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    • 36. 发明申请
    • COMPACT SUBSTRATE AND METHOD FOR MAKING THE SAME
    • 紧凑基板及其制造方法
    • WO2015183184A1
    • 2015-12-03
    • PCT/SG2014/000238
    • 2014-05-30
    • DAO, Nguyen Phu Cuong
    • DAO, Nguyen Phu Cuong
    • H05K3/46H05K1/11H05K3/00H05K3/10H05K3/20H05K3/28
    • H05K1/115H01L21/486H01L21/6835H01L23/49822H01L23/49827H01L24/08H01L24/16H01L24/73H01L24/80H01L24/81H01L24/92H01L2221/68345H01L2224/08238H01L2224/13023H01L2224/16111H01L2224/16237H01L2224/73201H01L2224/80903H01L2224/81011H01L2224/81024H01L2224/81385H01L2224/81815H01L2224/9211H05K3/0014H05K3/0032H05K3/205H05K3/4602H05K3/4682H05K2201/09436H05K2201/09545H05K2201/09827H05K2203/0108H01L2924/00014H01L2924/00012H01L2224/80H01L2224/81H01L2224/08H01L2224/16
    • The present invention relates to a compact substrate and a method for making the same. The compact substrate comprises at least one or a combination of a coreless structure, a double via structure and a compact double sided laser drilled (DSLD) via structure. The coreless structure has a first circuit comprising a plurality of first metal pads (151) and first metal lines (152). A first solder resist layer (16) is formed to cover parts of the first circuit and expose parts of the first metal pads (151) and parts of the first metal lines (152). Some Photo-Imageable Dielectric (PID) material can also be used to form the first solder resist layer (16). A second circuit comprising second metal pads (181) and second metal lines (182) are formed on the first solder resist layer (16). The second metal pads (181) cover the exposed first metal pads (151) and exposed first metal lines (152). The double via structure comprises a core substrate (19) having a first surface (191) and a second surface (192). Blind via holes (201) are formed on the first surface (191) of the core substrate (19). At least one through via holes (202) are formed on the base of the blind Via holes. The through via holes (202) are smaller in diameter as compared to that of the blind via holes (201). The through via holes (202) are located within the base of the blind via holes (201): The combination of the blind via holes (201) and the through via holes (202) forms the double via holes that penetrate through the core substrate (19). A compact double sided laser drilled (DSLD) via structure comprises a core substrate (19) having a first surface (191) and a second surface (192). DSLD via holes are formed and penetrate through the core substrate (19). Having the shape of two cones combined heads on, the DSLD via hole has its largest opening at its both ends and has its smallest opening somewhere near its middle portion.
    • 本发明涉及一种紧凑型基板及其制造方法。 紧凑型基板包括无芯结构,双通孔结构和紧凑型双面激光钻孔(DSLD)通孔结构中的至少一种或组合。 无芯结构具有包括多个第一金属焊盘(151)和第一金属线(152)的第一电路。 形成第一阻焊层(16)以覆盖第一电路的部分并暴露第一金属焊盘(151)的部分和第一金属线(152)的部分。 一些可光成像电介质(PID)材料也可用于形成第一阻焊层(16)。 在第一阻焊层(16)上形成包括第二金属焊盘(181)和第二金属线(182)的第二电路。 第二金属焊盘(181)覆盖暴露的第一金属焊盘(151)和暴露的第一金属线(152)。 双通道结构包括具有第一表面(191)和第二表面(192)的芯基板(19)。 在芯基板(19)的第一表面(191)上形成有盲通孔(201)。 至少一个通孔(202)形成在盲孔通孔的底部上。 通孔(202)的直径比盲孔(201)的直径小。 通孔(202)位于盲孔(201)的基部内。盲孔(201)和通孔(202)的组合形成穿过芯基板的双通孔 (19)。 紧凑的双面激光钻孔(DSLD)通孔结构包括具有第一表面(191)和第二表面(192)的芯基板(19)。 DSLD通孔形成并穿透芯基板(19)。 DSLD通孔具有两个锥体的形状,其两端具有最大的开口,并且在其中间部分附近具有最小的开口。