专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08846295B2 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof 有权
标题翻译：含有被保护的羟基用于负显影的光致抗蚀剂组合物和使用它的图案形成方法
公开(公告)号：US08846295B2
公开(公告)日：2014-09-30
申请号：US13457735
申请日：2012-04-27
申请人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li
发明人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li
IPC分类号： G03F7/038 , G03F7/021
CPC分类号： G03F7/0382 , G03F7/021 , G03F7/0397 , G03F7/20 , G03F7/325
摘要： The present invention relates to a photoresist composition capable of negative development and a pattern forming method using the photoresist composition. The photoresist composition includes an imaging polymer, a crosslinking agent and a radiation sensitive acid generator. The imaging polymer includes a monomeric unit having an acid-labile moiety-substituted hydroxyl group. The patterning forming method utilizes an organic solvent developer to selectively remove an unexposed region of a photoresist layer of the photoresist composition to form a patterned structure in the photoresist layer. The photoresist composition and the pattern forming method are especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
摘要翻译：本发明涉及能够显影的光致抗蚀剂组合物和使用光致抗蚀剂组合物的图案形成方法。光致抗蚀剂组合物包括成像聚合物，交联剂和辐射敏感的酸发生剂。成像聚合物包括具有酸不稳定部分取代的羟基的单体单元。图案形成方法利用有机溶剂显影剂选择性地除去光致抗蚀剂组合物的光致抗蚀剂层的未曝光区域，以在光致抗蚀剂层中形成图案化结构。光致抗蚀剂组合物和图案形成方法对于使用193nm（ArF）光刻在半导体衬底上形成材料图案特别有用。

2. 发明授权

US06921620B2 Imageable composition containing colorant having a counter anion derived from a non-volatile acid 失效
标题翻译：含有源自非挥发性酸的抗衡阴离子的着色剂的可成像组合物
公开(公告)号：US06921620B2
公开(公告)日：2005-07-26
申请号：US09933884
申请日：2001-08-21
申请人： Eiji Hayakawa , Jianbing Huang , Thomas Jordan , Yasushi Miyamoto , Jeffrey Collins
发明人： Eiji Hayakawa , Jianbing Huang , Thomas Jordan , Yasushi Miyamoto , Jeffrey Collins
IPC分类号： B41C1/10 , B41M5/36 , G03F7/00 , G03F7/004 , G03F7/016 , G03F7/021 , G03F7/038 , G03F7/30
CPC分类号： G03F7/0382 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/26 , B41C2210/262 , G03F7/0045 , G03F7/016 , G03F7/021
摘要： The present invention provides an imageable composition, which includes an acid curable composition, an acid generator, a colorant having a counter anion derived from a non-volatile acid, and further optionally, an infrared absorber or photothermal converter material. The present invention further provides an imageable element, which includes a substrate and an imageable composition according to the present invention coated on a surface of the substrate. Also provided is method of producing an imaged element according to the present invention.
摘要翻译：本发明提供一种可成像组合物，其包含酸可固化组合物，酸产生剂，具有衍生自非挥发性酸的抗衡阴离子的着色剂，以及进一步任选的红外吸收剂或光热转化器材料。本发明还提供了可成像元件，其包括基材和涂覆在基材表面上的根据本发明的可成像组合物。还提供了根据本发明的成像元件的制造方法。

3. 发明授权

US06861196B2 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds 失效
标题翻译：具有含烷氧基和非烷氧基重氮盐的化合物的混合物的光敏组合物
公开(公告)号：US06861196B2
公开(公告)日：2005-03-01
申请号：US10664179
申请日：2003-09-17
申请人： Stephan J. Platzer , Maria T. Sypek , Paul Perron , Harald Baumann , Melinda Alden
发明人： Stephan J. Platzer , Maria T. Sypek , Paul Perron , Harald Baumann , Melinda Alden
IPC分类号： G03F7/016 , G03F7/021 , G03F7/30
CPC分类号： G03F7/016 , G03F7/021 , G03F7/0215 , G03F7/0217
摘要： The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1. Upon imagewise exposure and development, an imaged element is obtained.
摘要翻译：本发明包括可成像元件，其可以是：（a）包含成像层的可成像元件，其包含：含有烷氧基取代基的芳族重氮盐盐化合物和不含烷氧基取代基的含芳族重氮盐的化合物; 聚乙烯醇缩醛粘合剂; 和片基材; 或（b）包含成像层的可成像元件，其包含：含有烷氧基取代基的芳族重氮盐盐化合物和不含烷氧基取代基的含芳族重氮盐盐化合物; 和片状基材。成像层包括含有至少10重量％的化合物含量的总芳族重氮盐。具有烷氧基取代基的含芳族重氮盐的化合物与不含烷氧基取代基的含芳族重氮盐化合物的摩尔比为约1.0:1至70:1。在成像曝光和显影时，获得成像元件。

4. 发明授权

US5846685A Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate 失效
标题翻译：辐射敏感重氮磺基丙烯酸加合物及其印刷方法
公开(公告)号：US5846685A
公开(公告)日：1998-12-08
申请号：US797675
申请日：1997-01-31
申请人： S. Peter Pappas , Jianbing Huang , Ajay Shah , Shashikant Saraiya
发明人： S. Peter Pappas , Jianbing Huang , Ajay Shah , Shashikant Saraiya
IPC分类号： G03F7/021 , G03F7/095
CPC分类号： G03F7/021
摘要： A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.
摘要翻译：一种辐射敏感性组合物，其含有具有侧面重氮基团的重氮化合物的加合物和具有磺酸根基侧基的磺化丙烯酸共聚物。磺化丙烯酸共聚物含有丙烯酸部分和磺化苯乙烯基或丙烯酸部分。共聚物可以任选地含有苯乙烯基部分。该组合物可用作用于图形艺术应用的成像元件中的辐射敏感层，并且在制备耐用的长寿命印刷版中特别有用。

5. 发明授权

US5609980A Radiation-sensitive materials comprising a layer having core-shell particles and a second layer with a radiation sensitive component 失效
标题翻译：辐射敏感材料包括具有核 - 壳颗粒的层和具有辐射敏感组分的第二层
公开(公告)号：US5609980A
公开(公告)日：1997-03-11
申请号：US883019
申请日：1992-05-14
申请人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
发明人： Andrew E. Matthews , David E. Murray , Allen P. Gates , John R. Wade , Michael J. Pratt , William A. King
IPC分类号： G03F7/00 , G03F7/021 , G03F7/022 , G03F7/023 , G03F7/027 , G03F7/033 , G03F7/038 , G03F7/039 , G03C1/72 , G03F7/11
CPC分类号： G03F7/0233 , G03F7/021 , G03F7/0212 , G03F7/033 , Y10S430/111
摘要： A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
摘要翻译：辐射敏感材料包括包含水溶性可热软化核的颗粒，其由在水性介质中可溶或可溶胀的壳包围。该材料还包括辐射敏感组分，其在暴露于辐射下导致材料的溶解度特性改变。该材料可以是正面或负面工作的，并且可以从水性介质涂覆到基材上以形成辐射敏感板，其在成像曝光之后可以在水性介质中显影，然后加热使颗粒聚结形成耐用的打印图像。

6. 发明授权

US5478690A Alkali developable photosensitive resin composition comprising a binder having betaine side groups 失效
标题翻译：碱显影性感光性树脂组合物，其含有甜菜碱侧基的粘合剂
公开(公告)号：US5478690A
公开(公告)日：1995-12-26
申请号：US366444
申请日：1994-12-30
申请人： Kazunori Kanda , Yoshifumi Ichinose , Seiji Arimatsu
发明人： Kazunori Kanda , Yoshifumi Ichinose , Seiji Arimatsu
IPC分类号： G03F7/00 , G03F7/004 , G03F7/021 , G03F7/023 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/32
CPC分类号： G03F7/322 , G03F7/021 , G03F7/0233 , G03F7/033 , Y10S430/107 , Y10S430/111
摘要： Disclosed is an alkali developable photosensitive resin composition useful for an offset printing plate, which has excellent developability and provides long life of a developer. The photosensitive resin composition comprising:(a) an alkali-soluble type binder resin,(b) a photosensitive substance, and(c) a dye;said binder resin (a) having an ampho-ionic group represented by the formula: ##STR1## [wherein R.sup.1 is H or a C.sub.1-10 alkyl group which optionally has a substituent or a functional group in a chain, R is a substituted or non-substituted C.sub.1-20 alkylene or phenylene group, and A is --COO or --SO.sub.3 ]and/or an ampho-ionic group represented by the formula: ##STR2## [wherein each R.sup.2 is the same or different and respectively indicates a C.sub.1-10 alkyl group which optionally has a substituent or a functional group in a chain, and R and A are as defined above] in a molecule and containing a resin having total acid value of 5 to 150.
摘要翻译：公开了一种可用于胶印印刷版的碱显影性感光性树脂组合物，其具有优异的可显影性并提供显影剂的长寿命。该感光性树脂组合物包含：（a）碱溶性型粘合剂树脂，（b）感光性物质和（c）染料; 所述粘合剂树脂（a）具有由下式表示的两性离子基团：其中R 1为H或任选具有取代基的C 1-10烷基或链中的官能团，R为取代或未取代的C 1-20亚烷基或亚苯基，A为-COO或-SO 3]和/或由下式表示的两性离子基团：其中每个R 2相同或不同，分别表示C1 -10烷基，其任选在链中具有取代基或官能团，并且R和A如上定义），并且含有总酸值为5至150的树脂。

7. 发明授权

US5427887A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5427887A
公开(公告)日：1995-06-27
申请号：US106699
申请日：1993-08-16
申请人： Satoshi Konuma , Toshiyuki Matsumura , Akihisa Murata , Shigeo Tsuji
发明人： Satoshi Konuma , Toshiyuki Matsumura , Akihisa Murata , Shigeo Tsuji
IPC分类号： G03F7/021 , G03C1/60
CPC分类号： G03F7/021 , Y10S430/111
摘要： Disclosed is a light-sensitive composition which comprises(A) a diazo resin and(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.
摘要翻译：公开了一种感光性组合物，其包含（A）重氮树脂和（B）碱溶性和可溶胀的聚合物化合物，所述高分子化合物是含有作为结构单元的结构的0.1〜10摩尔％衍生自具有8个或更多个碳原子的烷基的丙烯酸或甲基丙烯酸的酯。

8. 发明授权

US5340685A Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant 失效
标题翻译：含有重氮树脂，聚氨酯树脂和含氟原子的共聚物表面活性剂的感光性组合物
公开(公告)号：US5340685A
公开(公告)日：1994-08-23
申请号：US40615
申请日：1993-03-31
申请人： Toshiyuki Sekiya
发明人： Toshiyuki Sekiya
IPC分类号： G03F7/00 , C08G18/66 , C08L75/08 , G03F7/004 , G03F7/021 , G03F7/035
CPC分类号： G03F7/021 , C08G18/6692 , C08L75/08 , Y10S430/107
摘要： A light-sensitive composition comprises a light-sensitive diazo resin, a polymer binder and a fluorine atom-containing surfactant, wherein the polymer binder is a polyurethane resin having acidic hydrogen atom-containing substituents and comprising structural units derived from a diol represented by the following general formula (I); and the fluorine atom-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group which has a carbon atom number of 3 to 20 and a fluorine atom content of not less than 30% by weight and in which at least three terminal carbon atoms are completely fluorinated, with (ii) poly(oxyalkylene) acrylate or poly(oxyalkylene)methacrylate, the copolymer containing the fluoroaliphatic group-containing acrylate or methacrylate units in an amount ranging from 35 to 50% by weight on the basis of the weight of the copolymer and the copolymer having has a molecular weight ranging from 20,000 to 100,000:HO--(CH.sub.2 CH.sub.2 O).sub.n --H (I)wherein n is an integer of not less than 3. The light-sensitive composition can provide a PS plate having sufficient developability with an exhausted developer and can provide a lithographic printing plate having good printing durability and excellent ink receptivity during printing even after storing under high temperature and humidity conditions or after being exposed to light.
摘要翻译：光敏性组合物包含感光重氮树脂，聚合物粘合剂和含氟原子的表面活性剂，其中所述聚合物粘合剂是具有酸性含氢原子的取代基的聚氨酯树脂，并且包含衍生自由按照通式（I）; 含氟原子的表面活性剂是（i）具有碳原子数为3〜20，氟原子含量为30重量％以上的氟代脂族基的丙烯酸酯或甲基丙烯酸酯的共聚物，其中至少三末端碳原子完全氟化，其中（ii）聚（氧化烯）丙烯酸酯或聚（氧化烯）甲基丙烯酸酯，含有含氟脂族基团的丙烯酸酯或甲基丙烯酸酯单元的共聚物的量为35-50重量％共聚物的重量和共聚物的分子量范围为20,000至100,000：HO-（CH 2 CH 2 O）n H（I），其中n为不小于3的整数。光敏组合物可提供PS板具有足够的显影性和排气的显影剂，并且可以提供具有良好的印刷耐久性的平版印刷版，甚至在高温和高湿度储存暴露或暴露于光后。

9. 发明授权

US5320928A Photosensitive composition comprising a diazonium compound and a polyurethane 失效
标题翻译：包含重氮化合物和聚氨酯的感光组合物
公开(公告)号：US5320928A
公开(公告)日：1994-06-14
申请号：US755617
申请日：1991-09-05
申请人： Toshiaki Aoai
发明人： Toshiaki Aoai
IPC分类号： C08G18/28 , C08G18/38 , C08G18/83 , C08G18/85 , C08K5/23 , C08L75/00 , C08L75/04 , G03F7/00 , G03F7/021 , G03F7/035 , G03C1/77
CPC分类号： G03F7/021 , C08G18/3878 , Y10S430/107
摘要： A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.
摘要翻译：一种光敏组合物，其包含敏感重量的重氮化合物和聚氨酯树脂粘合剂，其量足以改善所述组合物的物理性能，其中所述聚氨酯树脂具有至少一种选自膦酸基团，磷酸基团和酯基，其量足以改善与载体的粘合性。本发明的感光性组合物对支持体的粘附性优异，碱性显影剂的显色性优异，印刷耐久性高。

10. 发明授权

US5310618A Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators 失效
标题翻译：感光组合物和利用含有芳族重氮盐基团的化合物或聚合物和用于三氯甲基-s-三嗪或吖嗪盐光聚合引发剂的敏化染料的光吸收残基的物品
公开(公告)号：US5310618A
公开(公告)日：1994-05-10
申请号：US705360
申请日：1991-05-24
申请人： Kouichi Kawamura
发明人： Kouichi Kawamura
IPC分类号： C07D277/20 , C07D335/16 , C07D409/04 , C07D417/04 , C07D417/12 , C09B23/01 , C09B23/10 , C09B69/10 , G03F7/016 , G03F7/021 , G03F7/029
CPC分类号： C07D277/20 , C07D335/16 , C07D409/04 , C07D417/04 , C07D417/12 , C09B23/0091 , C09B23/102 , C09B69/10 , G03F7/016 , G03F7/021 , G03F7/029 , Y10S430/12 , Y10S430/121
摘要： A light-sensitive composition comprising either an alkali-soluble resin or radical-polymerizable, unsaturated compound, and a diazonium compound represented by general formula (I) or (II):(S).sub.1 --(L.sup.1).sub.m --(D).sub.n (I)--(L.sup.2 (S)).sub.o --(L.sup.3 (D)).sub.P -- (II)wherein D is a diazonium salt group, S is a light absorbing group, L.sup.1, L.sup.2 and L.sup.3 are connecting groups connecting S and D, provided that S and D are not conjugated by L.sup.1, L.sup.2 and L.sup.3 ; l, m, n, o and p are integers.
摘要翻译：包含通式（I）或（II）表示的碱溶性树脂或可自由基聚合的不饱和化合物和重氮化合物的光敏性组合物：（S）1-（L1）m-（D）n （I） - （L2（S））o-（L3（D））P-（II）其中D是重氮盐基团，S是光吸收基团，L1，L2和L3是连接S和D的连接基团只要S和D不与L1，L2和L3共轭; l，m，n，o和p是整数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式