专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US08390980B2 Electrostatic chuck assembly 有权
标题翻译：静电吸盘组件
公开(公告)号：US08390980B2
公开(公告)日：2013-03-05
申请号：US12539410
申请日：2009-08-11
申请人： Steven V. Sansoni , Cheng-Hsiung Tsai , Shambhu N. Roy , Karl M. Brown , Vijay D. Parkhe , Hari Ponnekanti
发明人： Steven V. Sansoni , Cheng-Hsiung Tsai , Shambhu N. Roy , Karl M. Brown , Vijay D. Parkhe , Hari Ponnekanti
IPC分类号： H02N13/00
CPC分类号： H01L21/6833 , H01J37/32431 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H01L21/68785 , H01L2924/0002 , H02N13/00 , H01L2924/00
摘要： Embodiments of the present invention provide a cost effective electrostatic chuck assembly capable of operating over a wide temperature range in an ultra-high vacuum environment while minimizing thermo-mechanical stresses within the electrostatic chuck assembly. In one embodiment, the electrostatic chuck assembly includes a dielectric body having chucking electrodes which comprise a metal matrix composite material with a coefficient of thermal expansion (CTE) that is matched to the CTE of the dielectric body.
摘要翻译：本发明的实施例提供了一种经济高效的静电卡盘组件，其能够在超高真空环境中在宽的温度范围内运行，同时使静电卡盘组件内的热机械应力最小化。在一个实施例中，静电卡盘组件包括具有夹持电极的介电体，该夹持电极包括与电介质体的CTE匹配的具有热膨胀系数（CTE）的金属基质复合材料。

92. 发明申请

US20100321856A1 METHOD OF PLATEN FABRICATION TO ALLOW ELECTRODE PATTERN AND GAS COOLING OPTIMIZATION 失效
标题翻译：制造电极图案和气体冷却优化的方法
公开(公告)号：US20100321856A1
公开(公告)日：2010-12-23
申请号：US12487075
申请日：2009-06-18
申请人： Scott E. Peitzsch
发明人： Scott E. Peitzsch
IPC分类号： H02N13/00 , B32B3/10
CPC分类号： H02N13/00 , H01L21/6831 , Y10T428/24322
摘要： An electrode pattern and layered assembly is disclosed. This assembly utilizes multiple-piece construction, including at least two electrically conductive layers and at least three electrically insulating layers. By incorporating a second electrically conductive layer, each electrode can be divided into two or more separate portions on the top layer, and joined together using the second conductive layer. Connections between the two conductive layers can be made using any suitable technique, including through-hole vias, conductive rods and the like. The use of a second electrically conductive layer also allows for a different gas distribution strategy. The use of multiple conductive layers allows the use of one or more concentric channels to be used through which the gas can be injected.
摘要翻译：公开了电极图案和分层组件。该组件利用多片构造，包括至少两个导电层和至少三个电绝缘层。通过结合第二导电层，每个电极可以在顶层上分成两个或更多个分开的部分，并且使用第二导电层连接在一起。两个导电层之间的连接可以使用任何合适的技术制造，包括通孔通孔，导电棒等。使用第二导电层还允许不同的气体分布策略。使用多个导电层允许使用一个或多个同心通道，通过该通道可以注入气体。

93. 发明授权

US07813103B2 Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes 有权
标题翻译：从具有分离的RF BIAS和DC夹持电极的静电卡盘的基于时间的晶片去卡夹
公开(公告)号：US07813103B2
公开(公告)日：2010-10-12
申请号：US11974502
申请日：2007-10-11
申请人： Steven C. Shannon , Michael G. Chafin , Dennis S. Grimard
发明人： Steven C. Shannon , Michael G. Chafin , Dennis S. Grimard
IPC分类号： H02N13/00 , H01T23/00
CPC分类号： H02N13/00 , H01J37/32091 , H01J37/32174 , H01L21/6833 , H01L21/68742
摘要： An electrostatic chuck in a reactor chamber has a cathode electrode insulated from ground, a chucking electrode insulated from the cathode electrode and a dielectric layer overlying the chucking electrode that provides a workpiece support surface. A D.C. chucking voltage supply is coupled to the chucking electrode. An RF power generator is coupled to the cathode electrode. A voltage sensing apparatus is coupled to the chucking electrode and to the cathode electrode to monitor the voltage difference between them during discharge after removal of RF and DC power at the conclusion of processing. The reactor includes a controller programmed to raise the lift pins during electrode discharge as soon as the voltage sensing apparatus detects equal voltages simultaneously on the chucking and cathode electrodes.
摘要翻译：反应器室中的静电卡盘具有与地绝缘的阴极电极，与阴极绝缘的夹持电极和覆盖夹持电极的提供工件支撑表面的电介质层。夹紧电压供应装置连接到夹持电极。 RF发生器耦合到阴极电极。电压感测装置耦合到夹持电极和阴极电极，以在处理结束时去除RF和DC电力之后，在放电期间监测它们之间的电压差。电抗器包括一个控制器，其被编程为一旦电压感测装置同时在夹紧和阴极电极上检测相同的电压，就可以在电极放电期间升高升降管脚。

94. 发明授权

US07760484B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07760484B2
公开(公告)日：2010-07-20
申请号：US12217532
申请日：2008-07-07
申请人： Ikuo Itakura , Syouichiro Himuro
发明人： Ikuo Itakura , Syouichiro Himuro
IPC分类号： H02N13/00
CPC分类号： H01L21/6831
摘要： The present invention provides an electrostatic chuck, which has high plasma resistance and high capability of cooling a material to be clamped. As for the basic structure of the electrostatic chuck, an insulating film is formed on a surface of a metal plate by flame spraying, and a dielectric substrate is bonded onto the insulating film by an insulating adhesive layer. The top surface of the dielectric substrate is a surface for mounting a material to be clamped W such as a semiconductor wafer. Electrodes are formed on the lower surface of the dielectric substrate.
摘要翻译：本发明提供一种具有高等离子体电阻和高夹持材料的高能力的静电卡盘。对于静电卡盘的基本结构，通过火焰喷涂在金属板的表面上形成绝缘膜，并且通过绝缘粘合剂层将电介质基板接合到绝缘膜上。电介质基板的上表面是用于安装诸如半导体晶片的被夹持W的材料的表面。在电介质基板的下表面上形成电极。

95. 发明申请

US20100144147A1 SAMPLE HOLDING TOOL, SAMPLE SUCTION DEVICE USING THE SAME AND SAMPLE PROCESSING METHOD USING THE SAME 审中-公开
标题翻译：样品保持工具，使用该样品的样品吸收装置和使用该样品的样品处理方法
公开(公告)号：US20100144147A1
公开(公告)日：2010-06-10
申请号：US11996938
申请日：2006-07-28
申请人： Takeshi Muneishi , Katsuya Okumura
发明人： Takeshi Muneishi , Katsuya Okumura
IPC分类号： H01L21/683 , H02N13/00 , H01L21/30 , B05C13/02 , B23Q3/15 , B23B31/28
CPC分类号： H02N13/00 , H01L21/6838 , H01L21/68735 , Y10T279/23
摘要： A sample holding tool is provided with a base plate, a plurality of convex portions formed on the base plate so as to stick out from the upper face thereof; and at least one holding plate having a plurality of curved face portions corresponding to the convex portions, with a lower face concave portion of each of the curved face portions being made in contact with the tip portion of each of the convex portions, so that a sample is supported on the upper face convex portion of each of the curved face portions; thus, since the sample is supported by the curved face portion of the holding plate, the contact area to the sample is made very small so that it becomes possible to greatly reduce pointed peak portions, scratches and the like at contact portions between the sample and the curved face portions. Consequently, generation of particles due to abrasion of the sample can be reduced and the particles are reduced from intruding into scratches and voids and occasionally readhering to the sample.
摘要翻译：样品保持工具设置有基板，形成在基板上以从其上表面伸出的多个凸部; 以及至少一个保持板，其具有与所述凸部对应的多个曲面部，所述弯曲面部的下表面凹部与所述凸部的前端部抵接，样品被支撑在每个弯曲面部分的上表面凸部上; 因此，由于样品被保持板的曲面部支撑，所以与样品的接触面积变得非常小，从而可以大大减少样品与样品的接触部分的尖峰部分，划痕等。曲面部分。因此，可以减少由于样品的磨损而产生的颗粒，并且使颗粒从侵入划痕和空隙中减少并偶尔重新附着到样品上。

96. 发明授权

US07633738B2 Electrostatic chuck and manufacturing method thereof 有权
标题翻译：静电吸盘及其制造方法
公开(公告)号：US07633738B2
公开(公告)日：2009-12-15
申请号：US11980007
申请日：2007-10-30
申请人： Akiyoshi Hattori
发明人： Akiyoshi Hattori
IPC分类号： H02N13/00 , H01T23/00
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a base, and includes an electrode embedded in the base in parallel to a substrate mounting surface of the base. A terminal loaded into a terminal hole drilled into a back surface of the base toward the electrode is bonded to the electrode having a protruded portion with a substantially conical trapezoidal shape, which is formed on a flat surface on the terminal side of the electrode toward the terminal hole. In the protruded portion, an angle made by the flat surface on the terminal side of the electrode and an inclined surface of the protruded portion is 40° or less, and a distance from the flat surface of the electrode to a terminal-bonding surface of the protruded portion is 0.01 to 0.8 mm.
摘要翻译：静电卡盘包括基座，并且包括平行于基座的基板安装表面嵌入基座中的电极。将装载到基座朝向电极的后表面的端子孔的端子接合到具有大致圆锥形的突出部的电极，该突起形状形成在电极的端子侧的平坦表面上端子孔。在突出部中，由电极的端子侧的平坦面和突出部的倾斜面形成的角度为40°以下，从电极的平面到端子接合面的距离突出部分为0.01〜0.8mm。

97. 发明授权

US07567423B2 Pressure assisted wafer holding apparatus and control method 失效
标题翻译：压力辅助晶片保持装置及控制方法
公开(公告)号：US07567423B2
公开(公告)日：2009-07-28
申请号：US12248105
申请日：2008-10-09
申请人： David J. Bain , Christopher S. Bichard , Keith Hwong-Hon Wong
发明人： David J. Bain , Christopher S. Bichard , Keith Hwong-Hon Wong
IPC分类号： H02N13/00 , H02H1/00
CPC分类号： H01L21/6831
摘要： An electrostatic wafer holding apparatus includes an electrostatic chucking pedestal and a bi-directional backside conduit in fluid communication with a backside of the chucking pedestal. The bi-directional backside conduit is in fluid communication with a backside carrier gas supply line, and is further in fluid communication with a vacuum supply line.
摘要翻译：静电晶片保持装置包括静电吸盘基座和与卡盘座背面流体连通的双向背面导管。双向背面导管与后侧载体气体供应管线流体连通，并且还与真空供应管线流体连通。

98. 发明申请

US20090147434A1 USING MULTIPLE COULOMB ISLANDS TO REDUCE VOLTAGE STRESS 有权
标题翻译：使用多个COULOMB岛降低电压应力
公开(公告)号：US20090147434A1
公开(公告)日：2009-06-11
申请号：US11953011
申请日：2007-12-07
申请人： Thaddeus Gabara
发明人： Thaddeus Gabara
IPC分类号： H02N13/00
CPC分类号： H02N13/00 , H01L2224/48227 , H01L2924/01019 , H01L2924/01079 , H01L2924/1461 , H01L2924/16195 , H01L2924/19041 , H01L2924/30107 , H01L2924/3011 , H01L2924/3025 , H01L2924/00
摘要： A substrate is levitated a first distance over a mother substrate when a first group of Coulomb islands are charged. A second group of Coulomb islands are charged and increase a separation to a second distance. When the magnitude of the potential of all Coulomb islands is decreased, the separation decreases from the second distance to the first distance. All potentials associated with the Coulomb islands have decreased yet the distance of separation equals to the first distance. Increasing the number of Coulomb islands in a substrate can reduce the magnitude of potentials applied to the Coulomb islands thereby reducing the concern of voltage stress.
摘要翻译：当第一组库仑岛被充电时，衬底在母体衬底上悬浮第一距离。第二组库仑群岛被充电，并将间隔增加到第二距离。当所有库仑岛的电位的大小减小时，分离从第二距离减小到第一距离。与库仑岛相关的所有潜力已经下降，而分离距离等于第一距离。增加衬底中的库仑岛的数量可以减小施加到库仑岛的电位的大小，从而减少电压应力的关注。

99. 发明申请

US20090147432A1 FORMING LARGE PLANAR STRUCTURES FROM SUBSTRATES USING EDGE COULOMB FORCES 有权
标题翻译：使用边缘COOLOMB FORCES从基板形成大型平面结构
公开(公告)号：US20090147432A1
公开(公告)日：2009-06-11
申请号：US11953004
申请日：2007-12-07
申请人： Thaddeus Gabara
发明人： Thaddeus Gabara
IPC分类号： H02N13/00
CPC分类号： H02N13/00 , B81C3/002 , H01L23/48 , H01L23/642 , H01L23/645 , H01L24/16 , H01L24/45 , H01L24/48 , H01L24/94 , H01L24/95 , H01L25/0657 , H01L25/18 , H01L25/50 , H01L2223/6677 , H01L2224/13025 , H01L2224/32145 , H01L2224/32225 , H01L2224/451 , H01L2224/48091 , H01L2224/48145 , H01L2224/48227 , H01L2224/73265 , H01L2224/95145 , H01L2225/06506 , H01L2225/0651 , H01L2225/06513 , H01L2225/06541 , H01L2225/06562 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01023 , H01L2924/01029 , H01L2924/01033 , H01L2924/01038 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/10253 , H01L2924/10271 , H01L2924/10329 , H01L2924/14 , H01L2924/1433 , H01L2924/1461 , H01L2924/15311 , H01L2924/16195 , H01L2924/19041 , H01L2924/19042 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/3025 , H01Q9/0407 , H01Q9/14 , H01Q9/16 , H02K2201/18 , H02N1/004 , H02N1/008 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A movable substrate is placed over a bottom substrate where both substrates contain Coulomb islands. The Coulomb islands can be adjusted in charge and are used to develop a force between two opposing Coulomb islands. Information from sensors is applied to a control unit to control the movement of the movable substrate. Coulomb islands are formed in the juxtaposed edges of a first substrate and second substrate, respectively. The islands generate edge Coulomb forces. These edge Coulomb forces can be used to detach, repel, move, attract and reattach the edges of substrates into new configurations. One possibility is to combine a plurality of individual substrates into one large planar substrate.
摘要翻译：可移动基板放置在底部基板上，其中两个基板都包含库仑岛。库仑群岛可以进行调整，用于在两个相对的库仑群岛之间形成一个力量。来自传感器的信息被应用于控制单元以控制可移动基板的移动。库仑岛分别形成在第一基板和第二基板的并列边缘上。岛屿产生边缘库仑力。这些边缘库仑力可用于将基板的边缘分离，排斥，移动，吸引和重新附着到新的配置中。一种可能性是将多个单独的基板组合成一个大的平面基板。

100. 发明申请

US20090147431A1 ASSEMBLING STACKED SUBSTRATES THAT CAN FORM CYLINDRICAL INDUCTORS AND ADJUSTABLE TRANSFORMERS 失效
标题翻译：组装可形成圆柱形电感器和可调整变压器的堆叠基板
公开(公告)号：US20090147431A1
公开(公告)日：2009-06-11
申请号：US11953002
申请日：2007-12-07
申请人： Thaddeus Gabara
发明人： Thaddeus Gabara
IPC分类号： H02N13/00
CPC分类号： B01L3/502707 , B01L3/502715 , B01L2200/028 , B01L2200/10 , B01L2200/143 , B01L2300/0816 , B01L2300/0861 , B81C3/004 , B81C2203/051 , G01P15/125 , G01P15/18 , H01L23/06 , H01L24/48 , H01L24/73 , H01L24/95 , H01L25/18 , H01L25/50 , H01L2224/13021 , H01L2224/16235 , H01L2224/32145 , H01L2224/32225 , H01L2224/451 , H01L2224/48145 , H01L2224/48227 , H01L2224/73265 , H01L2224/83121 , H01L2224/95092 , H01L2224/95145 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01019 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01038 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/10253 , H01L2924/10329 , H01L2924/14 , H01L2924/1433 , H01L2924/1461 , H01L2924/15311 , H01L2924/16195 , H01L2924/19041 , H01L2924/19042 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/3025 , H01Q9/0407 , H01Q9/14 , H01Q9/16 , H01S5/183 , H01S5/4025 , Y10T29/49126 , H01L2924/00 , H01L2224/45099 , H01L2924/00012
摘要： A system is described that can assemble substrates over one another to form a stacked substrate. The various layers of the stacked substrate can be separated from each other by using Coulomb forces. In addition, a beam substrate can be used to increase the separation. The instructions for assembly and a FSM (Finite State Machine) can be included in the stacked substrate to pave the way for a self-constructing 3-D automaton. The beam substrate can be used to carry heat, fluids, electrical power or signals between the various layers of the stacked cells besides providing a mechanical support. A stacked substrate can be assembled into a cylindrical coil, a transformer or a coupled transformer depending on the construction of the beam structure. The magnetic coupling of the transformer can be altered by changing the distance between the separated substrates.
摘要翻译：描述了可以将衬底彼此组装以形成堆叠衬底的系统。层叠基板的各层可以通过使用库仑力彼此分离。此外，可以使用光束基板来增加分离。组装说明和FSM（有限状态机）可以包含在堆叠衬底中，为自建三维自动机铺平道路。除了提供机械支撑之外，光束基板可用于承载堆叠单元的各层之间的热，流体，电功率或信号。堆叠的基板可以根据梁结构的结构组装成圆柱形线圈，变压器或耦合变压器。可以通过改变分离的基板之间的距离来改变变压器的磁耦合。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式