
基本信息:
- 专利标题: 一种硅片预对准方法
- 专利标题(英):Pre-alignment method of silicon wafer
- 申请号:CN201511021917.0 申请日:2015-12-30
- 公开(公告)号:CN106933069A 公开(公告)日:2017-07-07
- 发明人: 周细文 , 孙伟旺 , 田翠侠 , 郑教增
- 申请人: 上海微电子装备有限公司 , 上海微高精密机械工程有限公司
- 申请人地址: 上海市浦东新区张东路1525号;
- 专利权人: 上海微电子装备有限公司,上海微高精密机械工程有限公司
- 当前专利权人: 上海微电子装备(集团)股份有限公司,上海微高精密机械工程有限公司
- 当前专利权人地址: 上海市浦东新区张东路1525号;
- 代理机构: 上海思微知识产权代理事务所
- 代理人: 屈蘅; 李时云
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; H01L21/68
The invention discloses a pre-alignment method of a silicon wafer. The pre-alignment method comprises the following steps of firstly, centering the silicon wafer by a centering platform, a lifting platform and a rotation platform so that the center of the silicon wafer is aligned to the center of the positioning platform; secondly, acquiring an image of the silicon wafer by image acquisition equipment; thirdly, dividing the image into a plurality of sub-regions from top to bottom by scribing grooves according to image characteristic; fourthly, processing the image, and acquiring a central axis of the scribing groove conforming to a set condition as a generalized mark; and finally, rotating the silicon wafer to complete direction according to a different value between the generalized mark and a designated on-chip angle. According to the surface characteristic of the silicon wafer in the acquired image, the image is divided into the plurality of sub-regions by the scribing grooves, the central axis of the scribing groove in the optimal level is acquired as the generalized mark, no extra mark is needed to be made on the silicon wafer, the influence of an external factor on the generalized mark is greatly reduced, high stability is achieved, and the recognition accuracy and the pre-alignment accuracy of the silicon wafer are improved.
公开/授权文献:
- CN106933069B 一种硅片预对准方法 公开/授权日:2018-07-20