专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4366383A Electron beam type pattern transfer apparatus 失效
标题翻译：电子束式图案转印装置
公开(公告)号：US4366383A
公开(公告)日：1982-12-28
申请号：US165618
申请日：1980-07-03
申请人： Shunichi Sano , Toshiaki Shinozaki , Ichiro Mori
发明人： Shunichi Sano , Toshiaki Shinozaki , Ichiro Mori
IPC分类号： H01L21/027 , H01J37/317 , H01L21/30 , A61K27/02 , G01N21/64
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01L21/30 , H01J2237/04735 , H01J2237/04922 , H01J2237/142 , H01J2237/31779 , Y10S505/879
摘要： An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.
摘要翻译：电子束型图案转印装置在由非磁性材料制成的真空容器中具有光电掩模和样品。光电掩模适于从光源接收紫外线并发射对应于预定转印图案的光电子，并且将样品与光电掩模平行放置并保持在预定距离处并用光电子照射以形成抗蚀剂图像对应于转印图案。用于施加用于加速发射的光电子的电压的电源连接在光电掩模和样品之间。一对聚焦磁铁设置在真空容器的轴线周围，使得它们位于真空容器的一个外侧和一个在相对的外侧中，从而允许在光电面罩和样品。聚焦磁体具有超导线圈并以持续模式驱动。

2. 发明申请

US20080116391A1 Charged Particle Beam Orbit Corrector and Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束轨道校正器和带电粒子束装置
公开(公告)号：US20080116391A1
公开(公告)日：2008-05-22
申请号：US11943241
申请日：2007-11-20
申请人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
发明人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
IPC分类号： G21K1/087 , G21K1/093
CPC分类号： H01J37/141 , H01J37/09 , H01J37/12 , H01J37/153 , H01J37/28 , H01J2237/142 , H01J2237/1534 , H01J2237/303
摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要翻译：本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

3. 发明申请

US20070187619A1 ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT 有权
标题翻译：具有活动场地容纳的电磁铁
公开(公告)号：US20070187619A1
公开(公告)日：2007-08-16
申请号：US11276128
申请日：2006-02-15
申请人： Peter Kellerman , Keneth Purser
发明人： Peter Kellerman , Keneth Purser
IPC分类号： H01J37/317 , H01J37/141
CPC分类号： H01J37/05 , H01J37/141 , H01J37/1472 , H01J37/3171 , H01J2237/0042 , H01J2237/057 , H01J2237/141 , H01J2237/142 , H01J2237/1508 , H01J2237/152 , H01J2237/31701 , H01J2237/31705
摘要： An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.
摘要翻译：公开了一种包括活性场容纳的电磁体和相关离子注入机系统。电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流电线定位成绕过第一和第二相对侧的每个开口。

4. 发明授权

US5395738A Electron lithography using a photocathode 失效
标题翻译：使用光电阴极进行电子光刻
公开(公告)号：US5395738A
公开(公告)日：1995-03-07
申请号：US997817
申请日：1992-12-29
申请人： George R. Brandes , Philip M. Platzman
发明人： George R. Brandes , Philip M. Platzman
IPC分类号： H01L21/30 , G03F7/20 , H01J37/317 , H01L21/027 , F03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/2057 , H01J37/3175 , H01J2237/0492 , H01J2237/06333 , H01J2237/142 , H01J2237/31779 , Y10S430/143
摘要： Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.
摘要翻译：重要的是在大规模集成器件的制造中的亚微米图案描绘基于图案化的光电阴极。在功能上，光电阴极在竞争系统中起着掩模的作用，无论是在接近印刷还是在投影中。在操作中，通过紫外线辐射照射光电阴极以释放电子，这些电子随着加速施加电压的均匀磁场的帮助而被聚焦在抗蚀剂涂覆的晶片上。

5. 发明授权

US08242674B2 Device for the field emission of particles and production method 有权
标题翻译：颗粒场发射装置及生产方法
公开(公告)号：US08242674B2
公开(公告)日：2012-08-14
申请号：US12449919
申请日：2008-02-28
申请人： Josef Sellmair
发明人： Josef Sellmair
IPC分类号： H01J1/50
CPC分类号： H01J37/073 , H01J37/063 , H01J37/08 , H01J37/141 , H01J37/143 , H01J37/28 , H01J2237/06341 , H01J2237/06375 , H01J2237/0807 , H01J2237/0815 , H01J2237/142
摘要： The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes, having at least one particle emitter (3) arranged in or pointing into a vacuum space (2) with at least one field emitter tip (4) for the emission of the particles, and having a magnetic field generator (6) attributed to the particle emitter (3) for focussing of the emitted particle beam (5), with the particle emitter (3) with its field emitter tip (4) is built by emitter structures (9) positioned on the surface (7) of a substrate (8) which is turned away from the magnetic field generator (6), and the substrate (8) formed as separating wall between vacuum space (2) and the atmospheric space (10) situated outside the vacuum space (2) at the side (14) of the substrate (8) which is turned away from the emitter structures (9).
摘要翻译：本发明涉及一种用于制造用于颗粒光学器件（例如电子或离子显微镜）的颗粒光学器件的热感应场发射装置的装置和方法，所述装置和方法具有布置在或指向真空中的至少一个粒子发射器（3）具有用于发射颗粒的至少一个场发射器尖端（4）的空间（2），并且具有归因于用于聚焦发射的粒子束（5）的粒子发射器（3）的磁场发生器（6），与具有其场发射极尖端（4）的粒子发射器（3）由位于离开磁场发生器（6）的衬底（8）的表面（7）上的发射器结构（9）构成，并且基板（8），其形成为位于真空空间（2）和位于真空空间（2）外侧的大气空间（10）之间的分离壁，所述空间（2）位于离开发射器结构的基板（8）的侧面（14） 9）。

6. 发明授权

US07800082B2 Electromagnet with active field containment 有权
标题翻译：具有活性场容纳的电磁体
公开(公告)号：US07800082B2
公开(公告)日：2010-09-21
申请号：US11276128
申请日：2006-02-15
申请人： Peter L. Kellerman , Keneth H. Purser
发明人： Peter L. Kellerman , Keneth H. Purser
IPC分类号： H01J37/317
CPC分类号： H01J37/05 , H01J37/141 , H01J37/1472 , H01J37/3171 , H01J2237/0042 , H01J2237/057 , H01J2237/141 , H01J2237/142 , H01J2237/1508 , H01J2237/152 , H01J2237/31701 , H01J2237/31705
摘要： An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.
摘要翻译：公开了一种包括活性场容纳的电磁体和相关离子注入机系统。电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流电线定位成绕过第一和第二相对侧的每个开口。

7. 发明授权

US5268579A Monopole magnetic lens field 失效
标题翻译：单极磁场透镜
公开(公告)号：US5268579A
公开(公告)日：1993-12-07
申请号：US741026
申请日：1991-08-06
申请人： Arno J. Bleeker , Pieter Kruit
发明人： Arno J. Bleeker , Pieter Kruit
IPC分类号： G01Q30/02 , G01Q70/08 , H01J37/141 , H01J37/244 , H01J37/30 , H01V37/141
CPC分类号： H01J37/141 , H01J37/3007 , H01J2237/142
摘要： In an electron optical system a monopole shaped magnetic field is introduced enabling an aberration free imaging writing or detection in the system. Apparatus based on this field distribution result in improved secondary electron detection such as for chip inspection, in improved resolution in Auger electron detection for analysis, in a higher exactness in chip production in an electron beam pattern generator and in an electron beam image projector in which now also size reduction can aberration free be introduced.

8. 发明授权

US4214162A Corpuscular beam microscope for ring segment focusing 失效
标题翻译：球形束显微镜用于环段聚焦
公开(公告)号：US4214162A
公开(公告)日：1980-07-22
申请号：US883005
申请日：1978-03-03
申请人： Walter Hoppe , Dieter Typke
发明人： Walter Hoppe , Dieter Typke
IPC分类号： H01J37/04 , H01J37/141 , H01J37/153 , H01J37/26
CPC分类号： H01J37/04 , H01J37/141 , H01J37/153 , H01J2237/141 , H01J2237/142 , Y10S505/871
摘要： A corpuscular beam microscope for ring segment focusing is provided with aondenser and an objective magnetic lens system which is disposed substantially axially symmetrically about the microscope axis for the purpose of generating two field maxima separated by a distance not exceeding five times the arithmetic means of half the half height widths of the component magnetic fields forming the maxima. The provision of such a magnetic lens system facilitates the elimination of aperture aberrations of the first and second order and the elimination of chromatic aberrations of zero order and partly of the first order as well as certain extra-axial defects.
摘要翻译：用于环段聚焦的红外光束显微镜设置有冷凝器和物镜磁透镜系统，该系统基于显微镜轴线基本上轴向对称地设置，用于产生两分频距离不超过半数运算装置的距离的两个场最大值组成磁场的半高宽度形成最大值。提供这种磁性透镜系统有助于消除第一阶和第二阶的孔径像差以及消除零级和部分第一阶以及某些特殊轴向缺陷的色像差。

9. 发明授权

US07947964B2 Charged particle beam orbit corrector and charged particle beam apparatus 有权
标题翻译：带电粒子束轨道校正器和带电粒子束装置
公开(公告)号：US07947964B2
公开(公告)日：2011-05-24
申请号：US11943241
申请日：2007-11-20
申请人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
发明人： Hiroyuki Ito , Yuko Sasaki , Tohru Ishitani , Yoshinori Nakayama
IPC分类号： G21K1/087
CPC分类号： H01J37/141 , H01J37/09 , H01J37/12 , H01J37/153 , H01J37/28 , H01J2237/142 , H01J2237/1534 , H01J2237/303
摘要： The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要翻译：本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

10. 发明申请

US20100090579A1 DEVICE FOR THE FIELD EMISSION OF PARTICLES AND PRODUCTION METHOD 有权
标题翻译：用于颗粒的场发射和生产方法的装置
公开(公告)号：US20100090579A1
公开(公告)日：2010-04-15
申请号：US12449919
申请日：2008-02-28
申请人： Josef Sellmair
发明人： Josef Sellmair
IPC分类号： H01J1/50 , H01J9/00
CPC分类号： H01J37/073 , H01J37/063 , H01J37/08 , H01J37/141 , H01J37/143 , H01J37/28 , H01J2237/06341 , H01J2237/06375 , H01J2237/0807 , H01J2237/0815 , H01J2237/142
摘要： The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes,having at least one particle emitter (3) arranged in or pointing into a vacuum space (2) with at least one field emitter tip (4) for the emission of the particles,and having a magnetic field generator (6) attributed to the particle emitter (3) for focussing of the emitted particle beam (5),with the particle emitter (3) with its field emitter tip (4) is built by emitter structures (9) positioned on the surface (7) of a substrate (8) which is turned away from the magnetic field generator (6),and the substrate (8) formed as separating wall between vacuum space (2) and the atmospheric space (10) situated outside the vacuum space (2) at the side (14) of the substrate (8) which is turned away from the emitter structures (9).
摘要翻译：本发明涉及一种用于制造用于颗粒光学器件（例如电子或离子显微镜）的颗粒光学器件的热感应场发射装置的装置和方法，所述装置和方法具有布置在或指向真空中的至少一个粒子发射器（3）具有用于发射颗粒的至少一个场发射器尖端（4）的空间（2），并且具有归因于用于聚焦发射的粒子束（5）的粒子发射体（3）的磁场发生器（6），与具有其场发射极尖端（4）的粒子发射器（3）由位于离开磁场发生器（6）的衬底（8）的表面（7）上的发射器结构（9）构成，并且基板（8），其形成为位于真空空间（2）和位于真空空间（2）外侧的大气空间（10）之间的分离壁，所述空间（2）位于离开发射器结构的基板（8）的侧面（14） 9）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式