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    • 26. 发明授权
    • Flow control device
    • 流量控制装置
    • US06170512B2
    • 2001-01-09
    • US09431938
    • 1999-11-01
    • Kuei-Hsi LaiKuo-Feng HuangMing-Che YangHung-Lung Mar
    • Kuei-Hsi LaiKuo-Feng HuangMing-Che YangHung-Lung Mar
    • G05D706
    • G05D7/0676Y10T137/3127Y10T137/7759
    • A supply apparatus comprises a storage tank, a chemical flow pipe to route a chemical solution into a semiconductor processing room, a pressurizing apparatus to supply gas to the storage tank to make the chemical solution flow into the processing room, and an electro-Pneumatic regulator valve to adjust the pressure of the input gas. The flow control device comprises a flow sensor, a set-up apparatus, and a processor for generating a control signal to the pressurizing apparatus depending on a difference between a target value and a measurement value to adjust the flow of the chemical solution in the chemical flow pipe. The flow sensor comprises a hollow cylinder, a choking magnetic core movably positioned inside the hollow cylinder, and a first and second conductive coil wrapped around the outer wall of the hollow cylinder which uses alternating current to generate a magnetic flux and sense a change in the magnetic flux to measure the flow of chemical solution.
    • 供给装置包括储存箱,将化学溶液输送到半导体处理室的化学流动管,将储存罐供给气体以使化学溶液流入处理室的加压装置,以及电动气动调节器 阀门调节输入气体的压力。 流量控制装置包括流量传感器,设置装置和处理器,用于根据目标值和测量值之间的差异向加压装置产生控制信号,以调整化学溶液在化学品中的流动 流量管。 流量传感器包括中空圆筒,可移动地定位在中空圆柱体内的阻塞磁芯,以及缠绕在中空圆柱体的外壁上的第一和第二导电线圈,其使用交流电产生磁通量并感测中空圆柱体的变化 磁通量测量化学溶液的流量。