专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US09279776B2 X-ray analysis apparatus with single crystal X-ray aperture and method for manufacturing a single crystal X-ray aperture 有权
公开(公告)号：US09279776B2
公开(公告)日：2016-03-08
申请号：US13895389
申请日：2013-05-16
申请人： incoatec GmbH
发明人： Andreas Kleine , Josef Kreith , Frank Hertlein
IPC分类号： G21K1/02 , G21K1/04 , A61B6/06 , G01N23/20 , G02B26/00 , G02B26/08 , G02B27/09 , G01N23/201 , G01N23/207
CPC分类号： G01N23/20008 , A61B6/06 , G01N23/201 , G01N23/207 , G02B26/001 , G02B26/0808 , G02B27/0988 , G21K1/02 , G21K1/04 , G21K1/046
摘要： An X-ray analysis apparatus has at least one X-ray aperture (4; 4a, 4b) which delimits an X-ray beam (RS) emitted by an X-ray source (2). The at least one X-ray aperture (4; 4a, 4b) is disposed at a separation from the sample (5) and has a single crystal aperture body (8) with a through pinhole (9). The single crystal aperture body (8) forms a peripheral continuous edge (10) which delimits the X-ray beam (RS) and starting from which the pinhole (9) widens like a funnel in a direction of an outlet opening (11) of the X-ray aperture (4; 4a, 4b) in a first area (B1). The X-ray analysis apparatus reduces impairment of X-ray measurements due to parasitic scattered radiation and at little expense.

32. 发明申请

US20160061752A1 DETECTION OF AN OBJECT WITHIN A VOLUME OF INTEREST 审中-公开
标题翻译：在一个利益体系内检测对象
公开(公告)号：US20160061752A1
公开(公告)日：2016-03-03
申请号：US14839883
申请日：2015-08-28
申请人： Decision Sciences International Corporation
发明人： Priscilla Kurnadi , Shawn McKenney , Sean Simon , Peter Lam
IPC分类号： G01N23/04 , G01N23/201
CPC分类号： G01N23/046 , G01V5/0016
摘要： Techniques, systems, and devices are disclosed for analyzing a point of closest approach (PoCA) image of a volume of interest (VOI) comprising a set of recorded PoCA points from charged particle detector measurements to detect an object within the VOI. The VOI is partitioned into a set of equally-sized bins with each bin including a subset of the PoCA points. A bin metric is determined for each bin. A subset of the bins is selected based on the detected bin metric with the subset of bins being most likely to contain objects. A potential object for each selected bin is determined by determining a location and a size for the potential object based at least on the PoCAs inside the bin. A figure of merit (FOM) of the potential object is determined as a measure of the likelihood that the potential object is truly a threat object.
摘要翻译：公开了技术，系统和设备，用于分析包含一组来自带电粒子检测器测量的记录的PoCA点的感兴趣体积（VOI）的最接近方法（PoCA）图像点以检测VOI内的对象。 VOI被划分成一组相同尺寸的箱，每个箱包括PoCA点的子集。为每个仓确定仓位。基于检测到的bin度量来选择垃圾箱的子集，其中子箱的子集最有可能包含对象。通过至少基于仓内的PoC确定潜在对象的位置和大小来确定每个所选择的仓的潜在对象。确定潜在对象的品质因数（FOM）作为潜在对象真正成为威胁对象的可能性的度量。

33. 发明申请

US20150285749A1 Compact X-Ray Source for CD-SAXS 审中-公开
标题翻译： CD-SAXS的紧凑型X射线源
公开(公告)号：US20150285749A1
公开(公告)日：2015-10-08
申请号：US14678567
申请日：2015-04-03
申请人： Massachusetts Institute of Technology
发明人： David Eugene Moncton , William Sproull Graves , Franz Xaver Kaertner , Hua Lin , Emilio Alessandro Nanni , Luis E. Zapata , Boris Khaykovich
IPC分类号： G01N23/201 , H05G2/00
CPC分类号： G01N23/201 , H05G2/00
摘要： The structure of materials can be characterized (e.g., via CD-SAXS) by generating a burst of electron bunches in a pulse train and accelerating the electron bunches to relativistic energies. Meanwhile, an optical cavity is filled with a laser pulse; and the electron bunches collide with the laser pulse in the optical cavity, permitting a single laser pulse to interact with the electron bunch train to generate x-rays via inverse Compton scattering. The generated x-rays are then directed to a sample, and the sample is imaged by measuring the scattering of the x-rays from the sample.
摘要翻译：材料的结构可以通过在脉冲串中产生电子束的脉冲串并将电子束加速到相对论能量来表征（例如通过CD-SAXS）。同时，用激光脉冲填充光腔; 并且电子束与光学腔中的激光脉冲碰撞，允许单个激光脉冲与电子束串相互作用以通过反康普顿散射产生X射线。然后将生成的X射线引导到样品，并且通过测量来自样品的X射线的散射来对样品成像。

34. 发明申请

US20150241366A1 HIGH PERFORMANCE KRATKY ASSEMBLY 有权
标题翻译：高性能KRATKY装配
公开(公告)号：US20150241366A1
公开(公告)日：2015-08-27
申请号：US14187832
申请日：2014-02-24
申请人： Rigaku Innovative Technologies, Inc.
发明人： Licai Jiang , Paul Ulrich Pennartz
IPC分类号： G01N23/201 , G21K1/04
CPC分类号： G01N23/201 , G21K1/02 , G21K1/025 , G21K1/04 , G21K2201/062
摘要： An assembly for Kratky collimator is provided. The assembly may be used for a small angle x-ray camera or system requiring such filtering. The assembly may include a first block with a first working surface and a second block with a second working surface. The first and second blocks may be aligned with the first working surface pointing an opposite direction of the second working surface and the first working surface being aligned in a common plane with the second working surface. In some implementations, the first block may comprise a crystal material. In some implementations, an extension may of the first block may be configured position a beamstop.
摘要翻译：提供了Kratky准直器的组件。组件可用于需要这种过滤的小角度X射线摄像机或系统。组件可以包括具有第一工作表面的第一块和具有第二工作表面的第二块。第一和第二块可以与第一工作表面对准，其指向第二工作表面的相反方向，并且第一工作表面与第二工作表面在公共平面中对准。在一些实施方案中，第一块可以包括晶体材料。在一些实施方案中，第一块的延伸部可以被配置为定位梁挡。

35. 发明授权

US09080944B2 Method and apparatus for surface mapping using in-plane grazing incidence diffraction 有权
$Method and apparatus for surface mapping using in-plane grazing incidence diffraction$
标题翻译：使用面内掠入射衍射的表面映射方法和装置
公开(公告)号：US09080944B2
公开(公告)日：2015-07-14
申请号：US13735509
申请日：2013-01-07
申请人： Bruker AXS, Inc.
发明人： Jonathan Giencke
IPC分类号： G01N23/207 , G01N23/201
CPC分类号： G01N23/207 , G01N23/201 , G01N2223/501 , G01N2223/61 , G01N2223/6116
摘要： An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.
摘要翻译：用于检查结晶样品的表面的装置使用位置敏感检测器进行平面内掠入射衍射。 x射线源照射样品的延伸区域，并且对于具有适当晶格取向的晶体部分，产生细长的衍射信号。然后可以改变样品和x射线束的相对位置以照射样品的不同区域，使得衍射信号对应于这些其它区域。通过扫描整个样品，可以产生样品表面的空间分布。该系统可用于在样品表面上定位晶体边界，缺陷或衰减材料的存在。

36. 发明申请

US20150117610A1 METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY USING X-RAY METROLOGY 有权
标题翻译：使用X射线测量法测量半导体器件叠加的方法和装置
公开(公告)号：US20150117610A1
公开(公告)日：2015-04-30
申请号：US14521966
申请日：2014-10-23
申请人： KLA-Tencor Corporation
发明人： Andrei Veldman , Michael S. Bakeman , Andrei V. Shchegrov , Walter D. Mieher
IPC分类号： G03F7/20 , G01N23/201 , G01N21/95 , G01N23/203
CPC分类号： G03F7/70633 , G01N21/9501 , H01L22/12
摘要： Disclosed are apparatus and methods for determining overlay error in a semiconductor target. For illumination x-rays having at least one angle of incidence (AOI), a correlation model is obtained, and the correlation model correlates overlay error of a target with a modulation intensity parameter for each of one or more diffraction orders (or a continuous diffraction intensity distribution) for x-rays scattered from the target in response to the illumination x-rays. A first target is illuminated with illumination x-rays having the at least one AOI and x-rays that are scattered from the first target in response to the illumination x-rays are collected. An overlay error of the first target is determined based on the modulation intensity parameter of the x-rays collected from the first target for each of the one or more diffraction orders (or the continuous diffraction intensity distribution) and the correlation model.
摘要翻译：公开了用于确定半导体目标中的重叠误差的装置和方法。对于具有至少一个入射角（AOI）的照明x射线，获得相关模型，并且相关模型将目标的重叠误差与一个或多个衍射级（或连续衍射中的每一个）的调制强度参数相关联强度分布），用于响应于照射x射线从目标散射的X射线。利用具有至少一个AOI的照明x射线照射第一个目标，并且响应于照射x射线而从第一个目标物体散射的X射线被照射。基于对于一个或多个衍射级（或连续衍射强度分布）和相关模型中的每一个而从第一目标收集的x射线的调制强度参数来确定第一目标的覆盖误差。

37. 发明申请

US20150110249A1 SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS 有权
标题翻译：小角度散射X射线量子系统和方法
公开(公告)号：US20150110249A1
公开(公告)日：2015-04-23
申请号：US14515322
申请日：2014-10-15
申请人： KLA-Tencor Corporation
发明人： Michael S. Bakeman , Andrei V. Shchegrov , Ady Levy , Guorong V. Zhuang , John J. Hench
IPC分类号： G01N23/201 , G01N33/00
CPC分类号： G01N23/201 , G01N2033/0095
摘要： Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.
摘要翻译：公开了用于执行小角度X射线散射测量的装置和方法。该系统包括用于产生X射线的X射线源和照明光学器件，用于收集并折射所产生的X射线的一部分朝着半导体样本上的特定聚焦点以多个入射光束的形式反射或折射多个不同的入射角（AOI）。该系统还包括传感器，用于响应于在不同AOI处的样品上的入射光束而从样品收集输出的X射线束，以及控制器，被配置为控制X射线源和照明光学器件的接收和接收输出x射线束并从这样的输出x射线产生图像。

38. 发明申请

US20140067316A1 MEASURING APPARATUS, DETECTOR DEVIATION MONITORING METHOD AND MEASURING METHOD 审中-公开
标题翻译：测量装置，检测器偏差监测方法和测量方法
公开(公告)号：US20140067316A1
公开(公告)日：2014-03-06
申请号：US13752490
申请日：2013-01-29
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Yasuhiko ISHIBASHI
IPC分类号： G01N23/201 , G06F17/00
CPC分类号： G01N23/201 , G01N2223/6116 , G06F17/00
摘要： In accordance with an embodiment, a measuring apparatus includes a stage, an electromagnetic wave applying unit, a detector, a monitor, a detector location adjusting unit, and a measuring unit. The stage supports a substrate comprising a periodic structure on a main surface thereof. The electromagnetic wave applying unit generates electromagnetic waves and applies the electromagnetic waves to the substrate. The detector detects the intensity of the electromagnetic waves scattered or reflected by the substrate with the use of two-dimensionally arranged detection elements, and then outputs a signal. The monitor processes the signal from the detector to acquire a first scatter profile, and measure a positional deviation of the detector in accordance with the first scatter profile. The detector location adjusting unit corrects the positional deviation of the detector in accordance with the measured positional deviation. The measuring unit calculates a surface shape of the periodic structure.
摘要翻译：根据实施例，测量装置包括台，电磁波施加单元，检测器，监视器，检测器位置调整单元和测量单元。该载物台在其主表面上支撑包含周期性结构的基底。电磁波施加单元产生电磁波并将电磁波施加到基板。检测器利用二维排列的检测元件检测由基板散射或反射的电磁波的强度，然后输出信号。监视器处理来自检测器的信号以获取第一散射分布，并且根据第一散射分布测量检测器的位置偏差。检测器位置调整单元根据所测量的位置偏差校正检测器的位置偏差。测量单元计算周期结构的表面形状。

39. 发明申请

US20130329858A1 DUAL MODE SMALL ANGLE SCATTERING CAMERA 有权
标题翻译：双模小角度散射摄像机
公开(公告)号：US20130329858A1
公开(公告)日：2013-12-12
申请号：US13912338
申请日：2013-06-07
申请人： Rigaku Innovative Technologies, Inc.
发明人： Licai Jiang
IPC分类号： G01N23/201
CPC分类号： G01N23/201 , G01N2223/308
摘要： A system for analyzing a sample is provided. The system includes a beam selection device for selecting between a one-dimensional operation mode for providing a one-dimensional x-ray beam to the sample and a two-dimensional operation mode for providing a two-dimensional x-ray beam to the sample.
摘要翻译：提供了一种用于分析样品的系统。该系统包括用于在用于向样本提供一维x射线束的一维操作模式和用于向样本提供二维X射线束的二维操作模式之间进行选择的束选择装置。

40. 发明申请

US20130110421A1 DEVICE ANALYSIS 审中-公开
标题翻译：设备分析
公开(公告)号：US20130110421A1
公开(公告)日：2013-05-02
申请号：US13696157
申请日：2011-05-06
申请人： Kay Lederer
发明人： Kay Lederer
IPC分类号： G01R31/28 , G06F15/00 , G01N23/201
CPC分类号： G01R31/28 , G01N1/286 , G01N23/201 , G06F15/00 , H01J2237/28 , H01J2237/31745 , H01J2237/31749 , H01L22/12 , H01L22/24
摘要： Performing an analysis of an electronic device sample by measuring a property at a plurality of points of said electronic device sample, and in advance of said analysis subjecting said plurality of points to at least one treatment that increases the difference in said property between at least two elements of said electronic device sample.
摘要翻译：通过测量所述电子设备样本的多个点处的属性来进行对电子设备样本的分析，并且在所述分析之前，对所述多个点进行至少一个处理，所述处理增加所述属性的差异至少在两个所述电子设备样品的元件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式