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1. 发明申请

US20180352177A1 IMAGE-PROCESSING DEVICE 审中-公开
公开(公告)号：US20180352177A1
公开(公告)日：2018-12-06
申请号：US15757933
申请日：2016-09-08
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Yuichiro KOMIYA , Muneaki YAMAGUCHI
IPC分类号： H04N5/357 , G06K9/32 , G06N3/08 , G06T7/00 , G06T7/246
CPC分类号： G06T1/00 , G06T7/00 , H04N7/18
摘要： An image-processing device for performing correction processing and event detection adaptively to the effect of a disturbance that an input image has received is disclosed. The device has a disturbance detection unit, an image correction unit, and an event detection unit. The disturbance detection unit analyzes an input image, detects the effects of a plurality of disturbances that the input image has received, and outputs the detected effects as disturbance information. The image correction unit applies correction processing to an input video in accordance with the disturbance information, and outputs a corrected image and correction information indicating the actually applied correction. The disturbance detection unit estimates the degree of the plurality of disturbances residual in the corrected image from the disturbance information and the correction information, and detects a specific event using a detection process selected in accordance with the degree of disturbances. The plurality of disturbances are three that includes, for example, a mist, heat haze, and noise.

2. 发明申请

US20230125890A1 IMAGE ANALYSIS SYSTEM, IMAGE ANALYSIS METHOD, AND IMAGE ANALYSIS PROGRAM 有权
公开(公告)号：US20230125890A1
公开(公告)日：2023-04-27
申请号：US17909458
申请日：2021-03-11
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Keigo HASEGAWA , Wataru ITO , Kazunari IWANAGA
IPC分类号： G06V20/52 , G06T7/00 , G06T7/11
摘要： There is provided an image analysis system having an image analysis server which analyzes an input image of a monitoring area and detects a state of a specific monitored object. The image analysis server is configured to divide, in the input image of the monitoring area, a portion of an area in which the monitored object is expected to be present into a plurality of grids, generate a trained model trained by associating “1” with an image of a grid in which the monitored object is present and “0” with an image of a grid in which the monitored object is not present for each grid, calculate, for the input image, a confidence of a presence of the monitored object for each grid using the trained model, determine a presence or absence of the monitored object in the monitoring area based on confidences of the plurality of grids, and detect an abnormality when a confidence value in at least one of the grids is inconsistent with the determination result.

3. 发明授权

US11551080B2 Learning dataset generation method, new learning dataset generation device and learning method using generated learning dataset 有权
公开(公告)号：US11551080B2
公开(公告)日：2023-01-10
申请号：US16618183
申请日：2017-05-30
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Hiroto Sasao
IPC分类号： G06G7/00 , G06N3/08 , G06F7/08 , G06N3/04
摘要： Even if an existing learning dataset is limited, a new learning dataset with sufficient variation is generated. Therefore, for each of a plurality of learning data subsets, new input signals are generated from input signals of a plurality of pieces of learning data, and a plurality of pieces of new learning data that are respectively combinations of the new input signals and output signals of the corresponding learning data subset are generated. The input signals of the plurality of pieces of the learning data included in the corresponding learning data subset are divided into a first signal group and a second signal group, and the new input signals are generated by a learning device that is generated by performing learning by the first signal group set as an input signal set and the second signal group set as an output signal set.

4. 发明授权

US11476112B2 Substrate processing apparatus 有权
公开(公告)号：US11476112B2
公开(公告)日：2022-10-18
申请号：US15918858
申请日：2018-03-12
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Akinori Tanaka , Hideto Tateno , Sadayoshi Horii
IPC分类号： H01L21/02 , C23C16/40 , H01L21/67 , C23C16/56 , C23C16/455 , C23C16/448 , H01L21/31 , C23C16/44 , H01J37/32
摘要： Described herein is a technique capable of acquiring, monitoring and recording the progress of the reaction between a substrate and a reactive gas contained in a process gas in a process chamber during the processing of the substrate. According to the technique, there is provided a substrate processing apparatus including: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber via a process gas supply pipe; an exhaust pipe configured to exhaust an inner atmosphere of the process chamber; a first gas concentration sensor configured to detect a first concentration of a reactive gas contained in the process gas in the process gas supply pipe; and a second gas concentration sensor configured to detect a second concentration of the reactive gas contained in an exhaust gas in the exhaust pipe.

5. 发明授权

US11450524B2 Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium 有权
公开(公告)号：US11450524B2
公开(公告)日：2022-09-20
申请号：US15921343
申请日：2018-03-14
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Kosuke Takagi , Risa Yamakoshi , Takanori Ueno
IPC分类号： C23C16/40 , H01L21/02 , C23C16/455 , C23C16/458
摘要： There is provided a technique that includes a process chamber in which a process is performed to a substrate, the process including forming a film containing a main element, a first nozzle configured to supply a precursor containing the main element to the substrate in the process chamber, and a second nozzle configured to supply a reactant to the substrate in the process chamber. The first nozzle includes a first ceiling hole provided at a ceiling portion of the first nozzle and opened in a vertical direction, and a plurality of first side holes provided at a side portion of the first nozzle and opened in a horizontal direction. An opening area of the first ceiling hole is larger than an opening area of each of the plurality of first side holes.

6. 发明申请

US20220189152A1 VIDEO SYSTEM, IMAGING DEVICE, AND VIDEO PROCESSING DEVICE 有权
公开(公告)号：US20220189152A1
公开(公告)日：2022-06-16
申请号：US17438913
申请日：2019-03-20
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Takaomi KANDA
IPC分类号： G06V10/82 , G06N3/04
摘要： A system configuration suitable for carrying out video recognition by machine learning in a video system including an imaging device and a video processing device is provided.
One aspect of the video system according to the present invention includes an imaging device and a video processing device. The imaging device includes an imaging unit configured to generate video data by imaging, a front side NN unit including multiple layers of neural networks from an input layer to a predetermined intermediate hidden layer (hereinafter referred to as “intermediate hidden layer”) that are configured to perform recognition processing of the video data; and an imaging side control unit configured to transmit an output of the intermediate hidden layer of the front side NN unit (hereinafter referred to as “intermediate feature quantity”). The video processing device includes a video processing side control unit configured to acquire the intermediate feature quantity transmitted from the imaging side control unit, and a rear side NN unit including the multiple layers of the neural networks from a layer subsequent the intermediate hidden layer to an output layer, the rear side NN unit configured to perform the remaining recognition processing regarding the intermediate feature quantity acquired by the video processing side control unit.

7. 发明申请

US20220167156A1 COMMUNICATION SYSTEM 有权
公开(公告)号：US20220167156A1
公开(公告)日：2022-05-26
申请号：US17593215
申请日：2019-03-18
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Satoru YASUI
IPC分类号： H04W12/04 , H04L9/08 , H04L9/14 , H04W12/03
摘要： A public key of a sensor node key pair is transmitted from a sensor node 22 to a server 20 via sensor network communication, and furthermore is transmitted from the server 20 to a mobile terminal 25 via mobile line communication. In addition, a public key of a mobile terminal key pair is transmitted from the mobile terminal 25 to the sensor node 22 through local communication. Thus, the configuration allows the sensor node 22 and the mobile terminal 25 to generate a common key by combining their own private key and the public key of the counterpart in order to encrypt the local communication by using this common key.

8. 发明申请

US20220115210A1 HIGH-FREQUENCY POWER SUPPLY DEVICE AND SUBSTRATE PROCESSING DEVICE 有权
公开(公告)号：US20220115210A1
公开(公告)日：2022-04-14
申请号：US17268100
申请日：2018-09-13
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： NAOTO TAKAHASHI , NAOYA FUJIMOTO , SUNAO EGASHIRA , YOSHIYUKI OSHIDA
IPC分类号： H01J37/32 , H04L27/26
摘要： A radio frequency (RF) generator device for supplying RF powers of different frequencies to multiple antennas disposed in a chamber is provided. The RF generator device includes a plurality of RF generators configured to supply the RF powers of the different frequencies to the multiple antennas, and a plurality of RF controllers configured to control the RF generators, respectively. Each of the RF controllers includes a fast Fourier transformer, and a filter. The fast Fourier transformer performs fast Fourier transform on a signal introduced as a reflected wave to decompose the signal into frequency components, and the filter removes waves having frequency components that are not outputted from the corresponding RF generator.

9. 发明授权

US11293096B2 Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer 有权
公开(公告)号：US11293096B2
公开(公告)日：2022-04-05
申请号：US15870283
申请日：2018-01-12
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Atsushi Morikawa , Masakazu Shimada , Takeshi Kasai , Kenichi Suzaki , Hirohisa Yamazaki , Yoshimasa Nagatomi
IPC分类号： H01L21/02 , H01L21/67 , C23C16/455 , C23C16/40 , C23C16/458 , C23C16/448
摘要： A vaporization system includes a vaporization chamber having a first portion and a second portion. A first fluid supply part is connected to the first portion of the vaporization chamber, and configured to supply a mixed fluid in which a first carrier gas and a liquid precursor are mixed, toward the second portion. A second fluid supply part is configured to supply a second carrier gas toward the mixed fluid at the second portion.

10. 发明授权

US11198935B2 Heating part, substrate processing apparatus, and method of manufacturing semiconductor device 有权
公开(公告)号：US11198935B2
公开(公告)日：2021-12-14
申请号：US15272798
申请日：2016-09-22
申请人： HITACHI KOKUSAI ELECTRIC INC. , TOKYO TECHNOLOGICAL LABO CO., LTD.
发明人： Shinobu Sugiura , Yosuke Kuwata , Tomoyasu Miyashita , Atsushi Umekawa , Kazuhiro Kimura , Akihiko Hiratsuka , Kaoru Kataoka , Ryosuke Arai
IPC分类号： C23C16/44 , C23C16/455 , H01L21/67
摘要： A heating part of covering and heating a gas pipe includes: a thermal insulation portion disposed outside a heat generation body; an enclosure configured to enclose the thermal insulation portion and the heat generation body; a fastening part installed outside the enclose and configured to fasten one end portion and the other end portion of the enclosure in a state in which the one end portion and the other end portion of the enclosure adjoin each other; and a temperature sensing part disposed at the side of the gas pipe with respect to the enclosure at a position facing a surface of the gas pipe and formed in a plate shape with a major surface thereof oriented toward the gas pipe.

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