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1. 发明申请

US20160203595A1 INSPECTION APPARATUS AND INSPECTION METHOD 审中-公开
公开(公告)号：US20160203595A1
公开(公告)日：2016-07-14
申请号：US14987951
申请日：2016-01-05
申请人： NuFlare Technology, Inc.
发明人： Hideo Tsuchiya , Nobutaka Kikuiri
IPC分类号： G06T7/00 , G06K9/62 , H04N5/225
CPC分类号： G06T7/0004 , G01R31/311 , G03F1/84 , G06K9/6201 , G06T7/0006 , G06T2207/10016 , G06T2207/30148 , H04N5/2256
摘要： An inspection apparatus includes a lighting unit, an imaging unit, an optical image comparison unit, a map creation unit, a map storage unit, a first storage unit, a map comparison unit, and a first determination unit. The lighting unit irradiates a sample including a defect to be inspected with a lighting light. The imaging unit obtains either or both of a first optical image formed by the lighting light transmitted through the sample to be inspected and a second optical image formed by the lighting light reflected by the sample to be inspected and obtains either or both of a third optical image formed by the lighting light transmitted through the sample to be inspected and having a corrected defect and a fourth optical image formed by the lighting light reflected by the sample to be inspected and having a corrected defect. The optical image comparison unit performs either or both of a first comparison between a first reference image referenced from an optical image formed by the lighting light transmitted through the sample to be inspected and the first optical image and a second comparison between a second reference image referenced from an optical image formed by the lighting light reflected by the sample to be inspected and the second optical image and performs either or both of a third comparison between the first reference image and the third optical image and a fourth comparison between the second reference image and the fourth optical image. The map creation unit creates either or both of a first map of the sample to be inspected based on the first comparison and a second map of the sample to be inspected based on the second comparison and creates either or both of a third map of the sample to be inspected based on the third comparison and a fourth map of the sample to be inspected based on the fourth comparison. The map storage unit stores either or both of the first map and the second map. The first storage unit stores defect correction method information on the defect. The map comparison unit performs either or both of a fifth comparison between the first map and the third map based on the defect correction method information and a sixth comparison between the second map and the fourth map based on the defect correction method information. The first determination unit determines, based on the defect correction method information and either or both of the fifth comparison and the sixth comparison, whether the correction is appropriate.

2. 发明申请

US20150379707A1 MASK INSPECTION APPARATUS, MASK EVALUATION METHOD AND MASK EVALUATION SYSTEM 有权
标题翻译：屏蔽检查装置，掩蔽评估方法和掩蔽评估系统
公开(公告)号：US20150379707A1
公开(公告)日：2015-12-31
申请号：US14748967
申请日：2015-06-24
申请人： NuFlare Technology, Inc.
发明人： Hideo TSUCHIYA , Nobutaka Kikuiri , Ikunao Isomura
IPC分类号： G06T7/00 , H04N5/225 , G06K9/62 , H04N7/18 , G06K9/52
CPC分类号： G06K9/6218 , G06T7/001 , G06T2207/30148
摘要： A mask inspection apparatus includes an optical image acquisition unit configured to acquire an optical image by irradiating light on a mask, a reference image generation unit configured to generate a reference image from design data of the mask, a comparison circuit configured to compare the optical image with the reference image, a pattern data extraction unit configured to obtain coordinates of a defective portion determined to be defective by the comparison unit and to extract, from the design data, pattern data of a predetermined dimension range including the coordinates, and an interface unit configured to supply an aerial image measurement apparatus with information associated with the defect, the information including the defect coordinates and the extracted pattern data.
摘要翻译：掩模检查装置包括：光学图像获取单元，被配置为通过在掩模上照射光来获取光学图像;参考图像生成单元，被配置为从掩模的设计数据生成参考图像;比较电路，被配置为比较光学图像利用参考图像，图案数据提取单元，被配置为获得由比较单元确定为有缺陷的缺陷部分的坐标，并从设计数据中提取包括坐标的预定尺寸范围的图案数据，以及接口单元配置为向空间图像测量装置提供与缺陷相关联的信息，该信息包括缺陷坐标和提取的图案数据。

3. 发明授权

US09165355B1 Inspection method 有权
标题翻译：检验方法
公开(公告)号：US09165355B1
公开(公告)日：2015-10-20
申请号：US14208757
申请日：2014-03-13
申请人： NuFlare Technology, Inc.
发明人： Hideo Tsuchiya , Manabu Isobe , Hiroteru Akiyama , Makoto Yabe , Takafumi Inoue , Nobutaka Kikuiri
IPC分类号： G06K9/00 , G06T7/00 , G06K9/62
CPC分类号： G06T7/0006 , G01N21/95607 , G01N2021/95615 , G03F1/84 , G03F7/7065 , G06K9/6215 , G06T7/0008 , G06T7/001 , G06T7/74 , G06T2200/24 , G06T2207/30108 , G06T2207/30148 , G06T2207/30168
摘要： An inspection method comprising, virtually dividing a sample, in which a plurality of chip patterns are formed, into a plurality of strip-shaped stripes along a predetermined direction to acquire an optical image of the chip pattern in each of the stripes, performing filtering based on design data of the chip pattern to produce a reference image corresponding to the optical image, comparing the chip pattern using a die-to-database method and comparing a repetitive pattern portion in the chip pattern using a cell method, obtaining at least one of a dimension difference and a dimension ratio between a pattern of the optical image and a pattern of the reference image compared to the pattern of the optical image by the die-to-database method; and obtaining a dimension distribution of the plurality of chip patterns from at least one of the dimension difference and the dimension ratio.
摘要翻译：一种检查方法，其特征在于，沿着规定的方向，将形成有多个芯片图案的样品实际上分割为多个条状条，从而获得每个条纹中的芯片图案的光学图像，对所述芯片图案的设计数据进行编码以产生与所述光学图像相对应的参考图像，使用芯片到数据库方法比较所述芯片图案，并使用单元方法比较所述芯片图案中的重复图案部分，获得至少一个通过模 - 数据库方法与光学图像的图案相比，光学图像的图案和参考图像的图案之间的尺寸差和尺寸比; 以及从所述尺寸差和尺寸比中的至少一个获得所述多个芯片图案的尺寸分布。

4. 发明授权

US09116136B2 Inspection method and system 有权
标题翻译：检验方法和制度
公开(公告)号：US09116136B2
公开(公告)日：2015-08-25
申请号：US13926060
申请日：2013-06-25
申请人： NuFlare Technology, Inc
发明人： Hiromu Inoue , Nobutaka Kikuiri
IPC分类号： G01B11/24 , G01N21/956 , G01N21/95
CPC分类号： G01N21/956 , G01B11/24 , G01N21/9501 , G01N21/9505 , G01N21/95607
摘要： A sample, which has a mesa portion having a pattern thereon, is placed on a Z table. Light is irradiated to the mesa portion through an optical system and light reflected by the mesa portion is received to measure a height of the mesa portion. A height map of the mesa portion is created based on a height of a corner position. A height using the height map is corrected based on a deviation of a measured value from a target value, and a temporal variation of a focal position of light irradiated to the mesa portion. An optical image of the pattern is obtained based on the corrected height of the mesa portion. The optical image is compared with a reference image and a defect is determined when a difference value between the optical image and the reference image is more than a predetermined threshold value.
摘要翻译：将具有其上具有图案的台面部分的样品放置在Z台上。光通过光学系统照射到台面部分，并且接收由台面部分反射的光以测量台面部分的高度。基于角位置的高度来创建台面部分的高度图。基于从目标值的测量值的偏差和照射到台面部分的光的焦点位置的时间变化来校正使用高度图的高度。基于台面部分的校正高度获得图案的光学图像。将光学图像与参考图像进行比较，并且当光学图像和参考图像之间的差值大于预定阈值时确定缺陷。

5. 发明授权

US08861832B2 Inspection system and method 有权
标题翻译：检验制度和方法
公开(公告)号：US08861832B2
公开(公告)日：2014-10-14
申请号：US13768392
申请日：2013-02-15
申请人： NuFlare Technology, Inc.
发明人： Takafumi Inoue , Eiji Matsumoto , Nobutaka Kikuiri , Ikunao Isomura
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/20021 , G06T2207/30148
摘要： An inspection region of a mask is virtually divided by stripes, and a pattern on a position error correcting unit is also virtually divided by stripes. Then, a stage is moved such that all the stripes of both the mask and the position error correcting unit are continuously scanned, so that optical images of these stripes are acquired. Fluctuation values of position coordinates of the patterns formed on the position error correcting unit are acquired from the optical images of the position error correcting unit. Based upon the fluctuation values, fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask are obtained so that the position coordinates are corrected. Thereafter, a map is generated from the fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask.
摘要翻译：掩模的检查区域实际上被条纹划分，并且位置误差校正单元上的图案也被实际上划分为条纹。然后，移动台，使得掩模和位置误差校正单元的所有条纹被连续地扫描，从而获得这些条纹的光学图像。从位置误差校正单元的光学图像中获取形成在位置误差校正单元上的图案的位置坐标的波动值。基于波动值，获得掩模的检查区域中各图案的位置坐标的波动值，从而校正位置坐标。此后，根据掩模的检查区域中的各图案的位置坐标的波动值生成地图。

6. 发明授权

US10777384B2 Multiple beam image acquisition apparatus and multiple beam image acquisition method 有权
公开(公告)号：US10777384B2
公开(公告)日：2020-09-15
申请号：US16199444
申请日：2018-11-26
申请人： NuFlare Technology, Inc.
发明人： Nobutaka Kikuiri , Atsushi Ando
IPC分类号： H01J37/28 , H01J37/244 , G01N23/2251 , H01J37/20 , H01J37/04
摘要： A multiple beam image acquisition apparatus includes a stage to mount thereon a target object, a beam forming mechanism to form multiple primary electron beams and a measurement primary electron beam, a primary electron optical system to collectively irradiate the target object surface with the multiple primary electron beams and the measurement primary electron beam, a secondary electron optical system to collectively guide multiple secondary electron beams generated because the target object is irradiated with the multiple primary electron beams, and a measurement secondary electron beam generated because the target object is irradiated with the measurement primary electron beam, a multi-detector to detect the multiple secondary electron beams collectively guided, a measurement mechanism to measure a position of the measurement secondary electron beam collectively guided, and a correction mechanism to correct a trajectory of the multiple secondary electron beams by using a measured position of the measurement secondary electron beam.

7. 发明授权

US10572995B2 Inspection method and inspection apparatus 有权
公开(公告)号：US10572995B2
公开(公告)日：2020-02-25
申请号：US15947090
申请日：2018-04-06
申请人： NuFlare Technology, Inc.
发明人： Hiromu Inoue , Nobutaka Kikuiri
IPC分类号： G06T7/00 , G03F1/84 , G01N21/956
摘要： A high resolution optical image is acquired by irradiating a mask with light emitted by a light source via a high resolution optical system. A low resolution optical image is acquired by irradiating the same mask with the light via a low resolution optical system. The design data of the mask pattern is corrected in light of shapes and dimensions determined according to at least one of a manufacturing process of the mask and a manufacturing process of a semiconductor device to be manufactured by transferring the mask pattern to a semiconductor wafer. Reference image data are generated corresponding to the high resolution optical image and the low resolution optical image. Whether the defect detected in the high resolution optical image is true or false is determined according to information of the defect detected in the low resolution optical image.

8. 发明授权

US10026011B2 Mask inspection apparatus, mask evaluation method and mask evaluation system 有权
公开(公告)号：US10026011B2
公开(公告)日：2018-07-17
申请号：US14748967
申请日：2015-06-24
申请人： NuFlare Technology, Inc.
发明人： Hideo Tsuchiya , Nobutaka Kikuiri , Ikunao Isomura
IPC分类号： G06T7/00 , G06K9/62
摘要： A mask inspection apparatus includes an optical image acquisition unit configured to acquire an optical image by irradiating light on a mask, a reference image generation unit configured to generate a reference image from design data of the mask, a comparison circuit configured to compare the optical image with the reference image, a pattern data extraction unit configured to obtain coordinates of a defective portion determined to be defective by the comparison unit and to extract, from the design data, pattern data of a predetermined dimension range including the coordinates, and an interface unit configured to supply an aerial image measurement apparatus with information associated with the defect, the information including the defect coordinates and the extracted pattern data.

9. 发明授权

US09659361B2 Measuring apparatus that generates positional deviation distribution of a pattern on a target object 有权
公开(公告)号：US09659361B2
公开(公告)日：2017-05-23
申请号：US14529358
申请日：2014-10-31
申请人： NuFlare Technology, Inc.
发明人： Ikunao Isomura , Nobutaka Kikuiri
IPC分类号： G06T7/00 , H01L21/66
CPC分类号： G06T7/001 , G06T7/0008 , G06T2207/10016 , G06T2207/20021 , G06T2207/30148 , H01L22/12
摘要： A measuring apparatus includes an optical image input unit to input optical image data of a figure pattern obtained by a pattern inspection apparatus, which inspects defects of a pattern on a target object to be inspected by scanning an inspection region of the target object, from the pattern inspection apparatus, a design data input unit to input design data of the pattern on the target object, a reference image generation unit to generate reference image data to be compared with the optical image data, by performing image development of the design data, a positional deviation distribution generation unit to generate positional deviation distribution by measuring a positional deviation amount of the pattern on the target object, by using the optical image data obtained from the pattern inspection apparatus and the reference image data having been generated, and an output unit to output generated positional deviation distribution of the pattern.

10. 发明授权

US09530202B2 Inspection apparatus and inspection method 有权
标题翻译：检验仪器和检验方法
公开(公告)号：US09530202B2
公开(公告)日：2016-12-27
申请号：US14607483
申请日：2015-01-28
申请人： NuFlare Technology, Inc.
发明人： Nobutaka Kikuiri
IPC分类号： G06T7/00 , G06K9/52 , G06K9/62
CPC分类号： G06T7/001 , G06K9/52 , G06K9/6215 , G06T2207/30148
摘要： An inspection apparatus includes an optical image acquisition unit to acquire an optical image of a photomask on which a plurality of figure patterns are formed, a first measurement unit to measure a first positional deviation amount in the horizontal direction at each position on the photomask accompanying deflection of the surface of the photomask generated by supporting the photomask using a support method which is used for acquiring the optical image, a second measurement unit to measure a second positional deviation amount of each of the plurality of figure patterns, by using the optical image, and a difference map generation unit to generate a difference map in which a difference value obtained by subtracting the first positional deviation amount from the second positional deviation amount is used as a map value, with respect to a region on the surface of the photomask.
摘要翻译：检查装置包括光学图像获取单元，用于获取其上形成有多个图形图案的光掩模的光学图像;第一测量单元，用于测量伴随偏转的光掩模上的每个位置处的水平方向上的第一位置偏差量通过使用用于获取光学图像的支持方法来支持光掩模而生成的光掩模的表面的第二测量单元，通过使用光学图像来测量每个图形图案的第二位置偏差量的第二测量单元，以及差分图生成单元，用于生成相对于光掩模表面的区域，将从第二位置偏差量减去第一位置偏差量而得到的差分值用作映射值的差分图。

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