专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

US20240249906A1 ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER 审中-公开
公开(公告)号：US20240249906A1
公开(公告)日：2024-07-25
申请号：US18158357
申请日：2023-01-23
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Po-Tang TSENG , Ching-Heng YEN , Tai-Kun KAO , Sheng-Tai PENG , Chun Yan CHEN
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/0815
摘要： An ion source head includes a curved liner that is configured to more closely and accurately repel, direct, or deflect ion species generated within an ion source cavity of an ion source container of an ion source head towards an ion beam opening that extends through the ion source container of the ion source head. This prevents or reduces the ion species from becoming trapped in the ion source cavity instead of exiting the ion source cavity through the ion beam opening that extends through the ion source container of the ion source head. The curved liner may be received by a curved structure of the ion source container of the ion source head. The ion source head may be utilized within an implanter tool to refine or process a solid target with the ion beam generated by the ion source head with the curved liner.

2. 发明授权

US10879040B2 Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly 有权
公开(公告)号：US10879040B2
公开(公告)日：2020-12-29
申请号：US16210633
申请日：2018-12-05
申请人： CANON ANELVA CORPORATION
发明人： Yasushi Yasumatsu , Naoyuki Okamoto , Masashi Tsujiyama , Fumihito Suzuki
IPC分类号： H01J37/08 , H01J37/305 , H01J27/02 , B08B3/08 , H01J37/063 , H01J37/317
CPC分类号： H01J37/3053 , B08B3/08 , H01J27/024 , H01J37/063 , H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/061 , H01J2237/083 , H01J2237/0815 , H01J2237/3151
摘要： Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

3. 发明授权

US09852887B2 Ion source of an ion implanter 有权
公开(公告)号：US09852887B2
公开(公告)日：2017-12-26
申请号：US13975206
申请日：2013-08-23
申请人： ADVANCED ION BEAM TECHNOLOGY, INC.
发明人： Stephen Edward Savas , Xiao Bai , Zhimin Wan , Peter M. Kopalidis
IPC分类号： H01J37/317 , H01J37/08
CPC分类号： H01J37/3171 , H01J37/08 , H01J2237/0815 , H01J2237/0817
摘要： An ion source uses at least one induction coil to generate ac magnetic field to couple rf/VHF power into a plasma within a vessel, where the excitation coil may be a single set of turns each turn having lobes or multiple separate sets of windings. The excitation coil is positioned outside and proximate that side of the vessel that is opposite to the extraction slit, and elongated parallel to the length dimension of the extraction slit. The conducting shield(s) positioned outside or integrated with the well of the vessel are used to block the capacitive coupling to the plasma and/or to collect any rf/VHF current may be coupled into the plasma. The conducting shield positioned between the vessel and the coil set can either shield the plasma from capacitive coupling from the excitation coils, or be tuned to have a higher rf/VHF voltage to ignite or clean the source.

4. 发明授权

US09773646B2 Plasma ion source and charged particle beam apparatus 有权
公开(公告)号：US09773646B2
公开(公告)日：2017-09-26
申请号：US15019990
申请日：2016-02-10
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Hiroshi Oba , Yasuhiko Sugiyama , Mamoru Okabe
IPC分类号： H01J37/08 , H01J37/32 , H01J37/20 , H01J27/16 , H01J37/06
CPC分类号： H01J37/32522 , H01J27/16 , H01J37/06 , H01J37/08 , H01J37/20 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/32568 , H01J37/32807 , H01J2237/0815 , H01J2237/31749
摘要： A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber and made of a dielectric material; a coil wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an envelope surrounding the gas introduction chamber, the plasma generation chamber and the coil; and insulating liquid filled inside the gas introduction chamber, the plasma generation chamber and the envelope to immerse the coil and having an dielectric strength voltage relatively greater than that of the envelope and the same dielectric dissipation factor as the plasma generation chamber.

5. 发明授权

US09773636B2 Apparatus and method for generating high current negative hydrogen ion beam 有权
公开(公告)号：US09773636B2
公开(公告)日：2017-09-26
申请号：US14831468
申请日：2015-08-20
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： W. Davis Lee , Neil Bassom , Anthony Renau
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J27/028 , H01J27/205 , H01J27/24 , H01J37/3171 , H01J2237/0815 , H01J2237/082 , H01J2237/31701
摘要： An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.

6. 发明授权

US09583308B1 Light bath for particle suppression 有权
标题翻译：光浴抑制粒子
公开(公告)号：US09583308B1
公开(公告)日：2017-02-28
申请号：US14837610
申请日：2015-08-27
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： William Davis Lee
IPC分类号： H01J37/317 , H01J37/08 , H01J37/147
CPC分类号： H01J37/08 , H01J37/05 , H01J37/1472 , H01J37/3171 , H01J2237/053 , H01J2237/0815 , H01J2237/31701 , H01J2237/31705
摘要： An apparatus, referred to as a light bath, is disposed in a beamline ion implantation system and is used to photoionize particles in the ion beam into positively charged particles. Once positively charged, these particles can be manipulated by the various components in the beamline ion implantation system. In certain embodiments, a positively biased electrode is disposed downstream from the light bath to repel the formerly non-positively charged particles away from the workpiece. In certain embodiments, the light bath is disposed within an existing component in the beamline ion implantation system, such as a deceleration stage or a Vertical Electrostatic Energy Filter. The light source emits light at a wavelength sufficiently short so as to ionize the non-positively charged particles. In certain embodiments, the wavelength is less than 250 nm.
摘要翻译：称为光浴的装置设置在束线离子注入系统中，用于将离子束中的颗粒光电离成带正电的颗粒。一旦带正电，这些颗粒可以通过束线离子注入系统中的各种组分来操纵。在某些实施例中，正偏置的电极设置在光浴的下游，以将以前不带正电的颗粒排斥离开工件。在某些实施例中，光浴设置在束线离子注入系统中的现有部件内，例如减速阶段或垂直静电能量过滤器。光源以足够短的波长发射光，以使非正电荷的粒子离子化。在某些实施方案中，波长小于250nm。

7. 发明申请

US20160064186A1 BIAS ELECTRODES FOR TANDEM ACCELERATOR 有权
标题翻译：用于加速器的偏置电极
公开(公告)号：US20160064186A1
公开(公告)日：2016-03-03
申请号：US14469050
申请日：2014-08-26
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Shengwu Chang , Christopher Lupoli , William Davis Lee , Frank Sinclair , James Pixley
IPC分类号： H01J37/30 , H01J37/05 , H05H5/06 , H01J37/317
CPC分类号： H01J37/3007 , H01J37/08 , H01J37/3171 , H01J2237/0473 , H01J2237/0815 , H05H5/063
摘要： A tandem accelerator and ion implanter with improved performance is disclosed. The tandem accelerator includes a plurality of input electrodes, a plurality of output electrodes and a high voltage terminal disposed therebetween. The high voltage terminal includes a stripper tube. Neutral molecules are injected into the stripper tube, which remove electrons from the incoming negative ion beam. The resulting positive ions are accelerated toward the plurality of output electrodes. To reduce the amount of undesired positive ions that exit the stripper tube, bias electrodes is disposed at the entrance and exit of the stripper tube. The bias electrodes are biased a second voltage, greater than the first voltage applied to the terminal. The bias electrodes repel slow moving positive ions, preventing them from exiting the stripper tube and contaminating the workpiece.
摘要翻译：公开了一种具有改进性能的串联加速器和离子注入机。串联加速器包括多个输入电极，多个输出电极和设置在它们之间的高电压端子。高压端子包括剥离管。将中性分子注入汽提塔，从入射的负离子束中除去电子。所产生的正离子朝向多个输出电极加速。为了减少离开汽提塔的不需要的正离子的量，偏压电极设置在汽提塔管的入口和出口处。偏置电极偏置第二电压，大于施加到端子的第一电压。偏置电极排斥缓慢移动的正离子，防止它们离开剥离管并污染工件。

8. 发明授权

US09214313B2 Ion source with independent power supplies 有权
标题翻译：离子源带独立电源
公开(公告)号：US09214313B2
公开(公告)日：2015-12-15
申请号：US13082983
申请日：2011-04-08
申请人： Joseph M. Matesa, Jr. , Paul E. Fischione
发明人： Joseph M. Matesa, Jr. , Paul E. Fischione
IPC分类号： H01J1/50 , H01J37/08 , H01J27/04 , H01J37/305
CPC分类号： H01J37/08 , H01J27/04 , H01J37/3056 , H01J2237/061 , H01J2237/0815
摘要： An ion source is disclosed which utilizes independently powered electrodes that are isolated with a series of insulators. The ion source comprises an anode electrode with a hollow interior, where the anode is disposed between a cathode and an anti-cathode. A magnet or electro-magnet imposes a magnetic field in an axial direction through the bore of the anode. Gas is introduced into the anode area at a controllable pressure. The ion source includes a first voltage differential between the anode and cathode for the production of plasma and a second voltage differential between the anode and the anti-cathode for extraction of ions from the plasma, forming an ion beam, which is preferably of a narrow diameter at low beam energy. In particular, the voltage differential between the anti-cathode and anode is adjusted to control the initial beam divergence of extracted ions. An optional focus electrode with an independent power supply further focuses the ion beam. A final electrode defines the output boundary of the ion source to provide un-perturbed drift of the ions into the vacuum chamber.
摘要翻译：公开了一种离子源，其利用与一系列绝缘体隔离的独立供电的电极。离子源包括具有中空内部的阳极电极，其中阳极设置在阴极和反阴极之间。磁体或电磁铁通过阳极的孔沿轴向施加磁场。气体以可控的压力被引入阳极区域。离子源包括用于产生等离子体的阳极和阴极之间的第一电压差和用于从等离子体提取离子的阳极和反阴极之间的第二电压差，形成离子束，其优选地为窄直径在低光束能量。特别地，调整反阴极和阳极之间的电压差以控制提取的离子的初始光束发散。具有独立电源的可选聚焦电极进一步聚焦离子束。最终电极定义了离子源的输出边界，以提供离子到真空室中的无扰动漂移。

9. 发明申请

US20150283405A1 ROTATABLE TARGETING MAGNET APPARATUS AND METHOD OF USE THEREOF IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM 审中-公开
标题翻译：可旋转的磁铁装置及其与充电粒子治疗系统连接的方法
公开(公告)号：US20150283405A1
公开(公告)日：2015-10-08
申请号：US14246803
申请日：2014-04-07
申请人： Vladimir Balakin
发明人： Vladimir Balakin
IPC分类号： A61N5/10
CPC分类号： A61N5/1082 , A61N5/1044 , A61N5/1067 , A61N5/107 , A61N5/1077 , A61N5/1081 , A61N2005/1087 , A61N2005/1097 , G21K1/093 , G21K5/04 , H01J37/141 , H01J2237/0815 , H05H2007/007 , H05H2007/082
摘要： A rotatable targeting magnet apparatus and method of use thereof is described where the rotatable targeting magnet rotates independently of a beamline arc at the end of the beamline arc, where the arc is after an accelerator and before the patient in a cancer therapy system. The rotatable targeting magnet directs the charged particle beam, such as vertically, using applied current to the targeting magnet while rotation of the magnet allows scanning across the tumor. Rotation of the patient relative to the charged particle allows distribution of trailing Bragg peak energy within and/or circumferentially about the tumor.
摘要翻译：描述了一种可旋转靶向磁铁装置及其使用方法，其中可转动的定向磁体独立于束线弧的末端处的光束弧线旋转，其中电弧在加速器之后并且在癌症治疗系统中的患者之前。可旋转定向磁体通过使用施加的电流将带电粒子束（例如垂直）引导到靶向磁体，同时磁体的旋转允许跨越肿瘤扫描。患者相对于带电粒子的旋转允许在肿瘤内和/或周向周围分布肿瘤的后布拉格峰能量。

10. 发明申请

US20150273240A1 FAST MAGNET METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM 审中-公开
标题翻译：使用与充电粒子治疗系统连接的快速磁体方法和装置
公开(公告)号：US20150273240A1
公开(公告)日：2015-10-01
申请号：US14231020
申请日：2014-03-31
申请人： Vladimir Balakin
发明人： Vladimir Balakin
IPC分类号： A61N5/10 , H01J37/141
CPC分类号： A61N5/1082 , A61N5/1044 , A61N5/1067 , A61N5/107 , A61N5/1077 , A61N5/1081 , A61N2005/1087 , A61N2005/1097 , G21K1/093 , G21K5/04 , H01J37/141 , H01J2237/0815 , H05H2007/007 , H05H2007/082
摘要： A fast magnet switching method and apparatus used to rapidly redirect cations, such as H+ or C6+, in a beam path, such as during or between treatment of individual volumes or voxels of a tumor of the patient, is described. Switching means include rapidly increasing or decreasing applied current to a coil about a magnet, which rapidly alters a magnetic field crossing the charged particle path and redirects a charged particle beam away from the patient, such as to a charged particle beam stop. Means to rapidly induce the current change include: (1) using a separate high voltage power supply and/or (2) opening a switch to redirect current through a resistor. In both cases, the rapid current change to the coil yields a rapid change the magnetic field and a corresponding rapid change in direction of the charged particles in the charged particle cancer therapy system.
摘要翻译：描述了用于在诸如患者的肿瘤的个体体积或体素的处理期间或之间的波束路径中快速重定向阳离子（例如H +或C6 +）的快速磁体切换方法和装置。切换装置包括对围绕磁体的线圈的施加电流迅速增加或减小，其迅速改变穿过带电粒子路径的磁场并将带电粒子束重新定向远离患者，诸如带电粒子束停止。快速引起电流变化的手段包括：（1）使用单独的高压电源和/或（2）打开开关以使电流重新定向通过电阻器。在这两种情况下，线圈的快速电流变化都会迅速改变带电粒子癌症治疗系统中带电粒子的磁场和相应的方向快速变化。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式