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91. 发明申请

US20190214287A1 RETICLE PRESSING UNIT AND EUV RETICLE POD USING SAME 审中-公开
公开(公告)号：US20190214287A1
公开(公告)日：2019-07-11
申请号：US16232164
申请日：2018-12-26
申请人： Gudeng Precision Industrial Co., LTD
发明人： MING-CHIEN CHIU , CHIA-HO CHUANG , HSIN-MIN HSUEH
IPC分类号： H01L21/673 , G03F7/20
摘要： A reticle pressing unit and an EUV reticle pod using the same are provided. An inner assembly includes an upper cover and a lower cover. The lower cover includes a supporting element for supporting the reticle. A pressing unit for pressing the reticle is disposed on the upper cover and includes a pressing element and a limiting cap. The pressing element has oppositely arranged pressing part and pressure receiving part. The pressing part extends through the upper cover to press against the reticle. The pressing element is covered by the limiting cap and is protruded outwardly from a top surface of the to limiting cap. An outer cover has a pushing surface for forming a surface-to-surface contact with the pressure receiving part and for simultaneously pressing against the pressure receiving part and the top surface to solve the problems relating to the reticle which is applied with uneven forces.

92. 发明授权

US10103045B2 Vertical fixing transmission box and transmission method using the same 有权
公开(公告)号：US10103045B2
公开(公告)日：2018-10-16
申请号：US15385017
申请日：2016-12-20
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： Kuan-Chun Liu , Wei-Yen Chen , Chia-Ho Chuang , Ming-Chien Chiu
IPC分类号： H01L21/673 , H01L21/677
摘要： A vertical fixing transmission box used for transmitting a container is disclosed. The transmission box includes a carrier substrate and an elastic component, wherein the carrier substrate is utilized to carry the container, and the elastic component may be switched between an opening state and a fixing state. When the container is carried by the carrier substrate and the elastic component is switched to the opening state, the elastic component provides a vertical elastic force to abut against the container downwardly and fix the container. Also, the transmission box may be transported by an automatic material handling system.

93. 发明授权

US10101047B2 Gas purifier for wafer substrate accommodating unit 有权
公开(公告)号：US10101047B2
公开(公告)日：2018-10-16
申请号：US13834796
申请日：2013-03-15
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： Ming-Mo Lo , Cheng-Hsin Chen , Tien-Jui Lin
IPC分类号： F24F7/04 , H01L21/673
摘要： A gas purifier to be applied on a wafer substrate accommodating unit with an inlet hole includes an outer tube and an inner tube. The outer tube is disposed on the wafer substrate accommodating unit and has a plurality of first gas filling apertures. One end of the inner tube is a closed end and the other end is an open end. The inner tube has a plurality of second gas filling apertures, and its open end is interconnected with the inlet hole. The inner tube is movably disposed within the outer tube between a first operating position and second operating position. The second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and interconnected with the first gas filling apertures when the inner tube is at a second operating position.

94. 发明申请

US20180210334A1 RETICLE POD 审中-公开
公开(公告)号：US20180210334A1
公开(公告)日：2018-07-26
申请号：US15651399
申请日：2017-07-17
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： Hsin-Min HSUEH , Chia-Ho CHUANG , Cheng-Ju LEE , Jeng-Jie HUANG
IPC分类号： G03F1/66 , H01L21/673 , B65D25/10 , B65D85/38
CPC分类号： G03F1/66 , B65D25/10 , B65D85/38 , H01L21/67359 , H01L21/67366 , H01L21/67376
摘要： A reticle pod for accommodating a reticle is provided. The reticle pod comprises a base; a cover; and at least one supporting member. When the reticle is accommodated on the reticle pod, the supporting member abuts against the reticle through a protrusion part; wherein the maximum static friction is constantly greater than a horizontal force applied to the support module from the reticle.

95. 发明授权

US09947563B2 Wafer container with air-tight device 有权
公开(公告)号：US09947563B2
公开(公告)日：2018-04-17
申请号：US14645648
申请日：2015-03-12
申请人： Gudeng Precision Industrial Co., LTD.
发明人： Chih-Ming Lin , Chen-Hao Chang , Jui-Ken Kao
IPC分类号： B65D85/00 , H01L21/673
CPC分类号： H01L21/67376
摘要： A wafer container is provided. The wafer container includes a housing, a door and an air-tight device. The housing has a room with an opening formed therein, and a door frame surrounding the opening. The door fits in the door frame to close the opening. The air-tight device is disposed around the door, located between the door and the door frame, and having a protruding part extending toward the room. The protruding part has an early-stage pressure-adjusting element configured to exhaust a first gas from the room by pumping a second gas into the room when the door is closed.

96. 发明申请

US20160300735A1 PURGE DEVICES HAVING MICRONOZZLES AND OPERATING METHODS THEREOF 有权
标题翻译：具有微量元素的装置及其操作方法
公开(公告)号：US20160300735A1
公开(公告)日：2016-10-13
申请号：US14740664
申请日：2015-06-16
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： YUNG-CHIN PAN , ZHI-HUANG ZHONG , AN-PANG WANG
IPC分类号： H01L21/67 , B08B5/02
CPC分类号： B08B5/02 , A47L9/08 , H01L21/67028
摘要： The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean pellicles used in semiconductor manufacturing. The purge devices having micronozzles comprises a base, at least one track configured on the base, a rotation platform, and a micronozzle array, in which the micronozzle array further comprises an air duct and a plurality of nozzles. Additionally, the rotation platform and the micronozzle array are able to move relatively to another along the at least one track.
摘要翻译：本发明提供了具有微喷嘴的清洗装置及其操作方法。具有微喷嘴的吹扫装置被操作以清洁半导体制造中使用的薄膜。具有微喷嘴的吹扫装置包括基座，在基座上配置的至少一个轨道，旋转平台和微喷嘴阵列，其中微喷嘴阵列还包括空气管道和多个喷嘴。此外，旋转平台和微喷嘴阵列能够沿着至少一个轨道相对移动到另一个轨道。

97. 发明申请

US20160276187A1 OPERATING METHODS OF PURGE DEVICES FOR CONTAINERS 有权
标题翻译：集装箱灌装装置的操作方法
公开(公告)号：US20160276187A1
公开(公告)日：2016-09-22
申请号：US14801823
申请日：2015-07-16
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： YUNG-CHIN PAN , SHUN-SHENG CHIU
IPC分类号： H01L21/673
CPC分类号： H01L21/67389
摘要： Operating methods of purge devices for containers are provided. The operating methods comprise a step of aligning an opening of a container to a first purging unit and placing the container in the purge device. After the container is purged, the container will be heated and filled with extreme clean dry air (XCDA) or nitrogen to finalize the purging process.
摘要翻译：提供容器清洗装置的操作方法。操作方法包括将容器的开口对齐到第一清洗单元并将容器放置在净化装置中的步骤。清洗容器后，容器将被加热并充满干净的干燥空气（XCDA）或氮气，以完成清洗过程。

98. 发明申请

US20160085144A1 EXTREME ULTRAVIOLET (EUV) POD HAVING MARKS 有权
标题翻译：极品ULTRAVIOLET（EUV）POD有标记
公开(公告)号：US20160085144A1
公开(公告)日：2016-03-24
申请号：US14862334
申请日：2015-09-23
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： WEI-YEN CHEN , CHENG-JU LEE , LONG-MING LU , CHENG-HSIN CHEN , TIEN-JUI LIN
IPC分类号： G03F1/22
CPC分类号： G03F1/22 , G03F1/42 , G03F1/66
摘要： The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
摘要翻译：本发明涉及具有标记的EUV舱，其包括掩模舱和设置在掩模舱上的一个或多个标记。处理机的一个或多个传感器用于检测一个或多个标记。通过包括一个或多个标记，可以改变由一个或多个传感器可检测的掩模盒的一个或多个区域的表面粗糙度。一个或多个传感器向掩模盒发射光，其将光反射到一个或多个传感器。一个或多个传感器接收来自掩模盒的反射光，并判断由反射光产生的电压是否落在标记的反射范围内。因此，可以确认一个或多个传感器对应于一个或多个构件。

99. 发明授权

US08973199B2 Photomask cleaning device 有权
标题翻译：光掩模清洗装置
公开(公告)号：US08973199B2
公开(公告)日：2015-03-10
申请号：US13761236
申请日：2013-02-07
申请人： Gudeng Precision Industrial Co, Ltd.
发明人： Yung-Chin Pan
IPC分类号： G03F1/82 , B08B1/00 , B08B3/02
CPC分类号： G03F1/82
摘要： A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.
摘要翻译：光掩模清洁装置包括台，流体分配器，擦洗单元，盖和定影单元。流体分配器包括对应于洗涤单元设置的直接分配单元和倾斜分配单元，其将水喷射到光掩模上。可以通过倾斜分配单元和洗涤单元的组合应用来去除大部分颗粒。

100. 发明申请

US20140137356A1 Device for Cleaning Photomask 审中-公开
标题翻译：清洁光罩设备
公开(公告)号：US20140137356A1
公开(公告)日：2014-05-22
申请号：US13770942
申请日：2013-02-19
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： CHARNG-SHIUAN SUEN , YUNG-CHIN PAN
IPC分类号： B08B1/00
CPC分类号： B08B1/006 , B08B1/007 , G03F1/82
摘要： The invention proposes a device for cleaning photomask comprising a wiping member wrapped on the surface of a central axle and unceasingly washed by cleaning fluid. When the photomask contacts the central axle, the washed wiping member can clean the photomask by rotation of the central axle in light of direction of the photomask's moving. After being wiped clean, the photomask will not be stained with dust or dirt.
摘要翻译：本发明提出了一种用于清洁光掩模的装置，其包括缠绕在中心轴的表面上并由清洁液不断洗涤的擦拭构件。当光掩模接触中心轴时，洗涤的擦拭构件可以根据光掩模移动的方向通过中心轴的旋转来清洁光掩模。擦拭干净后，光掩模不会被灰尘或污垢污染。

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