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1. 发明授权

US11428892B2 Optical apparatus 有权
公开(公告)号：US11428892B2
公开(公告)日：2022-08-30
申请号：US17003284
申请日：2020-08-26
申请人： Gigaphoton Inc.
发明人： Hiroshi Someya , Yukio Watanabe
IPC分类号： G03F7/20 , G02B7/02
摘要： An optical apparatus may include a housing having an opened front face, an optical unit freely movable into and out of an internal space of the housing through the front face, and a positioning portion disposed on a back side of the optical unit in the internal space. A base plate of the optical unit may include first and second convex portions disposed on a base end face of the base plate. The second convex portion may be disposed at a position different from the first convex portion in a width direction of the base plate. The positioning portion may include a V block having a V groove shape at a part contacting the first convex portion, and a flat block having a flat surface shape at a part contacting the second convex portion. The optical unit may be positioned in the internal space through the contact.

2. 发明申请

US20140166046A1 METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR 审中-公开
标题翻译： EUV光发生器清洗收集器镜的方法和装置
公开(公告)号：US20140166046A1
公开(公告)日：2014-06-19
申请号：US13964816
申请日：2013-08-12
申请人： GIGAPHOTON INC.
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00 , B08B13/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译：一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置到聚光位置。

3. 发明申请

US20130240645A1 TARGET SUPPLY DEVICE 有权
标题翻译：目标供应装置
公开(公告)号：US20130240645A1
公开(公告)日：2013-09-19
申请号：US13715897
申请日：2012-12-14
申请人： GIGAPHOTON INC
发明人： Takanobu Ishihara , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
IPC分类号： B05B1/14
CPC分类号： B65D47/06 , H05G2/005 , H05G2/006
摘要： A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
摘要翻译：目标供给装置可以包括：具有第一材料的圆柱形的罐，用于覆盖罐的圆柱形部分，圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成，第一盖由第二材料形成，具有通孔，所述第一盖设置在所述圆筒部的轴向的一端，所述第二盖由所述第二材料形成，并且设置在所述圆筒部的轴向的一端的相反侧的另一端，以及喷嘴，其设置成与所述罐的内部流体连通并且穿过所述通孔，所述喷嘴由所述第一材料形成。

4. 发明申请

US20130221247A1 COLLECTOR MIRROR EXCHANGING APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：收集器镜子交换装置和超极紫外光源装置的方法
公开(公告)号：US20130221247A1
公开(公告)日：2013-08-29
申请号：US13846894
申请日：2013-03-18
申请人： GIGAPHOTON INC.
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： G02B7/183 , H05G2/00
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：一种集电镜交换装置，能够安全且容易地交换用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光的集光镜。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

5. 发明授权

US09229192B2 Mirror device 有权
公开(公告)号：US09229192B2
公开(公告)日：2016-01-05
申请号：US14697260
申请日：2015-04-27
申请人： GIGAPHOTON INC.
发明人： Hiroshi Someya , Yukio Watanabe , Katsuhiko Wakana , Osamu Wakabayashi
IPC分类号： G02B7/182 , G02B7/18 , G02B5/08 , G02B5/10
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

6. 发明授权

US11320740B2 Target supply device, target supply method, and electronic device manufacturing method 有权
公开(公告)号：US11320740B2
公开(公告)日：2022-05-03
申请号：US17228000
申请日：2021-04-12
申请人： Gigaphoton Inc.
发明人： Tsukasa Hori , Yutaka Shiraishi , Toshihiro Nishisaka , Hiroshi Someya , Yukio Watanabe
IPC分类号： G03F7/20 , H05G2/00 , H01L21/027
摘要： A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

7. 发明授权

US10485085B2 Extreme ultraviolet light sensor unit and extreme ultraviolet light generation device 有权
公开(公告)号：US10485085B2
公开(公告)日：2019-11-19
申请号：US16121340
申请日：2018-09-04
申请人： GIGAPHOTON INC.
发明人： Hisashi Nara , Hiroshi Someya , Takuya Ishii
IPC分类号： G21K1/06 , H05G2/00 , G02B5/20
摘要： An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.

8. 发明授权

US08779402B2 Target supply device 有权
标题翻译：目标供应装置
公开(公告)号：US08779402B2
公开(公告)日：2014-07-15
申请号：US13675790
申请日：2012-11-13
申请人： Gigaphoton Inc.
发明人： Takayuki Yabu , Yukio Watanabe , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
IPC分类号： G21K5/00
CPC分类号： B05B17/0607 , B05B12/082
摘要： A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
摘要翻译：目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。

9. 发明授权

US10481354B2 Structure of connection between optical unit and optical path tube 有权
公开(公告)号：US10481354B2
公开(公告)日：2019-11-19
申请号：US16055243
申请日：2018-08-06
申请人： Gigaphoton Inc.
发明人： Yukio Watanabe , Hiroshi Someya , Yuki Kawashima , Yuto Tanaka
IPC分类号： G02B6/42 , H05G2/00 , G03F7/20
摘要： An optical unit and an optical path tube are easily connected. A structure of connection between a side surface (1a) of the optical unit and the optical path tube includes: an extensible tube (72) constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange (26) attached to one end of the optical path tube; a flange receiving part (20) provided on the optical unit, the flange receiving part (20) receiving a front surface (26a) of the flange (26), the front surface (26a) of the flange (26) being an end surface on an open side; and a biasing part (23, 72) configured to bias at least a part of the optical path tube in a direction in which the extensible tube (72) extends.

10. 发明授权

US09253866B2 Gas lock device and extreme ultraviolet light generation apparatus 有权
标题翻译：气锁装置和极紫外光发生装置
公开(公告)号：US09253866B2
公开(公告)日：2016-02-02
申请号：US14172535
申请日：2014-02-04
申请人： GIGAPHOTON INC.
发明人： Hiroshi Someya , Hideto Saito
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/006 , Y10T137/8376
摘要： A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.
摘要翻译：气体锁定装置可以包括具有通道部分和将表面连接到通道部分的连接孔的腔室，附接到腔室并密封通道部分的光学元件，气体供应装置和管子，在一端连接到气体供应装置并且在另一端附接到腔室，并且可以限定与连接孔连通的流动通道。

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