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61. 发明申请

US20210082659A1 LIGHT GUIDE ASSEMBLY FOR AN ELECTRON MICROSCOPE 有权
公开(公告)号：US20210082659A1
公开(公告)日：2021-03-18
申请号：US17011378
申请日：2020-09-03
申请人： FEI Company
发明人： Marek Uncovsky , Michal Geryk , Jan Lasko
IPC分类号： H01J37/244 , H01J37/28 , H01J37/22
摘要： An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.

62. 发明申请

US20210049749A1 TRAINING AN ARTIFICIAL NEURAL NETWORK USING SIMULATED SPECIMEN IMAGES 有权
公开(公告)号：US20210049749A1
公开(公告)日：2021-02-18
申请号：US17072035
申请日：2020-10-16
申请人： FEI Company
发明人： Ondrej Machek , Tomá{hacek over (s)} Vystavel , Libor Strako{hacek over (s)} , Pavel Potocek
IPC分类号： G06T7/00 , G06N3/08 , G06K9/62
摘要： Techniques for training an artificial neural network (ANN) using simulated specimen images are described. Simulated specimen images are generated based on data models. The data models describe characteristics of a crystalline material and characteristics of one or more defect types. The data models do not include any image data. Simulated specimen images are input as training data into a training algorithm to generate an artificial neural network (ANN) for identifying defects in crystalline materials. After the ANN is trained, the ANN analyzes captured specimen images to identify defects shown therein.

63. 发明申请

US20210035775A1 SYSTEM AND METHOD FOR BEAM POSITION VISUALIZATION 有权
公开(公告)号：US20210035775A1
公开(公告)日：2021-02-04
申请号：US16712553
申请日：2019-12-12
申请人： FEI Company
发明人： Branislav Straka , Radek Smolka , Lukas Kral , Jan Skalicky
IPC分类号： H01J37/28
摘要： A charged-particle beam (CPB) is aligned to a primary axis of a CPB microscope by determining a first beam deflection drive to a beam deflector for directing the CPB passing a reference location displaced from the primary axis. The beam deflector is provided with a second beam deflection drive during the working mode of the CPB microscope to propagate the beam along the primary axis. The second beam deflection drive is determined based on the first beam deflection drive.

64. 发明申请

US20210020400A1 METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR 有权
公开(公告)号：US20210020400A1
公开(公告)日：2021-01-21
申请号：US16929752
申请日：2020-07-15
申请人： FEI Company
发明人： Bart Jozef Janssen , Pleun Dona
IPC分类号： H01J37/28 , H01J37/244
摘要： The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.

65. 发明申请

US20210005420A1 METHODS AND SYSTEMS FOR ACQUIRING ELECTRON BACKSCATTER DIFFRACTION PATTERNS 有权
公开(公告)号：US20210005420A1
公开(公告)日：2021-01-07
申请号：US16460749
申请日：2019-07-02
申请人： FEI Company
发明人： Pavel Stejskal , Christopher J. Stephens
IPC分类号： H01J37/295 , H01J37/244 , H01J37/26 , G01N23/203 , G01N23/20058
摘要： Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.

66. 发明申请

US20200373115A1 MULTI-BEAM SCANNING ELECTRON MICROSCOPE 审中-公开
公开(公告)号：US20200373115A1
公开(公告)日：2020-11-26
申请号：US16421192
申请日：2019-05-23
申请人： FEI Company
发明人： Ali Mohammadi-Gheidari , Alexander Henstra
IPC分类号： H01J37/09 , H01J37/20 , H01J37/28 , H01J37/21 , H01J37/153 , H01J37/14
摘要： Variable multi-beam charged particle devices for inspection of a sample include a multi-beam source that produces a plurality of charged particle beamlets, an objective lens, a sample holder for holding the sample between the objective lens and the multi-beam source, and a focusing column that directs the plurality of charged particle beamlets so that they are incident upon the sample. The focusing column directs the plurality of charged beams such that there are one or more crossovers of the plurality of charged particle beamlets, where each crossover corresponds to a point where the plurality of charged particle beamlets pass through a common location. The variable multi-beam charged particle devices also include a variable aperture that is configured to vary the current of the plurality of charged particle beamlets, and which is located at a final crossover of the one or more crossovers that is most proximate to the sample.

67. 发明授权

US10830586B1 Confocal chromatic sensor systems 有权
公开(公告)号：US10830586B1
公开(公告)日：2020-11-10
申请号：US16445974
申请日：2019-06-19
申请人： FEI Company
发明人： Kelly Bruland
IPC分类号： G01C3/08 , H01J37/20 , H01J37/26
摘要： Confocal chromatic sensor systems for determining position of a sample include a beam emitter that emits a multichromatic beam incident on a surface of a sample, and a beam detector that is separate from the beam emitter and which detects a portion of the multichromatic beam reflected by the surface. The beam emitter is configured such that light of different wavelengths within the multichromatic beam have different corresponding focal lengths. The systems can include a memory storing computer readable instructions that cause a processing unit to determine which wavelength(s) are most prevalent in the detected portion of the multichromatic beam, and then determine the distance between the surface and the beam emitter based on the wavelength(s). When the surface is a sample within a charged particle beam system, a focus of the charged particle beam system or a sample position may be adjusted based on the position of the sample.

68. 发明授权

US10825648B2 Studying dynamic specimens in a transmission charged particle microscope 有权
公开(公告)号：US10825648B2
公开(公告)日：2020-11-03
申请号：US16364019
申请日：2019-03-25
申请人： FEI Comapny
发明人： Bastiaan Lambertus Martinus Hendriksen , Erik René Kieft
IPC分类号： H01J37/28 , H01J37/244 , H01J37/26 , H01J37/04
摘要： Methods and systems for examining a dynamic specimen using a Transmission Charged Particle Microscope are disclosed. An example method includes sparsifying a beam of charged particles to produce at detector an image of a sample comprising a distribution of sub-images that are mutually isolated from one another at least along an elected scan path, and using a scanning assembly to cause relative motion of said image and said detector along said scan path during a time interval Δt so as to smear out each sub-image into a detection streak on said detector, each such streak capturing temporal evolution of its associated sub-image during said time interval Δt.

69. 发明授权

US10811221B1 Secondary electron detection efficiency 有权
公开(公告)号：US10811221B1
公开(公告)日：2020-10-20
申请号：US16370066
申请日：2019-03-29
申请人： FEI Company
发明人： Qinsong Steve Wang , Jim McGinn , Peter Tvaro{hacek over (z)}ek , Amir Weiss
IPC分类号： H01J37/244 , H01J37/21
摘要： Systems and devices for improving the efficiency of secondary electron detection in charged particle beam systems include a charged particle detector, a first elongate member coupled with the charged particle detector, and a second elongate member coupled with the charged particle detector. The first elongate member and the second elongate member each extend away from the charged particle detector. The system also includes at least one drawing member that is coupled with the first elongate member. Additionally, at least one electrical connection point is arranged to supply at least one bias voltage to the first elongate member, the second elongate member, and the drawing member. The drawing member is configured to generate an electromagnetic field that applies a drawing force that draws charged particles away from the charged particle source, and/or reduces the amount of charged particles from the charged particle source that strike the charged particle tool.

70. 发明申请

US20200266030A1 FOCUSED ION BEAM IMPURITY IDENTIFICATION 审中-公开
公开(公告)号：US20200266030A1
公开(公告)日：2020-08-20
申请号：US16279837
申请日：2019-02-19
申请人： FEI Company
发明人： Jeremy Graham , Lukas Kral
IPC分类号： H01J37/30 , H01J37/28 , G01N23/2251
摘要： A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.

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