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91. 发明申请

US20080041719A1 Circulated cooled target 有权
标题翻译：循环冷却目标
公开(公告)号：US20080041719A1
公开(公告)日：2008-02-21
申请号：US11500936
申请日：2006-08-09
申请人： Wuu-Jyh Lin , Mao-Hsung Chang , Ping-Yen Huang , Jenn-Tzong Chen , Ting-Shien Duh , Dow-Che Chen , Kuo-Yuan Chu
发明人： Wuu-Jyh Lin , Mao-Hsung Chang , Ping-Yen Huang , Jenn-Tzong Chen , Ting-Shien Duh , Dow-Che Chen , Kuo-Yuan Chu
IPC分类号： C23C14/00
CPC分类号： H01J37/3497 , H01J37/3435
摘要： A liquid and a gas is constantly filled into a target chamber of a target. Then the liquid and the gas flow around the chamber and are flown out. By doing so, the target is effectively cooled down.
摘要翻译：液体和气体不断地被填充到目标的靶室中。然后液体和气体流过室并流出。通过这样做，目标被有效地冷却下来。

92. 发明申请

US20080017501A1 COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN 审中-公开
标题翻译：冷藏深色空间屏蔽多阴极设计
公开(公告)号：US20080017501A1
公开(公告)日：2008-01-24
申请号：US11780474
申请日：2007-07-20
申请人： Makoto INAGAWA
发明人： Makoto INAGAWA
IPC分类号： C23C14/34 , C23C14/04 , C23C14/50
CPC分类号： C23C14/3407 , H01J37/34 , H01J37/3408 , H01J37/3435 , H01J37/3441 , H01J37/3497
摘要： A cooled dark space shield for a multi-cathode, large area PVD apparatus is disclosed. For multi-cathode systems, a dark space shield between adjacent cathodes/targets may be beneficial. The shields may be grounded and provide a path to ground for electrons present within a sputtering plasma. Because the shields are between adjacent targets, the grounded shields may contribute to the formation of a uniform plasma within the processing space by acting as anodes. As the temperatures in the chamber fluxuate between a processing temperature and a downtime temperature, the shields may expand and contract. Cooling the shields reduces the likelihood of expansion and contraction and thus, reduces the amount of flaking that may occur. Embossing the surface of the shields may reduce the amount of material deposited onto the shields and control the expansion and contraction of the shields.
摘要翻译：公开了一种用于多阴极，大面积PVD装置的冷却的暗空间屏蔽。对于多阴极系统，相邻阴极/靶之间的暗空间屏蔽可能是有益的。屏蔽层可以接地，并为溅射等离子体中存在的电子提供到地面的路径。由于屏蔽层位于相邻的目标之间，所以接地的屏蔽件可能通过作为阳极而有助于在处理空间内形成均匀的等离子体。当室内的温度在加工温度和停机温度之间流动时，屏蔽件可能膨胀和收缩。冷却屏蔽减少膨胀和收缩的可能性，从而减少可能发生的剥落量。压印屏蔽表面可能会减少沉积在屏蔽上的材料的数量并控制屏蔽层的膨胀和收缩。

93. 发明授权

US07315128B2 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition 有权
标题翻译：用于电离物理气相沉积的磁增强电容等离子体源
公开(公告)号：US07315128B2
公开(公告)日：2008-01-01
申请号：US11381866
申请日：2006-05-05
申请人： Mirko Vukovic , Derrek Andrew Russell
发明人： Mirko Vukovic , Derrek Andrew Russell
IPC分类号： H01J7/24 , H01J17/14
CPC分类号： H01J37/3405 , H01J37/32082 , H01J37/32091 , H01J37/32532 , H01J37/3266 , H01J37/32724 , H01J37/3414 , H01J37/3461 , H01J37/3497 , H01J2237/332
摘要： A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and maybe a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surface magnet generally parallel to the electrode surface with a magnetic field extending radially over the electrode surface. Side magnets, such as inner and outer annular ring magnets, have polar axes that intersect the electrode with poles closest to the electrode of the same polarity as the adjacent pole of the surface magnet. A ferromagnetic back plate or back magnet interconnects the back poles of the side magnets. A ferromagnetic shield behind the magnet pack confines the field away from the iPVD material source.
摘要翻译：用于iPVD的电容等离子体源被浸没在强的局部磁场中，并且可以是用于iPVD的电感耦合等离子体（ICP）源的替代。源极包括环形电极，其后面具有磁体组件，其包括大致平行于电极表面的表面磁体，其中磁场沿电极表面径向延伸。诸如内外环形磁铁的侧磁体具有与电极相交的极轴，极点与最靠近与表面磁体的相邻磁极相同极性的电极。铁磁背板或后磁铁将侧磁体的后极互连。磁铁组件后面的铁磁屏蔽将场离开iPVD材料源。

94. 发明申请

US20060118412A1 Magnetron sputter cathode 有权
标题翻译：磁控溅射阴极
公开(公告)号：US20060118412A1
公开(公告)日：2006-06-08
申请号：US11284439
申请日：2005-11-21
申请人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
发明人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
IPC分类号： C23C14/00
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3408
摘要： To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).
摘要翻译：为了能够实现相对宽的磁控溅射阴极，提出在载体（2）的真空侧上设置带有背板（3）的溅射靶（4），其将间隙（14）从载体（2）。背板（3）显影为冷却板。在其中设置有冷却装置通道（15），其通过载体（2）的入口（16）被供应冷却流体，冷却流体可以经由出口（17）再次通过载体（2）流出。在大气一侧设有磁铁配置（5）。

95. 发明授权

US06841051B2 High-power ion sputtering magnetron 失效
标题翻译：大功率离子溅射磁控管
公开(公告)号：US06841051B2
公开(公告)日：2005-01-11
申请号：US10763627
申请日：2004-01-23
申请人： Daniel T. Crowley
发明人： Daniel T. Crowley
IPC分类号： C23C14/34 , H01J37/34 , C23C14/35
CPC分类号： H01J37/3411 , H01J37/3405 , H01J37/3497
摘要： A high-power ion sputtering magnetron having a rotary cathode comprising a conducting member disposed within the rotary cathode being made of an electrically conductive material for conducting electrical current from the power supply to the rotary cathode. The ion sputtering magnetron also has an electromagnetic field shield disposed between the conducting member and the drive shaft portion. The field shield is made of an electromagnetic field-permeable material such as a ferrous material for reducing damage to parts adjacent to the conducting member that are susceptible to inductive magnetic heating.
摘要翻译：具有旋转阴极的高功率离子溅射磁控管，其包括设置在旋转阴极内的导电构件，其由用于将电流从电源传导到旋转阴极的导电材料制成。离子溅射磁控管还具有设置在导电构件和驱动轴部分之间的电磁场屏蔽。场屏蔽由诸如铁类材料的电磁场可透过材料制成，用于减少对导电构件附近的对感应磁加热敏感的部件的损坏。

96. 发明申请

US20040045670A1 Cooling system for magnetron sputtering apparatus 有权
标题翻译：磁控溅射装置冷却系统
公开(公告)号：US20040045670A1
公开(公告)日：2004-03-11
申请号：US10655949
申请日：2003-09-05
申请人： Applied Materials, Inc.
发明人： Avi Tepman
IPC分类号： H01L021/306
CPC分类号： H01J37/3497 , H01J37/3405
摘要： Apparatus and method for cooling a magnetron sputtering apparatus. More particularly, a system including a stationary conduit, a hollow drive shaft rotatably coupled to the stationary conduit, and a magnetron coupled to the hollow drive shaft.
摘要翻译：用于冷却磁控管溅射装置的装置和方法。更具体地，包括固定导管，可旋转地联接到固定导管的中空驱动轴和耦合到中空驱动轴的磁控管的系统。

97. 发明授权

US06689254B1 Sputtering apparatus with isolated coolant and sputtering target therefor 失效
标题翻译：具有隔离冷却剂和溅射靶的溅射装置
公开(公告)号：US06689254B1
公开(公告)日：2004-02-10
申请号：US08439490
申请日：1995-05-11
申请人： Steven Hurwitt
发明人： Steven Hurwitt
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/34 , H01J37/3408 , H01J37/3414 , H01J37/3423 , H01J37/3455 , H01J37/3458 , H01J37/3497
摘要： A sputtering apparatus is provided with a cathode assembly formed of a cathode unit having a moveable magnet assembly and a cooling water source therein, and a removable target assembly that includes a replaceable target unit and a removable and preferably reusable cooling jacket that seals to the rear face of the target unit and encloses a cooling cavity therebetween. Ducts are configured to automatically disconnect and reconnect the cooling cavity to the water source when the target assembly is removed from and reconnected in the cathode assembly. The target unit includes a volume of sputtering material on which is a front sputtering face, and has a recessed rim surrounding the sputtering face. The rim is configured to form a vacuum seal to the wall of a sputtering chamber and a water seal to the cooling jacket. Thereby, the magnet assembly is isolated from contact with the cooling liquid. A central connection, preferably in the form of a projecting hub, is centered at the target unit back and connects to a shaft in the cathode assembly to support the target material against distortion from pressure and heat variances, generally tending to force the center of the target into the processing chamber. Preferably, the target is formed of an integral piece of sputtering material, where the material permits, and otherwise the rim and hub may be part of a backing plate bonded to the target material to form the target unit. In either event, the back of the target unit is intrinsically, or is coated or otherwise treated to be, impermeable to contamination from the cooling water.
摘要翻译：溅射装置设置有由阴极单元形成的阴极组件，阴极单元具有可移动的磁体组件和冷却水源，以及可移除的目标组件，其包括可更换的目标单元和可拆卸且优选地可重复使用的冷却套，其密封到后部目标单元的表面并且在其间包围冷却腔。管道被配置为当目标组件从阴极组件中移出并重新连接时自动断开并重新连接冷却腔至水源。目标单元包括溅射材料的体积，其上是前溅射面，并且具有围绕溅射面的凹陷边缘。轮辋构造成对溅射室的壁形成真空密封，并将冷却套的水封形成真空密封。由此，磁体组件与冷却液接触隔离。优选地以突出轮毂的形式的中心连接在目标单元的后面中心并且连接到阴极组件中的轴以支撑目标材料以防止来自压力和热变化的变形，通常倾向于迫使目标进入处理室。优选地，目标由整体的溅射材料形成，其中材料允许，否则边缘和轮毂可以是结合到目标材料的背板的一部分以形成目标单元。在任一情况下，目标单元的背面本质上或被涂覆或以其他方式被处理为不可渗透的来自冷却水的污染物。

98. 发明授权

US06221217B1 Physical vapor deposition system having reduced thickness backing plate 有权
标题翻译：物理气相沉积系统具有减小厚度的背板
公开(公告)号：US06221217B1
公开(公告)日：2001-04-24
申请号：US09205113
申请日：1998-12-03
申请人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
发明人： Mehrdad M. Moslehi , Dorian Heimanson , Cecil J. Davis , Thomas R. Omstead
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , C23C14/35 , H01J37/3408 , H01J37/3497
摘要： A magnetron sputtering system is provided that uses cooling channels in the magnetron assembly to cool the target. The magnetron sputtering system also generates low pressure region in the magnetron assembly such that the backing plate sees a pressure differential much lower than atmospheric pressure. In one embodiment, the backing plate includes a center post to support the backing plate during operation. The backing plate is reduced in thickness and provides less of a barrier to the generated magnetic field.
摘要翻译：提供磁控溅射系统，其使用磁控管组件中的冷却通道来冷却靶。磁控管溅射系统还在磁控管组件中产生低压区域，使得背板看到的压差远低于大气压。在一个实施例中，背板包括在操作期间支撑背板的中心柱。背板的厚度减小，并且对产生的磁场提供较少的屏障。

99. 发明授权

US06171461B2 Sputtering cathode 失效
标题翻译：溅射阴极
公开(公告)号：US06171461B2
公开(公告)日：2001-01-09
申请号：US09009219
申请日：1998-01-20
申请人： Mark A. Bernick
发明人： Mark A. Bernick
IPC分类号： C23C1434
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3408
摘要： A magnetron sputtering electrode for use within a magnetron sputtering device having more uniform cooling of the target with the use of a water chamber including water diverters to establish a turbulent water flow within the water chamber. The electrode also includes a direct power coupling to the cathode body to avoid degradation of the power supplied to the electrode. The electrode further includes introduction of process gas in an interstitial space between the anode shield and the cathode shield. The electrode also includes the use of removable shaped magnets providing improved target utilization and run times and a choice of erosion pattern and balanced or unbalanced sputtering by simple magnet substitution. In one embodiment, the invention includes the use of a threaded anode shield and a threaded cathode shield which significantly reduces the overall electrode size for a given target diameter.
摘要翻译：一种用于磁控溅射装置的磁控溅射电极，其具有使用包括水分配器的水室更均匀地冷却靶材，以在水室内建立湍流水流。电极还包括与阴极体的直接电力耦合，以避免供给电极的功率的劣化。电极还包括在阳极屏蔽和阴极屏蔽之间的间隙空间中引入工艺气体。电极还包括使用可移除的成形磁体，其提供改善的目标利用率和运行时间，以及通过简单磁体替代选择侵蚀模式和平衡或不平衡溅射。在一个实施例中，本发明包括使用螺纹阳极屏蔽和螺纹阴极屏蔽，其显着降低给定目标直径的总体电极尺寸。

100. 发明授权

US5863398A Hot pressed and sintered sputtering target assemblies and method for making same 失效
标题翻译：热压和烧结溅射靶组件及其制造方法
公开(公告)号：US5863398A
公开(公告)日：1999-01-26
申请号：US729505
申请日：1996-10-11
申请人： Janine K. Kardokus , Diana Morales
发明人： Janine K. Kardokus , Diana Morales
IPC分类号： B22F7/08 , C23C14/34 , B23K20/00
CPC分类号： H01J37/3435 , B22F7/08 , C23C14/3414 , H01J37/3497 , B22F2998/00
摘要： Described is a hot pressed and sintered sputtering target assembly formed of hot pressed and sintered metal powder diffusion bonded together and to a backing plate by use of an intermediate adhesion layer of titanium or titanium alloy.
摘要翻译：描述了通过使用钛或钛合金的中间粘合层将由热压和烧结金属粉末扩散粘合在一起形成的热压和烧结溅射靶组件与背衬板形成。

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