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1. 发明授权

US07375045B2 High dense sintered body of aluminum nitride, method for preparing the same and member for manufacturing semiconductor using the sintered body 有权
标题翻译：氮化铝的高致密烧结体，其制造方法以及使用该烧结体制造半导体的部件
公开(公告)号：US07375045B2
公开(公告)日：2008-05-20
申请号：US11405243
申请日：2006-04-17
申请人： Min-Woo Lee , Hyung Suk Ahn , Sung-Min Lee
发明人： Min-Woo Lee , Hyung Suk Ahn , Sung-Min Lee
IPC分类号： C04B35/581 , C04B35/582
CPC分类号： C04B35/581 , C04B2235/3206 , C04B2235/3225 , C04B2235/3232 , C04B2235/5436 , C04B2235/5445 , C04B2235/662 , C04B2235/77 , C04B2235/80 , H01L21/6831
摘要： The present invention provide a high dense aluminum nitride sintered body, a preparing method thereof, and a member for manufacturing semiconductor using the sintered body which has excellent leakage current characteristic, enough adsorbing property, good detachment property and excellent thermal conductivity and so can be applied to even a member for manufacturing semiconductor requiring high volume resistivity like the coulomb type electrostatic chucks as well as the Johnsen-Rahbek type electrostatic chucks.
摘要翻译：本发明提供一种高密度氮化铝烧结体及其制备方法以及使用该烧结体制造半导体的部件，其具有优异的漏电流特性，足够的吸附性，良好的剥离性和优异的导热性等。甚至是制造需要高体积电阻率的半导体器件的成员，如库仑型静电卡盘以及Johnsen-Rahbek型静电卡盘。

2. 发明申请

US20070023065A1 Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method 审中-公开
标题翻译：去除物体上的颗粒的方法，用于执行去除方法的装置，测量物体上的颗粒的方法和用于执行测量方法的装置
公开(公告)号：US20070023065A1
公开(公告)日：2007-02-01
申请号：US11481340
申请日：2006-07-05
申请人： Sang-Yup Kim , Sung-Soo Jang , Guk-Pil Kim
发明人： Sang-Yup Kim , Sung-Soo Jang , Guk-Pil Kim
IPC分类号： B08B6/00
CPC分类号： B08B5/02 , B08B7/0035 , H01L21/67011 , H01L21/67069
摘要： In a method of removing particles on an object in accordance with one aspect of the present invention, air is injected into a space where the object is placed to remove foreign substances in the space. A first light is irradiated onto the object to remove charges in the object. A second light is irradiated onto the object to remove moisture droplets between the object and the particles. A third light is irradiated onto the object to remove static electricity between the object and the particles. The particles are then blown off from the object. Thus, an adhesion force between the particles and the object may be removed so that the particles may be readily blown off from the object.
摘要翻译：在根据本发明的一个方面的除去物体上的颗粒的方法中，将空气注入到放置物体的空间中以去除空间中的异物。将第一光照射到物体上以去除物体中的电荷。将第二根光照射到物体上以除去物体和颗粒之间的水滴。将第三根光照射到物体上以除去物体和颗粒之间的静电。然后将颗粒从物体吹出。因此，可以除去颗粒和物体之间的粘附力，使得颗粒容易从物体吹出。

3. 发明申请

US20210332481A1 METHOD OF AEROSOL DEPOSITION COATING FOR PLASMA RESISTANT COATING 有权
公开(公告)号：US20210332481A1
公开(公告)日：2021-10-28
申请号：US16614515
申请日：2018-07-17
申请人： KOMICO LTD.
发明人： Dae-Hoon JANG , Hyunchul KO , Dong-Joo KIM , Sang-Gyu PARK , Jin-Soo PARK
IPC分类号： C23C24/04
摘要： Disclosed is an aerosol-deposition-coating method for plasma-resistant coating, in which the inside of a processing device can be protected from plasma during a plasma-etching process, the roughness of a coating layer on a metal substrate can be decreased to thereby reduce the generation of particles, and adhesion between the coating layer and the metal substrate can be enhanced.

4. 发明申请

US20060016554A1 Substrate holder having electrostatic chuck and method of fabricating the same 审中-公开
标题翻译：具有静电卡盘的基板支架及其制造方法
公开(公告)号：US20060016554A1
公开(公告)日：2006-01-26
申请号：US11178279
申请日：2005-07-12
申请人： Ho Ahn
发明人： Ho Ahn
IPC分类号： C23C16/00 , B32B37/00 , B32B38/04
CPC分类号： H01L21/6831
摘要： Provided is a substrate holder including a susceptor having edge protrusion formed on edge thereof and an electrostatic chuck mounted inside the edge protrusion and on the susceptor. The electrostatic chuck is attached to the susceptor by a gel adhesive sheet containing a plurality of wires and a silicon or corrosion-resistant epoxy based material is filled between the electrostatic chuck and the edge protrusion. The planarity of the electrostatic chuck can be maintained accurately when the electrostatic chuck is attached to the susceptor and clogging of cooling gas supply holes and leakage of cooling gas through a space between the electrostatic chuck and the susceptor can be prevented.
摘要翻译：提供了一种基板保持器，其包括具有形成在其边缘上的边缘突起的基座和安装在边缘突起内部和基座上的静电卡盘。静电卡盘通过包含多根电线的凝胶粘合片附接到基座，并且在静电卡盘和边缘突起之间填充硅或耐腐蚀的环氧基材料。当静电卡盘安装在基座上时，可以精确地保持静电卡盘的平面性，并且可以防止冷却气体供应孔的堵塞，并且可以防止冷却气体通过静电卡盘和基座之间的空间的泄漏。

5. 发明授权

US11473181B2 Yittrium granular powder for thermal spray and thermal spray coating produced using the same 有权
公开(公告)号：US11473181B2
公开(公告)日：2022-10-18
申请号：US17401145
申请日：2021-08-12
申请人： KOMICO LTD.
发明人： Dae Sung Kim , Seong Sik Bang , Jae Im Jeong , Dong Hun Jeong
IPC分类号： C04B35/505 , C23C4/11 , C04B35/626
摘要： The present disclosure relates to an yttrium-based granular powder for thermal spraying. More particularly, the yttrium-based granular powder is a mixture including one or more yttrium compound powders selected from among Y2O3, YOF, YF3, Y4Al2O9, Y3Al5O12, and YAlO3, and a silica (SiO2) powder. A Y—Si—O intermediate phase is included therein in a content of less than 10 wt %. The thermal spray coating manufactured using the same has a low porosity, and forms a very dense thin film, thus ensuring excellent plasma resistance.

6. 发明申请

US20220186353A1 YITTRIUM GRANULAR POWDER FOR THERMAL SPRAY AND THERMAL SPRAY COATING PRODUCED USING THE SAME 有权
公开(公告)号：US20220186353A1
公开(公告)日：2022-06-16
申请号：US17401145
申请日：2021-08-12
申请人： KOMICO LTD.
发明人： Dae Sung Kim , Seong Sik Bang , Jae Im Jeong , Dong Hun Jeong
IPC分类号： C23C4/11 , C04B35/505 , C04B35/626
摘要： The present disclosure relates to an yttrium-based granular powder for thermal spraying. More particularly, the yttrium-based granular powder is a mixture including one or more yttrium compound powders selected from among Y2O3, YOF, YF3, Y4Al2O9, Y3Al5O12, and YAlO3, and a silica (SiO2) powder. A Y—Si—O intermediate phase is included therein in a content of less than 10 wt %. The thermal spray coating manufactured using the same has a low porosity, and forms a very dense thin film, thus ensuring excellent plasma resistance.

7. 发明授权

US08080813B2 Ion implanter, internal structure of ion implanter and method of forming a coating layer in the ion implanter 有权
标题翻译：离子注入机，离子注入机的内部结构以及在离子注入机中形成涂层的方法
公开(公告)号：US08080813B2
公开(公告)日：2011-12-20
申请号：US12667303
申请日：2008-07-03
申请人： Kyung-Ic Jang , Kyung-Hwan Ye , Sam-Woong Kim , Yong-Sup Reim
发明人： Kyung-Ic Jang , Kyung-Hwan Ye , Sam-Woong Kim , Yong-Sup Reim
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , H01J37/16 , H01J2237/0206 , H01J2237/022
摘要： An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and includes the same material as that of the substrate.
摘要翻译：离子注入机包括一个处理室和一个涂层。处理室接收衬底并提供空间以在衬底上执行离子注入工艺。涂层设置在处理室的内壁上，以减少基板的污染，并且包括与基板相同的材料。

8. 发明申请

US20230128726A1 METHOD OF MANUFACTURING PLASMA-RESISTANT COATING FILM 有权
公开(公告)号：US20230128726A1
公开(公告)日：2023-04-27
申请号：US17874154
申请日：2022-07-26
申请人： KOMICO LTD.
发明人： Dong Hun Jeong , Seong Sik Bang , Jae Im Jeong , Dae Sung Kim
IPC分类号： C23C4/11 , C23C6/00 , C23C4/134
摘要： Disclosed herein is a method of manufacturing a plasma-resistant coating film. The method includes (1) forming a lower coating layer through a thermal spray process, on a base member, from a first rare earth metal compound powder including 90 to 99.9 wt % of first rare earth metal compound particles and 0.1 to 10 wt % of silica (SiO2) particles, (2) processing the surface of the lower coating layer formed in step (1) to have an average surface roughness of 1 to 6 μm, and (3) forming an upper coating layer through a suspension plasma spray process, on the lower coating layer which is surface-treated in step (2), from second rare earth metal compound particles, to obtain a structurally dense and chemically stable plasma-resistant coating film with improved plasma resistance.

9. 发明申请

US20230021394A1 METHOD FOR LARGE SURFACE COATING BASE ON CONTROL OF THIN FILM STRESS AND COATING STRUCTURE USEOF 有权
公开(公告)号：US20230021394A1
公开(公告)日：2023-01-26
申请号：US17476412
申请日：2021-09-15
申请人： KOMICO LTD.
发明人： Hong Rae Wang , Yeong Jun Son , Yo Han Ryu , In Haeng Lee , In Seop Byeon , Kyung Seung Koo , Jin Woo Hahn , Yong Soo Lee , Jae Ho Byun
IPC分类号： C23C28/04 , H01J37/32 , C23C14/08 , C23C14/22 , C23C16/50 , C23C16/40 , C23C14/34
摘要： Disclosed is a thin film stress control-based coating method for large-area coating. The method uses a two-step coating process in which a first coating layer that is a relatively low-hardness layer is primarily formed on a base member and a second coating layer that is a relatively high-hardness layer is secondarily formed on the first coating layer. The method can form a high-density coating structure that is hardly peeled off over a relatively large area compared to conventional coating methods by suppressing internal stress of the coating layers of the coating structure. Further disclosed is a coating structure manufactured by the same method.

10. 发明授权

US11560319B1 Manufacturing method for spherical YOF-based powder, and spherical YOF-based powder and YOF-based coating layer manufactured thereby 有权
公开(公告)号：US11560319B1
公开(公告)日：2023-01-24
申请号：US17849365
申请日：2022-06-24
申请人： KOMICO LTD.
发明人： Ki Won Hong , Seong Sik Bang , Dong Hun Jeong
IPC分类号： C01F17/259 , C23C4/134 , C23C4/04 , H05H1/34
摘要： Proposed is a method for manufacturing a spherical YOF-based powder. Specifically, proposed is a method for manufacturing a spherical YOF-based powder. The YOF-based powder injected into the plasma jet and melted into the refrigerant in a droplet state is sprayed and quenched, thereby improving density and controlling the component ratio through particle spheroidization.

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