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41. 发明申请

US20150117610A1 METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY USING X-RAY METROLOGY 有权
标题翻译：使用X射线测量法测量半导体器件叠加的方法和装置
公开(公告)号：US20150117610A1
公开(公告)日：2015-04-30
申请号：US14521966
申请日：2014-10-23
申请人： KLA-Tencor Corporation
发明人： Andrei Veldman , Michael S. Bakeman , Andrei V. Shchegrov , Walter D. Mieher
IPC分类号： G03F7/20 , G01N23/201 , G01N21/95 , G01N23/203
CPC分类号： G03F7/70633 , G01N21/9501 , H01L22/12
摘要： Disclosed are apparatus and methods for determining overlay error in a semiconductor target. For illumination x-rays having at least one angle of incidence (AOI), a correlation model is obtained, and the correlation model correlates overlay error of a target with a modulation intensity parameter for each of one or more diffraction orders (or a continuous diffraction intensity distribution) for x-rays scattered from the target in response to the illumination x-rays. A first target is illuminated with illumination x-rays having the at least one AOI and x-rays that are scattered from the first target in response to the illumination x-rays are collected. An overlay error of the first target is determined based on the modulation intensity parameter of the x-rays collected from the first target for each of the one or more diffraction orders (or the continuous diffraction intensity distribution) and the correlation model.
摘要翻译：公开了用于确定半导体目标中的重叠误差的装置和方法。对于具有至少一个入射角（AOI）的照明x射线，获得相关模型，并且相关模型将目标的重叠误差与一个或多个衍射级（或连续衍射中的每一个）的调制强度参数相关联强度分布），用于响应于照射x射线从目标散射的X射线。利用具有至少一个AOI的照明x射线照射第一个目标，并且响应于照射x射线而从第一个目标物体散射的X射线被照射。基于对于一个或多个衍射级（或连续衍射强度分布）和相关模型中的每一个而从第一目标收集的x射线的调制强度参数来确定第一目标的覆盖误差。

42. 发明申请

US20150110249A1 SMALL-ANGLE SCATTERING X-RAY METROLOGY SYSTEMS AND METHODS 有权
标题翻译：小角度散射X射线量子系统和方法
公开(公告)号：US20150110249A1
公开(公告)日：2015-04-23
申请号：US14515322
申请日：2014-10-15
申请人： KLA-Tencor Corporation
发明人： Michael S. Bakeman , Andrei V. Shchegrov , Ady Levy , Guorong V. Zhuang , John J. Hench
IPC分类号： G01N23/201 , G01N33/00
CPC分类号： G01N23/201 , G01N2033/0095
摘要： Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.
摘要翻译：公开了用于执行小角度X射线散射测量的装置和方法。该系统包括用于产生X射线的X射线源和照明光学器件，用于收集并折射所产生的X射线的一部分朝着半导体样本上的特定聚焦点以多个入射光束的形式反射或折射多个不同的入射角（AOI）。该系统还包括传感器，用于响应于在不同AOI处的样品上的入射光束而从样品收集输出的X射线束，以及控制器，被配置为控制X射线源和照明光学器件的接收和接收输出x射线束并从这样的输出x射线产生图像。

43. 发明申请

US20140067316A1 MEASURING APPARATUS, DETECTOR DEVIATION MONITORING METHOD AND MEASURING METHOD 审中-公开
标题翻译：测量装置，检测器偏差监测方法和测量方法
公开(公告)号：US20140067316A1
公开(公告)日：2014-03-06
申请号：US13752490
申请日：2013-01-29
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Yasuhiko ISHIBASHI
IPC分类号： G01N23/201 , G06F17/00
CPC分类号： G01N23/201 , G01N2223/6116 , G06F17/00
摘要： In accordance with an embodiment, a measuring apparatus includes a stage, an electromagnetic wave applying unit, a detector, a monitor, a detector location adjusting unit, and a measuring unit. The stage supports a substrate comprising a periodic structure on a main surface thereof. The electromagnetic wave applying unit generates electromagnetic waves and applies the electromagnetic waves to the substrate. The detector detects the intensity of the electromagnetic waves scattered or reflected by the substrate with the use of two-dimensionally arranged detection elements, and then outputs a signal. The monitor processes the signal from the detector to acquire a first scatter profile, and measure a positional deviation of the detector in accordance with the first scatter profile. The detector location adjusting unit corrects the positional deviation of the detector in accordance with the measured positional deviation. The measuring unit calculates a surface shape of the periodic structure.
摘要翻译：根据实施例，测量装置包括台，电磁波施加单元，检测器，监视器，检测器位置调整单元和测量单元。该载物台在其主表面上支撑包含周期性结构的基底。电磁波施加单元产生电磁波并将电磁波施加到基板。检测器利用二维排列的检测元件检测由基板散射或反射的电磁波的强度，然后输出信号。监视器处理来自检测器的信号以获取第一散射分布，并且根据第一散射分布测量检测器的位置偏差。检测器位置调整单元根据所测量的位置偏差校正检测器的位置偏差。测量单元计算周期结构的表面形状。

44. 发明申请

US20130329858A1 DUAL MODE SMALL ANGLE SCATTERING CAMERA 有权
标题翻译：双模小角度散射摄像机
公开(公告)号：US20130329858A1
公开(公告)日：2013-12-12
申请号：US13912338
申请日：2013-06-07
申请人： Rigaku Innovative Technologies, Inc.
发明人： Licai Jiang
IPC分类号： G01N23/201
CPC分类号： G01N23/201 , G01N2223/308
摘要： A system for analyzing a sample is provided. The system includes a beam selection device for selecting between a one-dimensional operation mode for providing a one-dimensional x-ray beam to the sample and a two-dimensional operation mode for providing a two-dimensional x-ray beam to the sample.
摘要翻译：提供了一种用于分析样品的系统。该系统包括用于在用于向样本提供一维x射线束的一维操作模式和用于向样本提供二维X射线束的二维操作模式之间进行选择的束选择装置。

45. 发明申请

US20130110421A1 DEVICE ANALYSIS 审中-公开
标题翻译：设备分析
公开(公告)号：US20130110421A1
公开(公告)日：2013-05-02
申请号：US13696157
申请日：2011-05-06
申请人： Kay Lederer
发明人： Kay Lederer
IPC分类号： G01R31/28 , G06F15/00 , G01N23/201
CPC分类号： G01R31/28 , G01N1/286 , G01N23/201 , G06F15/00 , H01J2237/28 , H01J2237/31745 , H01J2237/31749 , H01L22/12 , H01L22/24
摘要： Performing an analysis of an electronic device sample by measuring a property at a plurality of points of said electronic device sample, and in advance of said analysis subjecting said plurality of points to at least one treatment that increases the difference in said property between at least two elements of said electronic device sample.
摘要翻译：通过测量所述电子设备样本的多个点处的属性来进行对电子设备样本的分析，并且在所述分析之前，对所述多个点进行至少一个处理，所述处理增加所述属性的差异至少在两个所述电子设备样品的元件。

46. 发明授权

US08406375B2 Article inspection device and inspection method 有权
标题翻译：物品检验装置及检验方法
公开(公告)号：US08406375B2
公开(公告)日：2013-03-26
申请号：US13142712
申请日：2010-12-28
申请人： Yigang Yang , Tiezhu Li , Qinjiar Zhang , Yi Zhang , Yingkang Jin , Qinghao Chen , Yuanjing Li , Yinong Liu
发明人： Yigang Yang , Tiezhu Li , Qinjiar Zhang , Yi Zhang , Yingkang Jin , Qinghao Chen , Yuanjing Li , Yinong Liu
IPC分类号： G01N23/201
CPC分类号： G01V5/0016 , G01N23/046 , G01N23/05 , G01N2223/419 , G01V5/0025
摘要： The present invention discloses an article inspection device, comprising: an x-ray machine, a collimation unit, a transmission detector array and a scattering detector array. The scattering detector array comprising a plurality of same scattering detector modules arranged in a matrix of i-rows and j-columns. A transmission cross section of the article transmitted by the x-rays is divided into a plurality of same sub-regions arranged in a matrix of i-rows and j-columns. The plurality of scattering detector modules arranged in i-rows and j-columns correspond to the plurality of sub-regions arranged in i-rows and j-columns one by one for detecting pair production effect annihilation photons and Compton-effect scattering photons from the respective sub-regions. Obtaining atomic numbers of the respective sub-regions based on a ratio of the pair production effect annihilation photon count to the Compton-effect scattering photon count, so as to form a three-dimensional image of the article. In addition, the present invention further discloses an article inspection method.
摘要翻译：本发明公开了一种物品检查装置，包括：x射线机，准直单元，透射检测器阵列和散射检测器阵列。散射检测器阵列包括以i行和j列的矩阵排列的多个相同的散射检测器模块。通过X射线透射的物品的透射截面被划分成以i行和j列的矩阵排列的多个相同的子区域。布置在i行和j列中的多个散射检测器模块对应于一排一列地排列在i行和j列中的多个子区域，用于检测来自该对象的生成效应湮灭光子和康普顿效应散射光子各分区域。基于对生产效应湮灭光子计数与康普顿效应散射光子计数的比率，获得各个子区域的原子序数，以形成物品的三维图像。此外，本发明还公开了一种物品检查方法。

47. 发明申请

US20130012812A1 FUNCTIONAL AND PHYSICAL IMAGING BY SPECTROSCOPIC DETECTION OF PHOTO ABSORPTION OF PHOTONS AND SCATTERED PHOTONS FROM RADIOACTIVE SOURCES OR DIFFRACTED X-RAY SYSTEMS 审中-公开
标题翻译：通过光谱检测从放射源或衍射X射线系统中的光子和散射光子吸收的功能和物理成像
公开(公告)号：US20130012812A1
公开(公告)日：2013-01-10
申请号：US13177402
申请日：2011-07-06
申请人： Edward J. SEPPI
发明人： Edward J. SEPPI
IPC分类号： A61B6/00 , G01N23/223 , G01N23/201
CPC分类号： A61B6/4071 , A61B6/032 , A61B6/06 , A61B6/4078 , A61B6/4241 , A61B6/4429 , A61B6/481 , A61B6/483
摘要： An apparatus to examine a target volume in a patient includes an x-ray source generating a first x-ray beam targeting the target volume, and a detector which is placed at an angle less than 180 degrees relative to a beam path of the first x-ray beam to receive a second x-ray beam generated from the first x-ray beam interacting with the target volume. A method to image a target volume in a patient includes directing a first x-ray beam generated from an x-ray source at the target volume, wherein a second x-ray beam is generated by an interaction of the first x-ray beam with the target volume, detecting the second x-ray beam using a detector that is placed at less than 180 degrees relative to a path of the first x-ray beam, and obtaining spatial and temporal information of the target volume using the detected second x-ray beam.
摘要翻译：用于检查患者中的目标体积的装置包括产生靶向目标体积的第一X射线束的X射线源和相对于第一x的束路径以小于180度的角度放置的检测器射线束以接收从与目标体积相互作用的第一x射线束产生的第二x射线束。用于对患者中的目标体积进行成像的方法包括将从X射线源产生的第一X射线束引导到目标体积，其中第二X射线束由第一x射线束与使用相对于第一x射线束的路径放置在小于180度的检测器来检测第二X射线束，以及使用检测到的第二x射线束获得目标体积的空间和时间信息，射线束。

48. 发明授权

US08326011B2 Methods, systems, and computer-program products for estimating scattered radiation in radiographic projections 有权
标题翻译：用于估计射线照相预测中散射辐射的方法，系统和计算机程序产品
公开(公告)号：US08326011B2
公开(公告)日：2012-12-04
申请号：US12125053
申请日：2008-05-21
申请人： Josh Star-Lack , Mingshan Sun , John Milan Pavkovich
发明人： Josh Star-Lack , Mingshan Sun , John Milan Pavkovich
IPC分类号： G06K9/00 , G01N23/00 , G01N23/201 , G01B15/02
CPC分类号： G06T7/0012 , G06T11/005
摘要： Several related inventions for estimating scattered radiation in radiographic projections are disclosed. Several of the inventions use scatter kernels of various forms, including symmetric and asymmetric forms. The inventions may be used alone or in various combinations with one another. The resulting estimates of scattered radiation may be used to correct the projections, which can improve the results of tomographic reconstructions. Still other inventions of the present application generate estimates of scattered radiation from shaded or partially shaded regions of a radiographic projection, which may be used to correct the projections or used to adjust the estimates of scattered radiation generated according to inventions of the present application that employ kernels.
摘要翻译：公开了用于估计射线照相投影中的散射辐射的几个相关发明。几个发明使用各种形式的散射核，包括对称和非对称形式。本发明可以单独使用或以各种组合使用。所得到的散射辐射估计可用于校正投影，这可以改善断层扫描重建的结果。本申请的其他发明产生了放射线照相投影的阴影或部分阴影区域的散射辐射的估计，其可以用于校正投影或用于调整根据本申请的发明产生的散射辐射的估计内核

49. 发明授权

US08229165B2 Processing method for coded aperture sensor 有权
标题翻译：编码孔径传感器的处理方法
公开(公告)号：US08229165B2
公开(公告)日：2012-07-24
申请号：US12373946
申请日：2007-07-27
申请人： Malcolm John Alexander Strens
发明人： Malcolm John Alexander Strens
IPC分类号： G06K9/00 , G01N23/201
CPC分类号： G01T1/295
摘要： A method of processing for a coded aperture imaging apparatus which is useful for target identification and tracking. The method uses a statistical scene model and, preferably using several frames of data, determines a likelihood of the position and/or velocity of one or more targets assumed to be in the scene. The method preferably applies a recursive Bayesian filter or Bayesian batch filter to determine a probability distribution of likely state parameters. The method acts upon the acquired data directly without requiring any processing to form an image.
摘要翻译：一种用于编码孔径成像设备的方法，其对于目标识别和跟踪是有用的。该方法使用统计场景模型，并且优选地使用几帧数据来确定假定在场景中的一个或多个目标的位置和/或速度的可能性。该方法优选地应用递归贝叶斯滤波器或贝叶斯分块滤波器来确定可能的状态参数的概率分布。该方法直接作用于获取的数据，而不需要任何处理来形成图像。

50. 发明申请

US20120148026A1 X-Ray Inspection Tool 有权
标题翻译： X光检查工具
公开(公告)号：US20120148026A1
公开(公告)日：2012-06-14
申请号：US12965159
申请日：2010-12-10
申请人： Morteza Safai
发明人： Morteza Safai
IPC分类号： G01N23/201 , H05G1/02
CPC分类号： G01N23/04 , G01N23/203
摘要： The different advantageous embodiments provide an apparatus and a method for inspecting a surface of a work piece. In one advantageous embodiment, an apparatus comprising a number of tracks, a support structure, connection system, and controller is disclosed. The number of tracks are configured for placement along a path. The support structure is configured to move on the number of tracks. The X-ray system is moveably connected to the support structure. The X-ray system is configured to send a plurality of X-rays toward a work piece and is configured to move along an axis through the support structure. The connection system is configured to removably connect the number of tracks to the work piece using a vacuum applied to a surface of the work piece. The controller is configured to activate and deactivate the X-ray system based on an amount of vacuum applied to the surface of the work piece.
摘要翻译：不同的有利实施例提供了用于检查工件表面的装置和方法。在一个有利的实施例中，公开了一种包括多个轨道，支撑结构，连接系统和控制器的装置。轨道的数量被配置为沿着路径放置。支撑结构配置为在轨道数上移动。 X射线系统可移动地连接到支撑结构。 X射线系统被配置为向工件发送多个X射线，并且被配置为沿轴线移动通过支撑结构。连接系统被构造成使用施加到工件的表面的真空可移除地将轨道数量连接到工件。控制器被配置为基于施加到工件表面的真空量激活和去激活X射线系统。

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