基本信息:
- 专利标题： 一种表面波等离子体装置
- 专利标题（英）：Surface wave plasma device
- 申请号：CN201610121051.9 申请日：2016-03-03
- 公开(公告)号：CN107155256A 公开(公告)日：2017-09-12
- 发明人： 昌锡江 , 区琼荣 , 韦刚 , 黄亚辉
- 申请人： 北京北方微电子基地设备工艺研究中心有限责任公司
- 申请人地址： 北京市北京经济技术开发区文昌大道8号
- 专利权人： 北京北方微电子基地设备工艺研究中心有限责任公司
- 当前专利权人： 北京北方华创微电子装备有限公司
- 当前专利权人地址： 北京市北京经济技术开发区文昌大道8号
- 代理机构： 北京天昊联合知识产权代理有限公司
- 代理人： 彭瑞欣; 张天舒
- 主分类号： H05H1/46
- IPC分类号： H05H1/46
The invention provides a surface wave plasma device. A connection cavity is used to connect a resonant cavity and a rectangular waveguide. A screw probe extends into the resonant cavity via the rectangular waveguide and the connection cavity, so that microwave energy is fed in the connection cavity and the resonant cavity. By arranging a plurality of quartz windows in the bottom wall of the resonant cavity, the electric field of a standing wave formed in the resonant cavity by a microwave, and plasma is activated in the vacuum cavity. The plurality of quartz windows are equal to a plurality of plasma sources, which achieves uniformization of the plasma in the vacuum cavity in a large area compared with the conventional single plasma source, so as to meet the processing requirement for large-scale wafers.