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    • 26. 发明授权
    • Apparatus and method for recording mark
    • US07095703B2
    • 2006-08-22
    • US10374715
    • 2003-02-27
    • Seong-sue KimDu-seop YoonIn-sik ParkDong-ho Shin
    • Seong-sue KimDu-seop YoonIn-sik ParkDong-ho Shin
    • G11B7/00
    • G11B7/0948G11B7/00454G11B7/095G11B7/0956G11B7/126G11B7/1392
    • A recording apparatus to record a mark on a recording medium includes an aberration detecting part and an optical power controller. The aberration detecting part detects an aberration signal corresponding to the amount of an aberration contained in a light beam radiated onto a recording surface of the recording medium by using an optical pickup system which includes a light source and an objective lens. The light source emits a light beam having a power to record the mark on the recording medium. The objective lens condenses the light beam to focus the light beam as an optical spot on the recording surface of the recording medium. The optical power controller controls the power output from the light source according to the detected aberration signal, so as to have the light source output an optical power to record the mark, in which a deformation due to the aberration is compensated for, on the recording medium. Accordingly, even though the aberration occurs, a proper mark in which the deformation due to the aberration is compensated for can be recorded by increasing the recording power of the light source in proportion to the amount of the aberration to compensate for the aberration. As a result, the mark showing a good signal characteristic can be recorded on the recording medium without an additional aberration compensating device.
    • 28. 发明申请
    • METHOD AND APPARATUS FOR MEASURING AERIAL IMAGE OF EUV MASK
    • 用于测量EUV掩蔽的空气影像的方法和装置
    • US20130056642A1
    • 2013-03-07
    • US13542936
    • 2012-07-06
    • Dong-gun LEESeong-sue Kim
    • Dong-gun LEESeong-sue Kim
    • G01J1/04
    • G03F1/82B82Y10/00B82Y40/00G01J1/4228G01J1/4257G03F1/22
    • An aerial image measuring apparatus includes an extreme ultra-violet (EUV) light generation unit configured to generate EUV light, a moving unit configured to mount an EUV mask and to move the EUV mask in x and y axis directions, a primary reduction optics configured to primarily reduce a divergence of the EUV light generated by the EUV light generation unit, a secondary reduction optics configured to secondarily reduce the divergence of the primarily reduced EUV light, and a detection unit configured to sense energy information from the secondarily reduced EUV light reflected from the plurality of regions on the EUV mask, the secondarily reduced EUV light being incident on and reflected from a plurality of regions on the EUV mask.
    • 一种空间图像测量装置,包括:被配置为产生EUV光的极紫外(EUV)光产生单元,被配置为安装EUV掩模并在x轴和y轴方向上移动EUV掩模的移动单元, 以主要减少由EUV光发生单元产生的EUV光的发散,配置成二次减少主要减少的EUV光的发散的次级减光光学元件和被配置为从二次降低的EUV光中检测能量信息的检测单元 在EUV掩模上的多个区域中,二次还原的EUV光入射到EUV掩模上的多个区域并从其反射。