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61. 发明申请

US20060040139A1 Electronic devices made with metal Schiff base complexes 审中-公开
公开(公告)号：US20060040139A1
公开(公告)日：2006-02-23
申请号：US11207083
申请日：2005-08-18
申请人： Norman Herron , Ying Wang , Lucy Clarkson
发明人： Norman Herron , Ying Wang , Lucy Clarkson
IPC分类号： B32B19/00
CPC分类号： H01L51/0081 , H05B33/20
摘要： The present invention relates to new electronic devices including a layer comprising a photoactive material and metal Schiff base complex, wherein the metal Schiff base complex is present as a host for the photoactive material or in a layer between the cathode and the photoactive material containing layer, or both.

62. 发明申请

US20060020022A1 Enantioselective separation method 审中-公开
标题翻译：对映选择性分离方法
公开(公告)号：US20060020022A1
公开(公告)日：2006-01-26
申请号：US11187464
申请日：2005-07-22
申请人： Brian Chekal , Ernst Freund , Charles Minard Grill , Elke Huthmann , Markus Juza , Vera Leshchinskaya , Mark Thomas Maloney , Lawrence Marvin Miller , Ying Wang , Ming Zeng
发明人： Brian Chekal , Ernst Freund , Charles Minard Grill , Elke Huthmann , Markus Juza , Vera Leshchinskaya , Mark Thomas Maloney , Lawrence Marvin Miller , Ying Wang , Ming Zeng
IPC分类号： C07D311/04 , A61K31/353
CPC分类号： C07B57/00 , B01D15/1814 , B01D15/1857 , B01D15/1864 , C07D311/04 , C07D311/58 , C07D335/06
摘要： This invention relates to a method for separating enantiomers of a substituted 2-trifluoromethyl-2H-chromene-3-carboxylic acid or ester, a substituted 2-trifluoromethyl-1,2-dihydro-quinoline-3-carboxylic acid or ester, a substituted 2-trifluoromethyl-2H-thiochromene-3-carboxylic acid or ester, a substituted 3-trifluoromethyl-3,4-dihydro-naphthalene-2-carboxylic acid or ester, or a pharmaceutically acceptable salt of the acids or esters, using enantioselective fractional crystallization, enantioselective high performance liquid chromatography, enantioselective steady state recycling chromatography, or enantioselective multicolumn chromatography.
摘要翻译：本发明涉及一种分离取代的2-三氟甲基-2H-色烯-3-羧酸或酯，取代的2-三氟甲基-1,2-二氢喹啉-3-羧酸或酯的对映异构体的方法， 2-三氟甲基-2H-二氢吡喃-3-羧酸或酯，取代的3-三氟甲基-3,4-二氢 - 萘-2-羧酸或酯，或其酸或酯的药学上可接受的盐，使用对映选择性分数结晶，对映选择性高效液相色谱法，对映选择性稳态循环色谱法或对映选择性多色谱法。

63. 发明授权

US06946688B2 Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds 有权
标题翻译：具有氟化苯基吡啶，苯基嘧啶和苯基喹啉的电致发光铱化合物和由这些化合物制成的装置
公开(公告)号：US06946688B2
公开(公告)日：2005-09-20
申请号：US10696003
申请日：2003-10-29
申请人： Vladimir Grushin , Daniel David Lecloux , Viacheslav A. Petrov , Ying Wang
发明人： Vladimir Grushin , Daniel David Lecloux , Viacheslav A. Petrov , Ying Wang
IPC分类号： H01L51/50 , C07D213/26 , C07D213/30 , C07D213/61 , C07D213/68 , C07D215/04 , C07D215/12 , C07D239/26 , C07F15/00 , C09K11/06 , H01L51/00 , H01L51/30 , H05B33/14 , H01L33/00 , H01L21/00 , H01L35/24 , H01L51/40
CPC分类号： C07D213/26 , C07D213/30 , C07D213/61 , C07D213/68 , C07D215/04 , C07D239/26 , C07F15/0033 , C09K11/06 , C09K2211/1007 , C09K2211/1011 , C09K2211/1014 , C09K2211/1029 , C09K2211/185 , H01L51/005 , H01L51/0084 , H01L51/0085 , H01L51/50 , H01L51/5012 , H05B33/14 , Y10S428/917
摘要： The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines, phenylpyrimidines, and phenylquinolines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds.
摘要翻译：本发明一般涉及用于制备Ir（III）化合物的电致发光Ir（III）化合物，取代的2-苯基吡啶，苯基嘧啶和苯基喹啉，以及用Ir（III）化合物制成的装置。

64. 发明申请

US20050159597A1 3-Quinuclidinyl amino-substituted biaryl derivatives 有权
标题翻译： 3-喹啉基氨基取代的联芳基衍生物
公开(公告)号：US20050159597A1
公开(公告)日：2005-07-21
申请号：US11015158
申请日：2004-12-17
申请人： Jianguo Ji , Tao Li , Ying Wang
发明人： Jianguo Ji , Tao Li , Ying Wang
IPC分类号： C07D453/02 , C07D487/04
CPC分类号： C07D453/02
摘要： Compounds of formula (I) wherein A is N or N+—O−; n is 0, 1, or 2; Y is O, S, —NH—, and —N-alkyl-; Ar1 is both 6-membered aromatic rings; Ar2 is 5- or 6-membered aromatic rings with a —NR8R9 group, as defined herein. The compounds are useful in treating conditions or disorders prevented by or ameliorated by α7 nAChR ligands. Also disclosed are pharmaceutical compositions having compounds of formula (I) and methods for using such compounds and compositions.
摘要翻译：式（I）的化合物，其中A是N或N +，-O - n为0,1或2; Y是O，S，-NH-和-N-烷基 - ; Ar 1是两个6元芳环; Ar 2是如本文所定义的具有-NR 8 R 9 R 9基团的5-或6-元芳环。该化合物可用于治疗由α7nAChR配体预防或改善的病症或病症。还公开了具有式（I）化合物的药物组合物和使用这些化合物和组合物的方法。

65. 发明授权

US06916598B2 Ionization radiation imageable photopolymer compositions 失效
标题翻译：电离辐射可成像光聚合物组合物
公开(公告)号：US06916598B2
公开(公告)日：2005-07-12
申请号：US10394060
申请日：2003-03-21
申请人： Ying Wang
发明人： Ying Wang
IPC分类号： C08F2/54 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/038 , G03C1/725 , G03C1/73 , G03F7/032 , G03F7/30
CPC分类号： G03F7/027 , B33Y70/00 , G03F7/0037 , G03F7/038 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/143 , Y10S430/146 , Y10S430/154 , Y10S430/167 , Y10S430/168
摘要： This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.
摘要翻译：本发明公开了可以在暴露于诸如x射线，电子束，离子束和γ射线之类的电离辐射的情况下成像聚合/交联的组合物。本发明还公开了用于陶瓷微制造，立体光刻和用于光致抗蚀剂的x射线，电子束和离子束光刻的这些组合物的使用方法。

66. 发明申请

US20050095457A1 Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made such compounds 审中-公开
标题翻译：具有氟化苯基吡啶，苯基嘧啶和苯基喹啉的电致发光铱化合物和制备这种化合物的装置
公开(公告)号：US20050095457A1
公开(公告)日：2005-05-05
申请号：US10983119
申请日：2004-11-05
申请人： Vladimir Grushin , Viacheslav Petrov , Ying Wang
发明人： Vladimir Grushin , Viacheslav Petrov , Ying Wang
IPC分类号： H01L51/50 , C07D213/26 , C07D213/30 , C07D213/61 , C07D213/68 , C07D215/04 , C07D215/12 , C07D239/26 , C07F15/00 , C09K11/06 , H01L51/00 , H01L51/30 , H05B33/14 , C07D213/02 , C07D215/00
CPC分类号： H05B33/14 , C07D213/26 , C07D213/30 , C07D213/61 , C07D213/68 , C07D215/04 , C07D239/26 , C07F15/0033 , C09K11/06 , C09K2211/1007 , C09K2211/1011 , C09K2211/1014 , C09K2211/1029 , C09K2211/185 , H01L51/005 , H01L51/0084 , H01L51/0085 , H01L51/50 , H01L51/5012 , Y10S428/917
摘要： The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines, phenylpyrimidines, and phenylquinolines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds.
摘要翻译：本发明一般涉及用于制备Ir（III）化合物的电致发光Ir（III）化合物，取代的2-苯基吡啶，苯基嘧啶和苯基喹啉，以及用Ir（III）化合物制成的装置。

67. 发明申请

US20050014019A1 Method of selecting a charge transport and/or anti-quenching material 审中-公开
标题翻译：选择电荷输送和/或抗淬火材料的方法
公开(公告)号：US20050014019A1
公开(公告)日：2005-01-20
申请号：US10623042
申请日：2003-07-18
申请人： Ying Wang
发明人： Ying Wang
IPC分类号： C40B60/14 , G01N21/64 , H01L51/00 , H01L51/50 , G01N21/00 , H05B33/00
CPC分类号： G01N21/643 , B01J2219/00315 , B01J2219/00364 , B01J2219/005 , B01J2219/00585 , B01J2219/00596 , B01J2219/00653 , B01J2219/00659 , B01J2219/0072 , C40B60/14 , G01N2021/6432 , H01L51/0032 , H01L51/0059 , H01L51/0062 , H01L51/007 , H01L51/0081 , H01L51/5048
摘要： A method for selecting charge transport and/or anti-quenching materials is presented. The method includes determining a first luminescence intensity I0 of a luminescent material in the absence of the charge transport and/or anti-quenching material, determining a second luminescence intensity Iq of the luminescent material in the presence of the charge transport and/or anti-quenching material, and comparing the first luminescence intensity I0 with the second luminescence intensity Iq to determine a luminescence quenching constant of the charge transport and/or anti-quenching material with respect to the luminescent material. A device made using charge transport and/or anti-quenching material selected using the selection method and a kit to practice the selection method.
摘要翻译：提出了选择电荷传输和/或抗淬火材料的方法。该方法包括在没有电荷传输和/或抗猝灭材料的情况下确定发光材料的第一发光强度I0，在存在电荷输送和/或抗反射的情况下确定发光材料的第二发光强度Iq，淬火材料，并且将第一发光强度I0与第二发光强度Iq进行比较，以确定电荷输送和/或抗淬火材料相对于发光材料的发光猝灭常数。使用选择方法选择的使用电荷传输和/或抗猝灭材料制成的器件和用于实践选择方法的试剂盒。

68. 发明授权

US06777676B1 Non-destructive root cause analysis on blocked contact or via 有权
标题翻译：对破坏性接触或通过的非破坏性根本原因分析
公开(公告)号：US06777676B1
公开(公告)日：2004-08-17
申请号：US10303267
申请日：2002-11-21
申请人： Ying Wang , Yeishin Tung , Anne Testoni
发明人： Ying Wang , Yeishin Tung , Anne Testoni
IPC分类号： G01N2300
CPC分类号： G01N23/225 , H01J2237/2561
摘要： Disclosed are apparatus and methods for characterizing a potential defect of a semiconductor structure. A charged particle beam is scanned over a structure which has a potential defect. X-rays are detected from the scanned structure. The X-rays are in response to the charged particle beam being scanned over the structure. The potential defect of the scanned structure is characterized based on the detected X-rays. For example, it may be determined whether a potentially defective via has a SiO2 plug defect by comparing an X-ray count ratio of oxygen over silicon of the defective via with an X-ray count ratio of a known defect-free reference via. If the defective via has a relatively high ratio (more oxygen than silicon) as compared to the reference via, then it may be determined that a SiO2 plug defect is present within the defective via. Otherwise, the via may be defmed as having a different type of defect (e.g., not a SiO2 plug defect) or defined resulting in a “false” defect. Accordingly, specific embodiments of the present invention may be utilized to filter “false” defects from a defect sample.
摘要翻译：公开了用于表征半导体结构的潜在缺陷的装置和方法。带电粒子束在具有潜在缺陷的结构上扫描。从扫描结构检测X射线。 X射线响应于在结构上扫描的带电粒子束。基于检测到的X射线来表征扫描结构的潜在缺陷。例如，可以通过将有缺陷的通孔的硅上的氧的X射线计数比与已知的无缺陷参考通孔的X射线计数比进行比较，来确定潜在缺陷通孔是否具有SiO 2插塞缺陷。如果故障通孔与参考通孔相比具有相对高的比率（比硅更多的氧），则可以确定在缺陷通孔内存在SiO 2插塞缺陷。否则，可以将通孔定义为具有不同类型的缺陷（例如，不是SiO2插塞缺陷）或定义导致“假”缺陷。因此，可以利用本发明的具体实施例来从缺陷样品中过滤“假”缺陷。

69. 发明授权

US06670645B2 Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds 有权
公开(公告)号：US06670645B2
公开(公告)日：2003-12-30
申请号：US10027421
申请日：2001-12-20
申请人： Vladimir Grushin , Daniel D. Lecloux , Viacheslav A. Petrov , Ying Wang
发明人： Vladimir Grushin , Daniel D. Lecloux , Viacheslav A. Petrov , Ying Wang
IPC分类号： H01L3300
CPC分类号： C07D213/26 , C07D213/30 , C07D213/61 , C07D213/68 , C07D215/04 , C07D239/26 , C07F15/0033 , C09K11/06 , C09K2211/1007 , C09K2211/1011 , C09K2211/1014 , C09K2211/1029 , C09K2211/185 , H01L51/005 , H01L51/0084 , H01L51/0085 , H01L51/50 , H01L51/5012 , H01L51/5228 , H05B33/14
摘要： The present invention is generally directed to electroluminescent Ir(III) compounds, the substituted 2-phenylpyridines, phenylpyrimidines, and phenylquinolines that are used to make the Ir(III) compounds, and devices that are made with the Ir(III) compounds.

70. 发明授权

US06654521B2 Diffraction compensation of FBG phase masks for multi-channel sampling applications 有权
$Diffraction compensation of FBG phase masks for multi-channel sampling applications$
标题翻译：用于多通道采样应用的FBG相位掩模的衍射补偿
公开(公告)号：US06654521B2
公开(公告)日：2003-11-25
申请号：US10056575
申请日：2002-01-23
申请人： Yunlong Sheng , Joshua E. Rothenberg , HongPu Li , Ying Wang , Jason Zweiback
发明人： Yunlong Sheng , Joshua E. Rothenberg , HongPu Li , Ying Wang , Jason Zweiback
IPC分类号： G02B634
CPC分类号： G02B6/02085 , G02B6/02138
摘要： The present invention is directed to a system and method for designing efficient multi-channel FBG gratings using a pre-compensated phase mask for diffracting light for side-writing the grating on an optical fiber core. A desired phase function of the FBG is generated, specifically tailored to an effective spacing between the phase mask and the optical fiber core. From the phase function a phase mask is pre-compensated to offset diffraction effects associated with each longitudinal position of the FBG receiving light from two corresponding longitudinal positions of the phase mask substantially symmetrically spaced longitudinally relative to each particular longitudinal position of the FBG. The two corresponding longitudinal positions of the phase mask are spaced longitudinally from each other by a spacing determined by the effective spacing between the phase mask and fiber core and by the first order diffraction angle of light through the phase mask.
摘要翻译：本发明涉及一种用于使用预补偿相位掩模设计有效的多通道FBG光栅的系统和方法，用于衍射光以在光纤芯上侧写光栅。产生FBG的期望相位函数，专门针对相位掩模和光纤芯之间的有效间隔。从相位函数中，相位掩模被预补偿以抵消与FBG的每个纵向位置相关联的衍射效应，所述FBG接收来自相位掩模的两个相应纵向位置的光，其相对于FBG的每个特定纵向位置基本对称地间隔开。相位掩模的两个对应的纵向位置彼此纵向间隔由相位掩模和光纤芯之间的有效间隔确定的间隔以及通过相位掩模的一阶衍射光角。

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