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1. 发明授权

US11550082B2 Mirror with increased form stability and longevity and a method of fabricating the same 有权
公开(公告)号：US11550082B2
公开(公告)日：2023-01-10
申请号：US16471360
申请日：2017-12-21
申请人： MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. , MEDIA LARIO S.R.L.
发明人： Masahiro Teshima , Razmik Mirzoyan , Guiseppe Valsecchi , Robert Banham
IPC分类号： G02B5/10 , F24S23/70 , B32B17/10 , G02B5/08
摘要： A mirror includes a carrier, a reflecting layer disposed above a main face of the carrier, and a transparent layer disposed above the reflective layer. The carrier includes a base body, and the base body includes one or more of a material comprising a density in a range from 0.1 to 1.0 g/cm3, a porous material, a foamed material, a material comprising a structure containing closed cells, a material comprising a honeycomb structure, or a structure containing carbon fibers.

2. 发明申请

US20220331836A1 METHOD FOR APPLYING A CARBON-BASED REFLECTIVE OVERCOATING ON A GRAZING INCIDENCE OPTICAL UNIT 有权
公开(公告)号：US20220331836A1
公开(公告)日：2022-10-20
申请号：US17634472
申请日：2020-08-13
申请人： ISTITUTO NAZIONALE DI ASTROFISICA , POLITECNICO DI MILANO , MEDIA LARIO S.R.L.
发明人： Giovanni PARESCHI , Marta MAria CIVITANI , Giorgia SIRONI , Giuseppe VALSECCHI , Luca MAGAGNIN , Eugenio GIBERTINI
IPC分类号： B05D5/06 , G21K1/06 , B05D7/24 , B05D3/06
摘要： A method for applying a carbon-based reflective overcoating on a grazing incidence optical unit comprising a substrate and a coating of a high-density material chosen from the group comprising gold, platinum, iridium, palladium, rhodium, ruthenium, chrome and nickel or a low-density material such as carbon or B4C; the method comprises the step of treating the optical unit with a solution or gaseous phase containing at least one polymer precursor material to create the overcoating through absorption of the polymer material on the coating.

3. 发明申请

US20170233281A1 PROCESS FOR FORMING AN ARTICLE WITH A PRECISION SURFACE 审中-公开
公开(公告)号：US20170233281A1
公开(公告)日：2017-08-17
申请号：US15519122
申请日：2015-10-12
申请人： MEDIA LARIO S.R.L.
发明人： Robert David BANHAM , Giuseppe VALSECCHI , Oberto CITTERIO
IPC分类号： C03B23/035 , C03C27/04 , G02B5/10 , B29D11/00
摘要： A process for forming an article having at least one precision surface is disclosed. The process includes providing a thin sheet in contact with a surface of a mandrel. The process then includes establishing a pressure differential between opposite sides of the thin sheet using a collapsible enclosure so that the thin sheet is drawn onto the mandrel surface, thereby causing the thin sheet to substantially conform to the shape of the mandrel surface. The shaped thin sheet is then secured to a support member to define the article. The article is then removed from the mandrel. The front surface of the thin sheet defines the precision surface of the article. A process for forming a dual-sided precision article is also disclosed, along with an adaptive optical system and method that employs the precision article.

4. 发明申请

US20160007435A1 SYSTEMS AND METHODS FOR SYNCHRONOUS OPERATION OF DEBRIS-MITIGATION DEVICES 有权
标题翻译：减震装置同步运行的系统和方法
公开(公告)号：US20160007435A1
公开(公告)日：2016-01-07
申请号：US14325193
申请日：2014-07-07
申请人： Media Lario S.R.L.
发明人： Raymond Merrill, JR. , Natale Ceglio , Daniel Stearns
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/2039 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/7055 , G03F7/70916 , H05G2/003 , H05G2/005
摘要： Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.
摘要翻译：公开了在发射EUV辐射和碎屑颗粒的EUV辐射源中同步操作碎片减轻装置（DMD）的系统和方法。所述方法包括在第一和第二DMD之间建立选择的相对角度取向，其提供在第一和第二DMD的相应的第一和第二可旋转叶片之间的EUV辐射的最大传输量。所述方法还包括旋转第一组叶片和第二组叶片以捕获碎片颗粒中的至少一些，同时基本保持选择的相对角度取向。该系统采用DMD驱动单元，并且其中一个DMD驱动单元中的基于光学的编码器盘测量并控制可旋转的DMD叶片的旋转速度。还公开了用于最佳对准DMD的系统和方法。

5. 发明申请

US20140043595A1 EUV collector system with enhanced EUV radiation collection 有权
公开(公告)号：US20140043595A1
公开(公告)日：2014-02-13
申请号：US14056654
申请日：2013-10-17
申请人： Media Lario, S.R.L.
发明人： Natale M. Ceglio , Gopal Vasudevan
IPC分类号： G03F7/20 , G02B5/08
CPC分类号： G03F7/70008 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/0927 , G02B27/0983 , G03F7/70033 , G03F7/70166 , G03F7/70175
摘要： A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

6. 发明授权

US07322708B2 Mirror, optical imaging system and use thereof 失效
标题翻译：镜面，光学成像系统及其应用
公开(公告)号：US07322708B2
公开(公告)日：2008-01-29
申请号：US10496935
申请日：2002-11-27
申请人： Carlos Alberto Valenzuela , Miriam Noemi Valenzuela
发明人： Carlos Alberto Valenzuela , Miriam Noemi Valenzuela
IPC分类号： G02B5/08
CPC分类号： G02B7/182
摘要： The invention relates to a mirror (1), for use in optical imaging systems, whereby the mirror is connected at the edge thereof to a reinforcing element (3), at least partly surrounding the mirror and the reinforcing element also fixes the relative position of the mirror with regard to a further optical element (4). Positioning means (5) are arranged on the reinforcing element, cooperating with positioning means (7), arranged on further optical elements. The optical imaging system in particular concerns a telescope for optical transmission techniques.
摘要翻译：本发明涉及一种用于光学成像系统的反射镜（1），其中反射镜在其边缘处连接到至少部分地围绕反射镜的加强元件（3），并且加强元件还将相对位置关于另一光学元件（4）的镜子。定位装置（5）布置在加强元件上，与定位装置（7）配合，布置在另外的光学元件上。光学成像系统特别涉及用于光学传输技术的望远镜。

7. 发明授权

US08895946B2 Source-collector modules for EUV lithography employing a GIC mirror and a LPP source 有权
标题翻译：用于采用GIC镜和LPP光源的EUV光刻的源极集电极模块
公开(公告)号：US08895946B2
公开(公告)日：2014-11-25
申请号：US13761189
申请日：2013-02-07
申请人： Media Lario, S.R.L.
发明人： Natale M. Ceglio , Daniel Stearns , Jacques Kools , Giuseppe Valsecchi , Fabio Zocchi , Riccardo Binda
IPC分类号： H05G2/00 , G21K1/06 , G02B5/20 , G02B19/00 , G02B27/42
CPC分类号： H05G2/005 , G02B5/203 , G02B19/0095 , G02B27/425 , G03F7/70033 , G03F7/70166 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G21K1/067 , H05G2/008 , G21K2201/06 , G21K2201/064
摘要： Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
摘要翻译：公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。

8. 发明授权

US08873025B2 EUV collector system with enhanced EUV radiation collection 有权
标题翻译：具有增强的EUV辐射收集的EUV收集器系统
公开(公告)号：US08873025B2
公开(公告)日：2014-10-28
申请号：US14056654
申请日：2013-10-17
申请人： Media Lario, S.R.L.
发明人： Natale M. Ceglio , Gopal Vasudevan
IPC分类号： G03F7/20 , G02B5/08 , G02B5/10 , G02B5/20 , G02B27/09
CPC分类号： G03F7/70008 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/0927 , G02B27/0983 , G03F7/70033 , G03F7/70166 , G03F7/70175
摘要： A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.
摘要翻译：用于极紫外（EUV）辐射的收集器系统包括与照明器的孔径构件相邻布置的收集器反射镜和辐射收集增强装置（RCED）。收集器镜将EUV辐射源的EUV辐射引导到孔径构件。 RCED将EUV辐射的一部分重新定向，否则它们将不会通过孔径构件的孔径，或者不具有最佳的角度分布，以穿过该孔，并具有更好地适合于输入规格的角分布照明器这为照明器提供了比单独从收集器镜可能获得的更大量的可用的EUV辐射，从而增强了使用具有RCED的这种收集器系统的EUV光刻系统的执行。

9. 发明授权

US08746975B2 Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放电收集器的热管理系统，组件和方法
公开(公告)号：US08746975B2
公开(公告)日：2014-06-10
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
IPC分类号： H01J35/02 , H01J35/16 , G21K1/06
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

10. 发明申请

US20120281189A1 Evaporative thermal management of grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放射收集器的蒸发热管理
公开(公告)号：US20120281189A1
公开(公告)日：2012-11-08
申请号：US13136784
申请日：2011-08-10
申请人： Boris Grek , Daniel Stearns , Natale M. Ceglio
发明人： Boris Grek , Daniel Stearns , Natale M. Ceglio
IPC分类号： G03B27/52 , F28D15/04
CPC分类号： G03F7/70891 , F28D15/0208 , F28D15/04 , F28D15/046 , G02B7/1815 , G03F7/70166 , G21K1/067 , H05G2/001
摘要： Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.
摘要翻译：蒸发热管理系统和用于极紫外（EUV）光刻的掠入射收集器（GIC）的方法包括与外壳相接合的GIC壳，以形成具有前端并且限定腔室的结构。腔室可操作地支撑至少一个芯吸层。导管将芯吸层连接到支撑储存器中的冷却流体的冷凝器系统。当向前端施加热量时，冷却流体通过芯吸层中的毛细管作用和可选的重力辅助从冷凝器单元吸入室中，同时蒸气沿着从室到冷凝器单元的相反方向被抽吸。在冷凝器单元处从冷凝的蒸汽中除去热量，从而冷却GIC镜壳。

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