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1. 发明授权

US09239516B2 Method of manufacturing reflective extreme ultraviolet mask 有权
标题翻译：制造反射性极紫外线掩膜的方法
公开(公告)号：US09239516B2
公开(公告)日：2016-01-19
申请号：US14630825
申请日：2015-02-25
申请人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24 , G03F1/38 , G03F1/80
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光光散射部分和在反射层上的吸收层图案，吸收层图案具有与第一开口光连通的第二开口。

2. 发明申请

US20150160550A1 PHOTOMASK, METHOD OF CORRECTING ERROR THEREOF, INTEGRATED CIRCUIT DEVICE MANUFACTURED BY USING THE PHOTOMASK, AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT DEVICE 有权
标题翻译：照相机，校正其错误的方法，使用光电产生的集成电路装置以及制造集成电路装置的方法
公开(公告)号：US20150160550A1
公开(公告)日：2015-06-11
申请号：US14565087
申请日：2014-12-09
申请人： Sang-hyun KIM , Seong-sue KIM , Dong-gun LEE
发明人： Sang-hyun KIM , Seong-sue KIM , Dong-gun LEE
IPC分类号： G03F1/72 , G03F1/74 , G03F7/40 , G03F1/52 , G03F1/38
CPC分类号： G03F1/24 , G03F1/38 , G03F1/72 , G03F1/74
摘要： Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
摘要翻译：提供一种光掩模和一种校正其错误的方法。光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。该方法包括根据检测到的光掩模误差确定光掩模的前表面上的局部校正位置，并将能量束局部地施加到与沿局部校正位置的局部校正位置对准的光掩模的背侧表面区域光掩模本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。

3. 发明授权

US09025624B2 Beam generator 有权
标题翻译：梁发电机
公开(公告)号：US09025624B2
公开(公告)日：2015-05-05
申请号：US13545733
申请日：2012-07-10
申请人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo
发明人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo
IPC分类号： H01S3/30 , H01S3/02 , G03F7/20 , G03F1/84
CPC分类号： G03F7/70025 , G03F1/84 , G03F7/70575
摘要： A beam generator for an aerial image generating apparatus includes a laser source for emitting a laser beam and a short wavelength beam source for generating a short wavelength beam by processing the laser beam such that the short wavelength beam is coherent with and has a wavelength shorter than that of the laser beam. A spectral unit includes a quartz plate and a spectral layer coated on a surface of the quartz plate. The spectral layer has a Brewster's angle greater than 70° with respect to the laser beam such that the short wavelength beam is reflected from the spectral unit without the laser beam, increasing the reflectivity of the shortwave beam while decreasing the reflectivity and absorptivity of the laser beam in the spectral unit.
摘要翻译：用于空间图像生成装置的光束发生器包括用于发射激光束的激光源和用于通过处理激光束来产生短波长光束的短波长光束源，使得短波长光束相干并具有比波长短的波长激光束的。光谱单元包括石英板和涂覆在石英板的表面上的光谱层。光谱层相对于激光束具有大于70°的布鲁斯特角，使得短波长光束不受激光束从光谱单元反射，增加了短波束的反射率，同时降低了激光的反射率和吸收率光束在光谱单位。

4. 发明授权

US08968969B2 Reflective extreme ultraviolet mask and method of manufacturing the same 有权
标题翻译：反射极紫外线掩膜及其制造方法
公开(公告)号：US08968969B2
公开(公告)日：2015-03-03
申请号：US13302143
申请日：2011-11-22
申请人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun Kim , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24 , G03F1/38
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光光散射部分和在反射层上的吸收层图案，吸收层图案具有与第一开口光连通的第二开口。

5. 发明申请

US20130161543A1 ZONEPLATE AND MASK PATTERN MEASURING DEVICE COMPRISING THE ZONEPLATE 审中-公开
标题翻译：包含ZONEPLATE的分区和掩模图形测量装置
公开(公告)号：US20130161543A1
公开(公告)日：2013-06-27
申请号：US13585978
申请日：2012-08-15
申请人： Jong-Ju PARK , Dong-Gun LEE , Seong-Sue KIM , Chang-Hoon CHOI
发明人： Jong-Ju PARK , Dong-Gun LEE , Seong-Sue KIM , Chang-Hoon CHOI
IPC分类号： H01L31/0232 , G02B27/44
CPC分类号： G02B5/1876 , G02B5/1857
摘要： A zoneplate includes a first pattern having a first thickness, the first pattern including a first material, and a second pattern adjacent to the first pattern and having a second thickness larger than the first thickness, the second pattern including a second material, incident light incident on the first pattern from the outside passing through the first pattern, and incident light incident on the second pattern from the outside passing through the second pattern.
摘要翻译：附属区域包括具有第一厚度的第一图案，第一图案包括第一材料和与第一图案相邻的第二图案，并且具有大于第一厚度的第二厚度，第二图案包括第二材料，入射光入射从外部通过第一图案的第一图案和从通过第二图案的外部入射在第二图案上的入射光。

6. 发明申请

US20120135339A1 REFLECTIVE EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：反射极限超紫外线掩模及其制造方法
公开(公告)号：US20120135339A1
公开(公告)日：2012-05-31
申请号：US13302143
申请日：2011-11-22
申请人： Tae-Geun KIM , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
发明人： Tae-Geun KIM , Dong-Wan Kim , Dong-Gun Lee , Seong-Sue Kim
IPC分类号： G03F1/24
CPC分类号： G03F1/24 , G03F1/38 , G03F1/80
摘要： A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in fluid communication with the first opening.
摘要翻译：反射性极紫外线掩模包括具有曝光区域和周边区域的掩模基板，所述掩模基板在所述周边区域中包括光散射部分，所述掩模基板的上表面上的反射层，所述反射层具有第一打开曝光所述光散射部分，以及在所述反射层上具有吸收层图案，所述吸收层图案具有与所述第一开口流体连通的第二开口。

7. 发明申请

US20120008123A1 METHOD OF MEASURING AERIAL IMAGE OF EUV MASK 有权
标题翻译：测量EUV掩蔽的空气影像的方法
公开(公告)号：US20120008123A1
公开(公告)日：2012-01-12
申请号：US13238748
申请日：2011-09-21
申请人： Dong-gun LEE , Seong-sue KIM
发明人： Dong-gun LEE , Seong-sue KIM
IPC分类号： G03B27/52
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/84 , G21K2201/061
摘要： An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.
摘要翻译：一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA，＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

8. 发明授权

US07971920B2 Walk-in memory apparatus for automobile seat 有权
标题翻译：汽车座椅入座记忆装置
公开(公告)号：US07971920B2
公开(公告)日：2011-07-05
申请号：US12345495
申请日：2008-12-29
申请人： Jae Yong Jang , Jong Moon Yoo , Byung Jae Lee , Sang Man Seo , Eun Sue Kim
发明人： Jae Yong Jang , Jong Moon Yoo , Byung Jae Lee , Sang Man Seo , Eun Sue Kim
IPC分类号： B60N2/07 , B60N2/12
CPC分类号： B60N2/123
摘要： A walk-in memory apparatus for an automobile seat locks the seat on a body only after the seat moves past a preset reference point when the seat, moved forwards with a seat back folded up by a seat walk-in apparatus, moves backwards with the seat back unfolded. The walk-in memory apparatus causes the entire seat to move forwards along tracks in an unlocked state when the seat back is folded up. The seat includes a track memory unit which, when the seat moves backwards with the seat back unfolded, causes the seat to be unlocked from the track when the stopper bracket is located ahead of a reference stopper and to be locked on the track when the stopper bracket is located behind the reference stopper.
摘要翻译：用于汽车座椅的步行存储装置仅在座椅移动经过预设参考点之后将座椅锁定在座椅上，当座椅向前移动时，座椅靠背向后折叠的座椅向后移动，座椅靠背展开。当座椅靠背折叠时，步入式存储装置使得整个座椅沿着解锁状态的轨道向前移动。该座椅包括轨道记录单元，当座椅向后移动时座椅靠背展开时，当挡块支架位于基准限位器前方时，使座椅从轨道上解锁，并且当塞子支架位于参考挡块后面。

9. 发明授权

US07388824B2 Method of and apparatus for recording data on optical recording medium 有权
公开(公告)号：US07388824B2
公开(公告)日：2008-06-17
申请号：US10806320
申请日：2004-03-23
申请人： Yong-jin Ahn , In-sik Park , Kyung-geun Lee , Chang-jin Yang , Tatsuhiro Otsuka , Du-seop Yoon , Seong-sue Kim
发明人： Yong-jin Ahn , In-sik Park , Kyung-geun Lee , Chang-jin Yang , Tatsuhiro Otsuka , Du-seop Yoon , Seong-sue Kim
IPC分类号： G11B7/00
CPC分类号： G11B7/126 , G11B7/0045 , G11B7/00454 , G11B7/00456 , G11B7/0062 , G11B2007/0006
摘要： A method of and apparatus for recording data on an optical recording medium form a mark or a space by using a recording waveform having an erase pattern containing a multi-pulse. The method and the apparatus prevent distortion of the mark or the space and improve a mark shape such that a recording/reproducing characteristic of the optical recording medium is improved.

10. 发明授权

US07349306B2 Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor 有权
公开(公告)号：US07349306B2
公开(公告)日：2008-03-25
申请号：US10992700
申请日：2004-11-22
申请人： Kyung-geun Lee , Yong-jin Ahn , In-sik Park , Seong-sue Kim , Du-seop Yoon
发明人： Kyung-geun Lee , Yong-jin Ahn , In-sik Park , Seong-sue Kim , Du-seop Yoon
IPC分类号： G11B7/00
CPC分类号： G11B7/0062 , G11B7/00736 , G11B20/10 , G11B20/10009
摘要： An optical recording medium allowing data to be recorded on, erased from, and reproduced from, and storing information about power levels of an erase pulse. The recorded erase pattern information may include information about power levels of first and last pulses of an erase pattern for erasing data. The first and last pulses of the erase pattern can be differently set depending on the differing kind of recording layer or layers of a disk or differing kinds of disks and recorded in a reproducible only area or rewritable area of the optical recording medium. Thus, by presetting the appropriate erase power levels, the time required for selecting an optimal erase power for the optical recording medium can be considerably reduced.

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