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41. 发明授权

US10269607B2 Electrostatic chucking method and substrate processing apparatus 有权
公开(公告)号：US10269607B2
公开(公告)日：2019-04-23
申请号：US14975377
申请日：2015-12-18
申请人： TOKYO ELECTRON LIMITED
发明人： Yasuharu Sasaki , Taketoshi Tomioka , Hiroki Kishi , Jisoo Suh
IPC分类号： H01L21/683 , H01T23/00 , H02N13/00 , H01L21/67
摘要： An electrostatic chucking method uses a substrate processing apparatus including an electrostatic chuck, a focus ring, a supply unit configured to supply a heat transfer medium to a space formed between the focus ring and the electrostatic chuck, and a plurality of electrodes provided at a region in the electrostatic chuck which corresponds to the focus ring. The electrostatic chucking method includes supplying by the supply unit the heat transfer medium to the space for a plasma processing period for which a plasma for processing the substrate is generated, and applying different voltages to the plurality of electrodes to attract and hold the focus ring on the electrostatic chuck for a period other than the plasma processing period.

42. 发明申请

US20190088517A1 ELECTROSTATIC CHUCK DEVICE 审中-公开
公开(公告)号：US20190088517A1
公开(公告)日：2019-03-21
申请号：US15528026
申请日：2015-11-19
申请人： SUMITOMO OSAKA CEMENT CO., LTD.
发明人： Mamoru KOSAKAI , Yukio MIURA
IPC分类号： H01L21/683 , H02N13/00 , H01L21/67
摘要： An aspect of the present invention has an object to provide an electrostatic chuck device which is provided with a plurality of divided heaters and in which uniform temperature control of a zone which is heated by each heater can be performed with a simple configuration. An electrostatic chuck device according to an aspect of the present invention includes: an electrostatic chuck part which has a mounting surface on one principal surface thereof to mount a plate-shaped sample and has an electrode for electrostatic attraction; a temperature controlling base part which is provided at a side opposite to the mounting surface of the electrostatic chuck part and is configured to cool the electrostatic chuck part; a high frequency generating electrode which is provided in a layer between the electrostatic chuck part and the temperature controlling base part; a high frequency power source which is connected to the high frequency generating electrode; a first heater element which is configured with a plurality of main heaters which are provided in a layer between the high frequency generating electrode and the temperature controlling base part; and a guard electrode which is provided in a layer between the high frequency generating electrode and the first heater element.

43. 发明授权

US10205410B2 Insulating sheet having electrostatic charges causing attraction 有权
公开(公告)号：US10205410B2
公开(公告)日：2019-02-12
申请号：US14576493
申请日：2014-12-19
申请人： Kelly Stephen Robinson , Nelson Pizarro , Nelson Pizarro, II
发明人： Kelly Stephen Robinson , Nelson Pizarro , Nelson Pizarro, II
IPC分类号： H01B17/56 , H02N13/00 , G09F3/04 , G09F7/12
摘要： Disclosed is a sheet repositionable that is attracted to a nearby object by electrostatic charges. The sheet requires no pressure sensitive adhesive to stick to the object. The sheet is attracted to the nearby object by electrostatic charges on the sheet. The sheet has a first surface and a second surface. The electrostatic charges may be on the first surface, on the second surface, or on both the first surface and the second surface. The electrostatic charges have both a magnitude and a polarity that can be either positive or negative. The charges on the sheet may be all positive, the charges may be all negative, or the sheet may have regions of positive electrostatic charges and regions of negative electrostatic charges. In each case, the magnitude of the charges is sufficient to attract the sheet to the nearby object. Once the sheet is in contact with the object, electrostatic charges causes the sheet to stick to the object.

44. 发明申请

US20180374735A1 SUBSTRATE FIXING DEVICE 审中-公开
公开(公告)号：US20180374735A1
公开(公告)日：2018-12-27
申请号：US15956852
申请日：2018-04-19
申请人： SHINKO ELECTRIC INDUSTRIES CO., LTD.
发明人： Kazuhiro FUJITA
IPC分类号： H01L21/683 , H02N13/00 , H01L21/673
摘要： A substrate fixing device includes a baseplate, an adhesive layer on the baseplate, and an electrostatic chuck on the adhesive layer. The adhesive layer includes a first layer and a second layer. The second layer is between the first layer and the electrostatic chuck. The thermal conductivity of the first layer is higher in a stacking direction in which the baseplate, the adhesive layer, and the electrostatic chuck are stacked than in a plane direction perpendicular to the stacking direction. The thermal conductivity of the second layer is higher in the plane direction than in the stacking direction.

45. 发明授权

US10147629B2 Electrostatic chuck device 有权
公开(公告)号：US10147629B2
公开(公告)日：2018-12-04
申请号：US15027026
申请日：2014-10-15
申请人： Sumitomo Osaka Cement Co., Ltd.
发明人： Kentaro Takahashi , Megumi Ootomo
IPC分类号： H01L21/683 , H01L21/67 , H02N13/00
摘要： Provided is an electrostatic chuck device in which breakdown between an electrostatic chuck portion and a cooling base portion can be prevented, voltage endurance can be improved, uniformity in the in-plane temperature of a mounting surface of the electrostatic chuck portion where a plate-shaped sample is mounted can be improved, and voltage endurance of a heating member can be improved by applying a uniform voltage between the electrostatic chuck portion and the cooling base portion. An electrostatic chuck device (10) includes: an electrostatic chuck portion (11) that includes a ceramic plate-shaped body and an internal electrode 18 for electrostatic adsorption; and a cooling base portion (12) that adjusts a temperature of the internal electrode (18) for electrostatic adsorption, in which a first insulating member (20) is adhered to a second main surface of the ceramic plate-shaped body through a first adhesive (19) so as to cover a periphery of the internal electrode for electrostatic adsorption (18), a second insulating member (14) is adhered to a top surface of the cooling base portion (12) through a second adhesive (13), a heating member (15) is provided on a top surface of the second insulating member (14), and the electrostatic chuck portion (11) and the cooling base portion (12) are adhered to each other and integrated through an organic adhesive layer (16).

46. 发明申请

US20180319020A1 METHODS AND SYSTEMS FOR COMBINED NEGATIVE PRESSURE AND ELECTROADHESION-BASED MANIPULATION IN MANUFACTURING 审中-公开
公开(公告)号：US20180319020A1
公开(公告)日：2018-11-08
申请号：US16030707
申请日：2018-07-09
申请人： GRABIT, INC.
发明人： Harsha PRAHLAD , Richard J. CASLER , Susan KIM , Matthew LEETTOLA , Jon SMITH , Kenneth TAN , Patrick WANG , John Mathew FARREN , Patrick Conall REGAN , Po Cheng CHEN , Honam KO , Dragan JURKOVIC , Aishwarya VARADHAN , Tsung Tai CHIEN , Chang-Chu LIAO , Chih-Chi CHANG , Kuo-Hung LEE , TaeHoun KIM
IPC分类号： B25J15/06 , H02N13/00 , B25J9/04 , B25J15/00
CPC分类号： B25J15/0666 , B25J9/0093 , B25J9/0096 , B25J9/044 , B25J15/0085 , B25J19/023 , H02N13/00
摘要： Systems, apparatus, and methods of manufacturing an article using electroadhesion technology, either as a sole modality of handling such materials or in concert with vacuum for the pick up and release of materials, respectively.

47. 发明申请

US20180254211A1 ELECTROSTATIC CHUCK DEVICE 审中-公开
公开(公告)号：US20180254211A1
公开(公告)日：2018-09-06
申请号：US15752863
申请日：2016-08-09
申请人： SUMITOMO OSAKA CEMENT CO., LTD.
发明人： Mamoru KOSAKAI , Shinichi MAETA , Keisuke MAEDA
IPC分类号： H01L21/683 , H01L21/3065 , H02N13/00 , B23Q3/15 , H01L21/67
CPC分类号： H01L21/6833 , B23Q3/15 , H01L21/3065 , H01L21/67109 , H01L21/67248 , H01L21/683 , H01L21/6835 , H02N13/00
摘要： An electrostatic chuck device includes an electrostatic chuck member and a temperature controlling base member. The electrostatic chuck member has a ceramic plate having a mounting surface on which a plate-shaped sample is mounted, and an electrode for electrostatic attraction provided on the other surface on the side opposite the mounting surface of the ceramic plate. The temperature controlling base member is disposed on the surface on the side opposite the ceramic plate side of the electrode for electrostatic attraction and cools the electrostatic chuck member. The ceramic plate has a dike portion which extends to the temperature controlling base member side and surrounds the electrode for electrostatic attraction, the temperature controlling base member has a groove portion accommodating an end part of the dike portion, and a space between the groove portion and the dike portion is filled with a filling part formed of a resin material.

48. 发明申请

US20180179008A1 METHOD AND APPARATUS FOR JOINING THE PLY OF A REEL OF PAPER IN DEPLETION WITH THE INITIAL FLAP OF A NEW REEL 审中-公开
公开(公告)号：US20180179008A1
公开(公告)日：2018-06-28
申请号：US15849814
申请日：2017-12-21
申请人： GAMBINI S.p.A.
发明人： Giovanni Buffa , Fabio Picchi
IPC分类号： B65H19/18 , B65H19/10 , B65H23/04 , H02N13/00
CPC分类号： B65H19/18 , B65H16/028 , B65H19/102 , B65H19/1836 , B65H19/1863 , B65H19/1894 , B65H23/048 , B65H2301/4632 , B65H2301/4636 , B65H2301/5132 , B65H2404/254 , B65H2404/255 , B65H2404/52122 , B65H2701/1924 , H02N13/00
摘要： The present invention concerns a method for joining the ply of a reel of paper in depletion with the initial flap of a new reel, as well as an apparatus adapted for carrying out such a method.Thanks to the method according to the present invention, and to the apparatus suitable for carrying it out, the joining of the reels takes place without using gluing means, like for example the double-sided tape used in known methods, avoiding the relative drawbacks, the adhesion between the plies of the reels to be joined taking place by electrostatic attraction.

49. 发明申请

US20180175749A1 ATTRACTION DEVICE, METHOD FOR PRODUCING ATTRACTION DEVICE, AND VACUUM PROCESSING DEVICE 审中-公开
公开(公告)号：US20180175749A1
公开(公告)日：2018-06-21
申请号：US15719947
申请日：2017-09-29
申请人： ULVAC, INC.
发明人： Ken MAEHIRA , Kou FUWA
IPC分类号： H02N13/00 , H01L21/683 , B23Q3/15 , H01J37/32 , H01J37/34
CPC分类号： H02N13/00 , B23Q3/15 , H01J37/32715 , H01J37/34 , H01L21/67253 , H01L21/683 , H01L21/6833
摘要： Providing a technique for suppressing dust generation at the time of attraction and detachment of an object to be attracted, and for enabling control the attraction force of the attraction device to be uniform. The attraction device of the present invention includes a main body part having attraction electrodes within a dielectric; and an attraction part for attracting a substrate, provided on a surface of the main body part at an attraction-side. The attraction part includes a contact support part that is in contact with, and supports the substrate and a non-contact part that is not in contact with the substrate. In the attraction part, the volume resistivity of the material of the contact support part is greater than the volume resistivity of the material of the non-contact part.

50. 发明授权

US09997389B2 Bipolar mobile electrostatic carriers for wafer processing 有权
公开(公告)号：US09997389B2
公开(公告)日：2018-06-12
申请号：US14991772
申请日：2016-01-08
申请人： TESLA, INC.
发明人： Mehrdad M. Moslehi , David Xuan-Qi Wang
IPC分类号： H01T23/00 , H01L21/683 , G03F7/20 , H01L21/762 , H01L21/768 , H01L21/02 , H01L21/3065 , H02N13/00
CPC分类号： H01L21/6833 , G03F7/70708 , H01L21/02164 , H01L21/0217 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/3065 , H01L21/683 , H01L21/6831 , H01L21/76251 , H01L21/76275 , H01L21/76281 , H01L21/76879 , H02N13/00 , Y02P80/30
摘要： In one embodiment, there is provided a carrier comprising a top semiconductor layer having isolated positive electrode regions and isolated negative electrode regions separated by a frontside trench through the top semiconductor layer extending at least to an underlying insulating layer positioned between the top semiconductor layer and a bottom semiconductor layer. A dielectric layer covers the top exposed surfaces of the carrier. Backside trenches through the bottom semiconductor layer extending at least to the insulating layer form isolated backside regions corresponding to the frontside positive and negative electrode regions. Backside contacts positioned on the bottom semiconductor layer and coupled to the positive and negative electrode regions allow for the electric charging of the frontside electrode regions.

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