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1. 发明授权

US11488802B2 Semiconductor device for condition-controlled radio frequency system 有权
公开(公告)号：US11488802B2
公开(公告)日：2022-11-01
申请号：US17352449
申请日：2021-06-21
申请人： Piotech Inc.
发明人： Huaqiang Tan , Saiqian Zhang
IPC分类号： H01J37/244 , H01J37/32
摘要： This application relates to a semiconductor device for a condition-controlled radio frequency (RF) system. In an embodiment of this application, an RF detection apparatus includes: a high-pass filter (HPF), one end of which is electrically coupled to an RF loop electrode of a ceramic heater, and another end of which is grounded; a voltage measurer, connected to the HPF in parallel; and a low-pass circuit, connected to the HPF in parallel.

2. 发明授权

US11437253B2 Wafer pedestal with contact array 有权
公开(公告)号：US11437253B2
公开(公告)日：2022-09-06
申请号：US16887017
申请日：2020-05-29
申请人： PIOTECH INC.
发明人： Junichi Arami , Ren Zhou
IPC分类号： H05B3/68 , H01L21/67 , H01L21/687 , H01R13/24
摘要： The invention provides a wafer heating pedestal including a shaft connected to a bottom of a plate. The shaft holds a contact array being in contact with plural contact pads of the plate. The contact array includes plural contact columns.

3. 发明申请

US20220208577A1 MANIPULATOR FINGER, MANIPULATOR, AND METHOD OF OPERATING THE SAME 有权
公开(公告)号：US20220208577A1
公开(公告)日：2022-06-30
申请号：US17547666
申请日：2021-12-10
申请人： Piotech Inc.
发明人： Chun Liu , Zongshuai Jiang , Guangquan Lu
IPC分类号： H01L21/67 , H01L21/687 , B25J19/02 , G01K7/02 , G01K1/14
摘要： This application relates to a manipulator finger, a manipulator, and a method of operating the same. In an embodiment of this application, the manipulator finger includes: a finger; and one or more temperature measuring elements disposed in the finger and respectively connected to one or more temperature measuring contact points on a surface of the finger. The manipulator finger may be configured to monitor a temperature of a wafer in real time during delivery of the wafer.

4. 发明申请

US20220208584A1 WAFER TRANSFER METHOD AND MECHANICAL ARM 有权
公开(公告)号：US20220208584A1
公开(公告)日：2022-06-30
申请号：US17555631
申请日：2021-12-20
申请人： Piotech Inc.
发明人： Jason Tian , Zhuo Wang , Hui Li
IPC分类号： H01L21/677 , H01L21/687
摘要： This application relates to a wafer transfer method and a mechanical arm. The method includes: providing a first wafer to a finger portion front end of a mechanical arm; extending the mechanical arm to a first length to move the finger portion front end of the mechanical arm to a first processing position in a first processing chamber; placing the first wafer at the first processing position; contracting the mechanical arm to move the finger portion front end of the mechanical arm out of the first processing chamber; providing a second wafer to the finger portion front end of the mechanical arm; extending the mechanical arm to a second length to move the finger portion front end of the mechanical arm to a second processing position in the first processing chamber, wherein the second length is different from the first length; and placing the second wafer at the second processing position.

5. 发明申请

US20210407843A1 AUTOMATIC WAFER CARRYING SYSTEM AND METHOD FOR TRANSFERRING WAFER USING THE SYSTEM 有权
公开(公告)号：US20210407843A1
公开(公告)日：2021-12-30
申请号：US17354034
申请日：2021-06-22
申请人： Piotech Inc
发明人： Hualong Yang , Dezan Yang , Wenmin Liu , Fengli Wu
IPC分类号： H01L21/683 , H01L21/677
摘要： An automatic wafer carrying system and a method for transferring a wafer using the system are provided. The system includes: a vacuum chamber, including a plurality of wafer carrying stations; a plurality of first paddles and second paddles, all located inside the vacuum chamber and capable of rotating synchronously separately, where each of the plurality of second paddles and a corresponding first paddle form a pair of paddles to carry a wafer jointly; a double-ferrule magnetofluid, connected to the vacuum chamber in a sealed manner, and connected to the plurality of first paddles and the plurality of second paddles, to drive the first paddles or the second paddles or both the first and second paddles to rotate; a first drive mechanism, connected to the double-ferrule magnetofluid, to drive the plurality of first paddles and the plurality of second paddles through the double-ferrule magnetofluid to rotate synchronously in the same direction; and a second drive mechanism, also connected to the double-ferrule magnetofluid, to implement relative rotation of the plurality of first paddles and the plurality of second paddles through the double-ferrule magnetofluid. The system can reduce movement steps of a wafer during transfer, so as to improve transfer accuracy and stability of the wafer and reduce a position error of the wafer.

6. 发明申请

US20210398779A1 APPARATUS, SYSTEM, AND METHOD FOR IMPEDANCE ADJUSTMENT OF PROCESSING STATION 有权
公开(公告)号：US20210398779A1
公开(公告)日：2021-12-23
申请号：US17350352
申请日：2021-06-17
申请人： Piotech Inc.
发明人： Giyoul Kim , Junichi Arami , Zhen Liu , Yaxin Zhang , Yinghao Lin , Si Shen
IPC分类号： H01J37/32
摘要： This application relates to an apparatus, a system, and a method for impedance adjustment of a processing station. An apparatus for impedance adjustment of a single processing station may include: a heating plate including a first grounding grid and a second grounding grid, where the first grounding grid and the second grounding grid cover different areas of the heating plate; a first tuner connected to the first grounding grid and including a first adjustable capacitor and a first sensor for detecting a current; and a second tuner connected to the second grounding grid and including a second adjustable capacitor and a second sensor for detecting a current.

7. 发明申请

US20210358782A1 SUBSTRATE TRANSFER MODULE AND SEMICONDUCTOR PROCESSING SYSTEM 有权
公开(公告)号：US20210358782A1
公开(公告)日：2021-11-18
申请号：US17234047
申请日：2021-04-19
申请人： Piotech Inc.
发明人： Jason Lee Tian , Zhuo Wang
IPC分类号： H01L21/67 , H01L21/677
摘要： This application relates to a substrate transfer module and a semiconductor processing system. The substrate transfer module includes: a transfer chamber, having a first end and a second end in a length direction, and having a first side and a second side in a width direction; a slide rail, disposed in the transfer chamber, and extending in the length direction of the transfer chamber; and a mechanical arm, disposed on the slide rail and having an extending arm portion, wherein the mechanical arm is operable to move along the slide rail in the length direction of the transfer chamber to transfer a substrate between an equipment front end module (EFEM) and a processing chamber, the EFEM is located at the first end of the transfer chamber, and the processing chamber is located on the first side or the second side of the transfer chamber.

8. 发明申请

US20220208598A1 PROTECTION MECHANISM AND METHOD FOR PROTECTING WAFER AND PIN 有权
公开(公告)号：US20220208598A1
公开(公告)日：2022-06-30
申请号：US17542668
申请日：2021-12-06
申请人： Piotech Inc.
发明人： Huaqiang Tan , Yanchao Yin
IPC分类号： H01L21/687
摘要： This application provides a protection mechanism and a method for protecting a wafer and a pin. The protection mechanism includes: a drive; a linear unit, connected to the drive, so as to cause a pin to eject a wafer under the action of the drive; a torsion meter, configured to measure a torque of the protection mechanism in a process of ejecting the wafer by the pin; and a control module, configured to receive the torque measured by the torsion meter, and compare the torque with a predetermined value. The torsion meter is disposed between the drive and the linear unit. The to protection mechanism can effectively measure, in real time, a torque generated in a process of ejecting the wafer, and can determine, according to the torque, whether an abnormality occurs in the ejection process, so that an accident such as wafer fragmentation or pin fracturing can be effectively prevented.

9. 发明申请

US20220205092A1 COATING DEVICE AND CARRIER SEAT THEREOF 有权
公开(公告)号：US20220205092A1
公开(公告)日：2022-06-30
申请号：US17550522
申请日：2021-12-14
申请人： PIOTECH INC.
发明人： Yue Guo , Chun Liu , Ziyou Liu , Zhuo Wang , Jingshu Li
IPC分类号： C23C16/458 , C23C16/455 , C23C16/44
摘要： The present invention discloses a coating device including: a first shell, having a top portion and a side portion; and a second shell, accommodated in the first shell and at least partially divergently extending downwards from the top portion of the first shell. The first shell and the second shell define a first space in between, the second shell defines a second space, and the first space surrounds the second space and the two are not in communication.

10. 发明申请

US20210398771A1 SEMICONDUCTOR DEVICE FOR CONDITION-CONTROLLED RADIO FREQUENCY SYSTEM 有权
公开(公告)号：US20210398771A1
公开(公告)日：2021-12-23
申请号：US17352449
申请日：2021-06-21
申请人： Piotech Inc.
发明人： Huaqiang Tan , Saiqian Zhang
IPC分类号： H01J37/244 , H01J37/32
摘要： This application relates to a semiconductor device for a condition-controlled radio frequency (RF) system. In an embodiment of this application, an RF detection apparatus includes: a high-pass filter (HPF), one end of which is electrically coupled to an RF loop electrode of a ceramic heater, and another end of which is grounded; a voltage measurer, connected to the HPF in parallel; and a low-pass circuit, connected to the HPF in parallel.

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