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    • 9. 发明申请
    • CAPILLARY DRYING OF SUBSTRATES
    • 基片毛细干燥
    • WO2003066246A1
    • 2003-08-14
    • PCT/US2003/003561
    • 2003-02-05
    • AKRION, LLCMYLAND, Lawrence, J.
    • MYLAND, Lawrence, J.
    • B08B7/00
    • H01L21/67313H01L21/67034
    • An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.
    • 一种用于干燥基材的设备和方法。 本发明的装置包括:用于在具有包括毛细管材料的一个或多个支撑部分的处理罐中支撑至少一个基板的物体支撑构件。 本发明的方法是在处理罐中从湿底物中除去液体的方法,包括使湿底物与毛细管材料接触。 在另一方面,本发明是一种干燥至少一种在工艺罐中具有表面的基材的方法,该方法包括:将基材浸没在具有液位的液体中,所述液体具有将浸没的基底支撑在处理槽中,所述液体在液面上提供干燥蒸气, 降低液位或升高基板,使液面低于基板,从而从基板表面去除大部分液体,并用毛细管材料从基板表面去除剩余的液体。