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91. 发明授权

US10290464B2 Charged particle beam device and pattern measurement device 有权
公开(公告)号：US10290464B2
公开(公告)日：2019-05-14
申请号：US15759408
申请日：2016-08-15
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki Yokosuka , Chahn Lee , Hideyuki Kazumi , Manabu Hasegawa
IPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , G01N23/22 , G03F7/20 , G01B15/00 , G01B15/04 , G01N23/2251
摘要： The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.

92. 发明授权

US10269534B2 Mask position adjustment method of ion milling, electron microscope capable of adjusting mask position, mask adjustment device mounted on sample stage and sample mask component of ion milling device 有权
公开(公告)号：US10269534B2
公开(公告)日：2019-04-23
申请号：US15547315
申请日：2015-01-30
申请人： Hitachi High-Technologies Corporation
发明人： Toru Iwaya , Hisayuki Takasu , Sakae Koubori , Atsushi Kamino , Kento Horinouchi
IPC分类号： H01J37/20 , H01J37/26 , H01J37/31 , H01J37/305
摘要： The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.

93. 发明授权

US10267817B2 Automatic analysis apparatus 有权
公开(公告)号：US10267817B2
公开(公告)日：2019-04-23
申请号：US15326820
申请日：2015-06-10
申请人： Hitachi High-Technologies Corporation
发明人： Tatsuya Sakai , Akihisa Makino , Minoru Sano , Chie Yabutani
IPC分类号： G01N35/02 , G01N35/00 , G01N35/10 , G01N33/86 , G01N35/04
摘要： Provided is an automatic analysis apparatus for inspecting blood coagulation, which is capable of miniaturizing device configuration and reducing device costs. The automatic analysis apparatus includes: a reaction container in which a specimen and a reagent are mixed with each other and the mixed solution is reacted; a sample dispensing mechanism which dispenses the specimen into the reaction container; a blood coagulation time measuring unit in which the reaction container is mounted to measure a coagulation time of the mixed solution within the reaction container; a reaction container accommodating unit which accommodates a plurality of reaction containers provided to the blood coagulation measuring unit; a reaction container transfer mechanism which grasps the reaction container and transfers the reaction container to the blood coagulation measuring unit; and a control unit which controls the reaction container transfer mechanism.

94. 发明授权

US10267745B2 Defect detection method and defect detection device and defect observation device provided with same 有权
公开(公告)号：US10267745B2
公开(公告)日：2019-04-23
申请号：US15673582
申请日：2017-08-10
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/21 , G01N21/95 , G01N21/47 , G01N21/94 , G01N21/956
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

95. 外观设计

USD846140S1 Clinical analyzer 有权
公开(公告)号：USD846140S1
公开(公告)日：2019-04-16
申请号：US29627778
申请日：2017-11-29
申请人： Hitachi High-Technologies Corporation
设计人： Ai Masuda , Hiroyuki Noda , Mitsuru Oonuma , Tetsuji Kawahara , Yuichi Koiso
摘要： This application contains subject matter related to the following co-pending U.S. design patent applications:
Application Ser. No. 29/627,767, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,777, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,780, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,764, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,774, filed herewith and entitled “Clinical Analyzer with Graphical User Interface”; and
Application Ser. No. 29/627,781, filed herewith and entitled “Clinical Analyzer with Graphical User Interface”.
FIG. 1 is a front, top and right side perspective view of a clinical analyzer according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a rear elevational view thereof;
FIG. 8 is enlarged cross-sectional view taken in the direction of line 8-8 of FIG. 2;
FIG. 9 is an enlarged cross-sectional view taken in the direction of line 9-9 of FIG. 2;
FIG. 10 is an enlarged cross-sectional view taken in the direction of line 10-10 of FIG. 2;
FIG. 11 is an enlarged cross-sectional view taken in the direction of line 11-11 of FIG. 2; and,
FIG. 12 is a front, top and right side perspective view thereof shown in an opened position.
The broken lines illustrate portions of the clinical analyzer that form no part of the claimed design.

96. 外观设计

USD846139S1 Clinical Analyzer 有权
公开(公告)号：USD846139S1
公开(公告)日：2019-04-16
申请号：US29627777
申请日：2017-11-29
申请人： Hitachi High-Technologies Corporation
设计人： Ai Masuda , Hiroyuki Noda , Mitsuru Oonuma , Tetsuji Kawahara , Yuichi Koiso
摘要： This application contains subject matter related to the following co-pending U.S. design patent applications:
Application Ser. No. 29/627,767, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,778, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,780, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,764, filed herewith and entitled “Clinical Analyzer”;
Application Ser. No. 29/627,774, filed herewith and entitled “Clinical Analyzer with Graphical User Interface”; and
Application Ser. No. 29/627,781, filed herewith and entitled “Clinical Analyzer with Graphical User Interface”.
FIG. 1 is a front, top and right side perspective view of a clinical analyzer according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a rear elevational view thereof;
FIG. 8 is an enlarged cross-sectional view taken in the direction of line 8-8 of FIG. 2;
FIG. 9 is an enlarged cross-sectional view taken in the direction of line 9-9 of FIG. 2; and,
FIG. 10 is a front, top and right side perspective view thereof shown in an opened position.
The broken lines illustrate portions of the clinical analyzer that form no part of the claimed design.

97. 发明授权

US10262835B2 Plasma processing equipment and plasma generation equipment 有权
公开(公告)号：US10262835B2
公开(公告)日：2019-04-16
申请号：US15392060
申请日：2016-12-28
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Ryoji Nishio
IPC分类号： H01J37/32
摘要： A plasma processing equipment includes a vacuum processing chamber, an insulating material, a gas inlet, a high frequency induction antenna provided at an upper outside of the vacuum processing chamber, a magnetic field coil, a yoke for controlling distribution of a magnetic field in the vacuum processing chamber, a high frequency power supply for generating plasma and supplying a high frequency current to the antenna, and a power supply for supplying power to the magnetic field coil. The antenna is divided into n high frequency induction antenna elements are arranged in tandem on one circle so that a high frequency current delayed sequentially by λ (wavelength of high frequency power supply)/n flows clockwise through the antenna elements arranged in tandem via a delay unit, and a magnetic field is applied from the magnetic field coil to generate electron cyclotron resonance (ECR) phenomenon.

98. 发明授权

US10254235B2 Defect inspecting method and defect inspecting apparatus 有权
公开(公告)号：US10254235B2
公开(公告)日：2019-04-09
申请号：US15806937
申请日：2017-11-08
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , H01L21/66
摘要： A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.

99. 发明授权

US10249474B2 Charged particle beam device 有权
公开(公告)号：US10249474B2
公开(公告)日：2019-04-02
申请号：US15618203
申请日：2017-06-09
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki Yokosuka , Chahn Lee , Hideyuki Kazumi , Hajime Kawano , Shahedul Hoque , Kumiko Shimizu , Hiroyuki Takahashi
IPC分类号： H01J37/20 , H01J37/22 , H01J37/28 , H01J37/147
摘要： The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

100. 发明授权

US10243140B2 Manufacturing method of magnetoresistive element and vacuum processing apparatus 有权
公开(公告)号：US10243140B2
公开(公告)日：2019-03-26
申请号：US15251595
申请日：2016-08-30
申请人： Hitachi High-Technologies Corporation
发明人： Makoto Satake , Masaki Yamada , Kenetsu Yokogawa
IPC分类号： H01L43/12 , H01J37/32 , H01L27/22 , H01L43/02 , H01L43/08
摘要： The present invention is a manufacturing method for manufacturing a magnetoresistive element, including a first step for oxidizing or reducing a magnetic film constituting the magnetoresistive element and a metal oxidation film constituting the magnetoresistive element, and a second step performed after the first step, wherein in the second step, in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are oxidized, the oxidized magnetic film constituting the magnetoresistive element or the oxidized metal oxidation film constituting the magnetoresistive element is selectively reduced, and in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are reduced, the reduced magnetic film constituting the magnetoresistive element or the reduced metal oxidation film constituting the magnetoresistive element is selectively oxidized.

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