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81. 发明授权

US08895222B2 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition 有权
标题翻译：光敏感或辐射敏感性树脂组合物和抗蚀剂膜和图案形成方法使用该组合物
公开(公告)号：US08895222B2
公开(公告)日：2014-11-25
申请号：US12729336
申请日：2010-03-23
申请人： Tomotaka Tsuchimura , Hidenori Takahashi , Takayuki Ito , Takeshi Inasaki , Shohei Kataoka
发明人： Tomotaka Tsuchimura , Hidenori Takahashi , Takayuki Ito , Takeshi Inasaki , Shohei Kataoka
IPC分类号： G03F7/004 , G03F7/028 , G03F7/029 , G03F7/039 , G03F7/20 , C08F224/00
CPC分类号： C08F224/00 , C08F12/20 , C08F12/22 , C08F12/24 , C08F12/30 , C08F12/32 , C08F212/14 , C09D125/18 , G03F7/0045 , G03F7/029 , G03F7/0392 , G03F7/2037 , Y10S430/122 , C08F220/16 , C08F212/32 , C08F2220/1883 , C08F2220/1825
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
摘要翻译：本发明提供一种光活性射线敏感性或辐射敏感性树脂组合物，其包含（P）树脂，该树脂含有（A）具有离子结构部分的重复单元，该离子结构部分能够在照射光化学射线或辐射时在侧链上产生酸性阴离子，其中所述离子结构部分的阳离子部分具有酸可分解基团或碱可分解基团。

82. 发明授权

US08871882B2 Method for the preparation of styrenic fluoropolymers 有权
标题翻译：制备苯乙烯含氟聚合物的方法
公开(公告)号：US08871882B2
公开(公告)日：2014-10-28
申请号：US13372621
申请日：2012-02-14
申请人： Xiaoliang Zheng , Dong Zhang , Jiaokai Jing , Ted Calvin Germroth , Frank W. Harris , Thauming Kuo , Bin Wang , Douglas Stephens McWilliams
发明人： Xiaoliang Zheng , Dong Zhang , Jiaokai Jing , Ted Calvin Germroth , Frank W. Harris , Thauming Kuo , Bin Wang , Douglas Stephens McWilliams
IPC分类号： C08F12/20 , C08F112/14
CPC分类号： C08F12/20 , C08F2/08 , C08F2/10 , C08F2/26 , C08F2/28 , C08F2/30 , C08F14/18 , C08F112/14 , C08F212/14 , C08F214/18 , C08F212/08
摘要： A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.
摘要翻译：公开了通过在水性介质中通过反应混合物的乳液聚合制备含氟聚合物的方法，其中反应混合物包括具有以下结构的含氟单体：其中R 1，R 2和R 3各自独立地为氢原子，烷基，取代的烷基或卤素，其中R 1，R 2和R 3中的至少一个为氟原子，并且其中R各自独立地为苯乙烯环上的取代基，n为0至5的整数，表示取代基数在苯乙烯环上 b）乳液稳定剂组合，其包含：i）阴离子表面活性剂; 和ii）阳离子表面活性剂或非离子表面活性剂; 和c）自由基引发剂。

83. 发明授权

US08642244B2 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound 有权
标题翻译：用于浸渍曝光的抗蚀剂组合物，使用其形成抗蚀剂图案的方法和含氟化合物
公开(公告)号：US08642244B2
公开(公告)日：2014-02-04
申请号：US13310625
申请日：2011-12-02
申请人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
发明人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
IPC分类号： G03F7/004 , G03F7/028 , G03F7/033 , G03F7/039 , G03F7/26
CPC分类号： G03F7/0046 , C07C69/653 , C07C69/67 , C07C69/712 , C07C69/757 , C07C2603/00 , C07C2603/84 , C07C2603/86 , C08F12/20 , C08F12/22 , C08F12/32 , C08F220/22 , C08F220/24 , C08F220/26 , C08F220/28 , C09D125/14 , C09D125/18 , G03F7/0048 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F212/14 , C08F2220/1833 , C08F212/32 , C08F2220/185 , C08F2220/283 , C08F220/06
摘要： A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
摘要翻译：一种用于浸渍曝光的抗蚀剂组合物，包括在酸作用下在碱性显影液中表现出改变的溶解度的基础组分，暴露时产生酸的酸产生剂组分和由通式（c-1）表示的含氟化合物），其可以在碱性显影液中分解：其中R1表示可以含有可聚合基团的有机基团，条件是所述可聚合基团具有碳 - 碳多重键，并且形成多重键的碳原子不直接键合通式（c-1）中的-C（= O） - 基团中的碳原子; R2表示具有氟原子的有机基团。

84. 发明申请

US20140029267A1 CHEMICAL COMPOUND BEING USED FOR FORMING A RANDOM WRINKLE STRUCTURE, COMPOSITION CONTAINING THE COMPOUND, FILM HAVING THE STRUCTURE, METHOD OF FORMING THE FILM, AND OLED COMPRISING THE FILM 审中-公开
标题翻译：用于形成随机皱纹结构的化学化合物，包含该化合物的组合物，具有结构的膜，形成膜的方法和包含膜的OLED
公开(公告)号：US20140029267A1
公开(公告)日：2014-01-30
申请号：US13780391
申请日：2013-02-28
申请人： Electronics and Telecommunications Research Institute
发明人： Jaehyun MOON , Seung Koo Park , Jeong Ik Lee , Jin Wook Shin , Doo-Hee Cho , Joo Hyun Hwang , Chul Woong Joo , Jun-Han Han , Jin Woo Huh , Joon Tae Ahn , Nam Sung Cho , Hye Yong Chu , Byoung Gon Yu
IPC分类号： C07C43/225 , C08F136/20 , F21V3/04
CPC分类号： C23C16/56 , C07C43/225 , C08F12/20 , C08F12/34 , C08F136/20 , C08G65/007 , C09D125/18 , F21V3/06 , Y10T428/24446
摘要： Provided are a random wrinkle structure-formable compound, a composition including the same, a film including a random wrinkle structure, a method of forming the film, and an organic light emitting device including the film. A compound according to the present invention is coated and then, a film having a surface structure of random wrinkles may be simply formed through simple ultraviolet (UV) curing or thermosetting. When the film thus formed is used in an organic light emitting device, light generated from the organic light emitting device is scattered on surfaces of the random wrinkles to prevent light guide or total reflection, and thus, light is extracted to the outside. That is, a random structure disposed at the outside of the device performs a light extraction function and consequently, light efficiency of the organic light emitting device may be increased.
摘要翻译：提供了无规皱纹结构形成的化合物，包含其的组合物，包含随机皱纹结构的膜，形成膜的方法和包括该膜的有机发光器件。涂布本发明的化合物，然后简单地通过简单的紫外（UV）固化或热固化形成具有无规皱纹表面结构的膜。当这样形成的膜用于有机发光器件时，从有机发光器件产生的光被散布在随机皱纹的表面上，以防止光线或全反射，从而将光提取到外部。也就是说，设置在设备外部的随机结构执行光提取功能，因此可以增加有机发光器件的光效率。

85. 发明授权

US08476621B2 Resin composition, gate insulating layer, and organic thin film transistor 有权
标题翻译：树脂组合物，栅极绝缘层和有机薄膜晶体管
公开(公告)号：US08476621B2
公开(公告)日：2013-07-02
申请号：US13060456
申请日：2009-08-25
申请人： Isao Yahagi
发明人： Isao Yahagi
IPC分类号： H01L35/24
CPC分类号： C08F220/22 , C08F12/20 , C08F12/24 , C08F212/08 , C08F212/10 , C08F212/14 , C08F220/18 , C08F220/36 , C08F2220/343 , C08K5/0025 , C08L25/18 , C08L2205/02 , H01L51/052 , H01L51/0541 , H01L51/0545 , C08L2666/04
摘要： The subject of the present invention is to provide an organic thin film transistor with a small hysteresis. The means for solving the subject is a resin composition for an organic thin film transistor gate insulating layer comprising (A) a macromolecule that comprises at least one repeating unit selected from the group consisting of repeating units represented by Formula (1), repeating units represented by Formula (1′), and repeating units represented by Formula (2) and contains two or more first functional groups in its molecule, wherein the first functional group is a functional group that generates, by the action of electromagnetic waves or heat, a second functional group that reacts with active hydrogen, and (B) at least one compound selected from the group consisting of low-molecular compounds containing two or more active hydrogens in each molecule and macromolecules containing two or more active hydrogens in each molecule.
摘要翻译：本发明的主题是提供具有小滞后的有机薄膜晶体管。用于解决问题的方法是一种有机薄膜晶体管栅极绝缘层的树脂组合物，其包含（A）大分子，其包含至少一种选自由式（1）表示的重复单元，重复单元由式（1'）表示的重复单元和式（2）表示的重复单元，其分子中含有2个以上的第一官能团，其中，第一官能团是通过电磁波或热而产生的官能团与活性氢反应的第二官能团，和（B）选自每个分子中含有两个或更多个活性氢的低分子化合物和每个分子中含有两个或更多个活性氢的大分子的至少一种化合物。

86. 发明申请

US20130045445A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性树脂膜及其使用组合物形成图案的方法
公开(公告)号：US20130045445A1
公开(公告)日：2013-02-21
申请号：US13587299
申请日：2012-08-16
申请人： Toshiya TAKAHASHI , Hideaki TSUBAKI , Hiroshi TAMAOKI , Shuji HIRANO , Hiroo TAKIZAWA
发明人： Toshiya TAKAHASHI , Hideaki TSUBAKI , Hiroshi TAMAOKI , Shuji HIRANO , Hiroo TAKIZAWA
IPC分类号： G03F7/004 , G03F7/20 , G03F7/027
CPC分类号： C08F12/30 , C08F12/20 , C08F12/22 , C08F12/32 , C08F212/14 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , C08F212/32 , C08F2220/1825 , C08F220/16
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising a repeating unit (A) containing a group that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) containing a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and any of compounds (Q) of general formula (1) below.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含树脂（P），该树脂（P）包含重复单元（A），该重复单元包含当暴露于光化学射线或辐射时被分解的酸的重复单元（A） B）含有当被酸作用时的基团分解，从而增加其在碱显影剂和下述通式（1）的化合物（Q）中的溶解度。

87. 发明申请

US20120003590A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，耐腐蚀性膜和使用其的图案形成方法
公开(公告)号：US20120003590A1
公开(公告)日：2012-01-05
申请号：US13033079
申请日：2011-02-23
申请人： Shuji HIRANO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Takeshi KAWABATA , Hideaki TSUBAKI
发明人： Shuji HIRANO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Takeshi KAWABATA , Hideaki TSUBAKI
IPC分类号： G03F7/20 , C08F214/18
CPC分类号： G03F7/0045 , C08F12/20 , C08F12/24 , C08F12/30 , C08F212/14 , G03F7/0392 , G03F7/0397 , C08F220/16 , C08F2220/1825
摘要： An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译：含有具有（A）由特定式（I）表示的重复单元和（B））的树脂的光化射线敏感或辐射敏感性树脂组合物，其能够在用光化射线或辐射照射时产生酸。

88. 发明申请

US20100062368A1 LOW OUTGASSING PHOTORESIST COMPOSITIONS 有权
标题翻译：低出口光电组成
公开(公告)号：US20100062368A1
公开(公告)日：2010-03-11
申请号：US12206065
申请日：2008-09-08
申请人： Richard A. DiPietro , Ratnam Sooriyakumaran , Sally A. Swanson , Hoa D. Truong
发明人： Richard A. DiPietro , Ratnam Sooriyakumaran , Sally A. Swanson , Hoa D. Truong
IPC分类号： G03C1/053 , C08F224/00 , G03F7/20 , C08F214/18
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C08F212/32 , C08F220/28 , C09D125/18 , G03F7/0046 , G03F7/0382 , Y10S430/106 , Y10S430/114
摘要： Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.
摘要翻译：用于光致抗蚀剂组合物的聚合物包括具有下式的重复单元：其中Z表示聚合物主链的重复单元; X是选自亚烷基，亚芳基，亚芳基，羰基，羧基，羧基亚烷基，氧基，氧化烯及其组合的连接基团，R选自氢，烷基，芳基和环烷基，条件是X和R不是相同环系的一部分。还公开了用于图案化光致抗蚀剂组合物的浮雕图像的方法，其中光致抗蚀剂组合物具有小于6.5E + 14分子/ cm 2 / s的除气速率。

89. 发明申请

US20080287624A1 Process for Preparing an Optical Organic Polymer 审中-公开
标题翻译：光学有机聚合物的制备方法
公开(公告)号：US20080287624A1
公开(公告)日：2008-11-20
申请号：US11658208
申请日：2005-09-14
申请人： Maria Petrucci-Samija , Bao-Ling Yu
发明人： Maria Petrucci-Samija , Bao-Ling Yu
IPC分类号： C08F14/18 , C08F2/00
CPC分类号： C08F12/20 , C08F12/14 , C08F12/32
摘要： A process is provided for preparing an organic polymeric useful in the fabrication of optical waveguides or optical fiber. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group.
摘要翻译：提供了一种制备用于制造光波导或光纤的有机聚合物的方法。聚合物是具有烯属主链的均聚物或共聚物，其具有包含氟化芳族和脂族部分的侧基，并且是可交联的。具有宽范围折射率的聚合物可以通过选择侧基的具体组分来制备。

90. 发明申请

US20050074693A1 Polymer compound, resist material and pattern formation method 失效
标题翻译：高分子化合物，抗蚀剂材料和图案形成方法
公开(公告)号：US20050074693A1
公开(公告)日：2005-04-07
申请号：US10954373
申请日：2004-10-01
申请人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
发明人： Shinji Kishimura , Masayuki Endo , Masaru Sasago , Mitsuru Ueda , Hirokazu Imori , Toshiaki Fukuhara
IPC分类号： C08F12/20 , C08G75/30 , G03C1/492 , G03F7/004 , G03F7/039 , G03F7/04 , G03F7/20
CPC分类号： G03F7/0046 , C08F12/20 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a carbon number not less than 1 and not more than 20; 0
摘要翻译：抗蚀剂材料的基础聚合物含有包含由以下化学式5的通式表示的第一单元和由以下化学式6的通式表示的第二单元的聚合物化合物：其中R 1， R 2，R 3，R 7，R 8和R 9相同或不同，为氢原子，氟原子或直链烷基，支链或环状烷基基团或碳数不小于1且不大于20的氟化烷基; R 4是直链亚烷基或碳数不小于0且不大于20的支链或环状亚烷基; R 5，R 6和R 11相同或不同，为氢原子，直链烷基，支链或环状烷基或碳数不少于的氟化烷基 1，不大于20，或被酸释放的保护基; R 12为碳原子数为1以上且20以下的氟原子或直链氟化烷基或支链或环状氟化烷基， 0

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