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    • 56. 发明授权
    • Encapsulation structure for an optoelectronic component and method for encapsulating an optoelectronic component
    • 用于光电子部件的封装结构和用于封装光电子部件的方法
    • US09412971B2
    • 2016-08-09
    • US14232632
    • 2012-07-05
    • Thilo Reusch
    • Thilo Reusch
    • H01L51/52H05B33/04H01L51/44
    • H01L51/5256H01L51/448H01L51/5253H05B33/04
    • An encapsulation structure for an optoelectronic component may include: a barrier thin-film layer for protecting an optoelectronic component against chemical impurities; a cover layer applied above the barrier thin-film layer and serving for protecting the barrier thin-film layer against mechanical damage; and an intermediate layer applied on the barrier thin-film layer between barrier thin-film layer and cover layer and including a curable material designed such that when the non-cured intermediate layer is applied to the barrier thin-film layer, particle impurities at the surface of the barrier thin-film layer are enclosed by the intermediate layer and the applied intermediate layer has a substantially planar surface, and that after the intermediate layer has been cured, mechanical loads on the barrier thin-film layer as a result of particle impurities during the application of the cover layer are reduced by the intermediate layer.
    • 用于光电子部件的封装结构可以包括:用于保护光电子部件免受化学杂质的阻挡薄膜层; 覆盖层,其被施加在阻挡薄膜层上方,用于保护阻挡薄膜层免受机械损伤; 以及施加在阻挡薄膜层和覆盖层之间的阻挡薄膜层上的中间层,并且包括设计成使得当将未固化的中间层施加到阻挡薄膜层时的可固化材料, 阻挡薄膜层的表面被中间层包围,所施加的中间层具有基本平坦的表面,并且在中间层固化之后,由于颗粒杂质导致阻挡薄膜层上的机械载荷 在覆盖层的应用期间,中间层被还原。
    • 57. 发明授权
    • Display panel
    • 显示面板
    • US09379353B2
    • 2016-06-28
    • US14459764
    • 2014-08-14
    • AU OPTRONICS CORP.
    • Chih-Hung HsiaoShih-Feng Hsu
    • H01L51/52H05B33/22H05B33/04
    • H01L51/5246H05B33/04H05B33/22
    • A display panel has a display region including a first substrate, a second substrate opposite to the first substrate, a frit layer, a first reflective layer, and a second reflective layer. The frit layer surrounding the display region is disposed between the first substrate and the second substrate. The frit layer includes a first edge adjacent to the display region and a second edge adjacent to the peripheral region. The first reflective layer surrounds the first edge, in which an orthogonal projection direction of the first edge of the frit layer partially overlaps with the first reflective layer. The second reflective layer surrounds the second edge, in which an orthogonal projection direction of the second edge of the frit layer partially overlaps with the second reflective layer, and the first reflective layer and the second reflective layer are disposed opposite to each other on the first substrate.
    • 显示面板具有包括第一基板,与第一基板相对的第二基板,玻璃料层,第一反射层和第二反射层的显示区域。 围绕显示区域的玻璃料层设置在第一基板和第二基板之间。 玻璃料层包括与显示区域相邻的第一边缘和邻近周边区域的第二边缘。 第一反射层围绕第一边缘,其中玻璃料层的第一边缘的正交投影方向与第一反射层部分重叠。 第二反射层围绕第二边缘,其中玻璃料层的第二边缘的正交投影方向与第二反射层部分重叠,并且第一反射层和第二反射层在第一边缘上彼此相对设置 基质。
    • 58. 发明授权
    • Gas barrier film
    • 阻气膜
    • US09359527B2
    • 2016-06-07
    • US14759525
    • 2014-01-09
    • Konica Minolta, Inc.
    • Kazutoshi Murota
    • C09D183/16H05B33/04C09D183/00H01L51/52
    • C09D183/16C08G77/62C09D183/00H01L51/524H05B33/04C08K5/17C08K5/06
    • The purpose of the present invention is to provide a gas barrier film which exhibits excellent storage stability, in particular, excellent storage stability even under harsh conditions (high temperature and high moisture conditions).The present invention pertains to a gas barrier film which comprises a substrate and a silicon-containing film that has a chemical composition represented by the following Chemical Formula (1) and that satisfies the relationships represented by Mathematical Formula 1 and Mathematical Formula 2: [Mathematical Formula 1] 0.001≦Y/(X+Y)≦0.25  Mathematical Formula 1 3.30≦3Y+2X≦4.80  Mathematical Formula 2 in Chemical Formula (1), M represents at least one selected from a group consisting of the elements belonging to Group 2 to Group 14 in the long period type Periodic Table (with the proviso that, silicon and carbon are excluded), x represents an atomic ratio of oxygen relative to silicon, y represents an atomic ratio of nitrogen relative to silicon, and z represents an atomic ratio of M relative to silicon, which is 0.01 to 0.3, and in Mathematical Formula 1 and Mathematical Formula 2, X=x/(1+(az/4)), and Y=y/(1+(az/4)) (with the proviso that, a is the valency of the element M).
    • 本发明的目的是提供即使在恶劣条件(高温和高湿度条件)下也具有优异的储存稳定性,特别是优异的储存稳定性的阻气膜。 本发明涉及一种阻气膜,其包含具有由以下化学式(1)表示的化学组成并满足由数学式1和数学式2表示的关系的基材和含硅膜:[数学 式1] 0.001≦̸ Y /(X + Y)≦̸ 0.25数学式1 3.30≦̸ 3Y + 2X≦̸ 4.80化学式(1)中的数学式2,M表示选自元素 属于长周期型周期表中第2组至第14组(条件是不包括硅和碳),x表示氧相对于硅的原子比,y表示氮相对于硅的原子比, z表示相对于硅的M的原子比,其为0.01〜0.3,在数学式1和数学式2中,X = x /(1 +(az / 4)),Y = y /(1 + az / 4))(条件是a是th的化合价 e元素M)。