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1. 发明专利

JP2014144381A Bathroom in which auxiliary nursing care instrument for assisting care receiver and care giver can be easily installed 有权
标题翻译：辅助护理仪器辅助护理人员和护理人员的浴室可以轻松安装
公开(公告)号：JP2014144381A
公开(公告)日：2014-08-14
申请号：JP2014103869
申请日：2014-05-20
申请人： Koji Ichikawa , 耕司市川
发明人： ICHIKAWA KOJI
IPC分类号： A61G7/10 , A61G5/00
摘要： PROBLEM TO BE SOLVED: To provide a bathroom that an auxiliary nursing care instrument can be easily installed therein which assists a care giver who helps a care receiver with the movements of standing up and sitting, and which does not need external power and is light and safe.SOLUTION: A nursing care instrument suitable for bathing applies a movable pulley principle, and fixing members (5e, 5f) are appropriately disposed in areas of a bathroom which are not over the heads of a care receiver and a care giver. The nursing care instrument allows the care giver to easily apply force to the care receiver in a natural position and therefore to care the care receiver in a comfortable position by stamping on a force point member (stirrup member 5p) and using frictional force on a rope. A supporting member (annular harness 5h) for suspending and supporting the care receiver by the hip joints or armpits does not inflict pain on the care receiver, does not become obstructive at the time of bathing or the like, and is devised so as to be a sanitary one. Anchor members for installing the fixing members are provided at appropriate positions of the bathroom in advance.
摘要翻译：要解决的问题：为了提供可以容易地安装辅助护理仪器的浴室，其帮助护理者帮助护理接受者进行站立和坐着的运动，并且不需要外部电力并且是轻的和安全。解决方案：适用于沐浴的护理仪器应用可动滑轮原理，并且将固定构件（5e，5f）适当地设置在不在护理接收器和护理者的头部的浴室的区域中。护理仪器允许护理人员在自然的位置上容易地向护理接收器施加力，因此通过在力点构件（马镫构件5p）上冲压并在绳索上使用摩擦力来将护理接收器照在舒适的位置。用于通过髋关节或腋窝悬挂和支撑护理接收器的支撑构件（环形线束5h）不会在护理接收器上造成疼痛，在洗澡等时不会变得阻塞，并且被设计为一个卫生的。预先在浴室的适当位置设置用于安装固定构件的锚定构件。

2. 发明专利

JPS5163520A Yanenoshikoho 失效
公开(公告)号：JPS5163520A
公开(公告)日：1976-06-02
申请号：JP8511774
申请日：1974-07-26
申请人： Koji Ichikawa
发明人： ICHIKAWA KOJI
IPC分类号： E04D1/00 , E04D1/26

3. 发明专利

JP2012035069A Auxiliary nursing care instrument which assists person to be cared and caregiver, and bathroom in which attachment of nursing care instrument is made easy 有权
标题翻译：辅助护理人员的辅助护理仪器，护理人员和护理人员，以及护理仪器的附件容易进行的浴室
公开(公告)号：JP2012035069A
公开(公告)日：2012-02-23
申请号：JP2011154364
申请日：2011-07-13
申请人： Koji Ichikawa , 耕司市川
发明人： ICHIKAWA KOJI
IPC分类号： A61H33/00 , A61G5/00
摘要： PROBLEM TO BE SOLVED: To provide an auxiliary nursing care instrument which assists a caregiver who helps the standing up and sitting operation of a person to be cared, in which external power is needless, and which is light and safe.SOLUTION: A moving pulley principle is applied, a fixing member (fulcrum) is suitably arranged for a part which is not over the head of a person to be cared or a caregiver, since a stirrup member (5p) is stepped in or the friction of a rope is utilized, it is easy to apply force with a natural posture and the care can be performed with an easy posture. An annular harness (5h) which hangs and supports a person to be cared (5a) by a hip joint or armpits is painless, does not become obstructive at the time of bathing or the like, and is devised by a sanitary one. Since the idea of dividing a long auxiliary strut is performed and the carrying, assembling, and resolution are made easy, the auxiliary nursing care instrument can be utilized also for a visit care.
摘要翻译：要解决的问题：提供辅助护理仪器，帮助护理人员帮助一个人的站立和坐着操作，其中外部电力是不必要的，而且是轻而安全的。
解决方案：施加移动滑轮原理，由于踩踏构件（5p）被踩踏，固定构件（支点）适合地布置在不在被照顾的人的头部或护理者的头部上或者利用绳索的摩擦力，则以自然姿态施加力容易，并且能够以容易的姿势进行护理。通过髋关节或腋窝悬挂和支撑被照顾的人（5a）的环形线束（5h）是无痛的，在洗澡等时不会阻塞，并且由卫生设计。由于执行分割长辅助支柱的想法，并且携带，组装和分辨率变得容易，辅助护理仪器也可以用于访问护理。版权所有（C）2012，JPO＆INPIT

4. 发明授权

US09726976B2 Photoresist composition 有权
公开(公告)号：US09726976B2
公开(公告)日：2017-08-08
申请号：US12881942
申请日：2010-09-14
申请人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
发明人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046
摘要： A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.

5. 发明授权

US09405187B2 Salt, acid generator and resist composition 有权
标题翻译：盐，酸发生剂和抗蚀剂组成
公开(公告)号：US09405187B2
公开(公告)日：2016-08-02
申请号：US13170990
申请日：2011-06-28
申请人： Takashi Hiraoka , Hiromu Sakamoto , Koji Ichikawa
发明人： Takashi Hiraoka , Hiromu Sakamoto , Koji Ichikawa
IPC分类号： G03F7/004 , C07D207/12 , C07D211/46 , C07D233/60 , C07D307/77 , C07D327/08 , G03F7/039
CPC分类号： G03F7/0045 , C07D207/12 , C07D211/46 , C07D233/60 , C07D307/77 , C07D327/08 , G03F7/0046 , G03F7/0397
摘要： The present invention is a salt represented by the formula (I) wherein R1 and R2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents a C1 to C17 divalent saturated hydrocarbon group, a —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—; ring W1 represents a C2 to C36 heterocycle; R3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; R4 in each occurrence independently represent a C1 to C6 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; m represents an integer of 0 to 6; and Z+ represents an organic cation.
摘要翻译：本发明是由式（I）表示的盐，其中R 1和R 2各自独立地表示氟原子或C 1至C 6全氟烷基; L1表示C1〜C17二价饱和烃基，饱和烃基中所含的-CH 2可以被-O-或-CO-代替; 环W1表示C2〜C36杂环; R3表示氢原子或C1〜C12烃基，烃基中所含的-CH2-可以被-O-或-CO-代替; R4各自独立地表示C1〜C6烃基，烃基中所含的-CH 2可以被-O-或-CO-代替; m表示0〜6的整数， Z +表示有机阳离子。

6. 发明授权

US09260407B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US09260407B2
公开(公告)日：2016-02-16
申请号：US13295943
申请日：2011-11-14
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , C07D327/02 , C07D327/04 , C07D327/06 , C07D333/46 , C07D335/02 , C07D337/04 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , G03F7/039 , G03F7/38 , G03F7/20
CPC分类号： C07D327/02 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07D327/04 , C07D327/06 , C07D333/46 , C07D335/02 , C07D337/04 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： The present invention provides a salt represented by the formula (I): wherein R1, R2, L1, Y, R3, R4, R5, R6, R7, n, s, and R8 represent variables outlined in the specification.
摘要翻译：本发明提供由式（I）表示的盐：其中R1，R2，L1，Y，R3，R4，R5，R6，R7，n，s和R8表示说明书中概述的变量。

7. 发明授权

US09051405B2 Resin and resist composition 有权
标题翻译：树脂和抗蚀剂组成
公开(公告)号：US09051405B2
公开(公告)日：2015-06-09
申请号：US12821008
申请日：2010-06-22
申请人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
发明人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
IPC分类号： G03F7/039 , C08F224/00 , C08F220/10 , C08F228/06 , G03F7/004 , C08F220/28 , C08F226/06
CPC分类号： C08F224/00 , C08F220/10 , C08F220/18 , C08F220/28 , C08F222/14 , C08F226/06 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined, in the specification.
摘要翻译：在本说明书中，含有由式（aa）表示的化合物衍生的结构单元的树脂，其中T，R1和Z1定义。

8. 发明授权

US09051247B2 Salt, photoresist composition, and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US09051247B2
公开(公告)日：2015-06-09
申请号：US13443175
申请日：2012-04-10
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D327/08 , C07C309/17 , C07D333/46 , C07C381/12 , C07C25/18 , C08F220/28 , C08F220/38 , G03F7/039 , G03F7/20
CPC分类号： C07C309/12 , C07C25/18 , C07C303/32 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D327/08 , C07D333/46 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y02P20/55
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.
摘要翻译：由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，n表示0或1，L1表示单键或C1-C10烷二基，其中亚甲基可以被氧原子或羰基取代，条件是当n为0时，L1不是单键，环W表示可以被氧原子替代亚甲基的C 3 -C 36脂族环，硫原子，羰基或磺酰基，其中氢原子可以被羟基，C 1 -C 12烷基或C 1 -C 12烷氧基取代，R 1表示羟基或被保护基保护的羟基， Z +表示有机阳离子。

9. 发明授权

US08951709B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08951709B2
公开(公告)日：2015-02-10
申请号：US13280969
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/00 , G03F7/20 , G03F7/004 , G03F7/039
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

10. 发明授权

US08921029B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08921029B2
公开(公告)日：2014-12-30
申请号：US13551807
申请日：2012-07-18
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07D333/46 , C07D335/02 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07D333/46 , C07D335/02 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，R2，RII1，RII2，LII1，YII1，RII3，RII4，RII5，RII6，RII7，n，s和RII8 在规范中定义。

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