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1. 发明申请

US20170330156A1 PRODUCT PROVIDED WITH MANAGEMENT INFORMATION 审中-公开
公开(公告)号：US20170330156A1
公开(公告)日：2017-11-16
申请号：US15531364
申请日：2015-11-26
申请人： TECHNO QUARTZ INC.
发明人： Masahide KATO , Yasuhiro UMETSU
IPC分类号： G06Q10/00 , B41M5/24 , G05B19/12 , G05B19/402 , G06K19/06 , G06K7/14
CPC分类号： G06Q10/20 , B23K26/0006 , B23K26/0622 , B23K26/53 , B23K2101/40 , B23K2103/54 , B41M5/24 , G05B19/124 , G05B19/402 , G05B2219/23363 , G05B2219/40538 , G05B2219/40623 , G06K7/1417 , G06K19/06037 , G06K19/06046 , Y02P90/14
摘要： The invention provides a transparent product to which management information is provided such that said management information can be reliably transmitted, which is devised such that even though the product is used under a harsh environment, the indicated management information will be not peeled off, and a production method for the transparent product. The invention provides a transparent product provided with management information and indicating the management information for managing the product, characterized in that said management information is provided at a site where the product has a thickness, and inside thereof in the thickness direction, in which said management information can be visually recognized through at least one of the surfaces of said product in the thickness direction.

2. 发明申请

US20110023543A1 METHOD OF REFURBISHING A QUARTZ GLASS COMPONENT 有权
标题翻译：石墨玻璃组件的改造方法
公开(公告)号：US20110023543A1
公开(公告)日：2011-02-03
申请号：US12846537
申请日：2010-07-29
申请人： Yasuhiro Umetsu , Kosuke Imafuku , Katsutoshi Hoshino , Masahide Kato
发明人： Yasuhiro Umetsu , Kosuke Imafuku , Katsutoshi Hoshino , Masahide Kato
IPC分类号： C03B29/00
CPC分类号： C03B23/20 , C03B29/02 , Y02P40/57
摘要： A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.
摘要翻译：提供一种翻新由于在用于半导体制造的等离子体处理装置中连续使用而被污染和侵蚀的石英玻璃部件的方法。在该方法中，通过根据污染状态确定的适当的清洗方法除去石英玻璃成分上的表面沉积物，并且通过用预定波长的光照射仔细检查清洁部件上是否存在残留沉积物引起荧光效应。然后通过火焰处理和精密加工将石英玻璃部件的侵蚀部分恢复到原始状态。结果，翻新方法可以增加石英玻璃组分的机械强度，通过有效利用石英玻璃的剩余材料来提高生产率和产率。

3. 发明授权

US10572860B2 Product provided with management information 有权
公开(公告)号：US10572860B2
公开(公告)日：2020-02-25
申请号：US15531364
申请日：2015-11-26
申请人： TECHNO QUARTZ INC.
发明人： Masahide Kato , Yasuhiro Umetsu
IPC分类号： G06Q10/00 , B23K26/53 , G06K19/06 , B23K26/00 , B23K26/0622 , B41M5/24 , G05B19/402 , B23K103/00 , B23K101/40 , G05B19/12 , G06K7/14
摘要： A transparent product can reliably transmit management information, and even under a harsh environment, the indicated management information will not be peeled off. The transparent product includes management information for managing the product. The management information is provided inside the product so that the management information can be visually recognized through at least one surface of the product in the thickness direction.

4. 发明授权

US08991214B2 Method of refurbishing a quartz glass component 有权
标题翻译：石英玻璃部件的翻新方法
公开(公告)号：US08991214B2
公开(公告)日：2015-03-31
申请号：US12846537
申请日：2010-07-29
申请人： Katsutoshi Hoshino , Masahide Kato , Yasuhiro Umetsu , Kosuke Imafuku
发明人： Katsutoshi Hoshino , Masahide Kato , Yasuhiro Umetsu , Kosuke Imafuku
IPC分类号： C03B23/20 , C03B29/02
CPC分类号： C03B23/20 , C03B29/02 , Y02P40/57
摘要： A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.
摘要翻译：提供一种翻新由于在用于半导体制造的等离子体处理装置中连续使用而被污染和侵蚀的石英玻璃部件的方法。在该方法中，通过根据污染状态确定的适当的清洗方法除去石英玻璃成分上的表面沉积物，并且通过用预定波长的光照射仔细检查清洁部件上是否存在残留沉积物引起荧光效应。然后通过火焰处理和精密加工将石英玻璃部件的侵蚀部分恢复到原始状态。结果，翻新方法可以增加石英玻璃组分的机械强度，通过有效利用石英玻璃的剩余材料来提高生产率和产率。

5. 外观设计

USD789311S1 Pattern wafer 有权
公开(公告)号：USD789311S1
公开(公告)日：2017-06-13
申请号：US29569274
申请日：2016-06-24
申请人： Hitachi Kokusai Electric Inc. , Techno Quartz Inc.
设计人： Hiromi Okada , Masayuki Yamada , Satoshi Aizawa , Shinya Morita , Masayoshi Minami , Kazuhisa Osaka

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