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1. 发明专利

JPH03235412A DEVELOPING METHOD FOR PRINTED BOARD 失效
公开(公告)号：JPH03235412A
公开(公告)日：1991-10-21
申请号：JP3104490
申请日：1990-02-09
申请人： FUJITSU LTD
发明人： FUJITA YUKIO
IPC分类号： G03F7/30 , H03K3/06
摘要： PURPOSE:To remove developing unevenness, and simultaneously, to shorten developing time by rotating a board in a developer, and moving every part of the board close by an ultrasonic wave oscillator to ultrasonic-vibrate the developer. CONSTITUTION:While the developer 6 is ultrasonic-vibrated by the ultrasonic wave oscillator 7 as swinging the board 1 immersed in the developer (pure water) 6 up and down and right and left, the board 1 held by a jig 5 is rotated, and the part of the board 1 positioned far away from the ultrasonic wave oscillator 7 is moved by turns to the vicinity of the ultrasonic wave oscillator 7. Thus, every part of the printed board 1 brought into contact uniformly with the developer 6 ultrasonic-vibrated by strong energy at the vicinity of the ultrasonic wave oscillator 7.

2. 发明专利

JPS5829298B2 失效
公开(公告)号：JPS5829298B2
公开(公告)日：1983-06-22
申请号：JP15720980
申请日：1980-11-07
申请人： KOGYO GIJUTSUIN
发明人： YABE AKIRA
IPC分类号： C07C247/12 , C07C67/00 , C07C241/00 , C07C247/18 , G03C1/52 , G03F7/008 , H01L21/027 , H01L21/30 , H01L21/302 , H03K3/06

3. 发明专利

JPS5780356A Photosensitive compound 失效
标题翻译：光敏化合物
公开(公告)号：JPS5780356A
公开(公告)日：1982-05-19
申请号：JP15720980
申请日：1980-11-07
申请人： Agency Of Ind Science & Technol
发明人： YABE AKIRA
IPC分类号： C07C247/12 , C07C67/00 , C07C241/00 , C07C247/18 , G03C1/52 , G03F7/008 , H01L21/027 , H01L21/30 , H01L21/302 , H03K3/06
摘要： NEW MATERIAL:A photosensitive compound of formula I.
USE: A component of phtotosensitive resins: the spectral sensitivity is especically high in the range of 300W400nm. The combination thereof with a sensitizer enables the sensitization in more long-wave zones, i.e., over a wide range in the visible zone.
PREPARATION: The condensation reaction of a compound of formula II with a double amount of a compound of formula III or its derivative gives the compound of formula I. The compound of formula I is contained in a solution of a high-polymer compound such as natural rubber soluble in a solvent, modified rubber such as cyclic rubber, synthetic rubber such as styrene-butadiene rubber by a small amount, e.g., 0.1W10wt% and used as a photosensitive resin. The solution is coated on a base plate, irradiated with light according to the objective image and developed with a solvent. The parts exposed to light are insolublized to form the image. The raw materials are readily available, inexpensive and the compound of formula I is easily produced in high yield.
COPYRIGHT: (C)1982,JPO&Japio
摘要翻译：新材料：式I的光敏化合物。用途：感光树脂的组分：光谱灵敏度在300-400nm的范围内特别高。与敏化剂的组合使得能够在更长的波长区域，即在可见光区域的宽范围内进行增感。制备：式II化合物与双重量的式III化合物或其衍生物的缩合反应得到式I化合物。式I化合物包含在高分子化合物如天然可溶于溶剂的橡胶，环状橡胶等改性橡胶，苯乙烯 - 丁二烯橡胶等合成橡胶，少量例如0.1-10重量％，用作感光性树脂。将溶液涂布在基板上，根据目标图像用光照射并用溶剂显影。暴露于光的部分被不公开以形成图像。原料容易获得，价格便宜，并且易于以高产率生产式I化合物。

4. 实用新型

JPS6239321U 失效
公开(公告)号：JPS6239321U
公开(公告)日：1987-03-09
申请号：JP13066785
申请日：1985-08-26
IPC分类号： H03B5/32 , H03B5/36 , H03K3/06

5. 实用新型

JPS578268Y2 JPS578268Y2 - 失效
公开(公告)号：JPS578268Y2
公开(公告)日：1982-02-17
申请号：JP13671173
申请日：1973-11-27
IPC分类号： H03K3/282 , H03K3/06 , H03K17/08 , H03K17/60

6. 发明专利

JPS5240053A DEMODULATOR 失效
公开(公告)号：JPS5240053A
公开(公告)日：1977-03-28
申请号：JP11586375
申请日：1975-09-25
申请人： AIWA CO
发明人： ADACHI TADASHI
IPC分类号： H03D3/06 , H03D3/14 , H03D3/22 , H03K3/06
摘要： PURPOSE:To obtain an easy-to-adjust demudulator, which features good distortion rate, high S/N properties and simple structure as well as utilizes the product of the frequenby modulated wave which passes through the delay circuit and that which did not pass through the delay circuit.

7. 发明专利

JPS59226346A FORMATION OF PHOTORESIST 失效
公开(公告)号：JPS59226346A
公开(公告)日：1984-12-19
申请号：JP10132983
申请日：1983-06-07
申请人： FUOTOPORI OUKA KK
发明人： AOYAMA TOSHIMI , TOUDA HIROYUKI , KATOU KAZUO , NAKANE HISASHI
IPC分类号： G03F7/11 , G03F7/09 , G03F7/095 , G03F7/30 , H03K3/06 , H05K3/06 , G03C5/00 , G03F7/00
摘要： PURPOSE:To acquire superior resolution and image reproducibility by laminating a pattern forming photosensitive resin layer directly on a printed board having a surface protective layer contg. a halation inhibitor without removing said layer, and decveloping said photosensitive resin layer. CONSTITUTION:Surface protective layers 3.3 are formed with a photosensitive resin contg. a halation inhibitor on both sides of a printed board 1, and pattern- forming photosensitive resin layers 5.5 are formed directly on the layers 3.3 without removing them. The obtained resist is patternwise exposed and processed with a developing soln. capable of dissolving both exposed parts or unexposed parts of the layers 3.3 and 5.5 at the same time. Trouble of removing the layers 3.3 can be saved by inserting interlayers between the board 1 and the layers 5.5, and disconnection and deformation of pattern images to be formed caused by fine roughness and damages present on the surfaces of the board 1 can be prevented and exact etching can be executed, thus permitting manufacture of products with high yield.

8. 发明专利

JPS5212020B2 失效
公开(公告)号：JPS5212020B2
公开(公告)日：1977-04-04
申请号：JP6930472
申请日：1972-07-10
IPC分类号： H03K3/284 , H03K3/06 , H03K4/02 , H03K5/00 , H03K5/159

9. 发明专利

JPS4928256A 失效
公开(公告)号：JPS4928256A
公开(公告)日：1974-03-13
申请号：JP6930472
申请日：1972-07-10
IPC分类号： H03K3/284 , H03K3/06 , H03K4/02 , H03K5/00 , H03K5/159

10. 发明专利

JPH0374382B2 失效
公开(公告)号：JPH0374382B2
公开(公告)日：1991-11-26
申请号：JP10132983
申请日：1983-06-07
IPC分类号： G03F7/11 , G03F7/09 , G03F7/095 , G03F7/30 , H03K3/06 , H05K3/06

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