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81. 发明申请

US20110073259A1 METHOD AND APPARATUS FOR SEALING A GLASS PACKAGE 有权
标题翻译：密封玻璃包装的方法和装置
公开(公告)号：US20110073259A1
公开(公告)日：2011-03-31
申请号：US12958640
申请日：2010-12-02
申请人： Jeffrey Michael Amsden , James Joseph Bernas , John Joseph Costello, III , Margaret Helen Gentile , Mark Andrew Stocker , Lu Zhang
发明人： Jeffrey Michael Amsden , James Joseph Bernas , John Joseph Costello, III , Margaret Helen Gentile , Mark Andrew Stocker , Lu Zhang
IPC分类号： B29C65/14
CPC分类号： H05B33/04 , C03C23/001 , C03C23/002 , C03C23/0025 , C03C27/06 , C09J5/00 , C09J2205/31 , C09J2400/143 , H01L51/5246 , H05B33/10 , Y10T156/1066 , Y10T156/1374
摘要： An apparatus for sealing a substrate assembly by applying a force to the assembly while simultaneously exposing the substrate assembly, and in particular a sealing material disposed between two substrates of the substrate assembly, to an irradiating beam of electromagnetic energy. The beam heats, cures and/or melts the sealing material, depending upon the sealing material to form the seal. The force is applied by directing a flow of fluid against the substrate assembly, and beneficially improves contact between the substrates of the substrate assembly and the sealing material during the sealing process, therefore assisting in achieving a hermetic seal between the substrates.
摘要翻译：一种用于通过向组件施加力同时将衬底组件，特别是设置在衬底组件的两个衬底之间的密封材料同时暴露于电磁能的照射束来密封衬底组件的装置。梁根据密封材料加热，固化和/或熔化密封材料以形成密封。通过将流体流引导到衬底组件来施加力，并且有利地改善在密封过程期间衬底组件的衬底与密封材料之间的接触，从而有助于实现衬底之间的气密密封。

82. 发明申请

US20090208877A1 METHODS OF MAKING OPTICAL FIBER GRATINGS 审中-公开
标题翻译：制造光纤光栅的方法
公开(公告)号：US20090208877A1
公开(公告)日：2009-08-20
申请号：US12347269
申请日：2008-12-31
申请人： Adrian Carter
发明人： Adrian Carter
IPC分类号： G03F7/20
CPC分类号： G02B6/02123 , C03C23/002 , G02B6/02133 , G02B6/02142 , G02B6/02147 , H01S3/0675 , H01S3/06754 , H01S3/2308
摘要： Optical fibers and optical fiber lasers including gratings and methods of writing gratings into fibers. A method can comprise providing a photosensitive optical fiber having a region having an original refractive index (RI) profile along the elongate direction of the fiber; exposing the optical fiber to actinic radiation to alter the original RI profile to form along a length of the fiber a grating having a RI profile including alternating higher RI and lower RI sections; and wherein the maximum RI difference between a RI of a higher RI section and a RI of an adjacent lower RI section of the grating RI profile is no greater than 85% of the difference between the average index of the grating RI profile and the original RI profile.
摘要翻译：光纤和光纤激光器包括光栅和将光栅写入光纤的方法。方法可以包括提供具有沿着纤维的细长方向具有原始折射率（RI）轮廓的区域的光敏光纤; 将光纤暴露于光化辐射以改变原始RI分布，以沿着光纤的长度形成具有包括交替较高RI和较低RI部分的RI分布的光栅; 并且其中较高RI部分的RI与光栅RI轮廓的相邻较低RI部分的RI之间的最大RI差不大于光栅RI轮廓的平均指数与原始RI之间的差的85％个人资料

83. 发明申请

US20090016686A1 OPTICAL FIBER GRATINGS FOR HANDLING INCREASED POWER LEVELS AND METHODS OF MAKING 审中-公开
标题翻译：用于处理功率水平的光纤光栅和制造方法
公开(公告)号：US20090016686A1
公开(公告)日：2009-01-15
申请号：US11777838
申请日：2007-07-13
申请人： Adrian Carter
发明人： Adrian Carter
IPC分类号： G02B6/028 , C03C25/62
CPC分类号： G02B6/02123 , C03C23/002 , G02B6/02133 , G02B6/02142 , G02B6/02147 , H01S3/0675 , H01S3/06754 , H01S3/2308
摘要： Optical fibers and optical fiber lasers including gratings and methods of writing gratings into fibers. A method can comprise providing a photosensitive optical fiber having a region having an original refractive index (RI) profile along the elongate direction of the fiber; exposing the optical fiber to actinic radiation to alter the original RI profile to form along a length of the fiber a grating having a RI profile including alternating higher RI and lower RI sections; and wherein the maximum RI difference between a RI of a higher RI section and a RI of an adjacent lower RI section of the grating RI profile is no greater than 85% of the difference between the average index of the grating RI profile and the original RI profile.
摘要翻译：光纤和光纤激光器包括光栅和将光栅写入光纤的方法。方法可以包括提供具有沿着纤维的细长方向具有原始折射率（RI）轮廓的区域的光敏光纤; 将光纤暴露于光化辐射以改变原始RI分布，以沿着光纤的长度形成具有包括交替较高RI和较低RI部分的RI分布的光栅; 并且其中较高RI部分的RI与光栅RI轮廓的相邻较低RI部分的RI之间的最大RI差不大于光栅RI轮廓的平均指数与原始RI之间的差的85％个人资料

84. 发明申请

US20080299501A1 Low CTE photomachinable glass 有权
标题翻译：低CTE可感光玻璃
公开(公告)号：US20080299501A1
公开(公告)日：2008-12-04
申请号：US11897905
申请日：2007-08-31
申请人： Nicholas Francis Borrelli , Kathryn L. Goetschius , David Lathrop Morse , Charlene Marie Smith
发明人： Nicholas Francis Borrelli , Kathryn L. Goetschius , David Lathrop Morse , Charlene Marie Smith
IPC分类号： G03C5/16 , C03C10/00
CPC分类号： C03C15/00 , C03C3/095 , C03C10/0027 , C03C23/002 , C03C23/007 , C03C2218/34
摘要： The present invention describes a composition, method and article for a photomachinable glass having a coefficient of thermal expansion from less than 6×10−6/° C. in the temperature range of 0° C. to 300 ° C. The photomachinable glass composition is a low expansion glass having an amorphous glass phase and crystalline phases selected from the group consisting of spudomene and lithium disilicate.
摘要翻译：本发明描述了在0℃至300℃的温度范围内热可膨胀玻璃的组成，方法和制品的热膨胀系数小于6×10 -6 /℃。可光致热熔玻璃组合物为具有无定形玻璃相的低膨胀玻璃和选自由聚硅氧烷和二硅酸锂组成的组的结晶相。

85. 发明申请

US20080245109A1 METHODS TO FABRICATE A PHOTOACTIVE SUBSTRATE SUITABLE FOR SHAPED GLASS STRUCTURES 有权
标题翻译：用于形成适合形成玻璃结构的照相基板的方法
公开(公告)号：US20080245109A1
公开(公告)日：2008-10-09
申请号：US12058608
申请日：2008-03-28
申请人： Jeb H. Flemming , Colin T. Buckley , Carrie Schmidt
发明人： Jeb H. Flemming , Colin T. Buckley , Carrie Schmidt
IPC分类号： C03C25/66 , C03C25/62
CPC分类号： C03C25/62 , B32B3/10 , C03C3/095 , C03C3/108 , C03C4/04 , C03C15/00 , C03C23/002 , C03C23/007 , C03C2218/34 , Y10T428/24479
摘要： This invention provides an inexpensive and rapid method for fabricating a high-anisotropic-etch ratio, shaped glass structures using a novel photosensitive glass composition. Structures of the photosensitive glass may include micro-channels, micro-optics, microposts, or arrays of hollow micro-needles. Furthermore, such shaped glass structures can be used to form a negative mold for casting the shape in other materials.
摘要翻译：本发明提供了使用新型光敏玻璃组合物制造高各向异性 - 蚀刻比的成形玻璃结构的廉价且快速的方法。感光玻璃的结构可以包括微通道，微光学，微孔或空心微针阵列。此外，这种成形的玻璃结构可用于形成用于在其它材料中铸造形状的阴模。

86. 发明授权

US07396475B2 Method of forming stepped structures employing imprint lithography 有权
标题翻译：使用压印光刻法形成阶梯式结构的方法
公开(公告)号：US07396475B2
公开(公告)日：2008-07-08
申请号：US10423642
申请日：2003-04-25
申请人： Sidlgata V. Sreenivasan
发明人： Sidlgata V. Sreenivasan
IPC分类号： H01L21/302
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , C03C17/002 , C03C23/0005 , C03C23/002 , G03F7/0002 , H01L21/76813 , H01L21/76817
摘要： The present invention provides a method for forming a stepped structure on a substrate that features transferring, into the substrate, an inverse shape of the stepped structure disposed on the substrate.
摘要翻译：本发明提供一种在基板上形成阶梯状结构的方法，其特征在于，将设置在基板上的阶梯状结构的反转形状转移到基板中。

87. 发明申请

US20060037362A1 Photolithography methods and systems 审中-公开
公开(公告)号：US20060037362A1
公开(公告)日：2006-02-23
申请号：US11198697
申请日：2005-08-05
申请人： Nicholas Borrelli , Charlene Smith , Johannes Moll
发明人： Nicholas Borrelli , Charlene Smith , Johannes Moll
IPC分类号： C03B19/09 , C03B32/00
CPC分类号： G03F7/70041 , C03B19/1423 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2207/36 , C03C3/06 , C03C4/0085 , C03C23/002 , C03C2201/21 , C03C2201/23 , G03F7/70058 , G03F7/70941 , G03F7/70958 , G03F7/70966
摘要： Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

88. 发明授权

US06920765B2 Combined advanced finishing and UV laser conditioning process for producing damage resistant optics 有权
标题翻译：组合先进的整理和UV激光调理工艺，用于生产抗损伤光学元件
公开(公告)号：US06920765B2
公开(公告)日：2005-07-26
申请号：US10125851
申请日：2002-04-17
申请人： Joseph A. Menapace , John E. Peterson , Bernardino M. Penetrante , Philip E. Miller , Thomas G. Parham , Michael A. Nichols
发明人： Joseph A. Menapace , John E. Peterson , Bernardino M. Penetrante , Philip E. Miller , Thomas G. Parham , Michael A. Nichols
IPC分类号： B24B13/00 , C03C15/00 , C03C19/00 , C03C23/00 , G02B1/12 , G02F1/35 , C03B37/018 , B24B1/00 , C23F1/00 , C23F15/00 , C23B25/00
CPC分类号： C03C23/0025 , B24B13/00 , C03C15/00 , C03C19/00 , C03C23/002 , G02B1/12 , G02F1/3525
摘要： A method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects, and are better capable of resisting optical deterioration upon exposure to a high-power laser beam.
摘要翻译：一种降低熔融二氧化硅光学元件表面上易发生激光诱发损伤的位置的密度的方法，导致光学器件具有远远更少的灾难性缺陷，并且能够更好地抵抗暴露于高温下的光学劣化功率激光束。

89. 发明授权

US06632759B2 UV photosensitive melted germano-silicate glasses 有权
标题翻译： UV光敏熔融锗硅酸盐玻璃
公开(公告)号：US06632759B2
公开(公告)日：2003-10-14
申请号：US09874342
申请日：2001-06-05
申请人： Nicholas F. Borelli , George B. Hares , Charlene M. Smith
发明人： Nicholas F. Borelli , George B. Hares , Charlene M. Smith
IPC分类号： C03C3091
CPC分类号： G02B6/125 , C03B19/02 , C03B32/00 , C03B2201/21 , C03B2201/31 , C03C3/064 , C03C3/091 , C03C4/0085 , C03C4/04 , C03C4/085 , C03C17/3411 , C03C23/00 , C03C23/002 , C03C2201/21 , C03C2203/54 , G02B6/02114 , G02B6/12007 , G02B6/124 , G02B2006/12147
摘要： The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.
摘要翻译：本发明一般涉及UV（紫外线）感光体玻璃，特别涉及间歇可熔碱性硼铝硅酸盐玻璃。本发明的感光体玻璃显示对低于250nm的UV波长的光敏性。碱性硼铝硅酸盐体玻璃对于低于250nm的紫外波长的光敏性提供了玻璃中折射率图案的制备。在250nm以下的辐射源（例如激光）下，在玻璃中形成折射率图案。本发明的感光光学折射率图案形成块状玻璃允许在玻璃中形成图案并利用这种图案化玻璃的装置。

90. 发明申请

US20030114291A1 Flat glass having high transmittance 有权
标题翻译：平板玻璃透光率高
公开(公告)号：US20030114291A1
公开(公告)日：2003-06-19
申请号：US10220947
申请日：2002-09-06
发明人： Akihiro Koyama , Isamu Kuroda , Nobuyuki Yamamoto , Yasunori Seto
IPC分类号： C03C003/095 , C03C003/087
CPC分类号： C03C23/002 , C03C3/087 , C03C3/095 , C03C4/12 , H01L27/14625 , H01L31/0392 , H01L31/0481 , H01L31/0488 , Y02E10/50
摘要： The present invention is to provide a high transmittance glass sheet that has a composition containing as coloring components, expressed in wt. %, 0.005 to less than 0.02% of total iron oxide in terms of Fe2O3, less than 0.008% of FeO, and 0 to 0.25% of cerium oxide and having a ratio of FeO in terms of Fe2O3 to the total iron oxide of lower than 40%, and exhibits high visible light transmittance and solar radiation transmittance. Alternatively, a high transmittance glass sheet is provided that contains not more than 0.06% of total iron oxide and 0.025 to 0.20% of cerium oxide and has a ratio of a fluorescence intensity at 395 nm to a fluorescence intensity at 600 nm of 10% or higher when subjected to ultraviolet irradiation at a wavelength of 335 nm.
摘要翻译：本发明提供一种高透光性玻璃片，其具有以重量％表示的着色成分。％，以Fe 2 O 3计，总铁氧化物的0.005〜小于0.02％，小于0.008％的FeO和0〜0.25％的氧化铈，FeO以Fe2O3与总氧化铁的比例低于 40％，表现出高可见光透射率和太阳辐射透射率。或者，提供高透射率玻璃板，其含有不超过总氧化铁的0.06％和氧化铈的0.025至0.20％，并且在395nm处的荧光强度与600nm的荧光强度的比例为10％，或当在波长335nm进行紫外线照射时较高。

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