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91. 发明授权

US08337624B2 Particle removal method using an aqueous polyphosphate solution 有权
标题翻译：使用多磷酸盐水溶液的颗粒去除方法
公开(公告)号：US08337624B2
公开(公告)日：2012-12-25
申请号：US13316540
申请日：2011-12-11
申请人： Mark Jonathan Beck
发明人： Mark Jonathan Beck
IPC分类号： C23G1/00 , C11D7/00 , B08B3/00
CPC分类号： B08B3/04 , C11D3/06 , C11D7/16 , C11D11/0047 , C11D11/007 , G03F1/82 , H01L21/02057 , H01L21/02087 , H01L21/67051
摘要： A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.
摘要翻译：一种用于清洁诸如半导体晶片，硬盘，光掩模或压印模具的电子基板的方法和清洁方法。该方法包括以下步骤：使基材的表面与由多磷酸盐组成的清洁溶液接触，然后从表面除去清洁溶液。附加的可选步骤包括在清洁溶液与表面接触的同时将清洁溶液施加声能，并且通过在施加或不施加声能的情况下用冲洗溶液冲洗表面从表面除去清洁溶液。清洁溶液包含多磷酸盐，例如任何水溶性聚磷酸盐。取决于应用，清洁溶液还可以包含碱和/或一定量的悬浮颗粒。络合剂，胺，杀生物剂，表面活性剂和/或其它物质也可以加入到清洁溶液中。

92. 发明授权

US08075697B2 Particle removal method and composition 有权
标题翻译：颗粒去除方法和组成
公开(公告)号：US08075697B2
公开(公告)日：2011-12-13
申请号：US12069205
申请日：2008-02-07
申请人： Mark Jonathan Beck
发明人： Mark Jonathan Beck
IPC分类号： C23G1/00 , C11D7/00
CPC分类号： B08B3/04 , C11D3/06 , C11D7/16 , C11D11/0047 , C11D11/007 , G03F1/82 , H01L21/02057 , H01L21/02087 , H01L21/67051
摘要： A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.
摘要翻译：一种用于清洁诸如半导体晶片，硬盘，光掩模或压印模具的电子基板的方法和清洁方法。该方法包括以下步骤：使基材的表面与由多磷酸盐组成的清洁溶液接触，然后从表面除去清洁溶液。附加的可选步骤包括在清洁溶液与表面接触的同时将清洁溶液施加声能，并且通过在施加或不施加声能的情况下用冲洗溶液冲洗表面从表面除去清洁溶液。清洁溶液包含多磷酸盐，例如任何水溶性聚磷酸盐。取决于应用，清洁溶液还可以包含碱和/或一定量的悬浮颗粒。络合剂，胺，杀生物剂，表面活性剂和/或其它物质也可以加入到清洁溶液中。

93. 发明申请

US20080287332A1 Method for Removing Etch Residue and Chemistry Therefor 审中-公开
标题翻译：蚀刻残渣及其化学方法
公开(公告)号：US20080287332A1
公开(公告)日：2008-11-20
申请号：US12091032
申请日：2005-10-21
申请人： Balgovind Sharma
发明人： Balgovind Sharma
IPC分类号： C11D7/00
CPC分类号： H01L21/32138 , H01L21/31116
摘要： A method for cleaning, especially by removing etch residue (e.g., polymers or particles) from a semiconductor structure, and a cleaning chemistry is described. The method of cleaning includes placing the semiconductor structure with an etch residue particle on it in a chemistry to remove the particle, wherein the active component of the chemistry consists of a carboxylic acid having equal numbers of COOH and OH groups. In one embodiment, the carboxylic acid is tartaric acid. In one embodiment, the chemistry further comprises water.
摘要翻译：描述了一种用于清洁的方法，特别是通过从半导体结构去除蚀刻残留物（例如聚合物或颗粒）和清洁化学品。清洁方法包括将化学品中的蚀刻残留物颗粒放置在其上以除去颗粒，其中该化学物质的活性组分由具有相同COOH和OH基团的羧酸组成。在一个实施方案中，羧酸是酒石酸。在一个实施方案中，化学物质还包含水。

94. 发明申请

US20080234162A1 SEMICONDUCTOR ETCH RESIDUE REMOVER AND CLEANSING COMPOSITIONS 审中-公开
标题翻译： SEMICONDUCTOR ETCH RESIDUE REMOVER AND CLEANTING COMPOSITIONS
公开(公告)号：US20080234162A1
公开(公告)日：2008-09-25
申请号：US11688945
申请日：2007-03-21
申请人： Robert J. Rovito , Francis W. Job , Viral P. Lowalekar , Ashok Kumar Muthukumaran
发明人： Robert J. Rovito , Francis W. Job , Viral P. Lowalekar , Ashok Kumar Muthukumaran
IPC分类号： C11D7/00
CPC分类号： C11D11/0047 , C11D3/044 , C11D3/046 , C11D3/2082 , C11D3/2086 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/06 , C11D7/10 , C11D7/265 , C11D7/28 , C11D7/3218 , C11D7/5004 , G03F7/425 , G03F7/426 , H01L21/02057
摘要： An aqueous and semi-aqueous formulation useful for removing post etch and ash residue from Cu low K dielectric semiconductor devices. The composition comprises a polycarboxylic acid buffering system, a fluoride system, water, a water miscible organic solvent for the said aqueous compositions and optionally a chelating agent, a metal corrosion inhibitor and a surfactant.
摘要翻译：用于从Cu低K电介质半导体器件去除后蚀刻和灰渣的水性和半水性制剂。该组合物包含用于所述水性组合物的多元羧酸缓冲系统，氟化物系统，水，与水可混溶的有机溶剂，以及任选的螯合剂，金属腐蚀抑制剂和表面活性剂。

95. 发明申请

US20080163892A1 CLEANING WAFER INCLUDING DETERGENT LAYER FOR EXPOSURE APPARATUS OF IMMERSION LITHOGRAPHY SYSTEM, COMPOSITION OF DETERGENT LAYER, METHOD OF USING CLEANING WAFER AND APPLICATION SYSTEM 审中-公开
标题翻译：清洁水泥，包括浸渍层析系统曝光装置，洗涤层组合物，使用清洁水和应用系统的方法
公开(公告)号：US20080163892A1
公开(公告)日：2008-07-10
申请号：US11621002
申请日：2007-01-08
申请人： I-Hsiung Huang , Ling-Chieh Lin
发明人： I-Hsiung Huang , Ling-Chieh Lin
IPC分类号： B08B3/08 , C11D7/00 , B08B7/00
CPC分类号： C11D11/0047 , B08B3/08 , C11D17/049 , G03F7/70341 , G03F7/70925 , G03F7/70933 , G03F7/70983 , H01L21/6704
摘要： A method of an in situ cleaning of an objective lens of a semiconductor apparatus includes placing a cleaning wafer having a detergent layer on a scanning stage of the semiconductor apparatus. A cleaning composition in the detergent layer is dissolved by using an immersion liquid (water), so that the cleaning composition reacts with the contaminants on the objective lens. Thereafter, the objective lens is rinsed with another solvent.
摘要翻译：半导体装置的物镜的原位清洁方法包括将具有洗涤剂层的清洁晶片放置在半导体装置的扫描台上。通过使用浸没液（水）将洗涤剂层中的清洁组合物溶解，使得清洁组合物与物镜上的污染物反应。此后，用另一溶剂冲洗物镜。

96. 发明申请

US20050186170A1 Stabilized body care products, household products, textiles and fabrics 有权
标题翻译：稳定的身体护理产品，家用产品，纺织品和面料
公开(公告)号：US20050186170A1
公开(公告)日：2005-08-25
申请号：US10970112
申请日：2004-10-21
申请人： Joseph Lupia , Joseph Suhadolnik , Mervin Wood
发明人： Joseph Lupia , Joseph Suhadolnik , Mervin Wood
IPC分类号： A61K8/40 , A61K8/41 , A61K8/46 , A61K8/49 , A61Q5/00 , A61Q5/02 , A61Q5/06 , A61Q11/00 , A61Q15/00 , A61Q17/00 , A61Q19/00 , C11D3/386 , C11D7/00 , C11D7/32 , C14C11/00 , D06M13/00 , A61K7/075 , A61K7/08
CPC分类号： A61K8/40 , A61K8/41 , A61K8/466 , A61K8/4926 , A61K8/496 , A61K2800/52 , A61Q5/02 , A61Q5/06 , A61Q11/00 , A61Q19/00 , Y10T442/259 , Y10T442/2721
摘要： Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain dialkylhydroxyamine stabilizers, dialkylhydroxylamine stabilizer salts, nitrone stabilizers or amine oxide stabilizers. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.
摘要翻译：公开了包含某些二烷基羟胺稳定剂，二烷基羟胺稳定剂盐，硝酮稳定剂或氧化胺稳定剂的稳定的身体护理产品，家用产品，纺织品和织物。染色的产品和物品有效地稳定防止颜色退化。产品是例如护肤品，护发品，洁牙剂，化妆品，衣物洗涤剂和织物柔软剂，非洗涤剂类织物护理产品，家用清洁剂和纺织品护理产品。

97. 发明授权

US6001793A Cleaning compositions 失效
标题翻译：清洁组合物
公开(公告)号：US6001793A
公开(公告)日：1999-12-14
申请号：US737867
申请日：1997-06-06
申请人： Phillip E. Figdore , Charles J. Good
发明人： Phillip E. Figdore , Charles J. Good
IPC分类号： C11D1/02 , C11D1/38 , C11D1/66 , C11D1/88 , C11D3/00 , C11D3/18 , C11D3/43 , C11D7/00 , C11D3/44 , C11D14/02
CPC分类号： C11D3/43 , C11D1/02 , C11D1/38 , C11D1/66 , C11D1/88 , C11D3/0073 , C11D3/18
摘要： There are provided cleaning compositions for removing soils from a substrate. These compositions comprise(a) at least one C.sub.10 or higher terpene hydrocarbon solvent,(b) at least one surfactant,(c) at least one metal corrosion inhibiting agent,(d) at least one hard surface stress crazing inhibiting agent, and(e) water,wherein, if the soil comprises oil, the composition forms an oil-removing oil and water emulsion with said oil for a time sufficient to remove the oil from the substrate, the oil removing emulsion releasing free water within twenty-four hours after formation, the composition having a pH of less than about 10.
摘要翻译： PCT No.PCT / US95 / 06807 Sec。 371日期：1997年6月6日 102（e）日期1996年6月6日PCT提交1995年5月19日PCT公布。出版物WO95 / 32275 日期1995年11月30日提供了从基材中去除污垢的清洁组合物。这些组合物包含（a）至少一种C10或更高级的萜烯烃溶剂，（b）至少一种表面活性剂，（c）至少一种金属腐蚀抑制剂，（d）至少一种硬表面应力裂纹抑制剂，和 e）水，其中，如果土壤包含油，组合物与所述油形成除油油和水乳液足以从基材除去油的时间，除油乳液在二十四小时内释放游离水形成后，该组合物的pH值小于约10。

98. 发明授权

US5944908A Cleaning compositions and processes suitable for replacing grit blasting to clean metal mold surfaces for plastics 失效
标题翻译：清洁组合物和工艺适用于替代喷砂处理以清洁塑料的金属模具表面
公开(公告)号：US5944908A
公开(公告)日：1999-08-31
申请号：US728461
申请日：1996-10-10
申请人： Chester P. Jarema , Michael A. Stuart
发明人： Chester P. Jarema , Michael A. Stuart
IPC分类号： B08B9/08 , B29C33/72 , C11D7/00 , C11D7/04 , C11D7/22
CPC分类号： C11D3/43 , B29C33/722 , C11D1/72 , C11D11/0029 , C11D3/2068 , C11D3/2075 , C11D3/30 , C11D3/33 , C11D7/263 , C11D7/265 , C11D7/3218 , C11D7/3245 , C11D7/5022 , C23G1/18
摘要： Residue that accumulates on metallic molding surfaces during repeated molding of plastics such as PVC can be removed by cleaning with an aqueous solution of a glycol or oligo-glycol monoether, an amine, and a chelating agent. The cleaner is sufficiently effective to replace mechanical blasting that was previously required.
摘要翻译：通过用二醇或寡聚乙二醇单醚，胺和螯合剂的水溶液进行清洗，可以除去在PVC等塑料的重复成型时在金属成型面积聚的残渣。清洁器足够有效地替代以前需要的机械爆破。

99. 发明授权

US5780641A Stabilization of halogenated dialkyl hydantoins 失效
标题翻译：卤化二烷基乙内酰脲的稳定化
公开(公告)号：US5780641A
公开(公告)日：1998-07-14
申请号：US769542
申请日：1996-12-19
申请人： Moshe Yerushalmi , Zvi Vainberger , Shimon Herbet , James Rasco
发明人： Moshe Yerushalmi , Zvi Vainberger , Shimon Herbet , James Rasco
IPC分类号： A01N59/00 , C07D233/82 , C07D233/86 , C07D233/84 , A62D5/00 , C11D7/00 , C11D7/32 , D06L3/00
CPC分类号： C07D233/82 , A01N59/00
摘要： Method for stabilizing halogenated hydrantoins, comprising mixing the hydantoin with dry calcium hydroxide.
摘要翻译：稳定卤代氢溴酸盐的方法，包括将乙内酰脲与干燥的氢氧化钙混合。

100. 发明授权

US4348293A Water-insoluble, water-permeable bag having a water-soluble or water-dispersable protective layer and containing a particulate detergent composition 失效
标题翻译：具有水溶性或水分散保护层并含有颗粒状洗涤剂组合物的水不溶性透水袋
公开(公告)号：US4348293A
公开(公告)日：1982-09-07
申请号：US198016
申请日：1980-07-14
申请人： David E. Clarke , James F. Davies , John B. Tune
发明人： David E. Clarke , James F. Davies , John B. Tune
IPC分类号： C11D17/04 , B65D65/46 , B65D81/00 , B65D85/808 , C11D7/00 , C11D7/04 , C11D17/00 , C11D7/54
CPC分类号： B65D85/8085 , C11D17/046
摘要： A detergent product comprises a water-insoluble, water-permeable bag containing a particulate detergent composition, the bag material having a water-soluble or removable water-insoluble layer to protect the bag material from the composition and to reduce dusting. The protective layer may be coated on or impregnated into the bag material or may form a continuous layer laminated to the inside of the bag material or may be in the form of a separate inner bag. The water-soluble material may be soluble polyvinyl alcohol, polyethylene glycol, polysaccharide, alkali metal silicate, soap, nonionic detergent, gelatine, salts or esters of alginic acid. The removable water-insoluble material may be a silicone, a fatty acid, a water-insoluble cationic fabric softener, polyvinylacetate, insoluble polyvinyl alcohol, clay, zeolite, calcite, silica, titania or a wax. The bag material may be paper and/or plastics material such as polypropylene. The detergent composition is a fully formulated composition or other fabric treatment material.
摘要翻译： PCT No.PCT / GB79 / 00192 Sec。 371日期1980年7月14日第 102（e）日期1980年7月14日PCT申请日1979年11月16日PCT公布。出版物WO80 / 01078 日期为1980年5月29日。洗涤剂产品包含含有颗粒状洗涤剂组合物的水不溶性透水性袋，该袋材料具有水溶性或可去除的水不溶性层，以保护袋材料免受组合物的影响并减少除尘保护层可以涂覆在或浸渍到袋材料中，或者可以形成层压到袋材料的内部的连续层，或者可以是分开的内袋的形式。水溶性材料可以是可溶性聚乙烯醇，聚乙二醇，多糖，碱金属硅酸盐，皂，非离子洗涤剂，明胶，海藻酸的盐或酯。可去除的水不溶性材料可以是硅氧烷，脂肪酸，水不溶性阳离子织物柔软剂，聚乙酸乙烯酯，不溶性聚乙烯醇，粘土，沸石，方解石，二氧化硅，二氧化钛或蜡。袋材料可以是纸和/或塑料材料，例如聚丙烯。洗涤剂组合物是完全配制的组合物或其它织物处理材料。

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