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1. 发明申请

US20130081159A1 ADVANCED ATOMIC FORCE MICROSCOPY SCANNING FOR OBTAINING A TRUE SHAPE 审中-公开
标题翻译：用于获得真实形状的高级原子力显微镜扫描
公开(公告)号：US20130081159A1
公开(公告)日：2013-03-28
申请号：US13559034
申请日：2012-07-26
申请人： Huiwen Liu , Peter Gunderson , Lin Zhou
发明人： Huiwen Liu , Peter Gunderson , Lin Zhou
IPC分类号： G01Q60/24
CPC分类号： G01Q60/24 , G01Q10/06 , G01Q30/06
摘要： Advanced atomic force microscopy (AFM) methods and apparatuses are presented. An embodiment may comprise performing a first scan at a first angle, a second scan at a second angle, and correcting a system drift error in the first scan based on the second scan. Another embodiment may comprise performing a global scan of a first area, a local scan of a second area within the first area, correcting a leveling error in the local scan based on the global scan, and outputting a corrected sample image. Another embodiment may comprise performing a first scan at a first position at a first angle, a second scan at a flat region using the same scan angle and scan size to correct a scanner runout error in the first scan based on the second scan.
摘要翻译：提出了先进的原子力显微镜（AFM）方法和装置。实施例可以包括以第一角度执行第一扫描，以第二角度执行第二扫描，以及基于第二扫描来校正第一扫描中的系统漂移误差。另一个实施例可以包括执行第一区域的全局扫描，第一区域内的第二区域的局部扫描，基于全局扫描校正局部扫描中的调平误差，以及输出校正的采样图像。另一个实施例可以包括以第一角度在第一位置执行第一扫描，使用相同的扫描角度和扫描尺寸在平坦区域执行第二次扫描，以基于第二次扫描来校正第一扫描中的扫描器跳动误差。

2. 发明授权

US08371155B2 Scanning probe microscopy employing correlation pattern recognition 失效
标题翻译：扫描探针显微镜采用相关模式识别
公开(公告)号：US08371155B2
公开(公告)日：2013-02-12
申请号：US12854112
申请日：2010-08-10
申请人： Lin Zhou , Huiwen Liu , Dale Egbert , Peter Gunderson , John Ibele , Cing Siong Ling
发明人： Lin Zhou , Huiwen Liu , Dale Egbert , Peter Gunderson , John Ibele , Kah Choong Loo , Cing Siong Ling
IPC分类号： G01N19/02
CPC分类号： G01Q40/00 , B82Y35/00 , G01Q30/06
摘要： An apparatus and associated method for topographically characterizing a workpiece. A scanning probe obtains topographical data from the workpiece. A processor controls the scanning probe to scan a reference surface of the workpiece to derive a first digital file and to scan a surface of interest that includes at least a portion of the reference surface to derive a second digital file. Correlation pattern recognition logic integrates the first and second digital files together to align the reference surface with the surface of interest.
摘要翻译：一种用于地形学表征工件的装置和相关方法。扫描探头从工件获取地形数据。处理器控制扫描探针扫描工件的参考表面以导出第一数字文件并扫描包括参考表面的至少一部分的感兴趣的表面以导出第二数字文件。相关模式识别逻辑将第一和第二数字文件集成在一起以将参考表面与感兴趣的表面对齐。

3. 发明申请

US20120218659A1 CONTACT DETECTION 有权
标题翻译：接触检测
公开(公告)号：US20120218659A1
公开(公告)日：2012-08-30
申请号：US13036184
申请日：2011-02-28
申请人： Dongming Liu , Lin Zhou , Adam K. Himes , Lee C. Knippenberg , Michael T. Johnson
发明人： Dongming Liu , Lin Zhou , Adam K. Himes , Lee C. Knippenberg , Michael T. Johnson
IPC分类号： G11B27/36 , G11B5/02
CPC分类号： G11B5/6029 , G11B5/6005 , G11B5/6011 , G11B5/607 , G11B5/6076 , G11B27/36 , G11B2220/2516
摘要： A method of detecting a contact between a transducing head and a storage medium is provided. The method applies an input signal, having a select power level and known frequency, to an actuator for actuating the head. An output signal is obtained in response to the input signal. At least one signal component is extracted from the output signal at the same or a harmonic of the same known frequency as the input signal applied to the actuator. Whether the at least one extracted signal component indicates a contact between the head and the medium is determined. The power level of the applied wave pattern is increased incrementally until the extracted signal component indicates a contact between the head and the storage medium.
摘要翻译：提供了一种检测换能头与存储介质之间的接触的方法。该方法将具有选择功率电平和已知频率的输入信号施加到用于致动头部的致动器。响应于输入信号获得输出信号。以与施加到致动器的输入信号相同的已知频率的相同或谐波从输出信号提取至少一个信号分量。确定至少一个提取的信号分量是否指示头部和介质之间的接触。所施加的波形图案的功率电平逐渐增加，直到提取的信号分量表示头部和存储介质之间的接触。

4. 发明申请

US20120079635A1 METHODS AND DEVICES FOR CORRECTING ERRORS IN ATOMIC FORCE MICROSCOPY 有权
标题翻译：用于校正原子力显微镜中的误差的方法和装置
公开(公告)号：US20120079635A1
公开(公告)日：2012-03-29
申请号：US13190643
申请日：2011-07-26
申请人： Huiwen Liu , Peter Gunderson , Lin Zhou
发明人： Huiwen Liu , Peter Gunderson , Lin Zhou
IPC分类号： G01Q60/24
CPC分类号： B82Y35/00 , G01Q10/06 , G01Q30/06
摘要： In certain embodiments, a probe scans a surface to produce a first scan. The first scan is used to estimate a vertical offset for scanning the surface to produce a second scan. In certain embodiments, an AFM device engages a probe to a surface using a piezo voltage. The probe scans the surface to produce a first scan. The first scan is used to estimate a vertical offset such that the probe uses the piezo voltage to engage the surface for a second scan at a different vertical position.
摘要翻译：在某些实施例中，探针扫描表面以产生第一扫描。第一次扫描用于估计用于扫描表面以产生第二次扫描的垂直偏移。在某些实施例中，AFM装置使用压电电压将探针接合到表面。探头扫描表面以产生第一次扫描。第一扫描用于估计垂直偏移，使得探针使用压电电压在不同的垂直位置处接合表面进行第二次扫描。

5. 发明授权

US08067620B2 Dispiro 1,2,4-trioxolane antimalarials 有权
标题翻译： Dispiro 1,2,4-三恶烷抗疟药
公开(公告)号：US08067620B2
公开(公告)日：2011-11-29
申请号：US11930606
申请日：2007-10-31
申请人： Jonathan L. Vennerstrom , Yuxiang Dong , Susan A. Charman , Sergio Wittlin , Jacques Chollet , Darren J. Creek , Xiaofang Wang , Kamaraj Spiraghavan , Lin Zhou , Hugues Matile , William N. Charman
发明人： Jonathan L. Vennerstrom , Yuxiang Dong , Susan A. Charman , Sergio Wittlin , Jacques Chollet , Darren J. Creek , Xiaofang Wang , Kamaraj Spiraghavan , Lin Zhou , Hugues Matile , William N. Charman
IPC分类号： A61K31/357 , C07D323/02
CPC分类号： C07D493/10 , C07D323/02 , C07D405/12 , C07D413/12
摘要： A means and method for treating malaria, schistosomiasis, and cancer using a spiro or dispiro 1,2,4-trioxolane is described. The preferred 1,2,4-trioxolanes include a spiroadamantane group on one side of the trioxolane group, and a spirocyclohexyl on the other side of the trioxolane group. In comparison to artemisinin semisynthetic derivatives, the compounds of this invention are structurally simple, easy to synthesize, non-toxic, and potent against malarial parasites. The compounds of the invention unexpectedly provide a single-dose cure for malaria, as well as prophylactic activity against the same. The compounds are also active against schistosomiasis and cancer.
摘要翻译：描述了使用螺或二脱氧-1,2,4-三恶烷来治疗疟疾，血吸虫病和癌症的方法和方法。优选的1,2,4-三氧杂环戊烷在三氧杂环戊烷基的一侧包括一个双金刚烷基，在三氧杂环戊烷基的另一侧包括一个螺环己基。与青蒿素半合成衍生物相比，本发明的化合物在结构上简单，易于合成，无毒，对抗疟疾寄生虫有效。本发明的化合物意外地提供了用于疟疾的单剂量治疗，以及针对其的预防活性。这些化合物对抗血吸虫病和癌症也是有效的。

6. 发明授权

US07567179B2 Configuration management system and method for use in an RFID system including a multiplicity of RFID readers 失效
标题翻译：用于包括多个RFID读取器的RFID系统中的配置管理系统和方法
公开(公告)号：US07567179B2
公开(公告)日：2009-07-28
申请号：US11581788
申请日：2006-10-16
申请人： Robert A. Stephensen , Michael Grady , Scott Barvick , David J. Husak , Lin Zhou , Nirav R. Shah , Pattabhiraman Krishna , Jeffrey H. Fischer , Chilton L. Cabot
发明人： Robert A. Stephensen , Michael Grady , Scott Barvick , David J. Husak , Lin Zhou , Nirav R. Shah , Pattabhiraman Krishna , Jeffrey H. Fischer , Chilton L. Cabot
IPC分类号： G08B13/141
CPC分类号： H04W16/18 , H04L67/18 , H04W4/02 , H04W84/18
摘要： A system and method that facilitates the configuration and control of components of an RFID system, taking into account how the RFID system components are associated with one or more physical locations within an environment in which the RFID system is deployed. A user provides information specifying associations between the system components and the physical locations within the environment to obtain visual representations of configuration data generated therefrom with reference to a facility view, an RF coverage view, and a location view of the data. The facility view serves as a reference plane for placement and orientation of antennas associated with RFID readers, location benchmark tags, and the physical locations of interest. After each antenna is placed and oriented on the facility view, an estimate of the size and shape of the RF interrogation zone of each antenna is computed, and representations of the RF interrogation zones are provided on the facility view to obtain the RF coverage view of the data. Next, the user provides information specifying the physical locations of interest to obtain the location view of the data. A composite of the facility view, the coverage view, and the location view is then generated to obtain an enhanced visual understanding of how the system components and the physical locations exist within the system environment, and how the components and locations are associated with one another.
摘要翻译：考虑到RFID系统组件如何与在其中部署RFID系统的环境中的一个或多个物理位置相关联，便于对RFID系统的组件进行配置和控制的系统和方法。用户提供指定系统组件与环境内的物理位置之间的关联的信息，以参考参考设施视图，RF覆盖视图和数据的位置视图从其生成的配置数据的视觉表示。设备视图用作与RFID读取器，位置基准标签和感兴趣的物理位置相关联的天线的放置和定向的参考平面。在每个天线在设施视图上放置和定向之后，计算每个天线的RF询问区的大小和形状的估计，并且在设施视图上提供RF询问区的表示以获得RF覆盖视图数据。接下来，用户提供指定感兴趣的物理位置以获得数据的位置视图的信息。然后生成设施视图，覆盖视图和位置视图的组合，以获得对系统组件和物理位置如何存在于系统环境中以及组件和位置如何彼此关联的增强的视觉理解。

7. 发明授权

US07479396B2 Structure, system and method for dimensionally unstable layer dimension measurement 失效
标题翻译：尺寸不稳定层尺寸测量的结构，系统和方法
公开(公告)号：US07479396B2
公开(公告)日：2009-01-20
申请号：US11290737
申请日：2005-11-30
申请人： Lin Zhou , Eric P. Solecky
发明人： Lin Zhou , Eric P. Solecky
IPC分类号： H01L21/00
CPC分类号： H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A structure, a system and a method are directed towards determination of a dimension of a patterned dimensionally unstable layer when the dimension is measured using an apparatus that induces a variation of the dimension. The structure, system and method use a patterned dimensionally unstable layer pattern design that correlates with an algorithm used to determine the dimension when the dimension is measured using the apparatus that induces the variation of the dimension.
摘要翻译：当使用引起尺寸变化的装置测量尺寸时，结构，系统和方法针对图案化尺寸不稳定层的尺寸的确定。结构，系统和方法使用图案化的尺寸不稳定的层图案设计，其与用于在使用引起尺寸变化的装置测量尺寸时确定尺寸的算法相关联。

8. 发明授权

US07477365B2 Optical spot geometric parameter determination using calibration targets 失效
标题翻译：使用校准目标的光点几何参数确定
公开(公告)号：US07477365B2
公开(公告)日：2009-01-13
申请号：US11828666
申请日：2007-07-26
申请人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
发明人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
IPC分类号： G01J1/00 , G01B11/26 , G01B11/24 , G01B11/30 , G01C1/00
CPC分类号： G03F7/70516
摘要： A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.
摘要翻译：公开了一种用于确定光束的光点的几何参数的方法，系统和计算机程序产品。一种方法包括：提供校准目标，所述校准目标包括参数中的系统变化; 使用光束测量相对于系统变化的校准目标以获得多个测量值; 并分析测量和系统变化，以确定光点的几何参数。

9. 发明申请

US20080316471A1 DETERMINING AZIMUTH ANGLE OF INCIDENT BEAM TO WAFER 失效
标题翻译：确定入射光束的AZIMUTH角
公开(公告)号：US20080316471A1
公开(公告)日：2008-12-25
申请号：US11766820
申请日：2007-06-22
申请人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
发明人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
IPC分类号： G01B11/26
CPC分类号： G01B11/26
摘要： A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.
摘要翻译：公开了一种用于确定入射光束到晶片的方位角的方法，系统和计算机程序产品。一种方法包括：使用入射光束对彼此不同的第一组光栅角进行校准目标的第一组测量; 分析第一组测量以确定对应于入射光束具有实际上零方位角的光栅线的参考光栅角度; 以及使用所确定的参考光栅角度确定入射光束到晶片的方位角。

10. 发明授权

US07406860B2 Atomic force microscopy scanning and image processing 有权
标题翻译：原子力显微镜扫描和图像处理
公开(公告)号：US07406860B2
公开(公告)日：2008-08-05
申请号：US11413579
申请日：2006-04-28
申请人： Lin Zhou , Huiwen Liu , Dale Egbert , Jonathan A. Nelson , Jianxin Zhu
发明人： Lin Zhou , Huiwen Liu , Dale Egbert , Jonathan A. Nelson , Jianxin Zhu
IPC分类号： G01B6/28
CPC分类号： G01Q40/00 , B82Y35/00 , G01Q30/06
摘要： A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.
摘要翻译：使用原子力显微镜产生结构的形貌。扫描该结构使得结构的感兴趣区域以比目标区域外的结构的部分更高的分辨率被扫描。然后基于扫描生成结构的轮廓。为了校正轮廓的偏斜和倾斜，轮廓的第一特征与坐标系的第一轴对齐。然后对该轮廓进行操纵以将轮廓的第二特征与坐标系的第二轴对齐。

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