会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 42. 发明申请
    • OLED Display System Compensating for Changes Therein
    • OLED显示系统补偿其中的变化
    • US20100194670A1
    • 2010-08-05
    • US12759382
    • 2010-04-13
    • Ronald S. COK
    • Ronald S. COK
    • G09G3/30
    • G09G3/3225G09G2320/0233G09G2320/0285G09G2320/029G09G2320/0693G09G2320/08
    • A method of compensating an OLED display device having light-emitting elements that change with use, comprising the steps of: a) using the device to display images; b) sequentially displaying an ordered series of calibration images, wherein each of the calibration images have one or more corresponding flat fields, at least one of the corresponding flat fields of each calibration image of the ordered series has a different luminance value, and the calibration images are arranged in the ordered series so as to reduce perceived luminance discontinuities; c) measuring and recording current used by the display for each sequentially displayed calibration image; d) calculating compensation parameters based on the measured currents; e) compensating an input image using the compensation parameters; and f) displaying the compensated input image.
    • 一种补偿具有随着使用而改变的发光元件的OLED显示装置的方法,包括以下步骤:a)使用所述装置显示图像; b)顺序地显示有序序列的校准图像,其中每个校准图像具有一个或多个对应的平坦场,有序序列的每个校准图像的相应平坦场中的至少一个具有不同的亮度值,并且校准 图像以有序序列排列,以减少感知的亮度不连续性; c)测量和记录每个顺序显示的校准图像由显示器使用的电流; d)基于测量电流计算补偿参数; e)使用补偿参数补偿输入图像; 以及f)显示经补偿的输入图像。
    • 45. 发明授权
    • Method and apparatus for compensating aging of OLED display
    • 用于补偿OLED显示器老化的方法和装置
    • US07696965B2
    • 2010-04-13
    • US11424568
    • 2006-06-16
    • Ronald S. Cok
    • Ronald S. Cok
    • G01J1/42G09G3/10
    • G09G3/3225G09G2320/0233G09G2320/0285G09G2320/029G09G2320/0693G09G2320/08
    • A method of compensating an OLED display device having light-emitting elements that change with use, comprising the steps of: a) using the device to display images; b) sequentially displaying an ordered series of calibration images, wherein each of the calibration images have one or more corresponding flat fields, at least one of the corresponding flat fields of each calibration image of the ordered series has a different luminance value, and the calibration images are arranged in the ordered series so as to reduce perceived luminance discontinuities; c) measuring and recording current used by the display for each sequentially displayed calibration image; d) calculating compensation parameters based on the measured currents; e) compensating an input image using the compensation parameters; and f) displaying the compensated input image.
    • 一种补偿具有随着使用而改变的发光元件的OLED显示装置的方法,包括以下步骤:a)使用所述装置显示图像; b)顺序地显示有序序列的校准图像,其中每个校准图像具有一个或多个相应的平坦场,有序序列的每个校准图像的相应平坦场中的至少一个具有不同的亮度值,并且校准 图像以有序序列排列,以减少感知的亮度不连续性; c)测量和记录每个顺序显示的校准图像由显示器使用的电流; d)基于测量电流计算补偿参数; e)使用补偿参数补偿输入图像; 以及f)显示经补偿的输入图像。
    • 46. 发明授权
    • Method and apparatus for uniformity compensation in an OLED display
    • 用于OLED显示器中均匀补偿的方法和装置
    • US07675490B2
    • 2010-03-09
    • US11556343
    • 2006-11-03
    • Ronald S. CokChristopher J. WhitePaul J. Kane
    • Ronald S. CokChristopher J. WhitePaul J. Kane
    • G09G3/30
    • G09G3/3208G09G2320/0233G09G2320/0285G09G2320/0693
    • A method of compensating the uniformity of an OLED device that includes measuring the performance of light-emitting elements at three or more different input intensity values. Calculation of parameters a and b, for each light-emitting element, is performed to minimize the sum, for each of the three or more input intensity values i, of a minimization function: ƒ(yi,i,(yi−g(yi,i,a,b))2) where yi is the performance value of the light-emitting element or groups of elements in response to an input intensity value i, and g is a function that is a simplified representation of the performance of the one or more light-emitting elements or groups of elements. A linear transformation function is formed as: ƒ(i)=mi+k, where m and k depend upon the function g, and the parameters a and b.
    • 一种补偿OLED器件的均匀性的方法,其包括以三个或更多个不同的输入强度值测量发光元件的性能。 执行对于每个发光元件的参数a和b的计算,以使最小化函数的三个或更多个输入强度值i中的每一个最小化:ƒ(yi,i,(yi-g(yi ,i,a,b))2)其中yi是响应于输入强度值i的发光元件或元件组的性能值,并且g是作为输入强度值i的性能的简化表示的函数 一个或多个发光元件或元件组。 线性变换函数形成为:ƒ(i)= mi + k,其中m和k取决于函数g,以及参数a和b。
    • 47. 发明申请
    • DISPLAY DEVICE WITH CHIPLETS
    • 显示设备与CHIPLETS
    • US20100039357A1
    • 2010-02-18
    • US12191462
    • 2008-08-14
    • Ronald S. CokJohn W. HamerDustin L. Winters
    • Ronald S. CokJohn W. HamerDustin L. Winters
    • G09G3/32
    • H01L27/3255H01L27/3248H01L27/3276
    • A display device includes: a substrate; one or more pixels arranged on the substrate, each pixel including a control electrode; a wiring layer located over the substrate, the wiring layer having a continuous line and a discontinuous pass-thru line formed therein. The active-matrix device includes at least one chiplet located over the substrate and including first, second, third, and control connection pads including; a control line electrically connecting the control connection pad to the control electrode; a first end of the discontinuous pass-thru line connected to the first connection pad and a second end of the discontinuous pass-thru line connected to the second connection pad; circuitry electrically connecting the first and second connection pads; and the continuous line electrically connected to the third connection pad, wherein the continuous line extends to opposite sides of the chiplet.
    • 显示装置包括:基板; 一个或多个像素布置在基板上,每个像素包括控制电极; 位于基板上方的布线层,所述布线层具有连续的线和在其中形成的不连续的通过线。 所述有源矩阵器件包括位于所述衬底上方的至少一个小芯片,并且包括第一,第二,第三和第二控制连接焊盘,包括: 将所述控制连接焊盘电连接到所述控制电极的控制线; 连接到第一连接焊盘的不连续通过线的第一端和连接到第二连接焊盘的不连续通过线的第二端; 电连接第一和第二连接焊盘的电路; 并且所述连续线电连接到所述第三连接焊盘,其中所述连续线延伸到所述小芯片的相对侧。
    • 48. 发明授权
    • OLED patterning method
    • OLED图案化方法
    • US07662663B2
    • 2010-02-16
    • US11692381
    • 2007-03-28
    • Ronald S. CokChristopher B. Rider
    • Ronald S. CokChristopher B. Rider
    • B05D3/06H01L21/00
    • H01L51/0016H01L51/56
    • A method of patterning a substrate according to several steps, including: a) mechanically locating a first masking film over the substrate; and b) segmenting the first masking film into a first masking portion and one or more first opening portions in first locations. Next, mechanically locate a first removal film over the first masking portion and first opening portions. Afterwards, one or more of the first opening portions are adhered to the first removal film. The first removal film and one or more of the first opening portions adhered to the first removal film are mechanically removed to form one or more first openings in the first masking film. Finally, materials are deposited over the substrate through the first openings in the first masking film.
    • 一种根据几个步骤图案化衬底的方法,包括:a)将第一掩模膜机械地定位在衬底上; 以及b)将第一掩模膜分割成第一掩蔽部分和第一位置中的一个或多个第一开口部分。 接下来,将第一去除膜机械地定位在第一掩模部分和第一开口部分上。 此后,一个或多个第一开口部分粘附到第一去除膜。 第一去除膜和粘附到第一去除膜的一个或多个第一开口部分被机械地去除以在第一掩模膜中形成一个或多个第一开口。 最后,材料通过第一掩模膜中的第一开口沉积在衬底上。
    • 50. 发明申请
    • PATTERNING METHOD FOR LIGHT-EMITTING DEVICES
    • 用于发光装置的绘图方法
    • US20090104785A1
    • 2009-04-23
    • US11876334
    • 2007-10-22
    • Ronald S. Cok
    • Ronald S. Cok
    • H01L21/304G06F17/50
    • H01L51/56H01L27/3211H01L51/0011
    • A method of patterning a substrate by mechanically locating a first masking film over the substrate; removing one or more first opening portions in first locations in the first masking film to form one or more first masking portions in the first masking film. First materials are deposited over the substrate in the first locations to form first patterned areas before mechanically locating a second masking film over the substrate and first masking portions. One or more second opening portions are removed from second locations, different from the first locations, in both the second masking film and the first masking portions to form one or more second masking portions. Second materials are deposited over the substrate in the second locations to form second patterned areas.
    • 一种通过在衬底上机械地定位第一掩模膜来图案化衬底的方法; 去除第一掩模膜中的第一位置中的一个或多个第一开口部分,以在第一掩模膜中形成一个或多个第一掩蔽部分。 在将第二掩模膜机械地定位在衬底和第一掩蔽部分之上之前,首先将材料沉积在第一位置上的衬底上以形成第一图案化区域。 在第二掩模膜和第一掩蔽部分中,从与第一位置不同的第二位置移除一个或多个第二开口部分,以形成一个或多个第二掩蔽部分。 第二材料沉积在第二位置上的衬底上以形成第二图案区域。