会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 53. 发明专利
    • Slicing device, slicing method and cell observation method of biological specimen
    • 切片装置,切片方法和生物样本细胞观察方法
    • JP2014102147A
    • 2014-06-05
    • JP2012254175
    • 2012-11-20
    • Dastech Inc株式会社ダステックTsukasa Matsumoto司 松元
    • YOSHIDA SHUNJITAKAHASHI NOBUYUKIMATSUMOTO TSUKASA
    • G01N1/06C12Q1/02G01N1/28G01N1/30
    • G01N1/06G01N1/42Y10T83/041Y10T83/283
    • PROBLEM TO BE SOLVED: To hold a cell in a live state and slice a work piece of a biological specimen.SOLUTION: A slicing device for slicing a work piece W of a biological specimen comprises: a substrate 4 on which a work piece W is placed: means for freezing and fixing the work piece W on the substrate 4; and a blade 1 for slicing the work piece W freezed and fixed on the substrate 4 by rotation in a fixed rotation direction r. The shape of the tip 11 of the blade 1 is a curve in which a distance from a rotating shaft C is monotonously increased from an end being the nearest point Pmin having a distance Rmin shortest from the rotating shaft C to the other end being the farthest point Pmax having a distance Rmax longest from the rotating shaft C. The farthest point Pmax is behind positioned in the rotation direction r from the nearest point Pmin, and the curve is convex on the opposite side of the rotating shaft C to a straight line Q connecting the nearest point Pmin and the farthest point Pmax.
    • 要解决的问题:将细胞保持在活状态并切片生物样品的工件。解决方案:用于切片生物样品的工件W的切片装置包括:基板4,工件W在其上 放置:将工件W冷冻固定在基板4上的装置; 以及刀片1,用于通过沿固定旋转方向r旋转将工件W冷冻固定在基板4上。 叶片1的尖端11的形状是从旋转轴C的距离从距离旋转轴C最短距离最远的距离Rmin最近的最近点Pmin的端部单调增加到最远的一端的曲线 点Pmax距离旋转轴C最远的距离Rmax。最远点Pmax从最近点Pmin开始位于旋转方向r的后方,曲线在旋转轴C的相反侧成直线Q 连接最近点Pmin和最远点Pmax。
    • 56. 发明专利
    • Method of and apparatus for manufacturing semiconductor device
    • 制造半导体器件的方法和装置
    • JP2005252178A
    • 2005-09-15
    • JP2004064222
    • 2004-03-08
    • Toshiba Corp株式会社東芝
    • SHIMIZU NORIKOKUROSAWA TETSUYATAKU SHINYA
    • H01L21/301B28D5/00H01L21/78
    • B28D5/0011B23K26/364B23K26/40B23K2201/40B23K2203/50H01L21/304H01L21/78Y10T83/041Y10T225/30
    • PROBLEM TO BE SOLVED: To provide a method of and an apparatus for manufacturing semiconductor devices which enhance the manufacturing yield and also reduce the time required for dividing process. SOLUTION: Regions that become the starting points for cleavage consisting of at least either a plurality of grooves 12-1, 12-2, 12-3, ... or through holes are formed on pelletizing lines or dicing lines along cleavage faces of a wafer 10 in which semiconductor elements are formed, and a liquid substance is poured into the regions that become the starting points for cleavage. An external factor that physically changes the liquid substance is applied to make the change, and by utilizing the change, the wafer 10 is cleaved to divide it into individual semiconductor chips 13-1, 13-2, 13-3, .... Since the wafer 10 can be cleaved collectively, without applying external forces, the dividing method enhances the manufacturing yield and reduces the time required for the dividing process. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种提高制造成品率并减少分割处理所需时间的半导体装置的制造方法和装置。 解决方案:成为切割起点的区域由至少多个槽12-1,12-2,12-3,...或通孔中的至少一个形成,在切割线或切割线上沿切割形成 其中形成有半导体元件的晶片10的表面,并且将液体物质注入到成为切割起点的区域中。 施加物理地改变液体物质的外部因素以改变,并且通过利用该变化,晶片10被切割以将其分成单独的半导体芯片13-1,13-2,13-3,.... 由于可以在不施加外力的情况下集中地切割晶片10,所以分割方法提高了制造成品率,并且缩短了分割处理所需的时间。 版权所有(C)2005,JPO&NCIPI
    • 58. 发明公开
    • 봉을 전단하기 위한 전단장치를 포함하는 성형기계
    • 成型机包括用于剪切棒的剪切装置
    • KR1020070105358A
    • 2007-10-30
    • KR1020077020960
    • 2006-02-13
    • 하테부르 움포름마쉬넨 아크티엔게젤샤프트
    • 수터,마이클스테멜린,파스칼
    • B21K27/06B23D15/04
    • B21K27/06B23D15/00B23D35/001Y10T83/04Y10T83/041Y10T83/412Y10T83/8769Y10T83/9447
    • The invention relates to a forming machine comprising a shearing device for shearing a bar (2, 20). Said shearing device comprises a fixed blade (11) with a passage (111) for permitting the insertion of the bar to be sheared (2, 20) and a shearing part (12) that can be displaced forwards and backwards in relation to the fixed blade (11). The shearing part (12) comprises a first shear blade (121), which is used to shear a bar section that projects from the fixed blade (11) when the shearing part (12) is displaced forwards and a second shear blade (122), which is used to shear a bar section (201) that projects from the fixed blade (11) when the shear part (12) is displaced backwards. In addition, the forming machine comprises a disposal point (8), to which the second shear blade (122) transports all the bar sections (201) it has sheared as scrap sections. As the second shear blade (122) exclusively shears scrap sections (201), empty points in the forming stations and the associated disadvantages can be avoided.
    • 本发明涉及一种成型机,其包括用于剪切杆(2,20)的剪切装置。 所述剪切装置包括具有通道(111)的固定刀片(11),用于允许待剪切的杆(2,20)的插入和剪切部分(12),该剪切部分可相对于固定的 刀片(11)。 剪切部分(12)包括第一剪切刀片(121),当剪切部件(12)向前移位时,剪切刀片(121)用于剪切从固定刀片(11)突出的杆部分,以及第二剪切刀片(122) ,其用于当剪切部分(12)向后移位时剪切从固定刀片(11)突出的杆部分(201)。 此外,成型机包括处理点(8),第二剪切刀片(122)将其剪切的所有条形部分(201)作为废料部分输送到该处理点。 随着第二剪切刀片(122)专门剪切废料部分(201),可以避免成型站中的空位和相关的缺点。
    • 60. 发明公开
    • 제어된 전단 영역을 이용한 박막 층 전이 기법
    • 使用控制剪切区域的薄膜的层转移
    • KR1020090116660A
    • 2009-11-11
    • KR1020090039968
    • 2009-05-07
    • 실리콘 제너시스 코포레이션
    • 프랑수아제이.헨리
    • H01L31/04
    • H01L31/1804B26F3/004B26F3/16H01L21/76254H01L31/18Y10T83/041Y10T83/283
    • PURPOSE: A layer transfer of films utilizing controlled shear region is provided to improve productivity while reducing system energy consumption by removing an implantation process to form a cleave beginning region together with a peripheral area. CONSTITUTION: In a layer transfer of films utilizing controlled shear region, a surface region(1702) and peripheral area(1704) are formed on a substrate(1700). A cleave region(1706) is under the surface region, and the cleave area is a virtual plane and a layer which is under the surface at a predetermined depth d. A film is cleaved at the cleave area from the substrate, and a part of the peripheral area is associated with a certain pattern area of the surface region. A heat source with energy with a certain level is applied to the surface vertically.
    • 目的:提供利用受控剪切区域的膜的层转移,以通过去除植入工艺以与外围区域一起形成切割开始区域来降低系统能量消耗,从而提高生产率。 构成:在利用受控剪切区域的膜的层转移中,在衬底(1700)上形成表面区域(1702)和外围区域(1704)。 劈裂区域(1706)在表面区域下方,并且解理区域是虚拟平面,并且在预定深度d处的表面下方的层。 在基板的切割区域处切割膜,并且周边区域的一部分与表面区域的某一图案区域相关联。 具有一定水平能量的热源垂直施加在表面上。