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1. 发明授权

US10281828B2 Exposure method 有权
公开(公告)号：US10281828B2
公开(公告)日：2019-05-07
申请号：US15981272
申请日：2018-05-16
申请人： KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
发明人： Kento Arimatsu
IPC分类号： G03F7/20 , G03F9/00 , G03B27/34 , G03B27/53
摘要： An exposure method includes, in a case of exposing unmeasurable shots which are arranged linearly and whose focus value cannot be measured and a measurable shot which is adjacent to the unmeasurable shots and whose focus value can be measured, exposing alternately the measurable shot and the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.

2. 发明申请

US20120147344A1 ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME 审中-公开
标题翻译：执行器和微观投影曝光系统及其使用方法
公开(公告)号：US20120147344A1
公开(公告)日：2012-06-14
申请号：US13402115
申请日：2012-02-22
申请人： Ulrich Weber , Stefan Hembacher , Armin Schoeppach
发明人： Ulrich Weber , Stefan Hembacher , Armin Schoeppach
IPC分类号： F16H21/44 , G03B27/34 , H02N1/00
CPC分类号： G03F7/70141 , F16H21/44 , G03F7/70258 , G03F7/70825 , H02N1/002 , H02N2/023 , Y10T74/18992
摘要： An actuator includes a housing, a movable part, and an advancing unit that is at least temporarily connected to the movable part. The advancing unit includes a deformation unit and a deformer configured to deform the deformation unit with a vector component perpendicular to an effective direction of the actuator so that a total length of the deformation unit changes in the effective direction of the actuator as a result of the deformation. The movable part is configured to move in the effective direction of the actuator upon a removal of the vector component on the deformation unit and the deformation unit is disposed along the effective direction of the actuator upon the removal of the vector component on the deformation unit.
摘要翻译：致动器包括壳体，可移动部件和至少临时连接到可动部件的前进单元。前进单元包括变形单元和变形构件，其构造成使得垂直于致动器的有效方向的矢量分量使变形单元变形，使得变形单元的总长度在致动器的有效方向上变化，作为形变。可移动部件被构造成在去除变形单元上的矢量分量时沿着致动器的有效方向移动，并且在去除变形单元上的矢量分量时沿着致动器的有效方向设置变形单元。

3. 发明申请

US20110122389A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US20110122389A1
公开(公告)日：2011-05-26
申请号：US13055827
申请日：2009-07-15
申请人： Michel Fransois Hubert Klaassen , Rogier Herman Mathijs Groeneveld , Alexander Matthijs Struycken , Gerardus Hubertus Petrus Maria Swinkels
发明人： Michel Fransois Hubert Klaassen , Rogier Herman Mathijs Groeneveld , Alexander Matthijs Struycken , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03B27/34
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70175
摘要： A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.
摘要翻译：光刻设备包括源模块，其包括收集器和辐射源。收集器被配置为收集来自辐射源的辐射。照明器被配置为调节由收集器收集的辐射并提供辐射束。检测器相对于照明器以固定的位置关系设置。检测器被配置为确定辐射源相对于收集器的位置和源模块相对于照明器的位置。

4. 发明申请

US20090170024A1 Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography 审中-公开
标题翻译：基板图案，光敏层堆叠和光刻系统的方法
公开(公告)号：US20090170024A1
公开(公告)日：2009-07-02
申请号：US11968015
申请日：2007-12-31
申请人： Mario Hennig , Rainer Pforr , Jens Reichelt
发明人： Mario Hennig , Rainer Pforr , Jens Reichelt
IPC分类号： G03C1/00 , G03F7/26 , G03B27/34
CPC分类号： G03F7/70958 , G03F7/70633 , G03F9/7084
摘要： A photosensitive layer stack, lithographic systems and methods of patterning a substrate are disclosed having a patterning layer and a photochromic layer with an absorption switching from transmissive to absorptive upon exposure.
摘要翻译：公开了感光层堆叠，光刻系统和图案化衬底的方法，其具有图案化层和光致变色层，其在曝光时具有从透射到吸收的吸收切换。

5. 发明申请

US20080158532A1 Image Exposing Apparatus and Microlens Array Unit 审中-公开
标题翻译：图像曝光装置和微透镜阵列单元
公开(公告)号：US20080158532A1
公开(公告)日：2008-07-03
申请号：US11813814
申请日：2006-01-06
申请人： Hiromi Ishikawa
发明人： Hiromi Ishikawa
IPC分类号： G03B27/34 , G02B27/10
CPC分类号： G03F7/70916 , G02B6/4249 , G03F7/70275 , G03F7/70291 , G03F7/70808
摘要： In an image exposing apparatus that includes: a spatial optical modulation device having multitudes of pixel sections arranged two-dimensionally, each for modulating irradiated light; a light source for irradiating light on the spatial optical modulation device; and an image focusing optical system for focusing an image represented by the light modulated by the spatial optical modulation device on a photosensitive material, which includes image focusing lenses, and a microlens array disposed such that a plurality of microlenses are positioned at the image location of each of the pixel sections focused by the image focusing lenses, degradation in the image quality of an exposed image due to dust adhered to the microlens array is prevented by accommodating the microlens array in a housing having two transparent sections for transmitting the light to be passed through the microlens array and the light passed through the array.
摘要翻译：一种图像曝光装置，包括：空间光调制装置，其具有二维排列的多个像素部，每个用于调制照射光; 用于在所述空间光调制装置上照射光的光源; 以及用于将由空间光调制装置调制的光表示的图像聚焦在包括图像聚焦透镜的感光材料上的图像聚焦光学系统和布置成使得多个微透镜位于图像位置处的微透镜阵列通过图像聚焦透镜聚焦的每个像素部分，通过将微透镜阵列容纳在具有两个透明部分的壳体中来防止由于附着在微透镜阵列上的灰尘引起的曝光图像的图像质量的劣化，用于透射要通过的光通过微透镜阵列和光穿过阵列。

6. 发明申请

US20050127293A1 Auto focusing apparatus and method 有权
标题翻译：自动对焦装置及方法
公开(公告)号：US20050127293A1
公开(公告)日：2005-06-16
申请号：US10959174
申请日：2004-10-07
申请人： Young-Wan Kim , Sang-Kil Lee , Byung-Am Lee , Jin-Woo Lee , Hyo-Sang Cho
发明人： Young-Wan Kim , Sang-Kil Lee , Byung-Am Lee , Jin-Woo Lee , Hyo-Sang Cho
IPC分类号： H01L21/66 , G01N23/00 , G03B27/34 , G03F7/207 , H01J37/21 , H01J37/28 , H01L21/027
CPC分类号： H01J37/21 , H01J2237/216
摘要： An auto focusing method and apparatus for quantifying a focusing average value, comparing the focusing average value with an acceptance level of a preset focusing evaluation value, and iteratively focusing, while widening the depth of focus, when the focusing average value is lower than the acceptance level.
摘要翻译：一种自动对焦方法和装置，用于量化聚焦平均值，将聚焦平均值与预设聚焦评估值的接受水平进行比较，并且在聚焦平均值低于接受度的同时，在加深焦深的同时进行迭代聚焦水平。

7. 发明授权

US06897940B2 System for correcting aberrations and distortions in EUV lithography 失效
标题翻译：用于校正EUV光刻中的像差和畸变的系统
公开(公告)号：US06897940B2
公开(公告)日：2005-05-24
申请号：US10455254
申请日：2003-06-04
申请人： Michael Sogard
发明人： Michael Sogard
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027 , G03B27/52 , G03B27/62 , G03B27/32 , G03B27/34
CPC分类号： G03F7/70233 , G03F7/70258 , G03F7/70266 , G03F7/703 , G03F7/707 , G03F7/70708 , G03F7/70783 , G03F7/70875 , G03F7/70891 , Y10T428/24802
摘要： A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor. The deformable reticle chuck includes a supporting structure, a deformable membrane disposed above and being comprised of a dielectric layer and a conductive layer, a voltage source connected to the conductive coating on the reticle and the conductive layer to generate an electrostatic attractive force between them, a plurality of actuator rods each connected to a corresponding one of actuators, and a coolant gas inside a chamber formed between the membrane and the top surface of the supporting structure. A deformable wafer chuck and wafer height sensor may be included to provide further correction of the image.
摘要翻译：用于校正EUV光刻中的像差和畸变的系统将光罩放置在可变形的光罩卡盘上，并且使用标线高度传感器来测量放置在可变形标线盘卡盘上的掩模版的表面高度。光学系统将EUV辐射投射到掩模版上，并将来自掩模版的反射EUV辐射通过其出射光瞳聚集并投射到放置在晶片卡盘上的晶片上。为了此目的也可以控制靠近出射光瞳设置的可变形反射镜。控制可变形的光罩卡盘和可变形反射镜，使得基于由光罩高度传感器测量的高度来校正通过光学系统在晶片上形成的掩模版图像的像差和畸变。可变形标线盘卡盘包括支撑结构，设置在电介质层和导电层之上并由导电层构成的可变形膜，连接到标线片上的导电涂层和导电层的电压源，以在它们之间产生静电引力，多个致动器杆，每个致动器杆连接到相应的一个致动器，以及在膜和支撑结构的顶表面之间形成的室内的冷却剂气体。可以包括可变形的晶片卡盘和晶片高度传感器以提供图像的进一步校正。

8. 发明授权

US6072562A Apparatus for producing photographic prints 失效
标题翻译：用于制作照片的设备
公开(公告)号：US6072562A
公开(公告)日：2000-06-06
申请号：US150725
申请日：1998-09-10
申请人： Beat Frick
发明人： Beat Frick
IPC分类号： G03B27/32 , G03B27/34 , G03B27/40 , G03B27/46 , G03B27/47 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03B27/68 , G03B27/40 , G03B27/462 , G03B27/47 , G03B2227/005
摘要： A printing apparatus is disclosed which includes an original positioning device (3) for transporting an original (F) to and positioning it in a printing position, a printing material positioning device (2a) for transporting the photographic printing material (P) to and positioning it in an exposure position, a lighting device (4) for exposing the original, located in the printing position, to print light, an adjustable lens (5) for projecting the original, located in the printing position, onto the printing material located in the exposure position with an variable enlargement, a lens focusing device (6) for varying the enlargement of the lens (5), and a control device (10) for the original positioning device (3), the printing material positioning device (2a) and the lens focusing device (6). In order to produce arbitrary enlargements of sections, the lens (5) is disposed so as to be adjustable substantially crosswise to the transport direction (L) of the original (F), by means of a lens positioning device (12) that cooperates with the control device (10). In order to define a section to be copied from the original and to define a desired enlargement, a control device (13, 14) cooperating with the control device (10) is provided. The control device (10), on the basis of the detail and enlargement defined by the control device, controls the original positioning device (3), the lens positioning device (12), and the lens focusing device (6).
摘要翻译：本发明公开了一种打印装置，其中包括用于将原稿（F）输送到打印位置并将其定位在打印位置的原始定位装置（3），用于将照相打印材料（P）传送到和定位的打印材料定位装置位于曝光位置的照明装置（4），用于使位于打印位置的原稿曝光以打印光;可调透镜（5），用于将位于打印位置的原稿投影到位于打印位置的打印材料具有可变放大的曝光位置，用于改变透镜（5）的放大的透镜聚焦装置（6）和用于原始定位装置（3）的控制装置（10），打印材料定位装置（2a）和透镜聚焦装置（6）。为了产生部分的任意放大，透镜（5）通过与下述方式配合的透镜定位装置（12）设置成可以与原稿（F）的输送方向（L）基本上交叉地调节控制装置（10）。为了定义要从原件复制的部分并且限定期望的放大，提供了与控制装置（10）协作的控制装置（13,14）。控制装置（10）基于由控制装置限定的细节和放大来控制原始定位装置（3），透镜定位装置（12）和透镜聚焦装置（6）。

9. 发明授权

US5875376A Carriage positioning structure for a scanner 失效
标题翻译：扫描仪的支架定位结构
公开(公告)号：US5875376A
公开(公告)日：1999-02-23
申请号：US114266
申请日：1998-07-13
申请人： Jason Chou
发明人： Jason Chou
IPC分类号： H04N1/00 , H04N1/10 , H04N1/193 , G03B27/34 , G03G15/04 , G03G15/28 , H04N1/04
CPC分类号： H04N1/00827 , H04N1/00795 , H04N1/1013 , H04N1/1021 , H04N1/1039 , H04N1/193 , H04N2201/0442
摘要： A carriage positioning structure includes a carriage pivoted to a longitudinal guide rod and reciprocated along a longitudinal sliding rail inside a scanner between a bottom shell and a flat glass plate, an image pick-up mechanism carried on the carriage and moved with the carriage to pick up the image of an object placed on the flat glass plate, a bottom guide wheel mounted on the carriage at the bottom and supported on the longitudinal sliding rail to guide reciprocating movement of the carriage along the longitudinal sliding rail, and a top guide wheel mounted on the carriage at the top and spaced below the flat glass plate by a gap, the top guide wheel being forced into contact with the flat glass plate by the gravity weight of the carriage when the scanner is turned upside down, permitting the carriage to be reciprocated on the flat glass plate along the longitudinal guide rod so that the image pick-up mechanism can pick up the image of a 3-D document placed below the scanner.
摘要翻译：托架定位结构包括一个转动到纵向引导杆上的托架，并沿着底壳和平板玻璃板之间的扫描仪内的纵向滑动轨道往复运动，一个承载在滑架上并与托架一起移动的图像拾取机构放置在平板玻璃板上的物体的图像，底部引导轮，其安装在底部的托架上并被支撑在纵向滑轨上以引导托架沿着纵向滑轨的往复运动，以及安装在顶部导向轮在顶部的滑架上并且通过间隙在平板玻璃板下方间隔开时，当扫描仪上下颠倒时，顶部导向轮由于托架的重力被迫与平板玻璃板接触，允许滑架为沿着纵向导杆在平板玻璃板上往复运动，使得图像拾取机构可以拾取放置在扫描仪下方的3-D文档的图像。

10. 发明授权

US5825469A Auto focus system using twice reflection 失效
标题翻译：自动对焦系统使用两次反射
公开(公告)号：US5825469A
公开(公告)日：1998-10-20
申请号：US953410
申请日：1997-10-17
申请人： Byung-Ho Nam , Jae-Keun Jeong
发明人： Byung-Ho Nam , Jae-Keun Jeong
IPC分类号： G02B7/28 , G02B3/10 , G03F7/207 , G03F9/00 , H01L27/14 , G03B27/34 , G03B27/42
CPC分类号： G03F9/70
摘要： An auto focus system incudes a light source; a beam splitting means for transmitting a first beam emitted from the light source and reflecting a second beam emitted from the light source; a reflective mirror for reflecting the first beam from the beam splitting means; a wafer mounted on a wafer stage for receiving and reflecting the first beam reflected by the reflective mirror; a total reflection means for reversing a direction of the first beam from the wafer; a detector for detecting the first beam after the first beam is reflected from the total reflection means, the wafer, the reflective mirror, and the beam splitter, and for converting the first beam into an electrical signal; and a control unit for controlling the wafer stage in accordance with the electrical signal generated from the detector.
摘要翻译：自动对焦系统包含光源; 用于发射从光源发射的第一光束并反射从光源发出的第二光束的光束分离装置; 反射镜，用于从分束装置反射第一光束; 安装在晶片台上的晶片，用于接收和反射由反射镜反射的第一光束; 用于使来自晶片的第一光束的方向反转的全反射装置; 用于检测在第一光束从全反射装置，晶片，反射镜和分束器反射之后的第一光束的检测器，并用于将第一光束转换成电信号; 以及控制单元，用于根据从检测器产生的电信号来控制晶片台。

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