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    • 93. 发明授权
    • Recording/reproduction device and method
    • 记录/再现设备和方法
    • US07711249B2
    • 2010-05-04
    • US10533585
    • 2003-11-10
    • Kojiro KawasakiHiroyuki KondoMasahiro Horie
    • Kojiro KawasakiHiroyuki KondoMasahiro Horie
    • H04N5/91
    • H04N9/8042G11B20/00086G11B20/00159G11B2020/10537H04H60/27H04H60/47
    • When a digital broadcast is decoded and then re-encoded and digitally recorded, detailed program information contained in the original digital broadcast and information such as age-based viewer control information or parental control information may be lost. This problem is solved by providing a digital tuner to demodulate the digital broadcast signal and output the MPEG-TS, a demultiplexer to demultiplex the MPEG-TS into the component packet streams, an AV decoder to decode the demultiplexed AV data packets, and an AV encoder to re-encode the demultiplexed AV data packets into AV data packets for recording. A control microprocessor reads, reconstructs, and sends the PSI or SI packets demultiplexed by the demultiplexer to save the viewer control information to the system multiplexer. The system multiplexer multiplexes the PSI or SI packets with the re-encoded AV data packets, and the multiplexed stream is then written to the recording medium.
    • 当数字广播被解码然后被重新编码和数字记录时,包含在原始数字广播中的详细节目信息和诸如基于年龄的观众控制信息或家长控制信息之类的信息可能会丢失。 通过提供数字调谐器来解调数字广播信号并输出​​MPEG-TS,解复用器将MPEG-TS解复用到分量分组流中,解码数字调谐器以解码解复用的AV数据分组的AV解码器和AV 编码器将解复用的AV数据分组重新编码为用于记录的AV数据分组。 控制微处理器读取,重建并发送由解复用器解复用的PSI或SI分组,以将观众控制信息保存到系统多路复用器。 系统复用器将PSI或SI分组与重新编码的AV数据分组复用,然后将多路复用流写入记录介质。
    • 94. 发明授权
    • Exposure apparatus and exposure method
    • 曝光装置和曝光方法
    • US07580110B2
    • 2009-08-25
    • US12007096
    • 2008-01-07
    • Hiroyuki KondoTakashi Miyachi
    • Hiroyuki KondoTakashi Miyachi
    • H01L21/27G03B27/54G03B27/27
    • H05G2/001B82Y10/00G03F7/70033G03F7/70041G03F7/70725
    • An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light.In particular, a light emitting source generates pulsed light by producing plasma from an intermittently supplied target material. A reticle stage holds a reticle that is irradiated by the pulsed light. A photosensitive substrate stage holds a photosensitive substrate irradiated by the pulsed light patterned by the reticle. A control means controls the photosensitive substrate stage so that, before exposing the photosensitive substrate begins, the timing between an exposure starting point or an exposure ending point and the light emission timing are matched based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.
    • 从目标材料产生等离子体的曝光装置和曝光方法产生脉冲光,并用脉冲光进行曝光。 特别地,发光源通过从间歇供给的目标材料产生等离子体而产生脉冲光。 刻线台保持用脉冲光照射的掩模版。 感光基板台保持由被掩模版图案化的脉冲光照射的光敏基片。 控制装置控制感光基底台,使得在曝光感光基片开始之前,基于感光基底载物台和光的驱动时间匹配曝光开始点或曝光结束点之间的定时和发光定时 脉冲光的发射定时。
    • 95. 发明申请
    • Exposure apparatus and exposure method
    • 曝光装置和曝光方法
    • US20080116396A1
    • 2008-05-22
    • US12007096
    • 2008-01-07
    • Hiroyuki KondoTakashi Miyachi
    • Hiroyuki KondoTakashi Miyachi
    • G21K5/00
    • H05G2/001B82Y10/00G03F7/70033G03F7/70041G03F7/70725
    • An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting source generates pulsed light by producing plasma from an intermittently supplied target material. A reticle stage holds a reticle that is irradiated by the pulsed light. A photosensitive substrate stage holds a photosensitive substrate irradiated by the pulsed light patterned by the reticle. A control means controls the photosensitive substrate stage so that, before exposing the photosensitive substrate begins, the timing between an exposure starting point or an exposure ending point and the light emission timing are matched based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.
    • 从目标材料产生等离子体的曝光装置和曝光方法产生脉冲光,并用脉冲光进行曝光。 特别地,发光源通过从间歇供给的目标材料产生等离子体而产生脉冲光。 刻线台保持用脉冲光照射的掩模版。 感光基板台保持由被掩模版图案化的脉冲光照射的光敏基片。 控制装置控制感光基底台,使得在曝光感光基片开始之前,基于感光基底载物台和光的驱动时间匹配曝光开始点或曝光结束点之间的定时和发光定时 脉冲光的发射定时。