层,铝层,限定大后室区域(LBCA)的CMOS衬底层,小后室区域(SBCA)和 声阻尼路径(SDP),一组CMOS井,场氧化物(FOX)层,一组CMOS晶体管源极/漏极,形成CMOS晶体管栅极的第一多晶硅层,第二多晶硅层,所述CMOS阱,所述CMOS 晶体管源极/漏极和形成CMOS晶体管的所述CMOS栅极,嵌入多个与多个通孔层交错的金属层的氧化物层,以及间隙控制层,氧化物层,第一氮化物沉积层,金属沉积 层,第二氮化物沉积层,优选Al / NiV / Cu制成的凸块下金属(UBM)层和多个焊料球。