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91. 发明授权

US5770294A Molded glass plates produced by mold with modified surface 失效
标题翻译：由具有改性表面的模具制成的模制玻璃板
公开(公告)号：US5770294A
公开(公告)日：1998-06-23
申请号：US669998
申请日：1996-06-25
申请人： Yasuaki Sakamoto
发明人： Yasuaki Sakamoto
IPC分类号： C03B11/06 , C03B11/08 , C03B40/00 , C23C16/02 , G11B5/73 , B23B3/00
CPC分类号： G11B5/7315 , C03B11/06 , C03B11/086 , C03B40/00 , C23C16/0263 , C23C16/0272 , C03B2215/24 , C03B2215/44 , C03B2215/45 , Y10S428/913 , Y10T428/21 , Y10T428/315
摘要： In advance of carbon coating, by injecting ions into the shaped surface of a metallic mold made of super-hard materials, it becomes possible to increase the adhesiveness of the carbon coat onto the mold material, and to increase the life of the mold. In a metallic pressing mold with the required flatness secured by carbon coating on the surfaces, the surface layer of the shaped surfaces is modified by ion injection in advance of carbon coating.
摘要翻译：在碳涂覆之前，通过将离子注入到由超硬材料制成的金属模具的成形表面中，可以增加碳涂层对模具材料的粘合性，并且增加模具的使用寿命。在具有通过碳涂覆在表面上固定的所需平整度的金属压模中，成形表面的表面层在碳涂覆之前通过离子注入被改性。

92. 发明授权

US5662877A Process for forming diamond-like thin film 失效
标题翻译：形成金刚石薄膜的方法
公开(公告)号：US5662877A
公开(公告)日：1997-09-02
申请号：US827853
申请日：1992-01-30
申请人： Masanori Shibahara , Kunihiro Ueda , Masatoshi Nakayama
发明人： Masanori Shibahara , Kunihiro Ueda , Masatoshi Nakayama
IPC分类号： C30B29/04 , C23C16/02 , C23C16/26 , C23C16/27 , C23C16/50 , C30B25/02
CPC分类号： C23C16/0263 , C23C16/26 , C30B25/02 , C30B29/04
摘要： The present invention improves the adhesive property by pretreating under uniform conditions the substrate surface of metal, ceramics or glass etc. with a poor adhesive property, by accelerating ions under an electric field to the substrate in advance of a diamond-like film forming process. In light of the fact that a diamond-like film forming process by ionized deposition uses thermal electron ionization means and an electric potential is applied to a grid to accelerate ionized hydrocarbon ions, the present invention could attain the aimed purpose by ionizing and then accelerating a bombardment gas such as argon as a pretreatment process in the same apparatus.
摘要翻译：本发明通过在金刚石成膜工序之前，通过在电场下将离子加速到基板，在均匀的条件下预处理具有差的粘合性的金属，陶瓷或玻璃等的基板表面来提高粘合性。鉴于通过电离沉积的类金刚石膜形成工艺使用热电子电离装置并且电势施加到栅格以加速离子化的烃离子的事实，本发明可以通过电离然后加速轰击气体如氩气作为预处理过程在同一设备中。

93. 发明授权

US5454902A Production of clean, well-ordered CdTe surfaces using laser ablation 失效
标题翻译：使用激光烧蚀生产干净，有序的CdTe表面
公开(公告)号：US5454902A
公开(公告)日：1995-10-03
申请号：US951925
申请日：1992-09-24
申请人： Jennifer J. Zinck , Peter D. Brewer
发明人： Jennifer J. Zinck , Peter D. Brewer
IPC分类号： C23F1/10 , C23C16/02 , C23F4/00 , C30B29/48 , C30B33/00 , C30B33/04 , H01L21/00
CPC分类号： C23C16/0263 , C23C16/0227 , C30B29/48 , C30B33/00 , Y10S438/94 , Y10S438/98
摘要： Chemically-etched and or sputtered CdTe surfaces are exposed to UV excimer laser radiation at a fluence ranging from about 15 to 75 mJ/cm.sup.2, followed by either a low temperature (
摘要翻译：化学蚀刻和溅射的CdTe表面以约15至75mJ / cm 2的通量暴露于UV准分子激光辐射，然后进行低温（<300℃）热退火或CdTe表面暴露于 UV准分子激光辐射的注量低于阈值注量。该程序提供清洁，化学计量和有序的CdTe表面。

94. 发明公开

EP3031072A4 METHOD TO TRANSFER TWO DIMENSIONAL FILM GROWN ON METAL-COATED WAFER TO THE WAFER ITSELF IN A FACE-TO-FACE MANNER 审中-公开
标题翻译：用于传送ON涂覆的晶片的金属法生长二维薄膜在晶片的另一面
公开(公告)号：EP3031072A4
公开(公告)日：2017-04-19
申请号：EP14835353
申请日：2014-07-31
申请人： NAT UNIV SINGAPORE
发明人： LOH KIAN PING , GAO LIBO , CASTRO NETO ANTONIO HELIO
IPC分类号： H01L21/20 , C23C16/02 , C23C16/26 , H01L29/786
CPC分类号： C01B32/194 , C01B31/0453 , C01B32/186 , C23C16/01 , C23C16/0263 , C23C16/0281 , C23C16/26 , C30B23/02 , C30B29/225 , C30B29/26 , H01L21/02002 , H01L21/02107 , H01L21/02326 , H01L21/02381 , H01L21/02488 , H01L21/02491 , H01L21/02502 , H01L21/02527 , H01L21/02568 , H01L21/0262 , H01L21/02658 , H01L21/02664 , H01L21/02694 , H01L21/3205 , H01L29/1606 , H01L29/78684 , H01L39/2422
摘要： A method of in-situ transfer during fabrication of a component comprising a 2-dimensional crystalline thin film on a substrate is disclosed. In one embodiment, the method includes forming a layered structure comprising a polymer, a 2-dimensional crystalline thin film, a metal catalyst, and a substrate. The metal catalyst, being a growth medium for the two-dimensional crystalline thin film, is etched and removed by infiltrating liquid to enable the in-situ transfer of the two-dimensional crystalline thin film directly onto the underlying substrate.
摘要翻译：原位转移上的基底，其包括二维晶体薄膜组件的制造过程中的方法，是游离缺失盘。在一个，实施例的方法包括：形成分层结构，其包括聚合物，二维结晶性薄膜，金属催化剂和底物。金属催化剂，是用于二维晶体薄膜的生长培养基中，通过渗透液以使原位传递二维结晶性薄膜直接的下面的衬底走上蚀刻并去除。

95. 发明公开

EP3115137A1 A MACHINING TOOL 审中-公开
标题翻译： BEARBEITUNGSWERKZEUG
公开(公告)号：EP3115137A1
公开(公告)日：2017-01-11
申请号：EP15175706.9
申请日：2015-07-07
申请人： ThyssenKrupp Metalúrgica Campo Limpo Ltda. , ThyssenKrupp AG
发明人： GUERREIRO, Sergio Stefano , SALLES, Bruno Barbosa de Oliveira Ferreira
IPC分类号： B23B51/02 , B23B27/14 , B23P15/28 , C23C16/02
CPC分类号： B23B51/02 , B23B2228/10 , B23P15/28 , B23P15/32 , C23C14/022 , C23C14/028 , C23C16/0263
摘要： A machining tool (1), comprising at least one cutting edge (3) for chipping material from a workpiece to be machined,
wherein the at least one cutting edge (3) of the tool comprises a metal core (4), which is covered by a coating (5),
wherein a surface (9) of the metal core (4) comprises at least in the area of the cutting edge (3) a texture (6), having a plurality of cavities (7).
摘要翻译：一种加工工具（1），包括用于从待加工的工件切割材料的至少一个切削刃（3），其中所述工具的所述至少一个切削刃（3）包括被覆盖的金属芯（4）通过涂层（5），其中金属芯（4）的表面（9）至少在切割边缘（3）的区域中包括具有多个空腔（7）的纹理（6）。

96. 发明公开

EP2842156A4 LOCALIZED ATMOSPHERIC LASER CHEMICAL VAPOR DEPOSITION 审中-公开
标题翻译： LOKALISIERTEATMOSPHÄRISCHELASER-BASIERTE GASPHASENABSCHEIDUNG
公开(公告)号：EP2842156A4
公开(公告)日：2015-06-03
申请号：EP13781209
申请日：2013-04-19
申请人： L LIVERMORE NAT SECURITY LLC
发明人： MATTHEWS MANYALIBO JOSEPH , ELHADJ SELIM
IPC分类号： H01L21/268 , C03C15/02 , C03C17/245 , C23C16/02 , C23C16/04 , C23C16/448 , C23C16/46 , C23C16/48 , C23C16/52
CPC分类号： C23C16/047 , C03C17/245 , C03C2217/213 , C03C2218/152 , C23C16/0263 , C23C16/4488 , C23C16/46 , C23C16/483 , C23C16/52 , H01L21/268
摘要： An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.
摘要翻译：大气中的基于激光的化学气相沉积（LCVD）技术提供高度局部化的材料沉积，以减轻光学部件上的损伤部位。相同的激光束可用于沉积材料以及沉积材料的原位退火。 LCVD工艺的最终结果是处理部位的填充和平坦化，其产生光学上更耐损伤的表面。可以在单个循环期间交错几个沉积和退火步骤，以更精确地控制沉积材料的量以及增加沉积材料的损伤阈值。

97. 发明公开

EP1788115A1 METHOD FOR ENHANCING ADHESION OF THIN FILM 审中-公开
标题翻译： VERFAHREN ZUR VERBESSERUNG DER HAFTUNG EINESDÜNNENFILMS
公开(公告)号：EP1788115A1
公开(公告)日：2007-05-23
申请号：EP04772959.5
申请日：2004-09-06
申请人： Canon Machinery Inc.
发明人： SAWADA, Hiroshi, CANON MACHINERY CORPORATION , KAWAHARA, Kosuke, CANON MACHINERY CORPORATION
IPC分类号： C23C16/02 , B23K26/00
CPC分类号： C23F4/02 , C23C16/0263
摘要： (Problems) To provide a method for enhancing adhesion of a thin film, and a method for enhancing adhesion of a thin film provided with a surface function caused by the shape.
(Means) Adhesion of a thin film can be enhanced by irradiating the surface of a parent material with a laser beam at a fluence in the vicinity of the machining threshold, scanning the irradiated part while overlapping to form a grating structure, and then forming a solid thin film in the grating structure. When the grating structure formed on the parent material is left on the solid thin film, adhesion of the thin film is enhanced and surface functions, e.g. reduction of friction and wear caused by the shape, suppression of adhesion of fine particles, and cell sensibility, can be exhibited in conjunction with the function of the solid thin film.
摘要翻译：（问题）提供一种提高薄膜粘附性的方法，以及提高具有由形状引起的表面功能的薄膜的附着力的方法。（装置）通过用激光束在加工阈值附近照射母材表面，同时重叠扫描照射部分以形成光栅结构，可以增强薄膜的粘附性，然后形成固体薄膜在光栅结构中。当在母材上形成的光栅结构留在固体薄膜上时，薄膜的粘附性增强，并且表面功能例如。结合固体薄膜的功能可以显示由形状引起的摩擦和磨损的降低，细颗粒的粘附抑制和细胞感觉性。

98. 发明公开

EP1784369A1 SELECTIVE DOPING OF A MATERIAL 审中-公开
标题翻译：材料的选择性掺杂
公开(公告)号：EP1784369A1
公开(公告)日：2007-05-16
申请号：EP05757918.7
申请日：2005-06-23
申请人： BENEQ OY
发明人： RAJALA, Markku , PUTKONEN, Matti , PIMENOFF, Joe , NIINISTÖ, Lauri , PÄIVÄSAARI, Jani , KURKI, Jouko
IPC分类号： C03C17/09 , C30B25/02
CPC分类号： C03C23/0005 , C03B37/01838 , C03B37/01853 , C03B2201/10 , C03B2201/12 , C03B2201/28 , C03B2201/30 , C03B2201/31 , C03B2201/32 , C03B2201/34 , C03C21/00 , C03C21/007 , C23C16/0263 , C23C16/40 , C23C16/45553 , C30B25/02 , C30B31/08 , C30B31/16 , Y10T428/24802 , Y10T428/24926
摘要： The invention relates to a method of selective doping of a material by a) radiating a predetermined pre-treated pattern/region into the material, b) treating the material for producing reactive groups in the pre-treated pattern/region, and c) doping the material by the atomic layer deposition method for producing a pattern/region doped with a dopant in the material. The invention further relates to a selectively doped material, a system for preparing a selectively doped material, and use of said method.

99. 发明公开

EP0878558A1 COATED MATERIAL AND METHOD OF MANUFACTURING THE SAME 失效
标题翻译： BESCHICHTETES MATERIAL UND VERFAHREN ZU DESSEN HERSTELLUNG
公开(公告)号：EP0878558A1
公开(公告)日：1998-11-18
申请号：EP97944160.7
申请日：1997-10-17
申请人： KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
发明人： MORI, Hiroyuki,Kabushiki Kai.Toyota Chuo Kenkyusho , TACHIKAWA, Hideo,Kabushiki K.Toyota Chuo Kenkyusho
IPC分类号： C23C14/02 , C23C14/06 , C23C16/02 , C23C8/32
CPC分类号： C23C16/0263 , C23C4/02 , C23C14/022 , C23C30/00 , Y10T428/12472 , Y10T428/12743 , Y10T428/1275 , Y10T428/1284 , Y10T428/12847 , Y10T428/24355 , Y10T428/24364
摘要： This invention provides a covered member which possesses a high bond strength of a base material and a covering film, and has a smooth surface. The covered member comprises a base material and a covering film and the surface of the base material to be covered with the covering film is characterized by an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm. The uneven surface can be formed by ion impacting. A surface of a covering film formed on that is smooth since the unevenness of the surface is extremely fine.
摘要翻译：本发明提供一种具有基材和覆盖膜的高粘合强度并且具有光滑表面的被覆盖构件。被覆盖构件包括基材和覆盖膜，被覆盖膜覆盖的基材的表面的特征在于具有平均高度在10至100nm范围内的突起的不平坦表面，平均宽度不超过300nm。不均匀的表面可以通过离子冲击形成。形成在其上的覆盖膜的表面是光滑的，因为表面的不均匀性非常好。

100. 发明授权

EP0206145B1 A method of metallising an organic substrate so as to achieve improved adhesion of the metal 失效
标题翻译：有机基底的金属化方法，以达到改善金属的粘合性
公开(公告)号：EP0206145B1
公开(公告)日：1990-10-03
申请号：EP86108025.7
申请日：1986-06-12
申请人： International Business Machines Corporation
发明人： Clabes, Joachim Gerhard , Hahn, Peter Otto , Ho, Paul Siu-Chung , Lefakis, Haralambos Nmn , Rubloff, Gary Wayne
IPC分类号： C23C14/02 , B29C59/16 , C23C14/20
CPC分类号： B29C59/16 , B29C2035/0872 , B29C2035/0877 , B29K2079/00 , C23C14/022 , C23C16/0263

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