会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • RESIN COMPOSITION
    • 树脂组合物
    • WO1994019410A1
    • 1994-09-01
    • PCT/JP1994000232
    • 1994-02-16
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.KAWAKI, TakaoAMAGAI, Akikazu Corporate Research Laboratory of Mitsubishi Gas Chemical Company, Inc.YAMADA, ToshiakiHARADA, HidefumiBAN, HajimeTAKEDA, YujiYAMAMOTO, Koji
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.
    • C08L79/08
    • C08L67/02C08L79/08C08L81/02C08L2666/14C08L81/00C08L83/00C08L2666/18
    • A resin composition which is well balanced among moldability, heat-resistance and mechanical strength and comprises an aromatic polyamideimide resin (A) and a polyester resin (B), a polyphenylene sulfide resin (C) or a resin (D) capable of forming an anisotropic molten phase. The resin component (A) is composed of 5-95 mol % of repeating units represented by general formula (1) and 95-5 mol % of at least either repeating units represented by general formula (2) or ones represented by general formula (3), and is produced by the process which comprises polymerizing an aromatic tricarboxylic acid anhydride, at least either aromatic or aliphatic dicarboxylic acid, and an isocyanate compound in two or more steps, wherein the reaction in the first step is conducted in the temperature range of 50-110 DEG C and those in the second and subsequent steps are conducted in the temperature range of over 110 DEG C to 200 DEG C. In said formulae Ar represents a trivalent aromatic group, Ar1 represents a divalent aromatic group, R1 represents a divalent aliphatic group, and R represents a divalent aromatic or aliphatic group.
    • 一种在成型性,耐热性和机械强度之间良好平衡的树脂组合物,其包含芳族聚酰胺酰亚胺树脂(A)和聚酯树脂(B),聚苯硫醚树脂(C)或能够形成 各向异性熔融相。 树脂组分(A)由5-95mol%的由通式(1)表示的重复单元和95-5mol%的至少一个由通式(2)表示的重复单元或由通式(2)表示的重复单元 3),并且通过包括使芳族三羧酸酐,至少一种芳族或脂族二羧酸和异氰酸酯化合物以两个或更多个步骤聚合的方法制备,其中第一步中的反应在温度范围内进行 为50-110℃,第二步和后续步骤中的步骤在110℃至200℃的温度范围内进行。在所述式中Ar表示三价芳族基团,Ar 1表示二价芳基,R 1表示 二价脂族基团,R表示二价芳香族或脂肪族基团。
    • 8. 发明申请
    • POLYCYCLIC COMPOUNDS
    • WO2020080558A1
    • 2020-04-23
    • PCT/JP2019/042232
    • 2019-10-18
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.
    • SHIRATAKE, MunenoriISHIHARA, KentaroHIROSE, KojiIKEDA, ShinyaKATO, NoriyukiKONDO, MitsuteruSUZUKI, ShokoOSHIMA, KensukeSTOLZ, Florian
    • C07C39/23C08G64/04
    • The present invention relates to compounds of the formula (I), which are suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices: where A 1 , A 2 are selected from mono- or bicyclic aromatic radicals and mono- or bicyclic heteroaromatic radicals, X represents e.g. a single bond, O, NH, CR 6 R 7 , Y is e.g. absent or represents a single bond, O, NH, CR 8 R 9 ; R 1 , R 2 are hydrogen, a radical Ar'or a radical R a ; R 3 is Aik, O-Alk'-, 0-Alk'-[0-Alk'] 0 , 0-CH 2 -Ar-C(0)-, 0-C(0)-Ar-C(0)- or O-Alk-C(O)-, where in the last five moieties the left O is bound to A 1 and A 2 , respectively, m, n are 0, 1 or 2; o is an integer from 1 to 10; R 4 , R 5 are e.g. selected from CN and a radical R a ; R 6 , R 8 are e.g. selected from hydrogen, a radical Ar' and a radical R a ; R 7 , R 9 are e.g. selected from hydrogen, C 1 -C 4 -alkyl and a radical Ar'; R a is selected from the group consisting of C≡C-R 11 and Ar-C≡C- R 11 ; R 11 is e.g. selected from hydrogen, methyl, mono- or polycyclic aryl having from 6 to 26 carbon atoms and mono- or polycyclic hetaryl having a total of 5 to 26 atoms, which are ring members, where 1, 2, 3 or 4 of the ring atoms of hetaryl are selected from nitrogen, sulphur and oxygen, while the remainder of these atoms are carbon atoms, where mono- or polycyclic aryl are unsubstituted or substituted; and Ar is e.g. phenylene or naphthylene. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I) and to optical devices made of such resins.