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11. 发明专利

DE69940611D1 未知
公开(公告)号：DE69940611D1
公开(公告)日：2009-04-30
申请号：DE69940611
申请日：1999-12-07
申请人： MORI YUZO
发明人： MORI YUZO , ISHIKAWA TOSHIO
IPC分类号： H01L21/3063 , B08B3/02 , C25D11/32 , C25F1/00 , C25F3/00 , H01L21/00
摘要： With the present invention, clean processing can be performed, without leaving any impurities behind on the surface of a material, or washing can be performed in which fine impurity metals adhering to the material surface are completely removed, using just the hydroxide ions in ultra-pure water. With the present invention, the hydroxide ion density is increased and reaction substances produced through bonding with hydroxide ions are quickly removed from the surface, preventing re-adhesion and allowing processing and washing to be performed more efficiently. A material and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, and a voltage is applied using the high pressure nozzle as the cathode and the material as the anode. A high-speed shear flow of ultra-pure water sprayed from the high pressure nozzle is generated near the surface of the material, hydroxide ions produced from the ultra-pure water are supplied to the workpiece surface, and the material is subjected to removal processing or to oxide film formation processing by means of a chemical elution reaction or oxidation reaction brought about by the hydroxide ions.

12. 发明专利

DE3886113T2 未知
公开(公告)号：DE3886113T2
公开(公告)日：1994-06-30
申请号：DE3886113
申请日：1988-06-24
申请人： MORI YUZO , UHA MIKAKUTO PRECISION ENGINEE
发明人： MORI YUZO , YAMAUCHI KAZUTO
IPC分类号： B28D5/00 , C30B33/00 , B23K26/12
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.

13. 发明专利

DE3886113D1 未知
公开(公告)号：DE3886113D1
公开(公告)日：1994-01-20
申请号：DE3886113
申请日：1988-06-24
申请人： MORI YUZO , UHA MIKAKUTO PRECISION ENGINEE
发明人： MORI YUZO , YAMAUCHI KAZUTO
IPC分类号： B28D5/00 , C30B33/00 , B23K26/12
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.

14. 发明公开

EP1170083A2 Electrochemical machining method and apparatus 有权
标题翻译：用于电化学治疗的方法和装置
公开(公告)号：EP1170083A2
公开(公告)日：2002-01-09
申请号：EP01116344.1
申请日：2001-07-05
申请人： EBARA CORPORATION , Mori, Yuzo
发明人： Mori, Yuzo , Kobata, Itsuki , Shirakashi, Mitsuhiko , Saito, Takayuki , Toma, Yasushi
IPC分类号： B23H3/08 , C25F3/00
CPC分类号： B23H3/08
摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.

15. 发明公开

EP0415122A3 Method and apparatus for film formation by high pressure microwave plasma chemical vapour deposition 失效
标题翻译：通过高压微波等离子体化学气相沉积形成膜的方法和装置
公开(公告)号：EP0415122A3
公开(公告)日：1991-05-29
申请号：EP90114951.8
申请日：1990-08-03
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo
IPC分类号： C23C16/50 , H01J37/32
CPC分类号： H01J37/32275 , C23C16/511 , H01J37/32192 , H01J2237/3321
摘要： A film forming method and an apparatus therefor, in which reactant gas and carrier gas set in 10 torr through several atms very higher than the conventional plasma CVD gas pressure are put in a plasma condition of high density by utilizing standing waves or progressive waves of the microwave in a predetermined space, and then neutral radicals and ions of reactant species based on the reactant gas are guided to a substrate, thereby high-speed forming a thin film thereon.

16. 发明公开

EP0415122A2 Method and apparatus for film formation by high pressure microwave plasma chemical vapour deposition 失效
标题翻译：用于通过高压微波等离子体化学气相沉积成膜方法和装置。
公开(公告)号：EP0415122A2
公开(公告)日：1991-03-06
申请号：EP90114951.8
申请日：1990-08-03
申请人： Mori, Yuzo , UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
发明人： Mori, Yuzo
IPC分类号： C23C16/50 , H01J37/32
CPC分类号： H01J37/32275 , C23C16/511 , H01J37/32192 , H01J2237/3321
摘要： A film forming method and an apparatus therefor, in which reactant gas and carrier gas set in 10 torr through several atms very higher than the conventional plasma CVD gas pressure are put in a plasma condition of high density by utilizing standing waves or progressive waves of the microwave in a predetermined space, and then neutral radicals and ions of reactant species based on the reactant gas are guided to a substrate, thereby high-speed forming a thin film thereon.
摘要翻译：的成膜方法和装置为此，在该反应气体和载气通过利用驻波或的行波设定在10乇通过几个大气压比传统的等离子CVD的气体压力非常高被置于高密度的等离子体状态微波在预定的空间，然后中性自由基以及基于所述反应物气体反应物种类的离子被引导到一个底物，从而在其上形成高速薄膜。

17. 发明申请

WO2004097078A1 ELECTROLYTIC PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：电解处理设备和方法
公开(公告)号：WO2004097078A1
公开(公告)日：2004-11-11
申请号：PCT/JP2004/005766
申请日：2004-04-22
申请人： EBARA CORPORATION , MORI, Yuzo , KOBATA, Itsuki , TOMA, Yasushi
发明人： MORI, Yuzo , KOBATA, Itsuki , TOMA, Yasushi
IPC分类号： C25F7/00
CPC分类号： C25F7/00 , C25F3/00 , H01L21/32115
摘要： The present invention provides an electrolytic processing apparatus which can suppress the growth of a gas, which is inevitably generated during electrochemical processing, into bubbles thereby effectively preventing the formation of pits in a surface of a workpiece. The electrolytic processing apparatus includes an electrode section (44) including processing electrodes (76) and feeding electrodes (78) both having a diameter of not more than 1 mm, a substrate holder (42) for holding a workpiece (W), a power source (46) for applying a voltage between the processing electrodes and the feeding electrodes, a fluid supply section (72) for supplying a fluid between the electrode section and the workpiece, and a drive section (56, 62) for moving the electrode section and the workpiece relative to each other in such a manner that the processing electrodes pass every point in a processing surface of the workpiece.
摘要翻译：本发明提供一种电解处理装置，其可以将电化学处理中不可避免地产生的气体的生长抑制成气泡，从而有效地防止在工件的表面中形成凹坑。所述电解处理装置包括具有直径不大于1mm的处理电极（76）和馈电电极（78）的电极部（44），用于保持工件（W）的基板保持架（42）用于在处理电极和馈电电极之间施加电压的源极（46），用于在电极部分和工件之间提供流体的流体供应部分（72），以及用于使电极部分以及相对于彼此的工件，使得处理电极通过工件的处理表面中的每个点。

18. 发明申请

WO2004033765A1 ELECTRODE FOR ELECTROLYTIC PROCESSING 审中-公开
标题翻译：电解处理电极
公开(公告)号：WO2004033765A1
公开(公告)日：2004-04-22
申请号：PCT/JP2003/012650
申请日：2003-10-02
申请人： EBARA CORPORATION , MORI, Yuzo , GOTO, Hidekazu , TOMA, Yasushi
发明人： MORI, Yuzo , GOTO, Hidekazu , TOMA, Yasushi
IPC分类号： C25F3/00
CPC分类号： B23H9/00 , C25F7/00
摘要： An electrode (1, 2) for electrolytic processing has a conductive material (1a, 2a) and an organic compound (1b, 2b) having an ion exchange group. The organic compound (1b, 2b) is chemically bonded to a surface of the conductive material (1a, 2a). The organic compound (1b, 2b) comprises thiol or disulfide. The ion exchange group comprises at least one of a sulfonic acid group, a carboxyl group, a quaternary ammonium group, and an amino group. The conductive material (1a, 2a) includes at least one of gold, silver, platinum, copper, gallium arsenide, cadmium sulfide, and indium oxide (III).
摘要翻译：用于电解处理的电极（1,2）具有导电材料（1a，2a）和具有离子交换基团的有机化合物（1b，2b）。有机化合物（1b，2b）化学键合到导电材料（1a，2a）的表面。有机化合物（1b，2b）包括硫醇或二硫化物。离子交换基包括磺酸基，羧基，季铵基和氨基中的至少一种。导电材料（1a，2a）包括金，银，铂，铜，砷化镓，硫化镉和氧化铟（III）中的至少一种。

19. 发明申请

WO2003057948A1 ELECTROLYTIC PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：电解处理设备和方法
公开(公告)号：WO2003057948A1
公开(公告)日：2003-07-17
申请号：PCT/JP2003/000038
申请日：2003-01-07
申请人： EBARA CORPORATION , MORI, Yuzo , SHIRAKASHI, Mitsuhiko , KUMEKAWA, Masayuki , YASUDA, Hozumi , KOBATA, Itsuki , TOMA, Yasushi
发明人： MORI, Yuzo , SHIRAKASHI, Mitsuhiko , KUMEKAWA, Masayuki , YASUDA, Hozumi , KOBATA, Itsuki , TOMA, Yasushi
IPC分类号： C25F3/00
CPC分类号： B23H3/08 , B23H3/00 , B23H5/08 , C25F3/00 , C25F7/00
摘要： There is provided an electrolytic processing apparatus and method that can effect processing of a substrate with high processing precision and can produce an intended form of processed substrate with high accuracy of form. The electrolytic processing apparatus includes: a holder (30) for holding a substrate (W); a processing electrode (32) that can come close to the substrate; a feeding electrode (34) for feeding electricity to the substrate; an ion exchanger (40) disposed in the space between the substrate and the processing electrode, or the substrate and the feeding electrode; a fluid supply section (70) for supplying a fluid into the space; a power source (68) for applying a voltage between the processing electrode and the feeding electrode; a drive sections (44, 56 and 60) for allowing the substrate and the processing electrode, facing each other, to make a relative movement; and a numerical controller (72) for effecting a numerical control of the drive sections.
摘要翻译：提供了可以以高加工精度对基板进行加工的电解处理装置和方法，并且可以以高精度的形式产生预期形式的处理基板。电解处理装置包括：用于保持基板（W）的保持器（30）。可以靠近所述基板的处理电极（32）; 用于向基板供电的供电电极（34）; 设置在基板和处理电极之间的空间中的离子交换器（40），或基板和馈电电极; 用于将流体供应到所述空间中的流体供应部分（70）用于在所述处理电极和所述馈电电极之间施加电压的电源（68）; 用于允许基板和处理电极彼此面对的驱动部分（44,56和60）进行相对运动; 以及用于对驱动部进行数值控制的数值控制器（72）。

20. 发明申请

WO1996020406A1 ELEMENTARY ANALYSIS METHOD BY SCANNING PROBE MICROSCOPE AND ULTRA-SHORT PULSE HIGH-VOLTAGE APPLICATION METHOD USED FOR SAID METHOD 审中-公开
标题翻译：通过扫描探针显微镜和超短脉冲高压应用方法的分析方法
公开(公告)号：WO1996020406A1
公开(公告)日：1996-07-04
申请号：PCT/JP1995002702
申请日：1995-12-26
申请人： RESEARCH DEVELOPMENT CORPORATION OF JAPAN , MORI, Yuzo , SAKAMOTO, Masao
发明人： RESEARCH DEVELOPMENT CORPORATION OF JAPAN
IPC分类号： G01N37/00
CPC分类号： G01N23/227 , G01N23/2276 , G01Q30/02 , G01Q60/12 , Y10S977/852
摘要： The present invention makes it possible to conduct the determination of the three-dimensional coordinates of the atomic nucleus for each surface atom of a sample, elementary analysis and analysis of the chemical bond state by combining high spatial resolution of a scanning probe microscope with an Auger electron spectroscopy or an elementary analysis method by an energy analysis method of photons generated by high energy electron irradiation and a chemical bond state analysis method. An A.C. or D.C. ultra-short pulse high voltage is applied either singly or repeatedly between a probe and a sample during the operation of a scanning probe and a sample during the operation of a scanning probe microscope under its original operation condition or while the operation of the microscope is suspended temporarily, so as to excite core electrons of the sample or valence electrons distributed spherically and symmetrically with the atomic nucleus as the center, and energy analysis and counting analysis are carried out for the photons or the Auger electrons thereby emitted so as to decide the three-dimensional coordinates of the atomic nucleus of each surface atom of the sample and to measure surface distribution relating to the elementary analysis and the chemical bond state analysis, and to obtain atomic images containing the elements and chemical bond information.
摘要翻译：本发明可以通过将扫描探针显微镜的高空间分辨率与俄歇的结合进行样品的每个表面原子的原子核的三维坐标的确定，化学键合状态的元素分析和分析电子光谱学或通过高能电子辐射产生的光子的能量分析方法和化学键态分析方法的元素分析方法。在扫描探针显微镜在其原始操作条件下操作期间扫描探针和样品的操作期间，在探针和样品之间单独或重复地施加AC或DC超短脉冲高电压，暂时悬浮显微镜，激发样品的核心电子或以原子核为中心对称地分配电子的价电子，并对发射的光子或俄歇电子进行能量分析和计数分析，以便确定样品每个表面原子的原子核的三维坐标，并测量与元素分析和化学键状态分析相关的表面分布，并获得含有元素和化学键信息的原子图像。

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