专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明专利

JPH09254268A SHAPE CREATING METHOD AND APPARATUS 失效
公开(公告)号：JPH09254268A
公开(公告)日：1997-09-30
申请号：JP6649996
申请日：1996-03-22
申请人： MORI YUZO , NIKON CORP
发明人： SHIBATA NORIO , TAKINO HIDEO , MORI YUZO
IPC分类号： G02B3/02 , B29D11/00 , C03C15/00 , C23F4/00
摘要： PROBLEM TO BE SOLVED: To process a rotary body with high accuracy by moving the rotary body so as to rotate centering around its rotary center axis and linearly moving the same in its diameter direction and relatively moving the rotary body by the linear movement of the center axis in its axial direction and inclining the axial direction within the plane containing the center axis. SOLUTION: A lens 10 to be processed of which the outer shape is approximate to a rotary body such as a spherical surface lens low in shape accuracy is arranged on a work table 1 so that the center of the approximate spherical surface of the lens to be processed coincides with the center of the rotary driving of the work table 1 by a rotary drive device 604. Further, the lens 10 to be processed is moved in a y-axis direction and an x-axis direction by the x-direction drive device 601 and y-direction drive device of a positioning unit 6. An electrode inclining unit for inclining the shaft of a processing electrode 2 in the normal line direction of the lens 10 to be processed so that a plasma forming surface becomes parallel to the contact plane of the surface of the part desired to be processed of the lens 10 to be processed is attached to a processing electrode 2.

52. 发明专利

JPH09103525A GOLF CLUB 失效
公开(公告)号：JPH09103525A
公开(公告)日：1997-04-22
申请号：JP26554095
申请日：1995-10-13
申请人： TSURUYA CO , MORI YUZO
发明人： MORI YUZO
IPC分类号： A63B53/02 , A63B53/08 , A63B53/10 , A63B53/12 , A63B102/32
摘要： PROBLEM TO BE SOLVED: To provide a golf club improving the directivity of a driven ball and capable of increasing the flight distance. SOLUTION: Silicone bouncing putty 4 is sealed in a shaft 2 fitted with a head 3, the head 3 and the shaft 2 are integrated by the instantaneous hardening of the putty 4 due to the shock of an impact, the movement of the head 3 is suppressed, the directivity is improved, and the initial speed of a ball is increased to extend the flight distance.

53. 发明专利

JPH08178935A PRODUCTION OF PROBE FOR SCANNING TYPE PROBE MICROSCOPE 失效
公开(公告)号：JPH08178935A
公开(公告)日：1996-07-12
申请号：JP32566294
申请日：1994-12-27
申请人： MORI YUZO
发明人： MORI YUZO
IPC分类号： G01B21/30 , G01N37/00 , G01Q60/16 , G01Q70/16 , G01Q80/00 , G01Q90/00
摘要： PURPOSE: To produce a probe for a scanning type probe microscope capable of producing a conical stable tip single atom probe of which the average tip radius of curvature is extremely sharp and fine in a degree from several tens to several Å. CONSTITUTION: By using the scanning type probe microscope, the atom sequence of a probe 2 to be processed at the normal temp., or cooled or heated is measured by a measuring probe 1 capable of observing an atom image and at the normal temp., or cooled or heated and, and after or while the atomic image of the probe is observed by the probe, the atom to be removed, atom to be added or atom to be moved of the probe to be processed is determined. A pulse of proper voltage, proper polarity and proper width is singly or repeatedly applied between both probes and a determined atom is removed, added or moved to allow only one atom to stably project from the tip of the probe to be processed to produce a sharp tip single atom probe.

54. 发明专利

JPH08134651A GAS FOR PLASMA CVM 失效
公开(公告)号：JPH08134651A
公开(公告)日：1996-05-28
申请号：JP27744994
申请日：1994-11-11
申请人： MORI YUZO , CENTRAL GLASS CO LTD
发明人： MORI YUZO , ICHIMARU HIROSHI , NAKAGAWA SHINSUKE
IPC分类号： C23C16/44 , C23C16/455 , H01L21/302 , H01L21/3065
摘要： PURPOSE: To solve the problems of a low machining speed and low efficiency of utilization of gas of using gas for machining selected from among F2 , interhalogen compds. and nitrogen fluorides. CONSTITUTION: This gas for plasma CVM(Chemical Vaporization Machining) is one kind of gas or a mixture of two or more kinds of gases selected from among F2 , interhalogen compds. and nitrogen fluorides. The interhalogen compds. are ClF, ClF3 , ClF5 , BrB, BrB3 , BrF5 and BrF7 . The nitrogen fluorides are NF3 , N2 F4 , N2 F2 and N3 F. Contamination by the deposition of sulfur or its compd. and carbon or it compd. from the surfaces of a body to be machined and an electrode material can be prevented.

55. 发明专利

JPH04337635A CUTTING AND GROOVING ELECTRODE STRUCTURE 失效
公开(公告)号：JPH04337635A
公开(公告)日：1992-11-25
申请号：JP13975191
申请日：1991-05-14
申请人： YUUHA MIKAKUTOU SEIMITSU KOGAK , MORI YUZO
发明人： MORI YUZO
IPC分类号： B23K28/00 , B26F3/00 , B28D5/00 , B28D5/04 , H01L21/304
摘要： PURPOSE:To integrally simplify the holding structure of a plurality of blade- shaped electrodes by juxtaposing a plurality of slits with a flat-plate electrode substrate excepting a surrounding frame body of insulating material corrosive resistant to a reaction gas and by arranging the blade-shaped electrodes between the slits. CONSTITUTION:A plurality of slits 3,... are transversely juxtaposed with a flat-plate electrode substrate 1 excepting a surrounding frame body 2 of insulating material such as ceramic corrosive resistant to a reaction gas and strip-like blade-shaped electrode substrates 11 are arranged between respective slits 3, 3. Also, a guide groove 12 is formed in the central part of the width of the tip edge of each blade-shaped electrode substrate 11 and in the frame body 2, 2 continuing from the central part and a conductive wire electrode 13 is caused to run along the guide groove 12. Thus, blade-shaped electrodes are integrated with the surrounding frame body, the frame body operates as reinforcing material and the frame body exists around the blade-shaped electrodes so that an atmospheric gas containing the reaction gas can be supplied into the frame body.

56. 发明专利

JP2003183831A PROCESS FOR FORMING FUNCTIONALLY GRADIENT THIN FILM 审中-公开
公开(公告)号：JP2003183831A
公开(公告)日：2003-07-03
申请号：JP2001380698
申请日：2001-12-13
申请人： SHARP KK , MORI YUZO
发明人： NAKAHAMA KOJI , YAMAMOTO TATSUSHI , MORI YUZO
IPC分类号： C23C16/44
摘要： PROBLEM TO BE SOLVED: To form a functionally gradient thin film having a complicated distribution of an elemental composition along the film thickness direction, and to form a functionally gradient thin film partially possessing a fixed, uniform distribution of an elemental composition. SOLUTION: The functionally gradient thin film having the complicated concentration gradient of the elemental composition and the functionally gradient thin film partially possessing the fixed, uniform concentration gradient can be easily formed using a plasma CVD device having a cylindrical rotating electrode. Appropriate gases are selected from the viewpoint of dissociation energy and fed to each of reactor vessels 60 and 63 of the plasma CVD device. Film formation is serially performed on a substrate 66 by passing it through the reactor vessels 60 and 63 in directions 67a-67d, or by coupling the plurality of the reactor vessels 60 and 61. COPYRIGHT: (C)2003,JPO

57. 发明专利

JP2003160868A PLASMA FILM-FORMING APPARATUS OR IN-LINE PLASMA FILM- FORMING APPARATUS 审中-公开
公开(公告)号：JP2003160868A
公开(公告)日：2003-06-06
申请号：JP2001360840
申请日：2001-11-27
申请人： KOBE STEEL LTD , MORI YUZO
发明人： NAKAGAMI AKIMITSU , KOBAYASHI AKIRA , HAYASHI KAZUYUKI , GOTO YASUSHI , KUGIMIYA TOSHIHIRO , ISHIBASHI KIYOTAKA , MORI YUZO
IPC分类号： C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a plasma film-forming apparatus which can efficiently form a film on a cylindrical substrate at a high speed, and has a rotation elec trode with a cylindrical outer surface by a plasma CVD method, or to provide an in-line plasma film-forming apparatus. SOLUTION: In the plasma film-forming apparatus which is provided with the rotation electrode 103 having the cylindrical outer surface, generates plasma between the rotation electrode 103 and a substrate 101, supplies reaction gas into the plasma, and forms a film on the substrate 101 by a chemical reaction, this plasma film-forming apparatus comprises the substrate 101 of a cylindrical substrate having the cylindrical outer surface, and a mechanism for rotating the cylindrical substrate in a reverse direction to that of the rotating electrode 103 around the center axis of the substrate, while holding the substrate 101 so as to make its center axis parallel to that of the rotating electrode 103, and make both and cylindrical outer surfaces face each other at a predetermined gap. COPYRIGHT: (C)2003,JPO

58. 发明专利

JP2003129245A APPARATUS AND METHOD FOR FORMING PLASMA CVD FILM 审中-公开
公开(公告)号：JP2003129245A
公开(公告)日：2003-05-08
申请号：JP2001326200
申请日：2001-10-24
申请人： KOBE STEEL LTD , MORI YUZO
发明人： ISHIBASHI KIYOTAKA , GOTO YASUSHI , KUGIMIYA TOSHIHIRO , HAYASHI KAZUYUKI , HOSOKAWA YOSHIYUKI , HIRANO TAKAYUKI , KOBAYASHI AKIRA , MORI YUZO
IPC分类号： G03G5/08 , C23C16/509 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To make it possible to perform high-speed film formation and to prolong the maintenance cycle of an apparatus in a method comprising rotating a substrate having a cylindrical outer periphery and forming a film on the cylindrical periphery by a plasma CVD process. SOLUTION: The plasma CVD film formation apparatus comprises a high-frequency electrode opposite to the substrate; a rotation means that rotates the substrate; a linear plasma generation space formed by cooperatively partitioning a reactor with the substrate and the high-frequency electrode; a partitioning member for forming a film formation region comprising a gas introduction space and a gas discharge space between which the plasma generation space is sandwiched; an atmosphere pressure adjustment means that sets and adjusts the pressure of the atmosphere in the plasma generation space within the range of 1 k to 200 kPa; and a high-frequency electric power source that supplies a high-frequency electric power to the high-frequency electrode in order to generate a linear plasma by glow discharge between the high-frequency electrode and the cylindrical outer periphery of the substrate.

59. 发明专利

JP2002363757A GRADIENT FUNCTIONAL THIN FILM DEPOSITION METHOD 失效
公开(公告)号：JP2002363757A
公开(公告)日：2002-12-18
申请号：JP2001168886
申请日：2001-06-04
申请人： SHARP KK , MORI YUZO
发明人： NAKAHAMA KOJI , YAMAMOTO TATSUSHI , MORI YUZO
IPC分类号： C23C16/509 , H01L21/31 , H01L21/318
摘要： PROBLEM TO BE SOLVED: To obtain a gradient functional thin film in which concentration gradient is formed in the thickness direction of the thin film by a simple method. SOLUTION: Equal to or above 2 kinds of gaseous starting materials each having different dissociation energy is introduced into a cylinder type rotary electrode plasma CVD apparatus 10. In a plasma space 22 formed in the plasma CVD apparatus, a film containing a larger quantity of an element using the gaseous starting material having a smaller dissociation energy as the source is formed in the upstream part 22a of the plasma space 22 and a film containing a larger quantity of an element using the gaseous starting material having a larger dissociation energy is formed in the downstream part 22b of the plasma space 22. The gradient functional thin film having the concentration gradient formed in the thickness direction of the thin film is simply formed by scanning in the direction along from upstream side to the downstream side or along from the downstream side to the upstream side.

60. 发明专利

JP2002028441A METHOD AND DEVICE FOR TREATING GAS 失效
公开(公告)号：JP2002028441A
公开(公告)日：2002-01-29
申请号：JP2000216341
申请日：2000-07-17
申请人： KOBE STEEL LTD , MORI YUZO
发明人： HAYASHI KAZUYUKI , KOBAYASHI AKIRA , NAKAGAMI AKIMITSU , INOUE KENICHI , OKADA KAZUTO , ISHIBASHI KIYOTAKA , MORI YUZO
IPC分类号： H05H1/24 , B01D53/34 , B01D53/56 , B01D53/62 , B01D53/68 , B01D53/70 , B01D53/72 , B01J19/08 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To efficiently treat a gas to be treated such as a per-fluorinated compound(PFC) with simple equipment by using the chemical reaction with plasma. SOLUTION: A rotary electrode 18 and a flat electrode 17 or one more rotary electrode are arranged at a prescribed interval to face each other. The chemical reaction using the plasma 22 is performed by rotating the rotary electrode 18, applying voltage between both electrodes 17 and 18 to generate the plasma 22, simultaneously introducing the gas to be treated and a reaction gas into a chamber and involving the gases in the plasma 22 with the rotation of the rotary electrode 18.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式